Bioelectric impedance measuring apparatus
    1.
    发明授权
    Bioelectric impedance measuring apparatus 有权
    生物电阻抗测量仪

    公开(公告)号:US06473641B1

    公开(公告)日:2002-10-29

    申请号:US09672899

    申请日:2000-09-29

    IPC分类号: A61B505

    摘要: Disclosed is a bioelectric impedance measuring apparatus which can prevent such abnormal condition than an excessive current is applied to a human body when elements in the circuit has failed or is damaged, with a simple circuit configuration and without decreasing the measuring accuracy of the bioelectric impedance. The bioelectric impedance measuring apparatus according to the present invention is configured such that a capacitor or a set of a capacitor and a resistor arranged in parallel with each other is installed between an electrode to be brought into contact with a human body and a bioelectric impedance measuring circuit section comprising a generating section for generating an alternating current applied to a human body for measurement, a measuring section for measuring a voltage value between the portions where the current is applied to the human body, a computing section for computing a bioelectric impedance value, and a central processing unit (CPU).

    摘要翻译: 本发明公开了一种生物电阻抗测量装置,其能够以简单的电路结构,并且不降低生物电阻抗的测量精度来防止在电路中的元件发生故障或损坏时向人体施加过大的电流。 根据本发明的生物电阻抗测量装置被配置为使得在要与人体接触的电极和电阻抗测量之间安装电容器或一组彼此并联布置的电容器和电阻器 电路部分,包括用于产生施加到人体进行测量的交流电的产生部分,用于测量电流施加到人体的部分之间的电压值的测量部分,用于计算生物电阻抗值的计算部分, 和中央处理单元(CPU)。

    RAIL RESTRAINING METHOD AND RAIL RESTRAINING DEVICE
    2.
    发明申请
    RAIL RESTRAINING METHOD AND RAIL RESTRAINING DEVICE 审中-公开
    铁路限制方法和铁路限制装置

    公开(公告)号:US20150082611A1

    公开(公告)日:2015-03-26

    申请号:US14376886

    申请日:2012-02-06

    IPC分类号: C21D11/00 C21D9/04

    摘要: A rail restraining method for restraining a hot-rolled rail in an upright position at a time of forced cooling of a head portion and a foot portion of the rail includes defining a predetermined position within 2 meters from each of both end faces of the rail along a longitudinal direction of the rail as a first restraining position, defining a predetermined position 3 to 10 meters from the first restraining position in a direction toward center of the rail along the longitudinal direction of the rail as a second restraining position at the time of forced cooling, and restraining displacement of the rail in a vertical direction at the first restraining position and the second restraining position by a restraining force F (kN) that satisfies following Expression (1): F≧100/L2  (1) where L2 (m) is a distance between the first restraining position and the second restraining position.

    摘要翻译: 在强制冷却导轨的头部和脚部的同时,将热轧钢轨限制在直立位置的轨道限制方法包括在轨道的两个端面中的每一个的2m内限定预定位置 作为第一约束位置的轨道的纵向方向,在强制时作为第二限制位置,沿着轨道的纵向方向将轨道的中心方向从第一限制位置3至10米限定为第二限制位置 通过满足以下表达式(1)的约束力F(kN)来抑制轨道在第一约束位置和第二约束位置处的垂直方向的位移:F≥100/ L2(1)其中L2(m )是第一约束位置和第二约束位置之间的距离。

    RAIL HEAT TREATMENT DEVICE AND RAIL HEAT TREATMENT METHOD
    3.
    发明申请
    RAIL HEAT TREATMENT DEVICE AND RAIL HEAT TREATMENT METHOD 有权
    铁路热处理装置和铁热处理方法

    公开(公告)号:US20150021836A1

    公开(公告)日:2015-01-22

    申请号:US14375232

    申请日:2012-02-06

    IPC分类号: C21D9/04 C21D11/00 C21D1/667

    摘要: A rail heat treatment device includes a cooling header, an oscillation mechanism, and a control system including: a storage unit that stores therein at least information required for a oscillation control; and a control unit that obtains a permissible range of required cooling time for a rail that satisfies a permissible range of hardness of the rail based on a correlation expression representing a correlation between the cooling time for the rail with the cooling header and the hardness of the rail after cooling, controls a stroke and a speed of relative reciprocation of the rail and the cooling header based on the permissible range of the required cooling time, and causes the oscillation mechanism to perform the relative reciprocation of the rail and the cooling header by the stroke and at the speed.

