公开(公告)号：US06666958B1

公开(公告)日：2003-12-23

申请号：US09407703

申请日：1999-09-28

申请人： Masato Yoshikawa ,  Shingo Ohno ,  Sho Kumagai

发明人： Masato Yoshikawa ,  Shingo Ohno ,  Sho Kumagai

IPC分类号： C23C1406

CPC分类号： C23C14/06 ,  C23C14/0084 ,  C23C14/3414 ,  C23C14/548

摘要： A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.

摘要翻译： 制备干电镀叠层膜的方法包括提供碳化硅作为起始源并进行干电镀，同时连续或间歇地改变反应气体的浓度以沉积并在衬底上形成具有不同折射率的薄膜 沿其厚度的指数。 还描述了一种用于制造溅射组合膜的方法，其包括提供碳化硅作为靶，并且在连续或间歇地向靶提供电力的同时进行溅射，以沉积并形成沿着其的折射率不同的薄膜 厚度。

公开(公告)号：US06921465B2

公开(公告)日：2005-07-26

申请号：US10647251

申请日：2003-08-26

申请人： Masato Yoshikawa ,  Shingo Ohno ,  Sho Kumagai

发明人： Masato Yoshikawa ,  Shingo Ohno ,  Sho Kumagai

IPC分类号： C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  C23C14/54

CPC分类号： C23C14/06 ,  C23C14/0084 ,  C23C14/3414 ,  C23C14/548

摘要： A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.

摘要翻译： 制备干电镀叠层膜的方法包括提供碳化硅作为起始源并进行干电镀，同时连续或间歇地改变反应气体的浓度以沉积并在衬底上形成具有不同折射率的薄膜 沿其厚度的指数。 还描述了一种用于制造溅射组合膜的方法，其包括提供碳化硅作为靶，并且在连续或间歇地向靶提供电力的同时进行溅射，以沉积并形成沿着其的折射率不同的薄膜 厚度。

公开(公告)号：US20090142647A1

公开(公告)日：2009-06-04

申请号：US11719408

申请日：2005-11-17

申请人： Shinichiro Sugi ,  Shingo Ohno ,  Masato Yoshikawa

发明人： Shinichiro Sugi ,  Shingo Ohno ,  Masato Yoshikawa

IPC分类号： H01M4/96 ,  B32B5/22 ,  B29C47/00 ,  B01J32/00

CPC分类号： D01F1/02 ,  D01D5/0007 ,  D01F9/21 ,  D04H1/42 ,  H01M4/8825 ,  H01M4/92 ,  H01M4/926 ,  H01M8/1007 ,  Y10T428/24999

摘要： This invention relates to a method for producing carbon fibers having a sufficiently small fiber diameter, and more particularly to (1) a method for producing carbon fibers, which comprising the steps of jetting a polymer material-containing solution by an electrospinning method to form a deposit layer of a fibrous substance comprising the polymer material and firing the deposit layer of the fibrous substance comprising the polymer material to produce carbon fibers, and (2) a method for producing carbon fibers, which comprising the steps of jetting a carbon black-dispersed and polymer material-containing solution by an electrospinning method to form a deposit layer of a fibrous substance comprising the carbon black-dispersed polymer material and irradiating microwaves to the deposit layer of the fibrous substance to produce carbon fibers.

摘要翻译： 本发明涉及一种具有足够小纤维直径的碳纤维的制造方法，特别是涉及（1）碳纤维的制造方法，其特征在于，包括以下步骤：通过静电纺丝法喷射含聚合物材料的溶液，形成 包含聚合物材料的纤维状物质的沉积层，并焙烧包含该聚合物材料的纤维状物质的沉积层以产生碳纤维，和（2）一种生产碳纤维的方法，其包括以下步骤：喷射炭黑分散 和含聚合物材料的溶液，以形成包含炭黑分散聚合物材料的纤维物质的沉积层，并向纤维物质的沉积层照射微波以产生碳纤维。

公开(公告)号：US20060003188A1

公开(公告)日：2006-01-05

申请号：US11184811

申请日：2005-07-20

申请人： Shingo Ohno ,  Yoshinori Iwabuchi ,  Masato Yoshikawa ,  Yuzo Shigesato ,  Masato Kon

发明人： Shingo Ohno ,  Yoshinori Iwabuchi ,  Masato Yoshikawa ,  Yuzo Shigesato ,  Masato Kon

