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    Method of Manufacturing an Optical Element
    1.
    发明申请
    Method of Manufacturing an Optical Element 有权
    制造光学元件的方法

    公开(公告)号：US20080043247A1

    公开(公告)日：2008-02-21

    申请号：US11596187

    申请日：2004-05-14

    申请人： Ralf Arnold ,  Bernd Dorband ,  Frank Schillke ,  Susanne Beder

    发明人： Ralf Arnold ,  Bernd Dorband ,  Frank Schillke ,  Susanne Beder

    IPC分类号： G01B11/25

    CPC分类号： G01B11/2441

    摘要： A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.

    摘要翻译： 制造光学元件的方法包括通过使用产生仅照射被测光学元件的子孔径的测量光束的干涉仪光学元件来测试光学元件。 干涉仪光学器件包括全息图。 子孔径测量的结果被缝合在一起以获得关于光学元件的整个表面的测量结果。 此外，校准干涉仪光学器件的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖由干涉仪光学器件产生的测量光束的全部横截面的子孔径并将子孔缝合在一起的全息图 测量以获得指示干涉仪光学器件的完整横截面的结果。

    Method of manufacturing an optical element
    2.
    发明授权
    Method of manufacturing an optical element 有权
    制造光学元件的方法

    公开(公告)号：US07728987B2

    公开(公告)日：2010-06-01

    申请号：US11596187

    申请日：2004-05-14

    申请人： Ralf Arnold ,  Bernd Dörband ,  Frank Schillke ,  Susanne Beder

    发明人： Ralf Arnold ,  Bernd Dörband ,  Frank Schillke ,  Susanne Beder

    IPC分类号： G01B11/02

    CPC分类号： G01B11/2441

    摘要： A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.

    摘要翻译： 制造光学元件的方法包括通过使用产生仅照射被测光学元件的子孔径的测量光束的干涉仪光学元件来测试光学元件。 干涉仪光学器件包括全息图。 子孔径测量的结果被缝合在一起以获得关于光学元件的整个表面的测量结果。 此外，校准干涉仪光学器件的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖由干涉仪光学器件产生的测量光束的全部横截面的子孔径并将子孔缝合在一起的全息图 测量以获得指示干涉仪光学器件的完整横截面的结果。

    Method of manufacturing an optical element using a hologram
    3.
    发明授权
    Method of manufacturing an optical element using a hologram 失效
    使用全息图制造光学元件的方法

    公开(公告)号：US07061626B1

    公开(公告)日：2006-06-13

    申请号：US10845251

    申请日：2004-05-14

    申请人： Frank Schillke ,  Susanne Beder ,  Jochen Hetzler

    发明人： Frank Schillke ,  Susanne Beder ,  Jochen Hetzler

    IPC分类号： G01B9/02

    CPC分类号： G01B9/021 ,  G02B5/32 ,  G03H1/08 ,  G03H2001/0072

    摘要： A method of manufacturing an optical element having an optical surface of a target shape includes performing an interferometric test using an interferometer optics, wherein the interferometer optics includes a hologram that deflects a beam of measuring light by a substantial angle or that displaces an axis of symmetry of measuring light emerging from the hologram with respect to an axis of symmetry of measuring light incident on the hologram.

    摘要翻译： 制造具有目标形状的光学表面的光学元件的方法包括使用干涉仪光学器件执行干涉测试，其中所述干涉仪光学器件包括将测量光束偏转相当角度的全息图，或者使对称轴 测量相对于入射在全息图上的测量光的对称轴从全息图出射的光。

    Method for measuring and manufacturing an optical element and optical apparatus
    4.
    发明申请
    Method for measuring and manufacturing an optical element and optical apparatus 审中-公开
    光学元件和光学装置的测量和制造方法

    公开(公告)号：US20050225774A1

    公开(公告)日：2005-10-13

    申请号：US11098546

    申请日：2005-04-05

    申请人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    发明人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    IPC分类号： G01B9/02 ,  G01M11/02 ,  G02B13/18 ,  G02B27/62

    CPC分类号： G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G02B13/18 ,  G02B27/62

    摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.

    摘要翻译： 一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

    Projection objective of a microlithographic projection exposure apparatus
    7.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 失效
    微光刻投影曝光装置的投影目标

    公开(公告)号：US07710640B2

    公开(公告)日：2010-05-04

    申请号：US12138851

    申请日：2008-06-13

    申请人： Susanne Beder ,  Daniel Kraehmer ,  Heiko Feldmann

    发明人： Susanne Beder ,  Daniel Kraehmer ,  Heiko Feldmann

    IPC分类号： G02B13/14

    CPC分类号： G02B13/14 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70966

    摘要： A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.

    摘要翻译： 一种用于微光刻投影曝光装置的投影物镜。 投影物镜可以将可以在物平面中的位置设置的掩模的图像投影到能够被设置在图像平面中的位置的感光涂层上。 投影物镜可以被设计为以浸没模式操作，并且可以产生至少一个中间图像。 投影物镜可以包括图像平面侧的光学子系统，其中间图像以绝对值至少为0.3的像平面侧投影比率投射到像平面中。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    10.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20080304033A1

    公开(公告)日：2008-12-11

    申请号：US12194229

    申请日：2008-08-19

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。