公开(公告)号：US09059105B2

公开(公告)日：2015-06-16

申请号：US12442834

申请日：2007-12-26

申请人： Masahisa Ueda ,  Takashi Kurimoto ,  Michio Ishikawa ,  Koukou Suu ,  Toshiya Yogo

发明人： Masahisa Ueda ,  Takashi Kurimoto ,  Michio Ishikawa ,  Koukou Suu ,  Toshiya Yogo

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01L21/311 ,  H01J37/32

CPC分类号： H01L21/31138 ,  H01J37/3244

摘要： Disclosed is an ashing apparatus and its method of manufacture wherein decrease in processing efficiency is suppressed. Specifically, a shower plate is arranged to face a substrate stage on which a substrate is placed, and diffuses oxygen radicals supplied into a chamber. A metal blocking plate is arranged between the shower plate and the substrate stage and has a through hole through which oxygen radicals pass. In addition, the metal blocking plate has a first layer, which is made of a metal same as the one exposed in the substrate, on the surface facing the substrate.

摘要翻译： 公开了一种灰化装置及其制造方法，其中抑制了加工效率的降低。 具体而言，将淋浴板配置成面对放置有基板的基板台，并使供给到室内的氧自由基扩散。 金属阻挡板布置在淋浴板和衬底台之间，并且具有氧自由基通过的通孔。 此外，金属阻挡板具有在与基板相对的表面上由与基板中露出的金属相同的金属制成的第一层。

公开(公告)号：US20100089533A1

公开(公告)日：2010-04-15

申请号：US12442834

申请日：2007-12-26

申请人： Masahisa Ueda ,  Takashi Kurimoto ,  Michio Ishikawa ,  Koukou Suu ,  Toshiya Yogo

发明人： Masahisa Ueda ,  Takashi Kurimoto ,  Michio Ishikawa ,  Koukou Suu ,  Toshiya Yogo

IPC分类号： H01L21/3065

CPC分类号： H01L21/31138 ,  H01J37/3244

摘要： Disclosed is an ashing apparatus wherein decrease in processing efficiency is suppressed. Specifically, a shower plate is arranged to face a substrate stage on which a substrate is placed, and diffuses oxygen radicals supplied into a chamber. A metal blocking plate is arranged between the shower plate and the substrate stage and has a through hole through which oxygen radicals pass. In addition, the metal blocking plate has a first layer, which is made of a metal same as the one exposed in the substrate, on the surface facing the substrate.

摘要翻译： 公开了一种抑制加工效率降低的灰化装置。 具体而言，将淋浴板配置成面对放置有基板的基板台，并使供给到室内的氧自由基扩散。 金属阻挡板布置在淋浴板和衬底台之间，并且具有氧自由基通过的通孔。 此外，金属阻挡板具有在与基板相对的表面上由与基板中露出的金属相同的金属制成的第一层。

公开(公告)号：US20100317189A1

公开(公告)日：2010-12-16

申请号：US12676322

申请日：2008-09-03

申请人： Hideaki Zama ,  Michio Ishikawa ,  Takumi Kadota ,  Chihiro Hasegawa

发明人： Hideaki Zama ,  Michio Ishikawa ,  Takumi Kadota ,  Chihiro Hasegawa

IPC分类号： H01L21/768

CPC分类号： C23C16/18 ,  C23C16/045 ,  H01L21/28556 ,  H01L21/76843 ,  H01L21/76876 ,  H01L21/76877 ,  H01L29/7833

摘要： Disclosed is a method for manufacturing a semiconductor device which is decreased in resistance of a copper wiring containing a ruthenium-containing film and a copper-containing film, thereby having improved reliability. Also disclosed is an apparatus for manufacturing a semiconductor device. Specifically, an Ru film is formed on a substrate having a recessed portion by a CVD method using a raw material containing an organic ruthenium complex represented by the general formula and a reducing gas (step S12). Then, a Cu film is formed on the Ru film by a CVD method using a raw material containing an organic copper complex represented by the general formula and a reducing gas, thereby forming a copper wiring containing the Ru film and the Cu film in the recessed portion (step S14).

