公开(公告)号：US06838667B2

公开(公告)日：2005-01-04

申请号：US09983898

申请日：2001-10-26

申请人： Ruriko Tsuneta ,  Masanari Koguchi ,  Mari Nozoe ,  Muneyuki Fukuda ,  Mitsugu Sato

发明人： Ruriko Tsuneta ,  Masanari Koguchi ,  Mari Nozoe ,  Muneyuki Fukuda ,  Mitsugu Sato

IPC分类号： H01J37/04 ,  G01Q30/04 ,  H01J37/153 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28 ,  G01N23/225

CPC分类号： H01J37/21 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/31745 ,  H01J2237/31749

摘要： By use of charged particle beam images picked up in different conditions, a positional displacement caused by parallax is analyzed, and an optics of an apparatus for charged particle beam microscopy is corrected automatically. An analysis method using phase difference of Fourier transform images and having analytic accuracy lower than that for one pixel is adopted for the displacement analysis. In addition, a degree of coincidence between images calculated in this analysis method is used as a criterion for evaluating the reliability of an analysis result. Since the analysis method based on parallax is low in specimen dependency, the operation range is expanded. In addition, by adopting a high-accuracy displacement analysis method, the apparatus correction accuracy is improved by one digit. A malfunction preventing flow is added using the degree of coincidence as a judgement criterion. Thus, the apparatus can deal with unmanned operation. In addition, the degree of coincidence can be used as a monitor of inspection states or a record of states in an inspection apparatus.

公开(公告)号：US20120261574A1

公开(公告)日：2012-10-18

申请号：US13530797

申请日：2012-06-22

申请人： Muneyuki Fukuda ,  Tomoyasu Shojo ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki ,  Ichiro Tachibana

发明人： Muneyuki Fukuda ,  Tomoyasu Shojo ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki ,  Ichiro Tachibana

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/221 ,  H01J2237/2444 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495

摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.

摘要翻译： 一种电子束装置，包括放置样品的样品台和电子光学系统。 电子光学系统包括：电子枪，其产生一次电子束，将一次电子束收敛在样品上的浸没物镜;将主光束照射产生的二次粒子分离的E×B偏转器; 来自主光束的光轴的样品，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测速度分量和方位分量 由二次粒子与反射部件碰撞产生的三元粒子，以及位于反射部件上方的中心检测器。

公开(公告)号：US07449690B2

公开(公告)日：2008-11-11

申请号：US11349974

申请日：2006-02-09

申请人： Hidetoshi Nishiyama ,  Muneyuki Fukuda ,  Noritsugu Takahashi ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki

发明人： Hidetoshi Nishiyama ,  Muneyuki Fukuda ,  Noritsugu Takahashi ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24495 ,  H01J2237/2817

摘要： To establish a technique that enables sorting of the elevation and azimuth angle in the direction of emitting secondary electrons and obtaining images with emphasized contrast, in order to perform the review and analysis of shallow asperities and microscopic foreign particles in a wafer inspection during the manufacture of semiconductor devices, an electromagnetic overlapping objective lens is used to achieve high resolution, an electron beam is narrowly focused using the objective lens, an electric field for accelerating secondary electrons in the vicinity of a wafer in order to suppress the dependence on secondary electron energy of the rotation of secondary electrons generated by irradiation of the electron beam, a ring-shaped detector plate is disposed between an electron source and the objective lens, and the low angle components of the elevation angle of the secondary electrons, as viewed from the place of generation, and the high angle components are separated and also the azimuth components are separated and detected.

摘要翻译： 为了建立能够在发射二次电子的方向上对高程和方位角进行排序并获得具有强调对比度的图像的技术，以便在制造期间对晶片检查中的浅凹凸和微观异物进行检查和分析 半导体器件使用电磁重叠物镜实现高分辨率，电子束使用物镜窄聚焦，用于加速晶片附近的二次电子的电场，以抑制对二次电子能量的依赖性 通过电子束的照射产生的二次电子的旋转，环状检测器板设置在电子源和物镜之间，并且从二次电子的位置观察二次电子的仰角的低角分量 并且高角度分量被分离，也是azimu 分离和检测。

公开(公告)号：US09123501B2

公开(公告)日：2015-09-01

申请号：US13977139

申请日：2011-12-26

申请人： Muneyuki Fukuda ,  Yoichi Ose ,  Mitsugu Sato ,  Hiroyuki Ito ,  Hiroshi Suzuki ,  Naomasa Suzuki

发明人： Muneyuki Fukuda ,  Yoichi Ose ,  Mitsugu Sato ,  Hiroyuki Ito ,  Hiroshi Suzuki ,  Naomasa Suzuki

IPC分类号： H01J37/14 ,  H01J37/26 ,  H01J37/10 ,  H01J37/153 ,  H01J37/147

CPC分类号： H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2614

摘要： A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.