IPC分类号： H01L21/44 ,  B32B19/00

CPC分类号： C23C14/3464 ,  C23C14/0021 ,  C23C14/086 ,  C23C14/3414

摘要： A crystalline ITO transparent conductive thin film is formed by heating a substrate at low temperature during the sputtering film formation. The crystalline ITO transparent conductive thin film is formed by using an ITO target comprising In2O3 and SnO2 where a weight percentage of SnO2 is 6% or less based on the total weight of In2O3 and SnO2 in the ITO target, and heating the substrate at 90 to 170° C. during the sputtering film formation. The crystalline ITO film with high strength and mechanical durability can be formed by heating at low temperature, which meets heat resistance of the substrate, without requiring annealing after the film formation. There are provided a transparent conductive film comprising a polymer film 4 and an ITO transparent conductive film 5 formed thereon, and a touch panel comprising the transparent conductive film.

摘要翻译： 通过在溅射成膜期间在低温下加热基板来形成结晶ITO透明导电薄膜。 结晶ITO透明导电薄膜通过使用包含In 2 N 3 O 3和SnO 2 2的ITO靶形成，其中SnO 2的重量百分比 基于ITO靶中的In 2 N 3 O 3和SnO 2 N 2的总重量，SUB> 2 <6％或更小 在溅射成膜期间在90〜170℃下加热基板。 具有高强度和机械耐久性的结晶ITO膜可以通过在低温下加热而形成，其满足基板的耐热性，而不需要在成膜后退火。 提供了包含聚合物膜4和形成在其上的ITO透明导电膜5的透明导电膜，以及包括透明导电膜的触摸面板。

公开(公告)号：US20060234065A1

公开(公告)日：2006-10-19

申请号：US11403943

申请日：2006-04-14

申请人： Shingo Ohno ,  Yoshinori Iwabuchi ,  Hidefumi Kotsubo ,  Yasuhiro Morimura ,  Shinichiro Sugi ,  Hideo Sugiyama ,  Masato Yoshikawa

发明人： Shingo Ohno ,  Yoshinori Iwabuchi ,  Hidefumi Kotsubo ,  Yasuhiro Morimura ,  Shinichiro Sugi ,  Hideo Sugiyama ,  Masato Yoshikawa

IPC分类号： B32B17/06 ,  B32B9/00 ,  B32B19/00

CPC分类号： C01G19/00 ,  C01G15/00 ,  C01G19/02 ,  C01P2002/52 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/40 ,  H01G9/2031 ,  H01G9/2059 ,  H01L31/022466 ,  H01L31/022475 ,  H01L2251/308 ,  H01M14/005 ,  Y02E10/542

摘要： An acid-resistant transparent electroconductive substrate with an ITO layer includes a transparent base and the ITO layer formed over the transparent base. The ITO layer contains at least 30 percent by weight of tin oxide. A dye-sensitized solar cell electrode includes the transparent electroconductive substrate and a dye-adsorbed semiconductor layer formed over the ITO layer of the transparent electroconductive substrate. A dye-sensitized solar cell is provided which uses the dye-sensitized solar cell electrode as a dye-sensitized semiconductor electrode. A SnO2 content of 30 percent by weight or more enhances acid resistance. The dye-sensitized semiconductor electrode for the dye-sensitized solar cell is prepared by forming a layer-by-layer self-assembled film on the ITO layer by a layer-by-layer assembly technique, forming a replica layer by acid-treating the layer-by-layer self-assembled film to form irregularities, and forming a semiconductor layer on the replica layer.

摘要翻译： 具有ITO层的耐酸透明导电性基材包括透明基材和形成在透明基材上的ITO层。 ITO层含有至少30重量％的氧化锡。 染料敏化太阳能电池电极包括透明导电基材和形成在透明导电基材的ITO层上的吸收染料的半导体层。 提供了一种染料敏化太阳能电池，其使用染料敏化太阳能电池电极作为染料敏化半导体电极。 30重量％以上的SnO 2 N含量提高了耐酸性。 用于染料敏化太阳能电池的染料敏化半导体电极通过层叠组装技术在ITO层上形成层叠自组装膜而制备，通过酸处理形成复制层 逐层自组装膜形成凹凸，并在复制层上形成半导体层。