摘要翻译： 公开了一种制造半导体器件的方法，该半导体器件具有降低含有含钌膜和含铜膜的铜布线的电阻，从而提高了可靠性。 还公开了一种用于制造半导体器件的装置。 具体地说，通过使用含有由通式表示的有机钌络合物和还原气体的原料的CVD法，在具有凹部的基板上形成Ru膜（步骤S12）。 然后，通过CVD法使用含有通式表示的有机铜络合物的原料和还原气体在Ru膜上形成Cu膜，从而在凹陷部中形成含有Ru膜和Cu膜的铜布线 部分（步骤S14）。

公开(公告)号：US20090120787A1

公开(公告)日：2009-05-14

申请号：US12352011

申请日：2009-01-12

申请人： Yoshihiro OKAMURA ,  Satoru Toyoda ,  Michio Ishikawa

发明人： Yoshihiro OKAMURA ,  Satoru Toyoda ,  Michio Ishikawa

IPC分类号： C23C14/34

CPC分类号： H01L23/53238 ,  C23C14/046 ,  C23C14/185 ,  H01L21/2855 ,  H01L21/76831 ,  H01L21/76844 ,  H01L21/76864 ,  H01L21/76867 ,  H01L21/76873 ,  H01L21/76877 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： A barrier film of a semiconductor device is formed. The present invention forms a middle layer having copper as a main component and including a predetermined quantity of diffusible metal with the addition of a reaction gas, by sputtering an alloy target having copper as a main component with the addition of a diffusible metal, while supplying a reaction gas including oxygen or nitrogen. Since contents of the diffusible metal are accurately controlled when heating the middle layer, the barrier film is certainly formed. Additionally, the reaction gas is added to the middle layer so that the reactivity of the diffusible metal becomes high; and accordingly, it is possible to form the barrier film at a heating temperature lower than the conventional art.

摘要翻译： 形成半导体器件的阻挡膜。 本发明通过溅射具有铜作为主要成分的合金靶，通过添加可扩散金属，形成以铜为主要成分并包含预定量的可扩散金属并添加反应气体的中间层，同时供给 包括氧或氮的反应气体。 由于在加热中间层时能够精确地控制可扩散金属的含量，因此肯定形成阻挡膜。 另外，将反应气体添加到中间层，使得可扩散金属的反应性变高; 因此，可以在比传统技术更低的加热温度下形成阻挡膜。

公开(公告)号：US6061020A

公开(公告)日：2000-05-09

申请号：US995044

申请日：1997-10-31

申请人： Iwao Ishijima ,  Yasubumi Kanai ,  Michio Ishikawa ,  Akira Tsutsumi ,  Shigeki Sugiyama ,  Toshio Miyoshi

发明人： Iwao Ishijima ,  Yasubumi Kanai ,  Michio Ishikawa ,  Akira Tsutsumi ,  Shigeki Sugiyama ,  Toshio Miyoshi

IPC分类号： H04B15/00 ,  H04B7/00 ,  H04B7/10 ,  H01Q21/06 ,  H04B1/10 ,  H04B7/01

CPC分类号： H04B7/10

摘要： At a transmitting end, first and second dipole antennas are crossed each other by right angles and are arranged in a plane perpendicular to a propagating direction of radio wave. In first and second balanced modulators, a carrier signal is modulated with respective modulation signals having a phase difference of 90.degree. to produce balanced-modulated signals, which are then supplied to the first and second dipole antennas, respectively. Then a plane of polarization of a composite vector of radio waves transmitted by the dipole antennas is rotated at a frequency of the modulation signals, said frequency being higher than a fading frequency. The modulation signals are controlled by a state of a digital signal to be transmitted. At a receiving end, the digital signal is reproduced by receiving the transmitted radio wave by a conventional single side band receiver.

摘要翻译： 在发送端，第一和第二偶极子天线彼此交叉成直角，并且布置在与无线电波的传播方向垂直的平面中。 在第一和第二平衡调制器中，使用具有90°相位差的相应调制信号对载波信号进行调制，以产生平衡调制信号，然后将其分别提供给第一和第二偶极子天线。 然后由偶极天线发送的无线电波的复合矢量的偏振平面以调制信号的频率旋转，所述频率高于衰落频率。 调制信号由要发送的数字信号的状态控制。 在接收端，通过传统的单边带接收机接收发送的无线电波来再现数字信号。

公开(公告)号：US5606255A

公开(公告)日：1997-02-25

申请号：US28965

申请日：1993-03-10

申请人： Nobuyuki Shimbo ,  Junichi Ishiwata ,  Takatoshi Oyama ,  Fumio Ono ,  Michio Ishikawa

发明人： Nobuyuki Shimbo ,  Junichi Ishiwata ,  Takatoshi Oyama ,  Fumio Ono ,  Michio Ishikawa

IPC分类号： G01D5/245 ,  G01D5/14 ,  G01P3/488 ,  G01B7/14 ,  G01R33/06

CPC分类号： G01D5/147

摘要： A Hall effect sensing apparatus for a moving object includes a moving magnetic member having concave and convex segments alternately at is periphery, a detector including a pair of Hall effect elements for converting a magnetic signal to an electric signal, a processing circuit for processing signals from the detector, a magnet for providing magnetic field to the Hall effect elements, and a yoke provided in close proximity to the magnet. The yoke has a smaller surface area than that of the magnet and is movably arranged so as to adjust detecting sensitivity of the sensing apparatus. Therefore, even though there are some variances of magnetic characteristics in the detector, the detecting sensitivity of the sensing apparatus can be adjusted to an optimum level by observing a signal outputted from the processing circuit.