    摘要翻译: 轨道式热处理装置包括冷却集管,振荡机构和控制系统,包括:存储单元,其至少存储振荡控制所需的信息; 以及控制单元,其基于表示轨道与冷却集管的冷却时间与冷却集管的硬度之间的相关性的相关表达式,获得满足轨道的容许硬度范围的轨道所需的冷却时间的允许范围 冷却后的轨道基于所需冷却时间的允许范围来控制轨道和冷却集管的行程和速度,并且使振荡机构通过轨道和冷却集管的相对往复运动 中风和速度。

    NAVIGATION DEVICE AND METHOD OF CHANGING ROUTE FOR NAVIGATION DEVICE
    4.
    发明申请
    NAVIGATION DEVICE AND METHOD OF CHANGING ROUTE FOR NAVIGATION DEVICE 有权
    导航装置和改变导航装置路由的方法

    公开(公告)号:US20140372025A1

    公开(公告)日:2014-12-18

    申请号:US14373745

    申请日:2012-02-23

    申请人: Yoshikazu Yoshida

    发明人: Yoshikazu Yoshida

    IPC分类号: G01C21/36

    摘要: It is an object of the present invention to improve the operability of the operation of changing a route by setting a new waypoint or destination point in a navigation device. To accomplish the object, the navigation device according to the present invention includes: a route searching unit that searches for a route from a departure point through waypoints to a destination point; a display controller that produces a screen display which allows one desired location among the departure point and at least one of the waypoints passed through to be designated as a new waypoint or destination point in one operation; and a route changing unit that changes the route searched for by the route searching unit in accordance with the designation performed by the one operation.

    摘要翻译: 本发明的目的是通过在导航装置中设定新的航路点或目的地点来改善改变路线的操作的可操作性。 为了实现该目的,根据本发明的导航装置包括:路线搜索单元,其搜索从出发点经过路点到目的地点的路线; 显示控制器,其产生屏幕显示,其允许在一个操作中将出发点和所经过的点中的至少一个之间的一个期望位置指定为新的航路点或目的地点; 以及路线改变单元,其根据由一次操作执行的指定来改变由路径搜索单元搜索到的路线。

    Covering member and method of manufacturing the same
    5.
    发明申请
    Covering member and method of manufacturing the same 审中-公开
    覆盖件及其制造方法

    公开(公告)号:US20060237216A1

    公开(公告)日:2006-10-26

    申请号:US11473583

    申请日:2006-06-22

    IPC分类号: H01B3/30

    CPC分类号: H02G3/0481 F16C1/26 F16F1/37

    摘要: Disclosed is a covering member comprising a cylindrical foam or a columnar foam including a cut consisting of a slit line which extends from the outer circumferential surface of the foam to reach a through-hole of the foam, wherein the slit line joining the open portion formed by the cut on the outer circumferential surface of the foam to the open portion formed by the cut on the inner circumferential surface of the foam is nonlinear in respect of the cross section of the covering member in a direction perpendicular to the axial direction of the foam.

    摘要翻译: 公开了一种包括圆柱形泡沫或柱状泡沫的覆盖构件,其包括由从泡沫的外周表面延伸以到达泡沫的通孔的切割线的切口,其中形成的开口部分的切割线 通过在泡沫的外周面上的切割到由泡沫的内周面上的切口形成的开口部分,在与泡沫的轴向方向垂直的方向上的覆盖部件的截面方面是非线性的 。

    Method of machining glass substrate and method fabricating high-frequency circuit
    7.
    发明授权
    Method of machining glass substrate and method fabricating high-frequency circuit 失效
    加工玻璃基板的方法和制造高频电路的方法

    公开(公告)号:US06772514B2

    公开(公告)日:2004-08-10

    申请号:US09878265

    申请日:2001-06-12

    IPC分类号: H05K302

    摘要: A method of machining a glass substrate by using a laser, in which a low-permittivity, low-dielectric-loss glass substrate capable of coping with mass production processes is made applicable as the substrate of a high-frequency circuit intended for microwave and millimeter-wave bands in particular. For that purpose, a glass substrate is provided in which the amount of air bubbles in glass is arbitrarily controlled to improve the workability of the substrate itself. Then, the glass substrate is machined while being irradiated with a pulsed laser for a plurality of times, thereby improving the machining shape of the glass substrate. Since glass substrates which are typically difficult to machine can be easily applied to the fabrication of high-frequency circuits, it becomes possible to supply high-performance circuits and apparatuses widely to the public.

