公开(公告)号：US20100055851A1

公开(公告)日：2010-03-04

申请号：US12389031

申请日：2009-02-19

申请人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Seok Jeon ,  Pil-Soon Hong ,  Doek-Man Kang ,  Sae-Tae Oh ,  Chang-Ik Lee

发明人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Seok Jeon ,  Pil-Soon Hong ,  Doek-Man Kang ,  Sae-Tae Oh ,  Chang-Ik Lee

IPC分类号： H01L21/336 ,  C08F118/16 ,  G03F7/00

CPC分类号： H01L29/66765 ,  G03F7/0388

摘要： The present invention relates to a photoresist composition that comprises a resin that is represented by Formula 1, a method for forming a thin film pattern, and a method for manufacturing a thin film transistor array panel by using the same. Herein, R is a methylene group, and n is an integer of 1 or more.

摘要翻译： 本发明涉及一种光致抗蚀剂组合物，其包含由式1表示的树脂，薄膜图案的形成方法以及使用该薄膜晶体管阵列板的方法。 这里，R为亚甲基，n为1以上的整数。

公开(公告)号：US20090280591A1

公开(公告)日：2009-11-12

申请号：US12421555

申请日：2009-04-09

申请人： Pil-Soon Hong ,  Jung-In Park ,  Hi-Kuk Lee

发明人： Pil-Soon Hong ,  Jung-In Park ,  Hi-Kuk Lee

IPC分类号： H01L21/28

CPC分类号： H01L27/1288 ,  H01L27/3248 ,  H01L2227/323

摘要： Provided is a method of manufacturing a display substrate. In the method, a gate line, a data line crossing the gate line, and a switching device are formed on a base substrate. A passivation layer, a first resist layer and a second resist layer are formed on the base substrate. The first resist layer and the second resist layer are patterned to form a resist pattern and an etch-stop pattern, the etch-stop pattern having a sidewall protruding from a sidewall of the resist pattern. A portion of the passivation layer is removed to form a contact hole on a drain electrode of the switching device. A pixel electrode electrically connected to the switching device through the contact hole is formed. Thus, an undercut between an etch-stop pattern and a resist pattern may be more easily formed without over-etching a passivation layer.

摘要翻译： 提供一种制造显示基板的方法。 在该方法中，在基底基板上形成栅极线，与栅极线交叉的数据线以及开关元件。 在基底基板上形成钝化层，第一抗蚀剂层和第二抗蚀剂层。 图案化第一抗蚀剂层和第二抗蚀剂层以形成抗蚀剂图案和蚀刻停止图案，该蚀刻停止图案具有从抗蚀剂图案的侧壁突出的侧壁。 去除钝化层的一部分以在开关器件的漏电极上形成接触孔。 形成通过接触孔与开关装置电连接的像素电极。 因此，可以更容易地形成蚀刻停止图案和抗蚀剂图案之间的底切，而不会过度蚀刻钝化层。

公开(公告)号：US08557620B2

公开(公告)日：2013-10-15

申请号：US12421555

申请日：2009-04-09

申请人： Pil-Soon Hong ,  Jung-In Park ,  Hi-Kuk Lee

发明人： Pil-Soon Hong ,  Jung-In Park ,  Hi-Kuk Lee

IPC分类号： H01L21/00

CPC分类号： H01L27/1288 ,  H01L27/3248 ,  H01L2227/323

摘要： Provided is a method of manufacturing a display substrate. In the method, a gate line, a data line crossing the gate line, and a switching device are formed on a base substrate. A passivation layer, a first resist layer and a second resist layer are formed on the base substrate. The first resist layer and the second resist layer are patterned to form a resist pattern and an etch-stop pattern, the etch-stop pattern having a sidewall protruding from a sidewall of the resist pattern. A portion of the passivation layer is removed to form a contact hole on a drain electrode of the switching device. A pixel electrode electrically connected to the switching device through the contact hole is formed. Thus, an undercut between an etch-stop pattern and a resist pattern may be more easily formed without over-etching a passivation layer.

摘要翻译： 提供一种制造显示基板的方法。 在该方法中，在基底基板上形成栅极线，与栅极线交叉的数据线以及开关元件。 在基底基板上形成钝化层，第一抗蚀剂层和第二抗蚀剂层。 图案化第一抗蚀剂层和第二抗蚀剂层以形成抗蚀剂图案和蚀刻停止图案，该蚀刻停止图案具有从抗蚀剂图案的侧壁突出的侧壁。 去除钝化层的一部分以在开关器件的漏电极上形成接触孔。 形成通过接触孔与开关装置电连接的像素电极。 因此，可以更容易地形成蚀刻停止图案和抗蚀剂图案之间的底切，而不会过度蚀刻钝化层。

公开(公告)号：US08652749B2

公开(公告)日：2014-02-18

申请号：US13037212

申请日：2011-02-28

申请人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Deok-Man Kang ,  Youn-Suk Kim ,  Sae-Tae Oh

发明人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Deok-Man Kang ,  Youn-Suk Kim ,  Sae-Tae Oh

IPC分类号： G03F7/023 ,  G03F7/30

CPC分类号： G03F7/30 ,  G03F7/022 ,  G03F7/0236 ,  H01L27/1288 ,  H01L29/41733

摘要： A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. and R1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.

