利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

179 条记录 (耗时 0.044 秒)

    Elastomeric mask and use in fabrication of devices
    5.
    发明授权
    Elastomeric mask and use in fabrication of devices 有权
    弹性面膜和用于制造器件

    公开(公告)号：US07282240B1

    公开(公告)日：2007-10-16

    申请号：US09694074

    申请日：2000-10-20

    申请人： Rebecca J. Jackman ,  David C. Duffy ,  George M. Whitesides ,  Kathleen Vaeth ,  Klavs F. Jensen

    发明人： Rebecca J. Jackman ,  David C. Duffy ,  George M. Whitesides ,  Kathleen Vaeth ,  Klavs F. Jensen

    IPC分类号： B05D1/32

    CPC分类号： C23C14/042 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F1/00 ,  G03F7/0002 ,  G03F7/0007 ,  G03F7/12 ,  H01L27/3211 ,  H01L27/3244 ,  H01L27/3281 ,  H01L51/0011 ,  H01L51/56

    摘要： An elastomeric mask is provided that allows deposition of a variety of materials through mask openings. The mask seals effectively against substrate surfaces, allowing simple deposition from fluid phase, gas phase, and the like or removal of material using gaseous or liquid etchants. The mask then can be simply peeled from the surface of the substrate leaving the patterned material behind. Multi-layered mask techniques are described in which openings in an upper mask allow selected openings of a lower mask to remain un-shielded, while other openings of the lower mask are shielded. A first deposition step, following by re-orientation of the upper mask to expose a different set of lower mask openings, allows selective deposition of different materials in different openings of the lower mask. Pixelated organic electroluminescent devices are provided via the described technique.

    摘要翻译： 提供了一种弹性体掩模，其允许通过掩模开口沉积各种材料。 掩模有效地密封衬底表面，允许从流体相，气相等简单沉积或使用气体或液体蚀刻剂去除材料。 然后可以从掩模的表面简单地剥离掩模，留下图案化材料。 描述了多层掩模技术，其中上掩模中的开口允许下掩模的选定开口保持未屏蔽，而下掩模的其它开口被屏蔽。 第一沉积步骤，随后通过上掩模的重新定向以暴露不同的一组下掩模开口，允许不同材料在下掩模的不同开口中的选择性沉积。 通过所述技术提供像素化的有机电致发光器件。

    Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
    7.
    发明授权
    Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element 有权
    透明弹性体，接触模式光刻掩模，传感器和波前工程元件

    公开(公告)号：US06753131B1

    公开(公告)日：2004-06-22

    申请号：US09422611

    申请日：1999-10-21

    申请人： John A. Rogers ,  Rebecca J. Jackman ,  Kateri E. Paul ,  Olivier J. A. Schueller ,  Tricia Lynn Breen ,  George M. Whitesides

    发明人： John A. Rogers ,  Rebecca J. Jackman ,  Kateri E. Paul ,  Olivier J. A. Schueller ,  Tricia Lynn Breen ,  George M. Whitesides

    IPC分类号： G03C500

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/34 ,  G03F1/50 ,  G03F1/60 ,  G03F7/0002

    摘要： A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive photoresist, and the surface exposed to electromagnetic radiation through the phase mask. The phase shift due to radiation passing through the indentations as opposed to the protrusions is essentially complete. Minima in intensity of electromagnetic radiation are thereby produced at boundaries between the indentations and protrusions. The elastomeric mask conforms well to the surface of photoresist and, following development, features smaller than 100 nm can be obtained. Patterns including curved portions are obtained, as well as curved and/or linear patterns on non-planar surfaces. An elastomeric transparent diffraction grating serves also as a spatial light modulator photothermal detector, strain gauge, and display device. A technique for simplified photolithography is also described. A photoreactive, contoured surface is exposed to electricmagnetic radiation and contours in the surface alters the electromagnetic radiation to promote selective surface photoreaction. The contours can act as lenses, gratings, or the like, such that the photoreactive surface itself can selectively direct uniform radiation to promote selective photoreaction within itself. A photoresist layer having a contoured surface thus can be exposed to uniform radiation, without a mask, followed by development and lift-off to create a photoresist pattern that can be used in any of a variety of ways. The invention provides methods of making contoured, photoreactive surfaces, and contoured photoreactive surfaces themselves.

