公开(公告)号：US06325081B1

公开(公告)日：2001-12-04

申请号：US09214240

申请日：1999-05-17

申请人： Nobuhiro Miki ,  Takahisa Nitta ,  Yasuyuki Harada ,  Tadahiro Ohmi

发明人： Nobuhiro Miki ,  Takahisa Nitta ,  Yasuyuki Harada ,  Tadahiro Ohmi

IPC分类号： B08B302

CPC分类号： H01L21/02052 ,  B08B3/02 ,  B08B2203/0288 ,  H01L21/67051

摘要： A washing apparatus and a washing method, which further improve a washing effect and enable highly clean washing with a small amount of chemical. Also, it is an object of the invention to provide a washing apparatus of high throughput involving rapid switching of various chemicals of high responsibility and capable of performing a series of washing operations at high speed. The washing apparatus comprises undiluted cleaning liquid injection means for injecting an undiluted solution or undiluted gas of a cleaning liquid into a ultrapure water channel to make a cleaning liquid of a desired concentration, cleaning liquid supplying means connected to the super demineralized water channel for simultaneously supplying front and rear surface of a substrate with a cleaning liquid adjusted to a desired concentration or a ultrapure water, means for superposing ultrasonic wave or high frequency sound waves of 0.5 MHz or more on the substrate through the cleaning liquid, and means for rotating the substrate or means for moving either of the substrate and the cleaning liquid supplying means in one direction, whereby injection of the undiluted solution or undiluted gas into the ultrapure water channel is controlled to continuously perform washing of the substrate by the cleaning liquid and washing by the ultrapure water.

摘要翻译： 一种洗涤装置和洗涤方法，其进一步改善洗涤效果并且能够用少量化学品进行高度清洁的洗涤。 另外，本发明的目的是提供一种高产量的洗涤装置，涉及快速切换各种高度责任的化学品，能够高速地进行一系列洗涤操作。洗涤装置包括未稀释的清洗液注入装置， 将未稀释的溶液或清洁液体的未稀释气体输送到超纯水通道中以制备所需浓度的清洗液体，连接到超级软化水通道的清洗液供应装置，用于同时向基材的前表面和后表面提供清洁液体 调节到期望浓度或超纯水的装置，用于通过清洁液体在衬底上叠加超声波或0.5MHz以上的高频声波的装置，以及用于旋转衬底或用于移动衬底和清洁装置的装置的装置 液体供应装置在一个方向上，由此注射未稀释的 控制溶液或未稀释气体进入超纯水通道，以通过清洗液体连续地进行基材清洗，并通过超纯水进行洗涤。

公开(公告)号：US6050276A

公开(公告)日：2000-04-18

申请号：US22432

申请日：1998-02-12

申请人： Yasuyuki Harada ,  Mitsuru Nakada ,  Tadahiro Ohmi

发明人： Yasuyuki Harada ,  Mitsuru Nakada ,  Tadahiro Ohmi

IPC分类号： B08B3/02 ,  B08B3/10 ,  B08B3/12 ,  G11B23/50 ,  H01L21/00 ,  H01L21/304 ,  B08B3/00

CPC分类号： H01L21/67051 ,  B08B3/02 ,  G11B23/505 ,  B08B2203/0288

摘要： There are disclosed an apparatus and method for cleaning a precision substrate through use of high-frequency- or ultrasonic-applied cleaning liquid. An object substrate is horizontally held and rotated. High-frequency- or ultrasonic-applied cleaning liquid is jetted toward the surface of the object substrate from first cleaning liquid jetting unit disposed above the object substrate, and the nozzle of the first cleaning liquid jetting unit is moved in parallel with the surface of the object substrate. Cleaning liquid is also fed toward the central portion of the surface of the object substrate from cleaning liquid feed-to-center unit during cleaning. In the cleaning apparatus and method, a sufficiently high cleaning speed is attained. Further, there is not involved the problem that the film of cleaning liquid becomes thin on the central portion of a substrate during cleaning due to the effect of a centrifugal force with a resultant difficulty in transmission of high frequency or ultrasonic vibration to the central portion and the problem that during cleaning, due to the effect of a centrifugal force, no liquid film is present on the central portion, which thus becomes dry and contaminated. The cleaning apparatus and method also proves a cost advantage.

