公开(公告)号：US06806170B2

公开(公告)日：2004-10-19

申请号：US10242293

申请日：2002-09-12

申请人： Peter Ward ,  Simona Lorenti ,  Giuseppe Ferla

发明人： Peter Ward ,  Simona Lorenti ,  Giuseppe Ferla

IPC分类号： H01L2120

CPC分类号： H01L21/02667 ,  H01L21/02532 ,  H01L21/2022

摘要： A method for forming an interface free layer of silicon on a substrate of monocrystalline silicon is provided. According to the method, a substrate of monocrystalline silicon having a surface substantially free of oxide is provided. A silicon layer in-situ doped is deposited on the surface of the substrate in an oxygen-free environment and at a temperature below 700° C. so as to produce a monocrystalline portion of the silicon layer adjacent to the substrate and a polycrystalline portion of the silicon layer spaced apart from the substrate. The silicon layer is heated so as to grow the monocrystalline portion of the silicon layer through a part of the polycrystalline portion of the silicon layer. Also provided is a method for manufacturing a bipolar transistor.

摘要翻译： 提供了在单晶硅衬底上形成硅界面自由层的方法。 根据该方法，提供具有基本上不含氧化物的表面的单晶硅的衬底。 原位掺杂的硅层在无氧环境和低于700℃的温度下沉积在衬底的表面上，以便产生与衬底相邻的硅层的单晶部分和多晶部分 所述硅层与所述衬底间隔开。 加热硅层，以使硅层的单晶部分通过硅层的多晶部分的一部分生长。 还提供了制造双极晶体管的方法。

公开(公告)号：US06642121B2

公开(公告)日：2003-11-04

申请号：US10032334

申请日：2001-12-18

申请人： Cateno M. Camalleri ,  Simona Lorenti ,  Denise Cali′ ,  Patrizia Vasquez ,  Giuseppe Ferla

发明人： Cateno M. Camalleri ,  Simona Lorenti ,  Denise Cali′ ,  Patrizia Vasquez ,  Giuseppe Ferla

IPC分类号： H01L218222

CPC分类号： H01L29/66272 ,  H01L21/2256 ,  H01L29/7311

摘要： A method of controlling the quantity and uniformity of distribution of bonded oxygen atoms at the interface between the polysilicon and the monocrystalline silicon includes carrying out, after having loaded the wafer inside the heated chamber of the reactor and evacuated the chamber of the LPCVD reactor under nitrogen atmosphere, a treatment of the wafer with hydrogen at a temperature generally between 500 and 1200° C. and at a vacuum generally between 0.1 Pa and 60000 Pa. The treatment is performed at a time generally between 0.1 and 120 minutes, to remove any and all the oxygen that may have combined with the silicon on the surface of the monocrystalline silicon during the loading inside the heated chamber of the reactor even if it is done under a nitrogen flux. After such a hydrogen treatment, another treatment is carried out substantially under the same vacuum conditions and at a temperature generally between 700 and 1000° C. with nitrogen protoxide (N2O) for a time generally between 0.1 and 120 minutes.

公开(公告)号：US20110081759A1

公开(公告)日：2011-04-07

申请号：US12967845

申请日：2010-12-14

申请人： Angelo Magri ,  Ferruccio Frisina ,  Giuseppe Ferla

发明人： Angelo Magri ,  Ferruccio Frisina ,  Giuseppe Ferla

IPC分类号： H01L21/8232

CPC分类号： H01L29/7802 ,  H01L29/4238 ,  H01L29/4916 ,  H01L29/4933 ,  H01L29/4983

摘要： Power MOS device of the type comprising a plurality of elementary power MOS transistors having respective gate structures and comprising a gate oxide with double thickness having a thick central part and lateral portions of reduced thickness. Such device exhibiting gate structures comprising first gate conductive portions overlapped onto said lateral portions of reduced thickness to define, for the elementary MOS transistors, the gate electrodes, as well as a conductive structure or mesh. Such conductive structure comprising a plurality of second conductive portions overlapped onto the thick central part of gate oxide and interconnected to each other and to the first gate conductive portions by means of a plurality of conducive bridges.

