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1.发明授权Electronic/electric components used in clean room and substrate treatment apparatus 失效用于洁净室和基板处理设备的电子/电气部件公开(公告)号：US06337365B1
公开(公告)日：2002-01-08
申请号：US09381667
申请日：1999-09-24
申请人： Takenobu Matsuo , Tsuyoshi Wakabayashi , Misako Saito , Sadao Kobayashi , Yoshihide Wakayama , Masayuki Imafuku
发明人： Takenobu Matsuo , Tsuyoshi Wakabayashi , Misako Saito , Sadao Kobayashi , Yoshihide Wakayama , Masayuki Imafuku
IPC分类号： C08L9106
CPC分类号： C08K5/0075
摘要： An electronic/electric part used in a clean room in which the atmosphere is controlled to process a substrate in a semiconductor device industry, which contains a resin base material and additives added to the resin base material. The additives contain one or more materials selected from the group consisting of an anti-electrostatic agent made of a nonionic compound of a molecular weight of 350 or higher, an anti-oxidizing agent made of a phenolic compound of a molecular weight of 300 or higher, a lubricant, a plasticizer, a fire retardant, and a water repellent. The additives hardly releases gaseous organic substances from the resin base material under a condition where the part is used.
摘要翻译： 一种电子/电气部件，其用于在半导体器件工业中控制气氛以处理衬底的洁净室中，该半导体器件工业包含树脂基材和添加到树脂基材中的添加剂。 添加剂含有一种或多种选自由分子量为350以上的非离子化合物制成的抗静电剂的组分，由分子量为300以上的酚类化合物制成的抗氧化剂 润滑剂，增塑剂，阻燃剂和防水剂。 在使用该部件的条件下，添加剂在树脂基材中几乎不释放气态有机物质。
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公开(公告)号：US6077894A
公开(公告)日：2000-06-20
申请号：US147061
申请日：1998-09-29
申请人： Misako Saito , Takenobu Matsuo , Tsuyoshi Wakabayashi , Sadao Kobayashi , Yoshihide Wakayama , Masayuki Imafuku
发明人： Misako Saito , Takenobu Matsuo , Tsuyoshi Wakabayashi , Sadao Kobayashi , Yoshihide Wakayama , Masayuki Imafuku
IPC分类号： H01L21/68 , A43B1/14 , A43B3/16 , H01L21/67 , H01L21/673 , H01L21/677 , C08K5/20
CPC分类号： H01L21/67757 , A43B1/14 , A43B3/163 , H01L21/67 , H01L21/67366 , H01L21/67396
摘要： There are instruments used for handling a substrate in a clean room at room temperature and atmospheric pressure, which contain a resin base and at least one additive selected from the group consisting of a lubricant, a plasticizer, an anti-oxidizing agent and an antistatic agent, and the additives do not generate gaseous organic material compound under conditions of room temperature and atmospheric pressure.
摘要翻译： PCT No.PCT / JP97 / 01039 Sec。 371日期：1998年9月29日 102（e）1998年9月29日PCT PCT 1997年3月27日PCT公布。 公开号WO97 / 37381 日期1997年10月9日在室温和大气压下在洁净室中处理基材的仪器包括树脂基材和至少一种选自润滑剂，增塑剂，抗氧化剂 试剂和抗静电剂，并且添加剂在室温和大气压条件下不产生气态有机材料化合物。
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公开(公告)号：US06403498B1
公开(公告)日：2002-06-11
申请号：US09194539
申请日：1998-11-30
IPC分类号： H01L2131
CPC分类号： H01L21/02043 , H01L21/3121
摘要： A substrate processing method of processing a surface of a substrate in manufacture of a semiconductor device, characterized by comprising a surface processing step for making a substance having an adsorption heat higher than that of an organic matter whose adsorption on the surface of the substrate, which has been cleaned, is undesirable, adsorbed on the surface of the substrate, and a film formation step for forming a thin film on the surface of the substrate which was processed in the above step.