摘要翻译： 公开了一种通过使用高频或超声波清洗液来清洁精密基板的装置和方法。 物体基板水平保持旋转。 从设置在物体基板上方的第一清洗液喷射单元向对象基板的表面喷射高频或超声波清洗液，第一清洗液喷射单元的喷嘴平行于 物体衬底。 在清洁期间，清洁液体也从清洁液体供给到中心单元朝向物体基板的表面的中心部分供给。 在清洁装置和方法中，达到足够高的清洁速度。 此外，不存在由于离心力的影响而导致的清洗液的中​​心部位的清洗液的薄膜变薄的问题，导致难以将高频或超声波振动传递到中心部分， 在清洗过程中，由于离心力的作用，在中心部分没有液膜存在，因此变得干燥和污染。 清洁装置和方法也证明了成本优势。

公开(公告)号：US5985811A

公开(公告)日：1999-11-16

申请号：US780502

申请日：1997-01-08

申请人： Toda Masayuki ,  Tadahiro Ohmi ,  Yasuyuki Harada

发明人： Toda Masayuki ,  Tadahiro Ohmi ,  Yasuyuki Harada

IPC分类号： B08B3/10 ,  A61B19/00 ,  B08B3/12 ,  C11D3/39 ,  C11D7/00 ,  C11D11/00 ,  H01L21/304 ,  B08B3/04

CPC分类号： C11D3/3947 ,  B08B3/12 ,  C11D11/0047 ,  C11D11/007 ,  A61B90/70

摘要： A cleaning solution and cleaning method are provided which: (1) make treatment at room temperature possible, and do not require heating, (2) use little chemicals and water, (3) do not require specialized apparatuses, and moreover, (4) do not require the use of specialized chemicals. The cleaning solution of the present invention comprises pure water containing 20 ppb-100 ppb of oxygen and 2 ppb or more of nitrogen. Furthermore, the cleaning solution may comprise electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen. In the cleaning method of the present invention, the cleaning of a material to be cleaned is conducted in a cleaning solution comprising pure water containing 20 ppb-100 ppb of oxygen and 2 ppb-15 ppm of nitrogen, while applying ultrasound having a frequency of 30 kHz or more. Furthermore, in the cleaning method of the present invention, the cleaning of a material to be cleaned may be conducted in a cleaning solution comprising electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen, while applying ultrasound having a frequency of 30 kHz or more.

摘要翻译： 提供清洗方法和清洗方法：（1）在室温下进行处理，不需要加热，（2）少量使用化学品和水，（3）不需要专门的设备，而且（4） 不需要使用专门的化学品。 本发明的清洗液含有20ppb-100ppb的氧和2ppb以上的氮的纯水。 此外，清洁溶液可以包含含有OH-并且含有20ppb-100ppb氧的电解电离水。 在本发明的清洗方法中，要清洗的材料在包含20ppb-100ppb氧气和2ppb-15ppm氮气的纯水的清洁溶液中进行，同时施加频率为 30 kHz以上。 此外，在本发明的清洗方法中，清洗材料可以在含有OH-并含有20ppb-100ppb的氧的电解离子水的清洗溶液中进行，同时施加频率为 30 kHz以上。

公开(公告)号：US20100167122A1

公开(公告)日：2010-07-01

申请号：US12067663

申请日：2006-09-15

申请人： Yoshinobu Katayama ,  Shuhei Yoshida ,  Hiromasa Sugii ,  Yasuyuki Harada ,  Yoshihiro Masuda ,  Makoto Ochi ,  Masao Takee

发明人： Yoshinobu Katayama ,  Shuhei Yoshida ,  Hiromasa Sugii ,  Yasuyuki Harada ,  Yoshihiro Masuda ,  Makoto Ochi ,  Masao Takee

IPC分类号： H01M6/04 ,  H01M10/26

CPC分类号： H01M4/242 ,  H01M4/383 ,  H01M10/345 ,  H01M2004/021 ,  Y02E60/124

摘要： Disclosed is an alkaline storage battery comprising a negative electrode, a positive electrode, a separator and an alkaline electrolyte solution in a package can. The negative electrode contains a hydrogen storage alloy represented by the following general formula: Ln1-xMgx(Ni1-yTy)z (wherein Ln represents at least one element selected from lanthanoid elements, Ca, Sr, Sc, Y, Ti, Zr and Hf; T represents at least one element selected from V, Nb, Ta, Cr, Mo, Mn, Fe, Co, Al, Ga, Zn, Sn, In, Cu, Si, P and B; and 0