公开(公告)号：US20090321826A1

公开(公告)日：2009-12-31

申请号：US12551999

申请日：2009-09-01

申请人： Giuseppe ARENA ,  Giuseppe Ferla ,  Marco Camalleri

发明人： Giuseppe ARENA ,  Giuseppe Ferla ,  Marco Camalleri

IPC分类号： H01L29/78

CPC分类号： H01L29/7802 ,  H01L21/2815 ,  H01L29/42372 ,  H01L29/42376 ,  H01L29/4238 ,  H01L29/4933 ,  H01L29/66712

摘要： A process for the realization of a high integration density power MOS device includes the following steps of: providing a doped semiconductor substrate with a first type of conductivity; forming, on the substrate, a semiconductor layer with lower conductivity; forming, on the semiconductor layer, a dielectric layer of thickness comprised between 3000 and 13000 A (Angstroms); depositing, on the dielectric layer, a hard mask layer; masking the hard mask layer by means of a masking layer; etching the hard mask layers and the underlying dielectric layer for defining a plurality of hard mask portions to protect said dielectric layer; removing the masking layer; isotropically and laterally etching said dielectric layer forming lateral cavities in said dielectric layer below said hard mask portions; forming a gate oxide of thickness comprised between 150 and 1500 A (Angstroms) depositing a conductor material in said cavities and above the same to form a recess spacer, which is totally aligned with a gate structure comprising said thick dielectric layer and said gate oxide.

摘要翻译： 用于实现高集成度功率MOS器件的方法包括以下步骤：提供具有第一类型导电性的掺杂半导体衬底; 在所述基板上形成具有较低导电率的半导体层; 在半导体层上形成厚度介于3000和13000A（埃）之间的介电层; 在电介质层上沉积硬掩模层; 通过掩模层掩蔽硬掩模层; 蚀刻硬掩模层和下面的介电层以限定多个硬掩模部分以保护所述介电层; 去除掩蔽层; 各向同性和横向蚀刻所述介电层，在所述硬掩模部分下面的所述介电层中形成横向空腔; 形成厚度为150至1500A（埃）的栅极氧化物，其在所述空腔中沉积导体材料并且在其上方，以形成与包括所述厚介电层和所述栅极氧化物的栅极结构完全对准的凹陷间隔物。

公开(公告)号：US07569883B2

公开(公告)日：2009-08-04

申请号：US11285759

申请日：2005-11-21

申请人： Ferruccio Frisina ,  Giuseppe Ferla ,  Angelo Magri ,  Antonio Giuseppe Grimaldi ,  Gaetano Bazzano

发明人： Ferruccio Frisina ,  Giuseppe Ferla ,  Angelo Magri ,  Antonio Giuseppe Grimaldi ,  Gaetano Bazzano

IPC分类号： H01L29/76 ,  H01L29/94 ,  H01L21/336

CPC分类号： H01L29/7802 ,  H01L29/4238 ,  H01L29/4916 ,  H01L29/4933 ,  H01L29/4983

摘要： Power electronic MOS device of the type comprising a plurality of elementary power MOS transistors and a gate structure comprising a plurality of conductive strips realized with a first conductive material such as polysilicon, a plurality of gate fingers or metallic tracks connected to a gate pad and at least a connection layer arranged in series to at least one of said conductive strip. Such gate structure comprising at least a plurality of independent islands formed on the upper surface of the conductive strips and suitably formed on the connection layers. Said islands being realized with at least one second conductive material such as silicide.

摘要翻译： 这种类型的功率电子MOS器件包括多个基本功率MOS晶体管和一个栅极结构，该栅极结构包括由第一导电材料（例如多晶硅），多个栅极指状物或连接到栅极焊盘的金属轨道 至少一个与至少一个所述导电带串联布置的连接层。 这种门结构包括形成在导电条的上表面上并适当地形成在连接层上的至少多个独立的岛。 所述岛通过至少一种第二导电材料如硅化物实现。

公开(公告)号：US06890806B2

公开(公告)日：2005-05-10

申请号：US10763626

申请日：2004-01-23

申请人： Gianfranco Cerofolini ,  Giuseppe Ferla

发明人： Gianfranco Cerofolini ,  Giuseppe Ferla

IPC分类号： H01L21/8247 ,  H01L21/28 ,  H01L27/115 ,  H01L29/51 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  H01L51/05 ,  H01L51/30 ,  H01L51/40 ,  H01L21/8234

CPC分类号： H01L21/28167 ,  H01L29/51

摘要： A method of fabricating a MOS transistor with a controllable and modulatable conduction path through a dielectric gate oxide is disclosed, wherein the transistor structure comprises a dielectric oxide layer formed between two silicon plates, and wherein the silicon plates overhang the oxide layer all around to define an undercut having a substantially rectangular cross-sectional shape. The method comprises the steps of: chemically altering the surfaces of the silicon plates to have different functional groups provided in the undercut from those in the remainder of the surfaces; and selectively reacting the functional groups provided in the undercut with an organic molecule having a reversibly reducible center and a molecular length substantially equal to the width of the undercut, thereby to establish a covalent bond to each end of the organic molecule.

