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公开(公告)号:US20070100109A1
公开(公告)日:2007-05-03
申请号:US10520252
申请日:2002-08-15
申请人: Nigel Hacker , Scott Leffert , Lisa Figge , Richard Spear , William Bedwell , Teresa Ramos
发明人: Nigel Hacker , Scott Leffert , Lisa Figge , Richard Spear , William Bedwell , Teresa Ramos
IPC分类号: C08G77/12
CPC分类号: H01L21/02126 , C08G77/12 , C08G77/20 , H01B3/46 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/31695
摘要: Low dielectric materials are described herein that comprise a plurality of pores or nanopores in addition to the ultrananopores. It is further contemplated that the low dielectric materials described herein will have a dielectric constant of less than about 3. The dielectric materials are fromed from polymer compositions, wherein the polymer compositions comprise a plurality of monomers and wherein at least one monomer comprises a radical precursor bonded to a structural precursor. Further, methods of forming dielectric materials from polymer compositions are presented. The figure shows the chemical structure for a methyl/t-butyl Low organic Content/Low Organic Siloxane Polymer.
摘要翻译: 本文描述的低电介质材料除了超极子纳米孔之外还包含多个孔或纳米孔。 进一步预期,本文所述的低电介质材料将具有小于约3的介电常数。介电材料来自聚合物组合物,其中聚合物组合物包含多个单体,并且其中至少一个单体包含自由基前体 结合到结构前体。 此外,提出了从聚合物组合物形成电介质材料的方法。 该图显示了甲基/叔丁基低有机含量/低有机硅氧烷聚合物的化学结构。
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公开(公告)号:US20050003215A1
公开(公告)日:2005-01-06
申请号:US10830465
申请日:2004-04-21
申请人: Nigel Hacker , Lisa Figge , Scott Lefferts
发明人: Nigel Hacker , Lisa Figge , Scott Lefferts
CPC分类号: C08G77/08 , C08G77/12 , Y10T428/31663
摘要: Novel processes for preparing hydridosiloxane and organohydridosiloxane resins are disclosed. The processes of the invention broadly provide for the steps of contacting a silane monomer with a phase transfer catalyst in the presence of a reaction mixture that includes a nonpolar, e.g., hydrocarbon, solvent, and a polar solvent, e.g., alcohol and water. The process is conducted under conditions effective to catalytically convert said silane monomer into hydridosiloxane and organohydridosiloxane resins. Recovery of the products is advantageously aided by the ease of separating the phase transfer catalyst from the dual phase reaction mixture by separating the immiscible polar solvent carrying the catalyst from the nonpolar solvent that carries the product. Hydridosiloxane and organohydridosiloxane resins produced by the processes of the invention are also provided.
摘要翻译: 公开了制备氢硅氧烷和有机氢硅氧烷树脂的新方法。 本发明的方法广泛地提供了在包含非极性例如烃,溶剂和极性溶剂如醇和水的反应混合物存在下使硅烷单体与相转移催化剂接触的步骤。 该方法在有效地将所述硅烷单体催化转化成氢硅氧烷和有机氢硅氧烷树脂的条件下进行。 通过将携带催化剂的不混溶的极性溶剂与携带产物的非极性溶剂分离,可有利地辅助相分离催化剂与双相反应混合物的分离。 还提供了通过本发明的方法制备的氢硅氧烷和有机氢硅氧烷树脂。
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公开(公告)号:US06517951B2
公开(公告)日:2003-02-11
申请号:US09735746
申请日:2000-12-12
申请人: Nigel Hacker , Todd Krajewski , Richard Spear
发明人: Nigel Hacker , Todd Krajewski , Richard Spear
IPC分类号: B32B2742
CPC分类号: G03F7/094 , G03F7/0236 , Y10S428/901 , Y10T428/31688 , Y10T428/31942
摘要: A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
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公开(公告)号:US06506831B2
公开(公告)日:2003-01-14
申请号:US09205006
申请日:1998-12-02
申请人: Nigel Hacker , Todd Krajewski , Richard Spear
发明人: Nigel Hacker , Todd Krajewski , Richard Spear
IPC分类号: B32B2742
CPC分类号: G03F7/094 , G03F7/0236 , Y10S428/901 , Y10T428/31688 , Y10T428/31942
摘要: A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
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5.
公开(公告)号:US06723780B2
公开(公告)日:2004-04-20
申请号:US10299127
申请日:2002-11-18
申请人: Nigel Hacker , Todd Krajewski , Richard Spear
发明人: Nigel Hacker , Todd Krajewski , Richard Spear
IPC分类号: B32B2742
CPC分类号: G03F7/094 , G03F7/0236 , Y10S428/901 , Y10T428/31688 , Y10T428/31942
摘要: A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
摘要翻译: 在加热时不吸烟或烟雾的基板上形成平坦化膜的方法包括施加包含重量平均分子量在约1000和3000amu之间的聚合溶液,其已被分级分离以除去分子量分子 低于约350amu,将选自非氟化烃,氟化烃及其组合的表面活性剂和任选的有机溶剂加入到基材中,然后加热基材。
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公开(公告)号:US20050245717A1
公开(公告)日:2005-11-03
申请号:US11178544
申请日:2005-07-11
申请人: Joseph Kennedy , Teresa Baldwin , Nigel Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel Hacker , Richard Spear
IPC分类号: G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号:US06969753B2
公开(公告)日:2005-11-29
申请号:US10300357
申请日:2002-11-19
申请人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号: G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027 , C08G77/12
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm,248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号:US06824879B2
公开(公告)日:2004-11-30
申请号:US10001143
申请日:2001-11-15
申请人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号: C08G7718
CPC分类号: G02B5/23 , C03C17/008 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/091 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的至少一种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm,248nm,193nm和157nm的波长周围的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号:US06506441B2
公开(公告)日:2003-01-14
申请号:US09735838
申请日:2000-12-12
申请人: Nigel Hacker , Todd Krajewski , Richard Spear
发明人: Nigel Hacker , Todd Krajewski , Richard Spear
IPC分类号: B05D512
CPC分类号: G03F7/094 , G03F7/0236 , Y10S428/901 , Y10T428/31688 , Y10T428/31942
摘要: A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
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公开(公告)号:US06365765B1
公开(公告)日:2002-04-02
申请号:US09698883
申请日:2000-10-27
申请人: Teresa Baldwin , Nigel Hacker , Joseph Kennedy , Richard Spear
发明人: Teresa Baldwin , Nigel Hacker , Joseph Kennedy , Richard Spear
IPC分类号: C07F718
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机染料。 合适的染料在诸如248nm和193nm的波长周围的波长范围上是强吸收的,可以用于光刻。 制造染色旋涂玻璃材料的方法包括在旋涂玻璃材料合成期间将一种或多种有机染料与烷氧基硅烷反应物组合。
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