Integrated gate controlled high voltage divider
    2.
    发明授权
    Integrated gate controlled high voltage divider 有权
    集成门控高压分压器

    公开(公告)号:US08872273B2

    公开(公告)日:2014-10-28

    申请号:US13567340

    申请日:2012-08-06

    IPC分类号: H01L27/11 H01L27/06 H01L49/02

    CPC分类号: H01L28/20 H01L27/0629

    摘要: An integrated circuit containing a gate controlled voltage divider having an upper resistor on field oxide in series with a transistor switch in series with a lower resistor. A resistor drift layer is disposed under the upper resistor, and the transistor switch includes a switch drift layer adjacent to the resistor drift layer, separated by a region which prevents breakdown between the drift layers. The switch drift layer provides an extended drain or collector for the transistor switch. A sense terminal of the voltage divider is coupled to a source or emitter node of the transistor and to the lower resistor. An input terminal is coupled to the upper resistor and the resistor drift layer. A process of forming the integrated circuit containing the gate controlled voltage divider.

    摘要翻译: 一种集成电路,其包含栅极控制分压器,该栅极控制分压器具有与场效应晶体管上的上电阻串联的晶体管开关,与下电阻串联。 电阻器漂移层设置在上电阻器下方,并且晶体管开关包括与电阻器漂移层相邻的开关漂移层,由防止漂移层之间的击穿的区域分开。 开关漂移层为晶体管开关提供了扩展的漏极或集电极。 分压器的感测端子耦合到晶体管的源极或发射极节点和下电阻器。 输入端子耦合到上电阻器和电阻漂移层。 形成包含栅极控制分压器的集成电路的工艺。

    INTEGRATED HIGH VOLTAGE DIVIDER
    5.
    发明申请
    INTEGRATED HIGH VOLTAGE DIVIDER 有权
    集成高压分压器

    公开(公告)号:US20130032922A1

    公开(公告)日:2013-02-07

    申请号:US13567456

    申请日:2012-08-06

    IPC分类号: H01L29/06 H01L21/761

    CPC分类号: H01L21/761 H01L21/266

    摘要: An integrated circuit containing a voltage divider having an upper resistor of unsilicided gate material over field oxide around a central opening and a drift layer under the upper resistor, an input terminal coupled to an input node of the upper resistor adjacent to the central opening in the field oxide and coupled to the drift layer through the central opening, a sense terminal coupled to a sense node on the upper resistor opposite from the input node, a lower resistor with a sense node coupled to the sense terminal and a reference node, and a reference terminal coupled to the reference node. A process of forming the integrated circuit containing the voltage divider.

    摘要翻译: 一种集成电路,包括分压器,该分压器具有围绕中心开口的场氧化物上的非硅栅极材料的上电阻器,以及位于上电阻器下的漂移层的输入端子,所述输入端子与所述上电阻器的输入节点相邻, 场氧化物并通过中心开口耦合到漂移层,感测端子耦合到与输入节点相反的上电阻上的感测节点,具有耦合到感测端子的检测节点和参考节点的下电阻器,以及 参考终端耦合到参考节点。 形成包含分压器的集成电路的工艺。

    INTEGRATED GATE CONTROLLED HIGH VOLTAGE DIVIDER
    6.
    发明申请
    INTEGRATED GATE CONTROLLED HIGH VOLTAGE DIVIDER 有权
    集成门控高压分压器

    公开(公告)号:US20130032863A1

    公开(公告)日:2013-02-07

    申请号:US13567340

    申请日:2012-08-06

    IPC分类号: H01L27/07 H01L21/20

    CPC分类号: H01L28/20 H01L27/0629

    摘要: An integrated circuit containing a gate controlled voltage divider having an upper resistor on field oxide in series with a transistor switch in series with a lower resistor. A resistor drift layer is disposed under the upper resistor, and the transistor switch includes a switch drift layer adjacent to the resistor drift layer, separated by a region which prevents breakdown between the drift layers. The switch drift layer provides an extended drain or collector for the transistor switch. A sense terminal of the voltage divider is coupled to a source or emitter node of the transistor and to the lower resistor. An input terminal is coupled to the upper resistor and the resistor drift layer. A process of forming the integrated circuit containing the gate controlled voltage divider.