摘要翻译： 一种用于移动物体的霍尔效应感测装置包括：在周边交替地具有凹凸段的移动磁性部件，包括用于将磁信号转换为电信号的一对霍尔效应元件的检测器，用于处理来自 检测器，用于向霍尔效应元件提供磁场的磁体和靠近磁体设置的磁轭。 轭具有比磁体更小的表面积，并且可移动地布置，以便调节检测装置的检测灵敏度。 因此，即使在检测器中存在磁特性的一些变化，也可以通过观察从处理电路输出的信号将感测装置的检测灵敏度调整到最佳水平。

公开(公告)号：US5554418A

公开(公告)日：1996-09-10

申请号：US310760

申请日：1994-09-27

申请人： Kazuyuki Ito ,  Kyuzo Nakamura ,  Michio Ishikawa ,  Jun Togawa ,  Noriaki Tani ,  Masanori Hashimoto ,  Yumiko Ohashi

发明人： Kazuyuki Ito ,  Kyuzo Nakamura ,  Michio Ishikawa ,  Jun Togawa ,  Noriaki Tani ,  Masanori Hashimoto ,  Yumiko Ohashi

IPC分类号： C08J7/06 ,  C01B33/12 ,  C23C16/40 ,  G11B5/72 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84 ,  G11B7/26 ,  B05D3/06 ,  C23C16/00

CPC分类号： C23C16/402

摘要： A passivation film is formed by plasma CVD process in which organic oxysilane is used as a raw gas. When an SiO.sub.2 film as the passivation film is formed on a surface of a substrate, Ar, He or NH.sub.3 gas is used as a reactive gas which serves as an auxiliary for decomposing the raw gas. Ashing of the substrate by oxygen or hydrogen radicals is thus prevented. Fluorine group gas of CF.sub.4 or NF.sub.3 may be added to the reactive gas. The SiO.sub.2 film as a passivation film as described above may be formed first as an initial passivation film and then another passivation film may be formed on top of the initial passivation film by using a reactive gas having an ashing effect such as O.sub.2, N.sub.2 O, O.sub.3 and H.sub.2.

摘要翻译： 通过等离子体CVD工艺形成钝化膜，其中使用有机氧化硅作为原料气体。 当在基板的表面上形成作为钝化膜的SiO 2膜时，使用Ar，He或NH 3气体作为用作分解原料气体的辅助剂的反应性气体。 因此防止了氧或氢自由基的底物灰化。 可以将CF4或NF3的氟族气体加入反应气体中。 可以首先形成如上所述的钝化膜的SiO 2膜作为初始钝化膜，然后通过使用具有灰化效应的反应气体，例如O 2，N 2 O，O 3，可以在初始钝化膜的顶部形成另一钝化膜 和H2。

公开(公告)号：US5069983A

公开(公告)日：1991-12-03

申请号：US414235

申请日：1989-09-29

申请人： Kyuzo Nakamura ,  Yoshifumi Ota ,  Michio Ishikawa ,  Noriaki Tani ,  Masanori Hashimoto ,  Yuzo Murata

发明人： Kyuzo Nakamura ,  Yoshifumi Ota ,  Michio Ishikawa ,  Noriaki Tani ,  Masanori Hashimoto ,  Yuzo Murata

IPC分类号： G11B5/73 ,  G11B5/738

CPC分类号： G11B5/7325 ,  G11B5/738 ,  Y10S428/90 ,  Y10S428/928 ,  Y10T428/12465 ,  Y10T428/12847 ,  Y10T428/12854

摘要： A magnetic recording member having high coercive force, comprising:(a) a non-magnetic substrate;(b) a Cr base film formed on said substrate by a film forming process; and(c) a Co alloy film formed on said Cr base film by the same film forming process as in (b),wherein said Cr base film contains in addition to Cr at least one additional element selected from the group consisting of rare earth elements, Si, Cu, P and Ge, and wherein said Co alloy film is formed by continuous operation of said film forming process without interruption after completion of the formation of said Cr base film.