摘要翻译： 公开了一种通过电介质栅极氧化物制造具有可控和可调制传导路径的MOS晶体管的方法，其中晶体管结构包括在两个硅板之间形成的电介质氧化物层，并且其中硅板全部悬垂在氧化物层周围以限定 具有基本上矩形横截面形状的底切。 该方法包括以下步骤：将硅板的表面化学改变成在底切中提供的不同的官能团与其余表面中的不同的官能团; 并且将底切中提供的官能团选择性地与具有可逆还原中心和分子长度基本上等于底切宽度的有机分子反应，从而与有机分子的每个末端建立共价键。

公开(公告)号：US06468866B2

公开(公告)日：2002-10-22

申请号：US09427237

申请日：1999-10-26

申请人： Ferruccio Frisina ,  Angelo Magri ,  Giuseppe Ferla ,  Richard A. Blanchard

发明人： Ferruccio Frisina ,  Angelo Magri ,  Giuseppe Ferla ,  Richard A. Blanchard

IPC分类号： H01L21336

CPC分类号： H01L29/7802 ,  H01L29/0696 ,  H01L29/0847 ,  H01L29/0869 ,  H01L29/1095 ,  H01L29/66333

摘要： A MOS technology power device comprises a semiconductor material layer of a first conductivity type, a conductive insulated gate layer covering the semiconductor material layer, and a plurality of elementary functional units. The conductive insulated gate layer includes a first insulating material layer placed above the semiconductor material layer, a conductive material layer placed above the first insulating material layer, and a second insulating material layer placed above the conductive material layer. Each elementary functional unit includes an elongated body region of a second conductivity type formed in the semiconductor material layer. Each elementary functional unit further includes an elongated window in the insulated gate layer extending above the elongated body region. Each elongated body region includes a source region doped with dopants of the first conductivity type, intercalated with a portion of the elongated body region wherein no dopant of the first conductivity type are provided. The MOS technology power device further includes a plurality of insulating material sidewall spacers disposed above the semiconductor material layer along elongated edges of each elongated window to seal the edges of each elongated window in the insulated gate layer from a source metal layer disposed over the insulated gate layer and the semiconductor material layer. The source metal layer contacts each body region and each source region through each elongated window along the length of the elongated body region.

摘要翻译： MOS技术功率器件包括第一导电类型的半导体材料层，覆盖半导体材料层的导电绝缘栅极层和多个基本功能单元。 导电绝缘栅层包括置于半导体材料层上方的第一绝缘材料层，位于第一绝缘材料层上方的导电材料层和置于导电材料层上方的第二绝缘材料层。 每个基本功能单元包括形成在半导体材料层中的第二导电类型的细长体区域。 每个基本功能单元还包括在细长体区域上方延伸的绝缘栅极层中的细长窗口。 每个细长体区域包括掺杂有第一导电类型的掺杂剂的源区，插入有细长体区的一部分，其中不提供第一导电类型的掺杂剂。 MOS技术功率器件还包括多个绝缘材料侧壁间隔物，其沿着每个细长窗口的细长边缘设置在半导体材料层之上，以密封绝缘栅极层中每个细长窗口的边缘与设置在绝缘栅极上的源极金属层 层和半导体材料层。 源极金属层沿着细长主体区域的长度通过每个细长窗口接触每个体区域和每个源极区域。

公开(公告)号：US6064087A

公开(公告)日：2000-05-16

申请号：US739466

申请日：1996-10-29

申请人： Angelo Magri' ,  Ferruccio Frisina ,  Giuseppe Ferla

发明人： Angelo Magri' ,  Ferruccio Frisina ,  Giuseppe Ferla

IPC分类号： H01L29/74 ,  H01L21/331 ,  H01L29/06 ,  H01L29/08 ,  H01L29/10 ,  H01L29/749 ,  H01L29/78 ,  H01L29/76 ,  H01L29/94

CPC分类号： H01L29/66333 ,  H01L29/0696 ,  H01L29/1095 ,  H01L29/7802 ,  H01L29/0847

摘要： A MOS technology power device comprises a semiconductor material layer of a first conductivity type, a conductive insulated gate layer covering the semiconductor material layer, and a plurality of elementary functional units. The conductive insulated gate layer includes a first insulating material layer placed above the semiconductor material layer, a conductive material layer placed above the first insulating material layer, and a second insulating material layer placed above the conductive material layer. Each elementary functional unit includes an elongated body region of a second conductivity type formed in the semiconductor material layer. Each elementary functional unit further includes an elongated window in the insulated gate layer extending above the elongated body region. Each elongated body region includes a source region doped with dopants of the first conductivity type, intercalated with a portion of the elongated body region wherein no dopant of the first conductivity type are provided. The MOS technology power device further includes a plurality of insulating material sidewall spacers disposed above the semiconductor material layer along elongated edges of each elongated window to seal the edges of each elongated window in the insulated gate layer from a source metal layer disposed over the insulated gate layer and the semiconductor material layer. The source metal layer contacts each body region and each source region through each elongated window along the length of the elongated body region.