    摘要翻译: 一种集成电路,其包含栅极控制分压器,该栅极控制分压器具有与场效应晶体管上的上电阻串联的晶体管开关,与下电阻串联。 电阻器漂移层设置在上电阻器下方,并且晶体管开关包括与电阻器漂移层相邻的开关漂移层,由防止漂移层之间的击穿的区域分开。 开关漂移层为晶体管开关提供了扩展的漏极或集电极。 分压器的感测端子耦合到晶体管的源极或发射极节点和下电阻器。 输入端子耦合到上电阻器和电阻漂移层。 形成包含栅极控制分压器的集成电路的工艺。

    Integrated high voltage divider
    8.
    发明授权
    Integrated high voltage divider 有权
    集成高压分压器

    公开(公告)号:US08878330B2

    公开(公告)日:2014-11-04

    申请号:US13567456

    申请日:2012-08-06

    CPC分类号: H01L21/761 H01L21/266

    摘要: An integrated circuit containing a voltage divider having an upper resistor of unsilicided gate material over field oxide around a central opening and a drift layer under the upper resistor, an input terminal coupled to an input node of the upper resistor adjacent to the central opening in the field oxide and coupled to the drift layer through the central opening, a sense terminal coupled to a sense node on the upper resistor opposite from the input node, a lower resistor with a sense node coupled to the sense terminal and a reference node, and a reference terminal coupled to the reference node. A process of forming the integrated circuit containing the voltage divider.

    摘要翻译: 一种集成电路,包括分压器,该分压器具有围绕中心开口的场氧化物上的非硅栅极材料的上电阻器,以及位于上电阻器下的漂移层的输入端子,所述输入端子与所述上电阻器的输入节点相邻, 场氧化物并通过中心开口耦合到漂移层,感测端子耦合到与输入节点相反的上电阻上的感测节点,具有耦合到感测端子的检测节点和参考节点的下电阻器,以及 参考终端耦合到参考节点。 形成包含分压器的集成电路的工艺。

    METHOD OF MAKING VERTICAL TRANSISTOR WITH GRADED FIELD PLATE DIELECTRIC
    9.
    发明申请
    METHOD OF MAKING VERTICAL TRANSISTOR WITH GRADED FIELD PLATE DIELECTRIC 有权
    制造具有等级场板电介质的垂直晶体管的方法

    公开(公告)号:US20110275210A1

    公开(公告)日:2011-11-10

    申请号:US13188162

    申请日:2011-07-21

    IPC分类号: H01L21/28

    摘要: An electronic device has a plurality of trenches formed in a semiconductor layer. A vertical drift region is located between and adjacent the trenches. An electrode is located within each trench, the electrode having a gate electrode section and a field plate section. A graded field plate dielectric having increased thickness at greater depth is located between the field plate section and the vertical drift region.

    摘要翻译: 电子器件具有形成在半导体层中的多个沟槽。 垂直漂移区域位于沟槽之间和相邻的沟槽之间。 电极位于每个沟槽内,电极具有栅电极部分和场板部分。 在场板部分和垂直漂移区域之间设置具有较大深度的厚度增加的分级场板电介质。

    BVDII Enhancement with a Cascode DMOS
    10.
    发明申请
    BVDII Enhancement with a Cascode DMOS 审中-公开
    BVDII增强与Cascode DMOS

    公开(公告)号:US20090159968A1

    公开(公告)日:2009-06-25

    申请号:US11960432

    申请日:2007-12-19

    IPC分类号: H01L27/088 H01L21/8234

    摘要: Double diffused MOS (DMOS) transistors feature extended drain regions to provide depletion regions which drop high drain voltages to lower voltages at the gate edges. DMOS transistors exhibit lower drain breakdown potential in the on-state than in the off-state than in the off-state due to snapback by a parasitic bipolar transistor that exists in parallel with the DMOS transistor. The instant invention is a cascoded DMOS transistor in an integrated circuit incorporating an NMOS transistor on the DMOS source node to reverse bias the parasitic emitter-base junction during on-state operation, eliminating snapback. The NMOS transistor may be integrated with the DMOS transistor by connections in the interconnect system of the integrated circuit, or the NMOS transistor and DMOS transistor may be fabricated in a common p-type well and integrated in the IC substrate. Methods of fabricating an integrated circuit with the incentive cascoded DMOS transistor are also disclosed.

    摘要翻译: 双扩散MOS(DMOS)晶体管具有扩展的漏极区域,以提供耗尽区域,其将高漏极电压降低到栅极边缘处的较低电压。 由于与DMOS晶体管并联存在的寄生双极晶体管的回跳,DMOS晶体管在导通状态下的漏极击穿电位低于截止状态下的漏极击穿电位。 本发明是在DMOS源节点上结合有NMOS晶体管的集成电路中的级联DMOS晶体管,以在接通状态操作期间反向偏置寄生发射极 - 基极结,从而消除了快速恢复。 NMOS晶体管可以通过集成电路的互连系统中的连接与DMOS晶体管集成,或者NMOS晶体管和DMOS晶体管可以制造在共同的p型阱中并集成在IC衬底中。 还公开了使用激励级联DMOS晶体管制造集成电路的方法。