摘要翻译： 提供光致抗蚀剂组合物。 光致抗蚀剂组合物包括碱溶性树脂; 含有含有由式1表示的重氮萘醌的第一化合物和含有由式2表示的重氮萘醌的第二化合物的光敏剂; 和溶剂。 R 1选自氢原子，碳原子数1〜4的烷基，碳原子数2〜4的烯基，碳原子数3〜8的环烷基，碳原子数6〜12的芳基， 并且R 2选自Cl，F，Br和I.

公开(公告)号：US08968983B2

公开(公告)日：2015-03-03

申请号：US13565589

申请日：2012-08-02

申请人： Cha-Dong Kim ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

发明人： Cha-Dong Kim ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

IPC分类号： G03F7/022 ,  G03F7/023 ,  G03F7/40

CPC分类号： G03F7/0226 ,  G03F7/023 ,  G03F7/40 ,  Y10T428/1005

摘要： A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

摘要翻译： 公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。 光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。 因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

公开(公告)号：US08574971B2

公开(公告)日：2013-11-05

申请号：US12900936

申请日：2010-10-08

申请人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi-Kuk Lee

发明人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi-Kuk Lee

IPC分类号： H01L21/336

CPC分类号： H01L27/1288 ,  H01L27/1214

摘要： An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern.

摘要翻译： 在制造薄膜晶体管，栅极电极，栅极绝缘层，半导体层，欧姆接触层和源极金属层的衬底的制造中提供了用于没有掩模的图案化和蚀刻的方法。 使用数字曝光装置通过产生多个点光来形成包括第一照片图案和第二照片图案的第一光致抗蚀剂图案，第一照片图案形成于基底基板的第一区域并具有第一厚度，并且 第二照片图案形成在与第一区域相邻的第二区域上，并且具有第二厚度和在点光束直径的约50％至约60％的范围内的宽度。 图案化源极金属层以形成源电极和漏电极，并且源电极和漏电极在活性图案的第一区域中彼此间隔开。

公开(公告)号：US07951631B2

公开(公告)日：2011-05-31

申请号：US12200525

申请日：2008-08-28

申请人： Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee

发明人： Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee

IPC分类号： H01L21/00 ,  G03F1/00

CPC分类号： H01L27/1288 ,  G03F1/50 ,  G03F7/70791 ,  H01L27/1214

摘要： A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area.

摘要翻译： 半色调掩模包括透明基板，遮光层，第一半透明层和第二半透明层。 透明基板包括遮光区域，透光区域，透射第一光的第一半色调区域和透射比第一光线小的第二光的第二半色调区域。 遮光层形成在遮光区域中，以完全阻止光的透射。 第一和第二半透明层形成在透明基板上。 第一半透明层和第二半透明层中的至少一个形成在第一半色调区域中，并且第一半透明层和第二半透明层在第二半色调区域上彼此重叠。

公开(公告)号：US09025132B2

公开(公告)日：2015-05-05

申请号：US13406828

申请日：2012-02-28

申请人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

发明人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70275

摘要： A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

摘要翻译： 数字曝光装置包括可位移台，光源部分，数字微镜部分和微透镜部分。 衬底设置在平台上。 光源部分产生第一光。 数字微镜部分设置在舞台上。 数字微镜部分包括多个数字微镜。 数字微镜将第一光转换成一个或多个第二光束。 微透镜部分设置在平台和数字微镜部分之间并且包括多个微透镜。 微透镜将一个或多个第二光束转换成照射在基板上的一个或多个第三光束。 第三个光具有椭圆形横截面形状。

公开(公告)号：US08625109B2

公开(公告)日：2014-01-07

申请号：US12902745

申请日：2010-10-12

申请人： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

发明人： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

IPC分类号： G01B11/14 ,  G03B27/32 ,  G03F9/00 ,  G03C5/00

CPC分类号： G01B11/14 ,  G03F7/70291 ,  G03F7/70475

摘要： An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.

摘要翻译： 公开了一种用于确定光学头的重叠距离的装置和方法。 可以测量每个光点的位置和光量分布，其可以从光学头到基底提供。 高斯分布可以应用于位置和光量分布，以计算每个光点的补偿模型。 如果光头使用补偿模型沿着衬底的第一方向扫描，则可以计算对应于衬底的每个第一区域的第一累积光量。 如果光头沿着使用补偿模型在第二方向上以第一距离移动的第一方向进行扫描，则计算与每个第一区域重叠的每个第二区域对应的第二累积光量。 可以基于第一和第二累积光量的相加的均匀性来确定重叠距离。

公开(公告)号：US08477288B2

公开(公告)日：2013-07-02

申请号：US12906623

申请日：2010-10-18

申请人： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

发明人： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03B27/526 ,  G03B27/52 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70541

摘要： A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.

摘要翻译： 公开了一种用于执行该方法的数字曝光方法和数字曝光装置。 在该方法中，与形成在基板上的多个图案中的每一个对应地生成图形数据系统文件。 然后，从图形数据系统文件生成数字微镜装置开/关数据。 然后，响应于数字微镜装置的开/关数据曝光基板。 因此，可以同时执行用于形成显示面板的第一图案的第一曝光和用于形成基板和每个显示面板的识别号和去除基板的边缘部分的第二曝光，以简化曝光过程 降低成本