Abstract:
An upper planar capacitor is spaced above a lower planar capacitor by a dielectric layer. A bridged-post inter-layer connector couples the capacitances in parallel, through first posts and second posts. The first posts and second posts extend through the dielectric layer, adjacent the upper and lower planar capacitors. A first level coupler extends under the dielectric layer and couples the first posts together and to a conductor of the lower planar capacitor, and couples another conductor of the lower planar capacitor to one of the second posts. A second level coupler extends above the dielectric layer, and couples the second posts together and to a conductor of the upper planar capacitor, and couples another conductor of the upper planar capacitor to one of the first posts.
Abstract:
A semiconductor package according to some examples of the disclosure may include a first body layer, a transformer that may comprise one or more inductors, coupled inductors, or inductive elements positioned above the first body layer. A first ground plane is on a top of the first body layer between the first body layer and the inductive element. The first ground plane may have conductive lines generally perpendicular to a magnetic field generated by the inductive element, and a second ground plane on a bottom of the first body layer opposite the first ground plane. The first and second ground planes may also provide heat dissipation elements for the semiconductor as well as reduce or eliminate eddy current and parasitic effects produced by the inductive element.
Abstract:
Provided is a low-profile package and related techniques for use and fabrication. In an example, a low-profile package is provided. The low-profile package includes an exemplary integrated circuit (IC) having an active face, an integrated passive device (IPD) having a face, and a redistribution layer (RDL) disposed between the IPD and the IC. The IC is embedded in a substrate. The active face of the IC faces the face of the IPD in a face-to-face (F2F) configuration. At least one contact of the IPD is arranged in an overlapping configuration relative to the IC. The RDL is configured to electrically couple the IPD with the IC. The RDL can be disposed between the IPD and the IC, can be embedded in the substrate, and can be configured as an electromagnetic shield.
Abstract:
A multi-layer ground shield structure of interconnected elements is disclosed. The ground shield structure may include a first patterned layer of a ground shield structure, a second patterned layer of the ground shield structure, and a spacer between the first patterned layer and the second patterned layer. The first patterned layer includes first conductive elements interconnected within the first patterned layer according to a first pattern. The second patterned layer includes second conductive elements interconnected within the second patterned layer according to a second pattern.
Abstract:
A semiconductor package according to some examples may include a first portion of a support plate configured as an RF signal connection, a semiconductor die thermally coupled to a second portion of the support plate to dissipate heat, a first redistribution layer positioned in close proximity to a second redistribution layer to capacitively couple the first redistribution layer to the second redistribution layer, a first via extending between the first portion and the first redistribution layer, and a second via in close proximity to the first via to capacitively couple the second via to the first via.