摘要翻译： 一种在制造半导体器件中处理衬底表面的衬底处理方法，其特征在于包括：表面处理步骤，用于使吸附热量高于在衬底表面吸附的有机物的吸附热量的物质， 已被清洗，不希望的，吸附在基材的表面上，以及在上述步骤中处理的基材表面上形成薄膜的成膜步骤。
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公开(公告)号：US5514196A
公开(公告)日：1996-05-07
申请号：US226853
申请日：1994-04-13
CPC分类号： F24F3/16 , F24F2003/1614 , F24F2003/1625
摘要： An air cleaning apparatus includes an air passage chamber having a suction port, from which air is sucked, and a discharge port from which the air sucked from the suction port is discharged, an air blower, provided in the air passage chamber, for sucking the air from the suction port into the air passage chamber and discharging the sucked air from the discharge port, and a particle removing mechanism for removing particles contained in the air sucked from the suction port, the entire body of the particle removing mechanism being formed of a material which generates little impurity gas detrimental to processing in a processing space.
摘要翻译： 一种空气净化装置，具有：具有吸入口的吸入口和从吸入口吸入的空气从其排出的排出口的空气通道室，设置在该通气室内的用于吸入 空气从吸入口进入空气通道室并从排出口排出吸入空气;以及颗粒去除机构，用于去除从吸入口吸入的空气中所含的颗粒，颗粒去除机构的整体由 产生对处理空间中的处理有害的少量杂质气体的材料。
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5.发明授权Gas measuring device and processing apparatus provided with the gas measuring device 失效设有气体测量装置的气体测量装置和处理装置
公开(公告)号：US5294280A
公开(公告)日：1994-03-15
申请号：US904556
申请日：1992-06-26
IPC分类号： C23C16/44 , G01N27/416 , H01L21/00
CPC分类号： G01N27/4162 , C23C16/4401
摘要： A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to be measured from a value measured by the measuring unit.
摘要翻译： 一种气体测量装置，包括用于将待测量的气体溶解在溶剂介质中的溶解单元，用于测量待测气体在液体介质中离子化时产生的离子量的测量单元，以及计算单元， 由测量单元测量的值测量的气体。
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公开(公告)号：US5441076A
公开(公告)日：1995-08-15
申请号：US222589
申请日：1994-04-04
IPC分类号： G05D7/06
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761 , Y10T137/87885
摘要： A vertical heat treatment apparatus includes a heat treatment unit for performing a heat treatment process to a semiconductor wafer using a gas and a gas supply unit for supplying the gas to the heat treatment unit. The gas supply unit includes a plurality of gas controlling instruments having a plurality of gas flow control devices, a gas controlling instruments-storage vessel for storing the instruments, and a plurality of electrical parts arranged outside the storage vessel and belonging to the instruments, and an electrical parts-storage vessel for storing the electrical parts, and the plurality of gas flow control devices are integrated with each other by block-like joints.
摘要翻译： 立式热处理装置包括：热处理单元，用于使用气体和用于将气体供给到热处理单元的气体供给单元对半导体晶片进行热处理处理。 气体供给单元包括具有多个气体流量控制装置的多个气体控制装置，用于存储仪器的气体控制装置 - 储存容器，以及设置在存储容器外部并属于仪器的多个电气部件，以及 用于存储电气部件的电气部件存储容器，并且多个气体流量控制装置通过块状接头彼此一体化。
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公开(公告)号：US5439026A
公开(公告)日：1995-08-08
申请号：US164545
申请日：1993-12-10
IPC分类号： G05D7/06
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761 , Y10T137/87885 , Y10T137/9029
摘要： There is disclosed a flow control apparatus including a base body having a fluid inlet and a fluid outlet and a flow path for causing the inlet to communicate with the outlet, a flow adjustment means for adjusting a flow rate of the fluid in the flow path of said base body, a flow-rate detection means for detecting the flow rate of the fluid in the flow path, and a flow control means for outputting a flow-rate control signal to the flow adjustment means on the basis of a detection result of the flow-rate detection means to control the flow rate of the fluid to a predetermined value. At least one of the fluid inlet and the fluid outlet is positioned such that the flow direction of the fluid at a corresponding one of the fluid inlet and the fluid outlet is perpendicular to the flow path.
