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116 条记录 (耗时 0.03 秒)

    Optical inspection system and method
    1.
    发明授权
    Optical inspection system and method 有权
    光学检测系统及方法

    公开(公告)号：US06407809B1

    公开(公告)日：2002-06-18

    申请号：US09501230

    申请日：2000-02-10

    申请人： Moshe Finarov ,  Natalie Levinsohn ,  Shay Ghilai

    发明人： Moshe Finarov ,  Natalie Levinsohn ,  Shay Ghilai

    IPC分类号： G01N2100

    CPC分类号： G01N21/956 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2201/0635

    摘要： An optical inspection system is presented, aimed at detecting defects on a substantially flat workpiece having an axis of symmetry. The workpiece is supported on a stage so as to be in an inspection plane, the stage being mounted for rotation in a plane parallel to the inspection plane. A scanning apparatus is accommodated above the workpiece, and comprises an illumination assembly, a plurality of optical assemblies, and a plurality of area sensors. The illumination assembly produces a plurality of incident radiation components for illuminating a strip on the workpiece extending parallel to the axis symmetry between two opposite sides thereof. The optical assemblies are aligned along the axis of symmetry in a spaced-apart parallel relationship, and are mounted for reciprocating movement within a plane parallel to an inspection area that covers substantially a half of the workpiece. The area sensors are arranged in a predetermined manner, each area sensor being associated with a corresponding one of the optical assemblies for receiving a component of returned radiation and generating data representative thereof. The half of the workpiece is strip-by-strip inspected, then the stage with the workpiece is rotated by 180° and the other half of the workpiece is strip-by-strip inspected.

    摘要翻译： 提出了一种光学检查系统，目的在于检测具有对称轴的基本平坦的工件上的缺陷。 工件被支撑在台面上以便在检查平面中，该台被安装成在与检查平面平行的平面中旋转。 扫描装置容纳在工件上方，并且包括照明组件，多个光学组件和多个区域传感器。 照明组件产生多个入射辐射部件，用于照射平行于其两个相对侧之间的轴对称的工件上的条带。 光学组件沿着对称轴线以间隔开的平行关系对准，并且被安装用于在平行于覆盖工件的大致一半的检查区域的平面内往复运动。 区域传感器以预定的方式布置，每个区域传感器与相应的一个光学组件相关联，用于接收返回的辐射的分量并产生代表其的数据。 工件的一半被逐条检查，然后工件的台面旋转180°，另一半工件被逐条检查。

    Solar cells and method of manufacturing thereof
    3.
    发明授权
    Solar cells and method of manufacturing thereof 有权
    太阳能电池及其制造方法

    公开(公告)号：US08652872B2

    公开(公告)日：2014-02-18

    申请号：US13123532

    申请日：2009-10-12

    申请人： Moshe Finarov ,  Mikhael Matusovsky ,  Amir Noy

    发明人： Moshe Finarov ,  Mikhael Matusovsky ,  Amir Noy

    IPC分类号： H01L21/00

    CPC分类号： H01L31/022425 ,  C23C14/28 ,  H01L31/0682 ,  Y02E10/547

    摘要： A photovoltaic cell, the cell comprising: a silicon substrate of bulk silicon material having front and rear surfaces; an emitter layer on the rear surface of said substrate; elongate channels through the emitter layer; elongate contacts to the bulk of the silicon substrate within at least some of the elongate channels, wherein the contacts are narrower than the channels; and gaps in the emitter between at least some of the elongate contacts and the emitter layer on the sides of the contacts.

    摘要翻译： 一种光伏电池，所述电池包括：具有前表面和后表面的体硅材料的硅衬底; 在所述衬底的后表面上的发射极层; 细长通道穿过发射极层; 在至少一些细长通道内的硅衬底本体的细长接触，其中触点比通道窄; 以及发射器中至少一些细长触头和触点侧面上的发射极层之间的间隙。

    Method and system for measuring patterned structures
    5.
    发明授权
    Method and system for measuring patterned structures 有权

    公开(公告)号：US08023122B2

    公开(公告)日：2011-09-20

    申请号：US12838763

    申请日：2010-07-19

    申请人： Moshe Finarov ,  Boaz Brill

    发明人： Moshe Finarov ,  Boaz Brill

    IPC分类号： G01B11/24

    CPC分类号： G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

    摘要： A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

    Method and system for measuring patterned structures
    6.
    发明授权
    Method and system for measuring patterned structures 有权
    用于测量图案结构的方法和系统

    公开(公告)号：US07864343B2

    公开(公告)日：2011-01-04

    申请号：US12624555

    申请日：2009-11-24

    申请人： Moshe Finarov ,  Boaz Brill

    发明人： Moshe Finarov ,  Boaz Brill

    IPC分类号： G01B11/14

    CPC分类号： G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

    摘要： A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by simulation of the manufacturing process; and preparing diffraction signal reference data corresponding to the generated profiles.

    摘要翻译： 一种制备参考数据的方法，用于测量用于控制制造过程的图案化结构的轮廓，所述方法包括：提供用于基于制造过程产生轮廓的模型; 通过模拟制造过程生成轮廓; 并准备对应于所生成的轮廓的衍射信号参考数据。

    METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES
    7.
    发明申请
    METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES 有权

    公开(公告)号：US20100324865A1

    公开(公告)日：2010-12-23

    申请号：US12853453

    申请日：2010-08-10

    申请人： Moshe Finarov ,  Boaz Brill

    发明人： Moshe Finarov ,  Boaz Brill

    IPC分类号： G06F19/00 ,  G01B11/24

    CPC分类号： G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

    摘要： A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

    APPARATUS AND METHOD FOR SUBSTRATE HANDLING
    8.
    发明申请
    APPARATUS AND METHOD FOR SUBSTRATE HANDLING 审中-公开
    基板处理装置及方法

    公开(公告)号：US20100204820A1

    公开(公告)日：2010-08-12

    申请号：US12602770

    申请日：2008-06-05

    申请人： Moshe Finarov ,  Beniamin Schulman

    发明人： Moshe Finarov ,  Beniamin Schulman

    IPC分类号： H01L21/68

    CPC分类号： H01L21/681 ,  H01L21/68728

    摘要： A system for substrate handling proposed, comprising an optical local tilt detector, a plurality of arms each having vertically extended movable along vertical axis fingers to contact the edge of a substrate, wherein at least one of the arms has a linear actuator moveable arm and each of the fingers provided by z-axis miniature linear actuator; and a control unit connected to said tilt detector and said z-axis linear actuators enabling measuring and correcting of local tilt.

    摘要翻译： 提出了一种用于基板处理的系统，包括光学局部倾斜检测器，多个臂，每个臂具有垂直延伸，可沿着垂直轴指可移动以接触基板的边缘，其中至少一个臂具有线性致动器可动臂和每个 由z轴微型线性致动器提供的手指; 以及连接到所述倾斜检测器和所述z轴线性致动器的控制单元，其能够测量和校正局部倾斜。

    Method and system for measuring patterned structures
    9.
    发明授权
    Method and system for measuring patterned structures 有权

    公开(公告)号：US07760368B2

    公开(公告)日：2010-07-20

    申请号：US11931342

    申请日：2007-10-31

    申请人： Moshe Finarov ,  Boaz Brill

    发明人： Moshe Finarov ,  Boaz Brill

    IPC分类号： G01B11/14

    CPC分类号： G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

    摘要： A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.