Lithographic apparatus and alignment method
    1.
    发明授权
    Lithographic apparatus and alignment method 有权
    平版印刷设备和对准方法

    公开(公告)号:US08958053B2

    公开(公告)日:2015-02-17

    申请号:US13186028

    申请日:2011-07-19

    IPC分类号: G03F7/20

    摘要: A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement.

    摘要翻译: 一种光刻设备,包括:源极收集器模块,其包括收集器,其被配置为收集来自辐射源的辐射; 照明器,被配置为调节由所述收集器收集的辐射并提供辐射束; 以及检测器装置,其包括相对于所述照明器以固定位置关系设置的反射器布置,所述反射器布置被布置成反射来自所述源极收集器模块的辐射; 以及传感器装置,其相对于所述反射器装置以固定的位置关系设置,所述传感器装置被配置成测量由所述反射器反射的辐射的至少一个特性,所述检测器装置被配置为确定所述反射器的远场位置的位置 辐射是由反射器反射并由传感器装置测量的辐射的至少一个性质的函数。