公开(公告)号：US5841167A

公开(公告)日：1998-11-24

申请号：US772657

申请日：1996-12-23

申请人： Antonio Grimaldi ,  Antonino Schillaci ,  Ferruccio Frisina ,  Giuseppe Ferla

发明人： Antonio Grimaldi ,  Antonino Schillaci ,  Ferruccio Frisina ,  Giuseppe Ferla

IPC分类号： H01L21/336 ,  H01L23/482 ,  H01L29/06 ,  H01L29/10 ,  H01L29/417 ,  H01L29/423 ,  H01L29/78 ,  H01L29/76 ,  H01L29/94 ,  H01L31/062 ,  H01L31/113

CPC分类号： H01L29/66712 ,  H01L23/4824 ,  H01L29/0696 ,  H01L29/1095 ,  H01L29/4238 ,  H01L29/7802 ,  H01L29/41725 ,  H01L2924/0002

摘要： A MOS-gated power device integrated structure comprises a plurality of elementary units formed in a semiconductor material layer of a first conductivity type. Each elementary unit is formed in a body stripe of a second conductivity type. There are a plurality of body stripes of the second conductivity type extending substantially in parallel to each other and at least one source region of the first conductivity type disposed within each body stripe. A conductive gate layer is insulatively disposed over the semiconductor material layer between the body stripes in the form of a first web structure. A second web structure of the second conductivity type is formed in the semiconductor material layer and comprises an annular frame portion surrounding the plurality of bodystripes and at least one first elongated stripe extending between two sides of the annular frame portion in a direction substantially orthogonal to the body stripes and that is merged at each end with the annular frame portion. The body stripes are divided by the at least one first elongated stripe into at least two groups of body stripes, wherein one end of each body stripe is merged with the annular frame portion of the second conductivity type and the other end is merged with the at least one first elongated stripe. A conductive gate finger is insulatively disposed above the first elongated stripe and is part of the first web structure. A conductive gate ring surrounds the conductive gate layer and the conductive gate finger and completes the first web structure. A metal gate finger is disposed above the conductive gate finger and is merged at its ends with a metal gate ring structure disposed above the conductive gate ring to provide a third web structure. Source metal plates cover the at least two groups of body stripes and contact each source region and each body stripe to form a source electrode of the power device. A bottom surface of the semiconductor material layer forms a drain of the power device.

公开(公告)号：US5817546A

公开(公告)日：1998-10-06

申请号：US576989

申请日：1995-12-19

申请人： Giuseppe Ferla ,  Ferruccio Frisina

发明人： Giuseppe Ferla ,  Ferruccio Frisina

IPC分类号： H01L21/336 ,  H01L29/10 ,  H01L21/332

CPC分类号： H01L29/66712 ,  H01L29/1095 ,  Y10S148/126

摘要： A process forms a MOS-technology power device including a semiconductor material layer of a first conductivity type and a body region disposed therein. The body region includes a heavily doped region of a second conductivity type, a lightly doped region of the second conductivity type and a heavily doped region of the first conductivity type. The process includes forming an insulated gate layer on portions of the surface of the semiconductor material layer to leave selected portions of the semiconductor material layer exposed. A dopant of the second conductivity type is implanted twice at different concentrations and energies into the selected regions of the semiconductor material layer. The implanted ions are thermally diffused to form body regions, each body region including a heavily doped region substantially aligned with the edges of the insulated gate layer, and a lightly doped region formed by lateral diffusion of the first dopant under the insulated gate layer. A dopant of the first conductivity type is then implanted into the heavily doped regions to form source regions substantially aligned with the edges of the insulated gate layer.

摘要翻译： 一种工艺形成包括第一导电类型的半导体材料层和设置在其中的体区的MOS技术功率器件。 身体区域包括第二导电类型的重掺杂区域，第二导电类型的轻掺杂区域和第一导电类型的重掺杂区域。 该方法包括在半导体材料层的表面的部分上形成绝缘栅极层，以使半导体材料层的选定部分露出。 将第二导电类型的掺杂剂以不同的浓度和能量注入到半导体材料层的选定区域中两次。 注入的离子热扩散以形成体区，每个体区包括基本上与绝缘栅层的边缘对准的重掺杂区，以及通过第一掺杂剂在绝缘栅层下方的横向扩散形成的轻掺杂区。 然后将第一导电类型的掺杂剂注入到重掺杂区域中以形成与绝缘栅极层的边缘基本对准的源极区域。