摘要翻译： 公开了一种包装罐中的负极，正极，隔膜和碱性电解质溶液的碱性蓄电池。 负极包含由以下通式表示的储氢合金：Ln1-xMgx（Ni1-yTy）z（其中Ln表示选自镧系元素，Ca，Sr，Sc，Y，Ti，Zr和Hf中的至少一种元素 T表示选自V，Nb，Ta，Cr，Mo，Mn，Fe，Co，Al，Ga，Zn，Sn，In，Cu，Si，P和B中的至少一种元素; 0

公开(公告)号：US5725753A

公开(公告)日：1998-03-10

申请号：US638233

申请日：1996-04-26

申请人： Yasuyuki Harada ,  Shigeyoshi Netsu

发明人： Yasuyuki Harada ,  Shigeyoshi Netsu

IPC分类号： B08B3/10 ,  C02F1/36 ,  C02F1/461 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

CPC分类号： H01L21/02052 ,  B08B3/10 ,  C02F1/4618 ,  H01L21/67057 ,  C02F1/36 ,  C02F2001/4619 ,  C02F2201/4611 ,  C02F2201/46115 ,  C02F2201/46195

摘要： An improvement is proposed in the cleaning treatment of semiconductor silicon wafers in which the conventional step of cleaning with an aqueous solution of an alkali is replaced with a cleaning treatment with a temporarily alkaline pure water which is produced electrolytically by the application of a DC voltage between a cathode and an anode bonded to the surfaces of a hydrogen-ion exchange membrane so that the alkaline cleaning treatment can be performed under mild conditions so as to eliminate the troubles due to formation of COPs unavoidable in the conventional process. In addition, the pure water rinse following the alkali cleaning of the wafers before transfer to the succeeding acidic cleaning step can be omitted to greatly contribute to the improvement of productivity. The apparatus used therefor comprises a rectangular vessel divided into a central cathode compartment, in which the wafers are held in a vertical disposition within an up-flow of pure water, and a pair of anode compartments by partitioning with a pair of hydrogen-ion exchange membranes, on both sides of which a cathode plate and anode plate are bonded.

摘要翻译： 在半导体硅晶片的清洗处理中提出了一种改进，其中用碱性水溶液进行清洁的常规步骤被用临时碱性纯水清洗处理代替，所述临时碱性纯水通过在 结合到氢离子交换膜的表面的阴极和阳极，使得碱性清洁处理可以在温和条件下进行，以消除由于形成常规方法中不可避免的COP的麻烦。 此外，在转移到后续的酸性清洁步骤之前，在晶片的碱清洗之后的纯水冲洗可以被省略，以极大地有助于提高生产率。 所使用的装置包括分成中央阴极室的矩形容器，其中晶片在纯水的上升流中保持垂直布置，并且一对阳极室通过用一对氢离子交换 膜，其两侧粘合阴极板和阳极板。

公开(公告)号：US07867653B2

公开(公告)日：2011-01-11

申请号：US12238813

申请日：2008-09-26

申请人： Makoto Ochi ,  Atsutoshi Ako ,  Yasuyuki Harada ,  Kazuhiro Kitaoka ,  Masao Takee

发明人： Makoto Ochi ,  Atsutoshi Ako ,  Yasuyuki Harada ,  Kazuhiro Kitaoka ,  Masao Takee

IPC分类号： H01M10/32 ,  H01M4/32 ,  H01M4/52

CPC分类号： H01M10/345 ,  H01M4/0416 ,  H01M4/28 ,  H01M4/32 ,  H01M4/52 ,  H01M4/80 ,  H01M10/26 ,  H01M10/44 ,  H01M2300/0014 ,  Y02E60/124

摘要： An alkaline storage battery system according to an aspect of the present invention, with which a partial charging-discharging is performed, includes an alkaline storage battery 10 including an electrode group having a nickel positive electrode 11, a hydrogen storage alloy negative electrode 12, a separator 13; an alkaline electrolyte; and an outer can 14 accommodating the electrode group and the alkaline electrolyte, and further includes a partial charge-discharge control unit for controlling charging-discharging of the battery 10. In addition, zinc (Zn) is added to nickel hydroxide that is a main positive electrode active material in the nickel positive electrode 11 with an addition amount of 5% by mass or less with respect to the mass of nickel in the positive electrode active material. The concentration of the alkaline electrolyte is 6.5 mol/L or less and the content of lithium in the alkaline electrolyte is 0.3 mol/L or more.