    摘要翻译： 接触模式光刻相位掩模包括具有多个凹陷和突起的衍射表面。 突起与正性光致抗蚀剂的表面接触，并且表面暴露于通过相位掩模的电磁辐射。 与突起相反的通过压痕的辐射的相移基本上完成。 因此，在凹陷和突起之间的边界处产生电磁辐射强度的微小。 弹性体掩模与光致抗蚀剂的表面相适应，并且在显影之后，可以获得小于100nm的特征。 获得包括弯曲部分的图案，以及在非平面表面上的曲线和/或线性图案。 弹性透明衍射光栅还用作空间光调制器光热检测器，应变计和显示装置。 还描述了用于简化光刻的技术。 光反应的轮廓表面暴露于电磁辐射，并且表面中的轮廓改变电磁辐射以促进选择性表面光反应。 轮廓可以用作透镜，光栅等，使得光反应表面本身可以选择性地引导均匀的辐射以促进其本身内的选择性光反应。 因此，具有轮廓表面的光致抗蚀剂层可以暴露于均匀的辐射，而不需要掩模，然后显影和剥离以产生可以以各种方式中的任何一种使用的光致抗蚀剂图案。 本发明提供了制造轮廓，光反应表面和轮廓光反应表面本身的方法。

    Fabrication of small-scale cylindrical articles
    8.
    发明授权
    Fabrication of small-scale cylindrical articles 失效
    小型圆柱形制品的制造

    公开(公告)号：US5951881A

    公开(公告)日：1999-09-14

    申请号：US681235

    申请日：1996-07-22

    申请人： John A. Rogers ,  Rebecca J. Jackman ,  George M. Whitesides

    发明人： John A. Rogers ,  Rebecca J. Jackman ,  George M. Whitesides

    IPC分类号： B05D1/28 ,  G03F7/00 ,  G03F7/16 ,  G03F7/18 ,  G03F7/24 ,  H01F41/04 ,  H01L22/027

    CPC分类号： G02B6/02142 ,  B05D1/283 ,  B82Y30/00 ,  B82Y40/00 ,  G02B6/02138 ,  G03F7/00 ,  G03F7/161 ,  G03F7/18 ,  G03F7/24 ,  H01F41/042 ,  G02B6/02152

    摘要： Techniques for fabrication of small-scale metallic structures such as microinductors, microtransformers and stents are described. A chemically active agent such as a catalyst is applied from an applicator in a pattern to an exterior surface of an article, metal is deposited according to the pattern and optionally, removed from the substrate. Where the substrate is cylindrical, the pattern can serve as a stent. Alternatively, a pattern of a self-assembled monolayer can be printed on a surface, which pattern can dictate metal plating or etching resulting in a patterned metal structure that can be cylindrical. In another embodiment, a structure is patterned on a surface that serves as a phase-modulating pattern or amplitude-modulating pattern. The article subsequently is exposed to radiation that can induce a change in refractive index within the article, and the phase-modulating or amplitude-modulating pattern results in different indices of refraction being created in different portions of the article. By this technique, a grating can be written into a core of an optical fiber.

    摘要翻译： 描述了微型电感器，微型变压器和支架等小型金属结构的制造技术。 将化学活性剂如催化剂从涂布器以图案施加到制品的外表面，根据图案沉积金属，并任选地从基材上除去金属。 在基底为圆柱形的情况下，图案可用作支架。 或者，自组装单层的图案可以印刷在表面上，该图案可以规定金属电镀或蚀刻，导致可以是圆柱形的图案化金属结构。 在另一个实施例中，在用作相位调制图案或幅度调制图案的表面上图案化结构。 该物品随后暴露于可引起制品内的折射率变化的辐射，并且相位调制或幅度调制图案导致在制品的不同部分产生不同的折射率。 通过这种技术，可以将光栅写入光纤的核心。