摘要翻译： 公开了一种流量控制装置，其包括具有流体入口和流体出口的基体，以及用于使入口与出口连通的流路，流量调节装置，用于调节流体入口和流体出口的流动路径中的流体的流速 所述基体，用于检测流路中流体的流量的流量检测装置，以及流量控制装置，用于根据流量调节装置的检测结果向流量调节装置输出流量控制信号 流量检测装置，用于将流体的流量控制到预定值。 流体入口和流体出口中的至少一个被定位成使得流体入口和流体出口中的相应一个处的流体的流动方向垂直于流动路径。
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公开(公告)号：US5421365A
公开(公告)日：1995-06-06
申请号：US53354
申请日：1993-04-28
IPC分类号： C23C14/54 , C30B25/14 , G05D7/06 , H01L21/205 , H01L21/302 , H01L21/31
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761 , Y10T137/87362
摘要： A flow control apparatus comprises a base body, first and second gas passages provided in the base body for passing gas therethrough, gas flow adjusting mechanism, provided so as to connect the first and second gas passages to each other, for adjusting the flow of gas passing therethrough, and gas flow control unit for outputting a flow control signal to the gas flow adjusting mechanism so as to control the flow of gas passing through the first or second gas passage. In the base body, a bypass passage is formed in the base body for connecting the first and second gas passages to each other, and a valve mechanism is employed for opening and closing the bypass passage. When a trouble has occurred, the valve mechanism is opened, and a purging gas is supplied through the bypass passage to purge a flammable or noxious gas. Thereafter, the gas flow control apparatus is removed and repaired.
摘要翻译： 一种流量控制装置，包括：基体，设置在基体中的用于使气体通过的第一和第二气体通道，设置成将第一和第二气体通路彼此连接的气体流量调节机构，用于调节气体流量 以及气体流量控制单元，用于向气体流量调节机构输出流量控制信号，以控制通过第一或第二气体通道的气体的流动。 在基体中，在基体中形成有用于将第一和第二气体通路彼此连接的旁通通道，并且采用阀机构来打开和关闭旁路通道。 当发生故障时，阀机构打开，并且通过旁路通道供应净化气体以吹扫易燃或有害气体。 此后，除去并修理气体流量控制装置。
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公开(公告)号：US5307568A
公开(公告)日：1994-05-03
申请号：US942501
申请日：1992-09-09
CPC分类号： H01L21/67017 , C23C16/4401 , C23C16/45561 , H01J37/3244 , H01J37/32871 , H01J2237/022
摘要： A gas supply system includes a gas source containing a process gas to be supplied in a reduced-pressure container, a piping unit including a metallic pipe through which the process gas circulates and arranged between the gas supply source and the reduced-pressure container, and a duct formed of a metallic and/or nonmetallic pipe and arranged between the piping unit and the reduced-pressure container. At least part of the duct is formed of an austenitic stainless steel containing 6% or more of molybdenum by weight.
摘要翻译： 气体供给系统包括：气体源，其包含供给到减压容器内的处理气体;管道单元，包括金属管，工业气体通过该金属管在气体供给源和减压容器之间循环配置;以及 由金属管和/或非金属管形成的管道，布置在管道单元和减压容器之间。 管道的至少一部分由含有6重量％以上的钼的奥氏体不锈钢形成。
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公开(公告)号：US5853803A
公开(公告)日：1998-12-29
申请号：US964608
申请日：1997-11-05
申请人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
发明人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/687 , B05D3/12
CPC分类号： H01L21/67173 , B05C11/08 , G03F7/162 , G03F7/168 , H01L21/6715 , H01L21/68707 , Y10S134/902
摘要： A method of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.
摘要翻译： 一种抗蚀剂处理方法，包括抗蚀剂涂布步骤，该方法包括在将抗蚀剂溶液旋转的同时向其提供抗蚀剂溶液，以至少在其一个表面上形成抗蚀剂膜，以及除去液体的抗蚀剂去除步骤，其可以解决 在其侧边缘处抵抗其两个表面以从它们去除抗蚀剂膜。
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