摘要翻译： 根据本发明的一个方面的执行部分充电放电的碱性蓄电池系统包括：碱性蓄电池10，其包括具有镍正极11的电极组，储氢合金负极12， 分离器13; 碱性电解液 以及容纳电极组和碱性电解质的外罐14，还包括用于控制电池10的充电 - 放电的部分充放电控制单元。此外，将锌（Zn）加入作为主要的氢氧化镍 相对于正极活性物质中的镍的质量，镍正极11中的正极活性物质的添加量为5质量％以下。 碱性电解质的浓度为6.5mol / L以下，碱性电解液中的锂的含量为0.3mol / L以上。

公开(公告)号：US06548210B1

公开(公告)日：2003-04-15

申请号：US09449552

申请日：1999-11-29

申请人： Katsuhiko Shinyama ,  Reizo Maeda ,  Yasuyuki Harada ,  Tadayoshi Tanaka ,  Yoshinori Matsuura ,  Toshiyuki Nohma ,  Ikuo Yonezu

发明人： Katsuhiko Shinyama ,  Reizo Maeda ,  Yasuyuki Harada ,  Tadayoshi Tanaka ,  Yoshinori Matsuura ,  Toshiyuki Nohma ,  Ikuo Yonezu

IPC分类号： H01M432

CPC分类号： H01M4/366 ,  H01M4/32 ,  H01M4/52 ,  H01M4/62 ,  H01M10/30 ,  H01M10/345 ,  Y02E60/124 ,  Y10T428/12493 ,  Y10T428/12944

摘要： A nickel electrode for alkaline secondary battery including a porous sintered nickel substrate loaded with a nickel hydroxide-based active material, the nickel electrode has a configuration wherein a surface portion of the active material loaded into the sintered nickel substrate is provided with a combination of a first coating layer of a suitable compound and a second coating layer of a suitable compound, or a coating layer of a compound of two or more suitable elements, or wherein the coating layer of two or more suitable elements is formed between the sintered nickel substrate and the active material.

公开(公告)号：US20130122352A1

公开(公告)日：2013-05-16

申请号：US13811672

申请日：2011-07-26

申请人： Yasuyuki Harada ,  Yasuhiro Kudo ,  Kenji Fujita ,  Toshihiro Sakatani ,  Makoto Mori ,  Teruhito Nagae

发明人： Yasuyuki Harada ,  Yasuhiro Kudo ,  Kenji Fujita ,  Toshihiro Sakatani ,  Makoto Mori ,  Teruhito Nagae

IPC分类号： H01M4/04

CPC分类号： H01M4/0416 ,  H01M4/32 ,  H01M4/52 ,  H01M10/30 ,  H01M10/345 ,  Y02E60/124 ,  Y02P70/54

摘要： Disclosed is a sintered nickel positive electrode that has an expanded usable range to a low charging region by using nickel hydroxide having a particular crystal structure as a main component of a positive electrode active material.In the sintered nickel positive electrode of the invention, a nickel sintered substrate is filled, through a plurality of impregnation steps, with a positive electrode active material containing nickel hydroxide (β-Ni(OH)2) as a main component. In addition, the nickel hydroxide (β-Ni(OH)2) has an integrated intensity ratio of a peak intensity in a (001) face of 1.8 or more with respect to a peak intensity in a (100) face, where the peak intensities are determined by X-ray diffraction analysis, while an integrated intensity ratio of a peak intensity in a (001) face with respect to a peak intensity in a (100) face is about 1.5 in the related art. Using the nickel hydroxide having an integrated intensity ratio of the peak intensity in the (001) face of 1.8 or more with respect to the peak intensity in the (100) face enables high-rate continuous discharge in a low charging region.

