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1.
公开(公告)号:US20180076047A1
公开(公告)日:2018-03-15
申请号:US15562072
申请日:2016-03-24
发明人: Hirofumi TANAKA , Yasuhisa KAYABA , Hiroko WACHI , Koji INOUE , Shoko ONO
IPC分类号: H01L21/3105 , C08G73/02 , C09D179/02 , H01L21/02 , H01L21/311
CPC分类号: H01L21/31051 , C08G73/0206 , C09D179/02 , H01L21/02118 , H01L21/02282 , H01L21/02343 , H01L21/02362 , H01L21/31058 , H01L21/31133 , H01L21/31138 , H01L21/76
摘要: A method for manufacturing a filling planarization film, the method including: a first coating step of applying a first coating liquid, containing a polyamine and a first solvent, to a region including a recessed part of a member having the recessed part, to fill the first coating liquid into the recessed part; and a second coating step of applying a second coating liquid, containing an organic substance having two or more carboxyl groups and a second solvent having a boiling point of 200° C. or less and an SP value of 30 (MPa)1/2 or less, to the region including the recessed part of the member into which the first coating liquid has been filled.
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公开(公告)号:US20170162382A1
公开(公告)日:2017-06-08
申请号:US15325511
申请日:2015-08-05
发明人: Yasuhisa KAYABA , Hirofumi TANAKA , Shoko ONO , Koji INOUE , Hiroko WACHI , Tsuneji SUZUKI
IPC分类号: H01L21/02 , C08L79/00 , C09D157/06
摘要: The invention provides a sealing composition including: polymer (A) containing a cationic functional group and having a weight average molecular weight of from 2,000 to 1,000,000; and a benzotriazole compound; in which the content of the polymer (A) is from 0.05 parts by mass to 0.20 parts by mass with respect to 100 parts by mass of the sealing composition; in which the content of the benzotriazole compound in the sealing composition is from 3 ppm by mass to 200 ppm by mass; and in which the sealing composition has a pH of from 3.0 to 6.5.
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公开(公告)号:US20160049343A1
公开(公告)日:2016-02-18
申请号:US14779757
申请日:2014-03-11
发明人: Yasuhisa KAYABA , Shoko ONO , Hirofumi TANAKA , Tsuneji SUZUKI , Shigeru MIO , Kazuo KOHMURA
IPC分类号: H01L23/29 , C09J179/04 , H01L23/528 , H01L23/532 , H01L21/02 , H01L21/56
CPC分类号: H01L23/293 , C08G73/0206 , C08K5/0091 , C08L79/02 , C09J179/04 , H01L21/0206 , H01L21/02118 , H01L21/02282 , H01L21/56 , H01L23/528 , H01L23/53209 , H01L23/5329 , H01L2924/0002 , H01L2924/00
摘要: Provided is a method for manufacturing a composite body, the method containing: a composition preparation process of preparing a composition that contains a polymer having a cationic functional group and having a weight average molecular weight of from 2,000 to 1,000,000, and that has a pH of from 2.0 to 11.0; a composite member preparation process of preparing a composite member that includes a member A and a member B, a surface of the member B having a defined isoelectric point, and that satisfies a relationship: the isoelectric point of a surface of the member B
摘要翻译: 本发明提供一种复合体的制造方法,该方法包括:制备含有阳离子官能团的聚合物,重均分子量为2,000〜1,000,000的组合物的组合物制备方法,其具有 从2.0到11.0; 制备复合构件的复合构件制备方法,其包括构件A和构件B,构件B的具有确定的等电点的表面,并且满足以下关系:构件B的表面的等电点 组分的pH <构件A的表面的等电点; 以及将组合物施加到构件A的表面和包含在复合构件中的构件B的表面的施加过程。
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公开(公告)号:US20190187560A1
公开(公告)日:2019-06-20
申请号:US16301885
申请日:2017-05-19
发明人: Yasuhisa KAYABA , Shoko ONO , Hirofumi TANAKA
CPC分类号: G03F7/11 , C09D7/40 , C09D201/00 , G03F7/0755 , G03F7/0757 , G03F7/094 , G03F7/16 , G03F7/26 , H01L21/027 , H01L21/3065
摘要: A composition for forming a metal-containing film, the composition including: a compound (A) which is at least one selected from the group consisting of: a compound (a1) containing a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom, and a compound (a2) which is a compound other than the compound (a1) and which contains a nitrogen atom; and a compound (B) which is at least one selected from the group consisting of: a compound (b1) containing a carboxy group and at least one of a germanium atom, a tin atom, a selenium atom or a zirconium atom, and an ester of the compound (b1).
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公开(公告)号:US20180327547A1
公开(公告)日:2018-11-15
申请号:US15776013
申请日:2016-11-16
发明人: Yasuhisa KAYABA , Hirofumi TANAKA , Hiroko WACHI , Shoko ONO
IPC分类号: C08G73/02 , C08G73/10 , C08K5/092 , H01L21/02 , H01L21/3105
摘要: A composition for forming a film for semiconductor devices including: a compound (A) including a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom and having a weight average molecular weight of from 10,000 to 400,000; a crosslinking agent (B) which includes the three or more —C(═O)OX groups (X is a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms) in the molecule, in which from one to six of three or more —C(═O)OX groups are —C(═O)OH groups, and which has a weight average molecular weight of from 200 to 600; and water (D), in which the compound (A) is an aliphatic amine.
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6.
公开(公告)号:US20170372993A1
公开(公告)日:2017-12-28
申请号:US15535761
申请日:2015-12-14
发明人: Yasuhisa KAYABA , Shoko ONO , Hirofumi TANAKA , Koji INOUE , Hiroko WACHI
IPC分类号: H01L23/498 , H01L23/532
CPC分类号: H01L23/49827 , H01L21/02164 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02362 , H01L21/486 , H01L21/76898 , H01L23/145 , H01L23/481 , H01L23/53295 , H01L2924/0002 , H01L2924/00
摘要: A substrate intermediary body includes: a substrate having a hole in a thickness direction, and a conductor being disposed in the hole; and an adhesion layer formed on a wall surface of the hole. The adhesion layer contains a reaction product of a polymer (A) having a cationic functional group and having a weight-average molecular weight of from 2,000 to 1,000,000 and a polyvalent carboxylic acid compound (B) having two or more carboxyl groups per molecule or a derivative thereof.
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