Light Emitting Device and Method for Manufacturing Light Emitting Device
    2.
    发明申请
    Light Emitting Device and Method for Manufacturing Light Emitting Device 有权
    发光装置及其制造方法

    公开(公告)号:US20160190392A1

    公开(公告)日:2016-06-30

    申请号:US15065994

    申请日:2016-03-10

    Abstract: A light emitting device that is inexpensive, is easy to manufacture, and has high light extraction efficiency is provided. The light emitting device includes an oriented polycrystalline substrate, a plurality of columnar light emitting parts, and a light confinement layer. The oriented polycrystalline substrate includes a plurality of oriented crystal grains. The plurality of columnar light emitting parts are discretely located on or above one main surface of the oriented polycrystalline substrate in areas in which there are no crystal defects, and are each a columnar part having a longitudinal direction matching a normal direction of the oriented polycrystalline substrate. The light confinement layer is made of a material having a lower refractive index than a material for the plurality of columnar light emitting parts, and is located on or above the oriented polycrystalline substrate so as to surround the plurality of columnar light emitting parts.

    Abstract translation: 廉价的发光器件易于制造,并且具有高的光提取效率。 发光器件包括定向多晶衬底,多个柱状发光部件和光限制层。 定向多晶基板包括多个定向晶粒。 多个柱状发光部分离散地位于不存在晶体缺陷的区域中的取向多晶基板的一个主表面的上方或上方,并且分别具有与取向多晶基板的法线方向一致的纵向方向的柱状部 。 光限制层由折射率低于多个柱状发光部的材料的材料构成,位于取向多晶基板的上方或上方,以包围多个柱状发光部。

    Group-III element nitride semiconductor substrate

    公开(公告)号:US12057307B2

    公开(公告)日:2024-08-06

    申请号:US18180272

    申请日:2023-03-08

    Abstract: There is provided a Group-III element nitride semiconductor substrate including a first surface and a second surface, in which even when devices to be produced on the first surface are increased in size, variations in device characteristics between the devices in the same substrate are suppressed. A Group-III element nitride semiconductor substrate includes a first surface and a second surface. The Group-III element nitride semiconductor substrate satisfies at least one of the following items (1) to (3): (1) The main surface has a maximum height Wz of a surface waviness profile of 150 nm or less; (2) The main surface has a root mean square height Wq of the surface waviness profile of 25 nm or less; (3) The main surface has an average length WSm of surface waviness profile elements of 0.5 mm or more.

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