摘要翻译： 本发明公开了一种通过使用具有特定晶体结构的氢氧化镍作为正极活性物质的主要成分，使低电荷区域具有扩大的可用范围的烧结镍正极。 在本发明的烧结镍正极中，通过多个浸渍工序将含镍氢氧化镍（β-Ni（OH）2）的正极活性物质作为主要成分填充镍烧结基板。 此外，氢氧化镍（β-Ni（OH）2）具有（001）面中的峰强度相对于（100）面中的峰强度为1.8以上的积分强度比，其中峰 通过X射线衍射分析确定强度，而在（001）面中的峰强度相对于（100）面中的峰强度的积分强度比在现有技术中约为1.5。 使用具有（001）面中的峰强度与（100）面中的峰强度为1.8以上的积分强度比的氢氧化镍，能够实现低充电区域的高速连续放电。

公开(公告)号：US06790562B2

公开(公告)日：2004-09-14

申请号：US10097837

申请日：2002-03-15

申请人： Yasuyuki Harada ,  Tadayoshi Tanaka ,  Katsuhiko Shinyama ,  Toshiyuki Nohma ,  Ikuo Yonezu

发明人： Yasuyuki Harada ,  Tadayoshi Tanaka ,  Katsuhiko Shinyama ,  Toshiyuki Nohma ,  Ikuo Yonezu

IPC分类号： H01M216

CPC分类号： H01M2/145 ,  H01M2/162 ,  H01M10/28 ,  H01M10/345 ,  H01M2300/0014 ,  Y02E60/124 ,  Y02P70/54 ,  Y10T442/2459

摘要： In an alkaline secondary battery provided with a positive electrode, a negative electrode, a separator to be interposed between the positive electrode and the negative electrode, and an alkaline electrolyte solution, the above-mentioned separator has carbon-carbon double bonds. Further, an average amount of carbon-carbon double bonds in the separator is in the range of 10 &mgr;mol/g to 200 &mgr;mol/g, and an average amount of increased nitrogen in the separator after the separator is immersed in an alkaline aqueous solution having ammonium salt dissolved therein is not less than 140 &mgr;g/g.

摘要翻译： 在设置有正极，负极，正极和负极之间的隔膜的碱性二次电池和碱性电解液中，上述隔板具有碳 - 碳双键。 此外，隔板中的碳 - 碳双键的平均量在10mumol / g至200mumol / g的范围内，隔板之后的隔板中的氮平均增加量浸渍在具有 溶解在其中的铵盐不低于140mug / g。

公开(公告)号：US5733434A

公开(公告)日：1998-03-31

申请号：US648696

申请日：1996-05-16

申请人： Yasuyuki Harada ,  Shigeyoshi Netsu ,  Shouichi Miura

发明人： Yasuyuki Harada ,  Shigeyoshi Netsu ,  Shouichi Miura

IPC分类号： B01D61/46 ,  B01J19/10 ,  B08B3/10 ,  B08B3/12 ,  B08B7/00 ,  C02F1/36 ,  C02F1/461 ,  C30B29/06 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306 ,  H01L21/308

CPC分类号： H01L21/02052 ,  B08B3/12 ,  B08B7/00 ,  C02F1/4618 ,  H01L21/67057 ,  C02F1/36 ,  C02F2001/46185 ,  C02F2201/4611 ,  C02F2201/46115 ,  C02F2201/46195

摘要： An improvement is proposed in the cleaning treatment of semiconductor silicon wafers in which the conventional step of cleaning with an aqueous solution of an acid is replaced with a cleaning treatment with a temporarily acidic pure water which is produced electrolytically by the application of a DC voltage between an anode and a cathode bonded to the surfaces of a hydrogen-ion exchange membrane so that the acidic cleaning treatment can be performed under mild conditions so as to eliminate the troubles unavoidable in the conventional process. The apparatus used therefor comprises a rectangular vessel partitioned into a central anode compartment, in which the wafers are held in a vertical disposition within an upflow of pure water, and a pair of cathode compartments on both sides of the anode compartment by partitioning with a pair of hydrogen-ion exchange membranes, on both sides of which an anode plate and a cathode plate are bonded.

摘要翻译： 在半导体硅晶片的清洗处理中提出了一种改进，其中用酸性水溶液进行清洁的常规步骤被用临时酸化的纯水进行的清洁处理代替，所述临时酸性纯水通过在 阳极和阴极结合到氢离子交换膜的表面，使得酸性清洁处理可以在温和条件下进行，以消除常规方法中不可避免的麻烦。 使用的装置包括分隔成中央阳极室的矩形容器，其中晶片在纯水的上流中保持垂直布置，并且通过一对分隔在阳极室的两侧上的一对阴极室 的氢离子交换膜，其两侧粘合有阳极板和阴极板。