摘要翻译： 具有高矫顽力的磁记录元件，包括：（a）非磁性基片; （b）通过成膜工艺在所述基板上形成的Cr基膜; 和（c）通过与（b）中相同的成膜方法在所述Cr基膜上形成的Co合金膜，其中所述Cr基膜除Cr之外还含有至少一种选自稀土元素 Si，Cu，P和Ge，并且其中所述Co合金膜是在所述Cr基膜的形成完成之后，通过所述成膜工艺的连续操作而不间断地形成的。

公开(公告)号：US4473329A

公开(公告)日：1984-09-25

申请号：US314476

申请日：1981-10-23

申请人： Shozo Aoshima ,  Noboru Hirose ,  Michio Ishikawa

发明人： Shozo Aoshima ,  Noboru Hirose ,  Michio Ishikawa

IPC分类号： B23B47/18 ,  B23Q5/50 ,  B23Q11/04 ,  B23Q15/12 ,  B23Q17/09

CPC分类号： B23Q15/12 ,  B23B49/00 ,  B23Q11/04 ,  B23Q17/0966 ,  G05B2219/37344 ,  G05B2219/43152 ,  G05B2219/45129 ,  Y10T408/14 ,  Y10T408/172 ,  Y10T408/175 ,  Y10T408/21 ,  Y10T408/23

摘要： A drilling machine is provided with a quill feed device for reciprocating a quill, a driving member and a driven member, disposed between a spindle rotatably supported by the quill and a driving source therefor in such a manner as to produce a relative angular displacement therebetween according to magnitude of a load applied on a tool held by the spindle, a detector generating a series of pulse signals correlated to the relative angular displacement between both members, a counter numerically counting the pulse signals generated from the detector in respect of one rotation of the spindle, a memory memorizing numerical data, corresponding to the relative angular displacement while the tool being separated from a workpiece, counted by the counter device, and a comparator for comparing the value memorized in the memory and an actual counted value in the counter. The quill is, in the event the actual counted becomes larger than the memorized value by a predetermined limit, returned backwards once before being re-advanced.

摘要翻译： 钻孔机设置有用于使套筒往往运动的套筒进给装置，驱动构件和从动构件，其布置在由套筒可旋转地支撑的心轴和其驱动源之间，以便在它们之间产生相对的角位移， 产生与主轴保持的工具上施加的载荷的大小，检测器，产生与两个构件之间的相对角位移相关的一系列脉冲信号;计数器，对来自检测器的脉冲信号相对于 主轴，记忆数据数据的存储器，对应于工具与工件分离的相对角位移，由计数器装置计数;以及比较器，用于比较存储器中存储的值和计数器中的实际计数值。 如果实际计数超过存储值超过预定限制，则套筒将被重新提前一次返回。

公开(公告)号：US4451187A

公开(公告)日：1984-05-29

申请号：US347539

申请日：1982-02-10

申请人： Michio Ishikawa ,  Kiyoshi Sasaki

发明人： Michio Ishikawa ,  Kiyoshi Sasaki

IPC分类号： B23Q15/12 ,  B23B39/00 ,  B23B47/18 ,  B23C9/00 ,  B23Q11/04 ,  G05B19/416

CPC分类号： B23Q11/04 ,  G05B19/4163 ,  G05B2219/37391 ,  G05B2219/45129 ,  G05B2219/49047 ,  Y10T408/172 ,  Y10T408/23 ,  Y10T409/306832 ,  Y10T409/306888 ,  Y10T409/30728

摘要： A machine tool comprising a rotary drive unit rotating a tool or workpiece, a load torque detecting device disposed between the rotary drive unit and the tool or workpiece rotated thereby, a linear drive unit moving one of the tool and the workpiece toward and away from the other, a main start switch for actuating the rotary drive unit, and a control device. The control device starts the rotary drive unit upon actuation of the main start switch; starts the linear drive unit to allow the tool to initiate a cutting operation on the workpiece when a variation in a load torque within a given period detected by the detecting device has decreased down to a first preset limit; and reverse the operating direction of the linear drive unit to interrupt the cutting operation if and when a difference between a load torque currently detected by the detecting device after the start of the linear drive unit and a load torque detected by the detecting device after the decrease of said variation to the first preset limit and before the initiation of the cutting operation, has exceeded a second preset limit.

摘要翻译： 一种机床，包括旋转工具或工件的旋转驱动单元，设置在旋转驱动单元和由其旋转的工具或工件之间的负载扭矩检测装置，线性驱动单元，其将工具和工件中的一个移向和远离 另一方面，用于驱动旋转驱动单元的主启动开关和控制装置。 控制装置在主起动开关动作时启动旋转驱动单元; 当所述检测装置检测到的给定期间内的负载转矩的变化已经降低到第一预设极限时，启动所述线性驱动单元以允许所述工具启动对所述工件的切割操作; 并且如果当线性驱动单元开始之后由检测装置当前检测到的负载转矩与在减小后由检测装置检测到的负载转矩之间的差异以及当该线性驱动单元开始时的负载转矩之间的差异 的所述变化量与第一预设极限之间以及在切割操作开始之前已经超过了第二预设极限。