公开(公告)号：US20050233131A1

公开(公告)日：2005-10-20

申请号：US11091505

申请日：2005-03-29

申请人： Mitsuhiro Nishida ,  Shingo Ohno ,  Masato Yoshikawa ,  Nobuko Kato

发明人： Mitsuhiro Nishida ,  Shingo Ohno ,  Masato Yoshikawa ,  Nobuko Kato

IPC分类号： G02B1/11 ,  H01J5/16 ,  H01J29/89 ,  B32B27/00 ,  B32B5/16

CPC分类号： H01J5/16 ,  G02B1/111 ,  H01J29/896 ,  H01J2211/442 ,  H01J2329/892 ,  Y10T428/25 ,  Y10T428/261 ,  Y10T428/31504

摘要： An antireflective film includes a base film, a hard coat layer provided on the base film, a layer having a relatively high refractive index and provided on the hard coat layer, and an outermost layer having a low refractive index and provided on the layer having the relatively high refractive index. In the antireflective film, the layer disposed adjacent to the outermost layer has a light-absorbing property. The layer disposed adjacent to the outermost layer includes carbon black, titanium black, fine metal particles, or an organic dye. The attenuation coefficient k at light having a wavelength of 550 nm of the layer disposed adjacent to the outermost layer is represented by 0.1

摘要翻译： 防反射膜包括基膜，设置在基膜上的硬涂层，具有较高折射率并设置在硬涂层上的层和具有低折射率的最外层，并且设置在具有 折射率相对较高。 在防反射膜中，与最外层相邻设置的层具有光吸收性。 邻近最外层设置的层包括炭黑，钛黑，细金属颗粒或有机染料。 在与最外层相邻布置的层中具有550nm波长的光的衰减系数k由0.1

公开(公告)号：US06896981B2

公开(公告)日：2005-05-24

申请号：US10194963

申请日：2002-07-15

申请人： Yoshinori Iwabuchi ,  Taichi Kobayashi ,  Shingo Ohno ,  Yukihiro Kusano ,  Masato Yoshikawa

发明人： Yoshinori Iwabuchi ,  Taichi Kobayashi ,  Shingo Ohno ,  Yukihiro Kusano ,  Masato Yoshikawa

IPC分类号： B32B9/00 ,  B32B15/04 ,  C03C27/08

CPC分类号： G06F3/045 ,  G06F2203/04103 ,  Y10T428/12618 ,  Y10T428/265 ,  Y10T428/2949 ,  Y10T428/30

摘要： A transparent conductive film has a polymer film 4 and a transparent conductive layer 5 formed on the polymer film 4. The transparent conductive layer includes indium oxide, a zinc oxide system and a tin oxide system. A covering layer 9, made of material different from that of the transparent conductive layer 5, is formed on the transparent conductive layer 5. A touch panel is provided with the transparent conductive film as its upper electrode 6A or lower electrode. The surface of the transparent conductive layer is covered with the covering layer, so that physical or chemical stresses generated during the input to the touch panel do not affect transparent conductive layer directly, thus preventing damages and delamination of the transparent conductive layer. Furthermore, the covering layer formed on the transparent conductive layer improves the strength of the transparent conductive film, thereby enhancing a resistance to wear.

摘要翻译： 透明导电膜具有在聚合物膜4上形成的聚合物膜4和透明导电层5。 透明导电层包括氧化铟，氧化锌系和氧化锡系。 在透明导电层5上形成由不同于透明导电层5的材料制成的覆盖层9。 触摸面板设置有透明导电膜作为其上电极6A或下电极。 透明导电层的表面被覆盖层覆盖，使得在输入到触摸面板期间产生的物理或化学应力不直接影响透明导电层，从而防止透明导电层的损坏和分层。 此外，形成在透明导电层上的覆盖层提高了透明导电膜的强度，从而提高了耐磨性。

公开(公告)号：US06899957B2

公开(公告)日：2005-05-31

申请号：US09987971

申请日：2001-11-16

申请人： Mitsuhiro Nishida ,  Shingo Ohno ,  Masato Yoshikawa ,  Nobuko Kato

发明人： Mitsuhiro Nishida ,  Shingo Ohno ,  Masato Yoshikawa ,  Nobuko Kato

IPC分类号： B32B7/02 ,  G02B1/11 ,  G02B1/111 ,  G02B1/14 ,  G02B1/16 ,  G09F9/00 ,  B32B27/14

CPC分类号： G02B1/111 ,  G02B1/116 ,  G02B1/14 ,  G02F2201/38 ,  Y10T428/1059 ,  Y10T428/1064 ,  Y10T428/25 ,  Y10T428/31518 ,  Y10T428/31786