    摘要翻译: 通过使用能够应付大规模生产工艺的低介电常数低介电损耗玻璃基板的激光加工玻璃基板的方法可应用于用于微波和毫米的高频电路的基板 特别是波段。 为此,提供玻璃基板,其中玻璃中的气泡量被任意控制,以提高基板本身的可加工性。 然后,在用脉冲激光照射多次的同时对玻璃基板进行加工,从而提高玻璃基板的加工形状。 由于通常难以加工的玻璃基板可以容易地应用于高频电路的制造,所以可以向公众广泛地提供高性能电路和设备。

    Laser sputtering apparatus
    8.
    发明授权
    Laser sputtering apparatus 失效
    激光溅射装置

    公开(公告)号:US5468930A

    公开(公告)日:1995-11-21

    申请号:US29410

    申请日:1993-03-10

    CPC分类号: C23C14/505 C23C14/28

    摘要: A laser sputtering apparatus includes a laser oscillator for emitting laser beams, a target-supporting member supporting a flat target thereon and being rotatable in a vacuum chamber while the target is inclined relative to the target-supporting member, a driving device for rotating the target-supporting member, a substrate-supporting member for supporting the substrate parallel with the target-supporting member, and an optical device for irradiating the target with the beams emitted by the laser oscillator.

    摘要翻译: 激光溅射装置包括用于发射激光束的激光振荡器,支撑平板靶的靶支撑部件,并且在靶相对于靶支撑部件倾斜的同时可在真空室中旋转;驱动装置,用于使靶 支撑构件,用于支撑与靶支撑构件平行的基板的基板支撑构件,以及用于用激光振荡器发射的光束照射目标的光学装置。

    Microwave plasma source
    9.
    发明授权
    Microwave plasma source 失效
    微波等离子体源

    公开(公告)号:US5230784A

    公开(公告)日:1993-07-27

    申请号:US709223

    申请日:1991-06-03

    申请人: Yoshikazu Yoshida

    发明人: Yoshikazu Yoshida

    摘要: A microwave plasma source includes: a microwave source; a rectangular waveguide having the microwave source at one end thereof; a coaxial waveguide arranged so as to penetrate through the other end of the rectangular waveguide and having an outer conductor and an inner conductor both having a door-knob-shaped portion at one end thereof and an opening at the end thereof; a target holder, for holding a target through an electrically insulating member, and arranged at the end of the inner conductor near the opening thereof; a magnet arranged at the end of the inner conductor near the opening thereof; and a vacuum chamber connected to the openings of the ends of the inner and outer conductors and having a gas inlet and a gas outlet. A microwave field generated by from the microwave source is propagated to the target through a space formed between the inner and outer conductors of the coaxial waveguide and is radiated on the target, so that an electrical discharge is caused in the vacuum chamber in which gas is introduced from the gas inlet, and a plasma is generated on the target.

    摘要翻译: 微波等离子体源包括:微波源; 在其一端具有微波源的矩形波导; 布置成穿过矩形波导的另一端并具有外导体和内导体的同轴波导,两导体和内导体在其一端具有门把形部分和其末端的开口; 目标支架,用于通过电绝缘构件保持目标,并且布置在靠近其开口的内导体的端部; 布置在内导体的端部附近的磁体的开口附近的磁体; 以及与内导体和外导体的端部的开口连接并具有气体入口和气体出口的真空室。 由微波源产生的微波场通过形成在同轴波导的内外导体之间的空间传播到靶,并被辐射在目标上,使得在真空室中产生放电,其中气体是 从气体入口引入,并且在靶上产生等离子体。

    Metal ion source
    10.
    发明授权
    Metal ion source 失效
    金属离子源

    公开(公告)号:US4846953A

    公开(公告)日:1989-07-11

    申请号:US144464

    申请日:1988-01-19

    申请人: Yoshikazu Yoshida

    发明人: Yoshikazu Yoshida

    CPC分类号: H01J27/16 H01J37/08

    摘要: A sputtering type of a metal ion source includes a microwave radiation means and a pair of magnetic poles to which a negative electric potential is applied. The magnetic pole acts as an electrode for retarding electrons when a sputtering target is placed at the pointed end of the magnetic pole, high density ions generated by the operation of PIG (Penning Ionization Guage) discharge and a magnetic field efficiently bombard and sputter a target, and a microwave discharge acts as an electron supplying source so that a stable discharge is maintained.

    摘要翻译: 溅射型金属离子源包括微波辐射装置和施加负电位的一对磁极。 当溅射靶位于磁极的尖端时,磁极用作用于延迟电子的电极,通过PIG(Penning Ionization Guage)放电的操作产生的高密度离子和磁场有效地轰击并溅射靶 微波放电充当电子供给源,从而保持稳定的放电。