摘要： An antireflection film is formed of an organic film, and a hard-coating layer, a high refractive index layer and a low refractive index layer laminated in this order on the organic film. The high refractive index layer is formed of metal oxide particles of ITO with electrical conductivity and TiO2 with high refractive index, and synthetic resin. A volume percentage of the TiO2 particles to a total volume of the TiO2 and ITO particles in the high refractive index layer is 1 to 60%, and a volume percentage of the metal oxide particles to a total volume of the metal oxide particles and the synthetic resin is 20% or more.

摘要翻译： 防反射膜由有机膜和有机膜上依次层叠的硬涂层，高折射率层和低折射率层形成。 高折射率层由具有导电性的ITO的金属氧化物颗粒和具有高折射率的TiO 2和合成树脂形成。 TiO 2颗粒相对于高折射率层中的TiO 2和ITO颗粒的总体积的体积百分比为1〜60％，体积百分比为 金属氧化物粒子与金属氧化物粒子和合成树脂的总体积为20％以上。

公开(公告)号：US06884495B2

公开(公告)日：2005-04-26

申请号：US09837618

申请日：2001-04-19

申请人： Mitsuhiro Nishida ,  Shingo Ohno ,  Masato Yoshikawa ,  Nobuko Kato

发明人： Mitsuhiro Nishida ,  Shingo Ohno ,  Masato Yoshikawa ,  Nobuko Kato

IPC分类号： G02B1/11 ,  B32B25/10 ,  B32B3/26 ,  B32B5/16 ,  B32B9/00 ,  C09K19/00

CPC分类号： G02B1/111 ,  Y10T428/1059 ,  Y10T428/1064 ,  Y10T428/24942 ,  Y10T428/249939 ,  Y10T428/249953 ,  Y10T428/24998 ,  Y10T428/25

摘要： An antireflection film is formed of an organic film, a hard hard coating layer on the organic film, a first layer coated on the hard coating layer, and a second layer having an index of refraction lower than that of the first layer and coated on the first layer. The first layer is formed of a synthetic resin having pores therein and metallic oxide particles contained in the synthetic resin. The metallic oxide is at least on selected from the group consisting of ZrO1, TiO2, NbO, ITO, ATO, SbO2, In2O3, SnO2 and ZnO. The synthetic resin is ultraviolet ray curable resin or electron beam curable resin. The second layer partly enters the pores of the first layer to firmly bond to the first layer through the pores.

摘要翻译： 防反射膜由有机膜，有机膜上的硬硬涂层，涂覆在硬涂层上的第一层和折射率低于第一层的第二层形成，并涂覆在第一层上 第一层 第一层由其中具有孔的合成树脂和合成树脂中所含的金属氧化物颗粒形成。 金属氧化物至少选自ZrO 1，TiO 2，NbO，ITO，ATO，SbO 2，In 2 O 3，N 2 O 3和ZnO。 合成树脂是紫外线固化树脂或电子束固化树脂。 第二层部分地进入第一层的孔，以通过孔与第一层牢固结合。

公开(公告)号：US06875478B2

公开(公告)日：2005-04-05

申请号：US10066380

申请日：2002-02-05

申请人： Masato Yoshikawa ,  Yoshinori Iwabuchi ,  Shingo Ohno ,  Yukihiro Kusano

发明人： Masato Yoshikawa ,  Yoshinori Iwabuchi ,  Shingo Ohno ,  Yukihiro Kusano

IPC分类号： C23C14/20 ,  C23C14/56 ,  D06M11/00 ,  D06M11/83 ,  B05D1/04 ,  C23C14/00 ,  C23C16/00

CPC分类号： C23C14/562

摘要： A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.

摘要翻译： 一种装有真空室的成膜装置，包括用于垂直行进连续片材作为基底的一对辊子和用于在真空室中在片材表面上连续沉积薄膜的一对溅射阴极。 阴极垂直布置并水平面对。 片材在一对阴极之间行进。 使用它的装置和成膜方法使得可以在柔性片的表面上沉积膜，而不会导致诸如膜沉积错误或异常放电的问题，同时确保稳定，连续的长期操作。