摘要翻译： 由电磁线圈环的多极形成的衍射像差校正器，具有调整矢量电势相对于光束轴线的正交性或轴向移动的功能的功能。 为了产生相位差，在物镜孔附近设置衍射像差校正器，该衍射像差校正器垂直于光束轴并且在相对于光束轴线的正交平面内具有对称分布的矢量电位， 镜片。 在从光束轴倾斜的状态下行进的衍射波通过磁通的环。 由于由于向量电位而使光束直径内的相位差增加了Aharonov-Bohm效应，所以抑制了样品上电子束的强度。

公开(公告)号：US20080302962A1

公开(公告)日：2008-12-11

申请号：US12155038

申请日：2008-05-29

申请人： Noritsugu Takahashi ,  Muneyuki Fukuda ,  Hideo Todokoro ,  Mitsugu Sato

发明人： Noritsugu Takahashi ,  Muneyuki Fukuda ,  Hideo Todokoro ,  Mitsugu Sato

IPC分类号： G01N23/225

CPC分类号： G01N23/225 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221

摘要： The invention provides a charged particle beam apparatus capable of preventing image errors in a display image and capturing a clear display image. A display image displayed on a display unit has a rectangular shape having sides that are substantially parallel to coordinate axes of a rectangular coordinate system determined by wafer alignment. A charged particle beam is radiated onto an area including a display image in a direction that is not parallel to the coordinate axes of the reference rectangular coordinate system to scan the area. Then, among image information obtained by scanning, only information of a position within the display image is displayed on the image display unit. In this way, a clear display image without brightness variation is obtained.

摘要翻译： 本发明提供一种能够防止显示图像中的图像错误并捕获清晰显示图像的带电粒子束装置。 在显示单元上显示的显示图像具有与由晶片对准确定的直角坐标系的坐标轴基本平行的侧面的矩形。 带电粒子束在与平行于参考直角坐标系的坐标轴不平行的方向上辐射到包括显示图像的区域上以扫描该区域。 然后，在通过扫描获得的图像信息中，只有显示图像中的位置的信息被显示在图像显示单元上。 以这种方式，可以获得没有亮度变化的清晰显示图像。

公开(公告)号：US07462828B2

公开(公告)日：2008-12-09

申请号：US11412976

申请日：2006-04-28

申请人： Atsuko Fukada ,  Mitsugu Sato ,  Naomasa Suzuki ,  Hidetoshi Nishiyama ,  Muneyuki Fukuda ,  Noritsugu Takahashi

发明人： Atsuko Fukada ,  Mitsugu Sato ,  Naomasa Suzuki ,  Hidetoshi Nishiyama ,  Muneyuki Fukuda ,  Noritsugu Takahashi

IPC分类号： G01N23/00

CPC分类号： G01N23/2251 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/24507

摘要： In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.

摘要翻译： 在具有高分辨能力的电浸透镜中，加速从样本产生的二次电子，以抑制由物镜施加到其上的二次电子的旋转作用对二次电子的能级的依赖性，并且当选择性地检测低角度和高角度时 通过插入在电子源和物镜之间的环形检测器从二次电子产生位置观察的仰角和方位的分量，二次电子通过ExB偏转器被调节和偏转，使得二次电子的中心轴 在加速度下精细收敛与低仰角信号检测系统的中心轴一致，二次电子偏离高仰角信号检测系统的孔径。

公开(公告)号：US06627889B2

公开(公告)日：2003-09-30

申请号：US10152000

申请日：2002-05-22

申请人： Isao Ochiai ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Muneyuki Fukuda ,  Mitsugu Sato ,  Tohru Ishitani

发明人： Isao Ochiai ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Muneyuki Fukuda ,  Mitsugu Sato ,  Tohru Ishitani

IPC分类号： G01N2300

CPC分类号： H01J37/256 ,  H01J2237/2561 ,  H01J2237/31745

摘要： An apparatus and method for observing a sample that is capable of making observations by irradiating an electron beam to a sample in the form of a thin film, and making elemental analysis accurately and with increased resolution while reducing background noise. A particular portion of the sample is observed by the electron beam by disposing a light element piece having a hole provided immediately behind the thin film sample. According to the present invention, it is possible to reduce the x-rays generated from portions other than the sample and electron beam incident on the sample after being scattered to portions other than the sample when observing the thin film sample by irradiating the electron beam. It is therefore possible to make secondary electron observation and elemental analysis with increased accuracy and sensitivity. Thus, an apparatus and a method for observing samples is provided that allows for the accurate and high-resolution internal observation of LSI devices.

摘要翻译： 一种用于观察能够通过以薄膜形式向样品照射电子束而进行观察的样品的装置和方法，并且在降低背景噪声的同时精确地并且以更高的分辨率进行元素分析。 通过设置具有设置在薄膜样品后面的孔的光元件片，通过电子束观察样品的特定部分。 根据本发明，通过照射电子束来观察薄膜样品时，可以减少在样品和入射到样品上的部分之后产生的X射线在散射到除了样品之外的部分之外的部分。 因此，可以以更高的精度和灵敏度进行二次电子观察和元素分析。 因此，提供了用于观察样本的装置和方法，其允许LSI器件的精确和高分辨率的内部观察。

公开(公告)号：US20140124664A1

公开(公告)日：2014-05-08

申请号：US13977139

申请日：2011-12-26

申请人： Muneyuki Fukuda ,  Yoichi Ose ,  Mitsugu Sato ,  Hiroyuki Ito ,  Hiroshi Suzuki ,  Naomasa Suzuki

发明人： Muneyuki Fukuda ,  Yoichi Ose ,  Mitsugu Sato ,  Hiroyuki Ito ,  Hiroshi Suzuki ,  Naomasa Suzuki

IPC分类号： H01J37/10 ,  H01J37/26 ,  H01J37/147

CPC分类号： H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2614

摘要： A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.

摘要翻译： 由电磁线圈环的多极形成的衍射像差校正器，具有调整矢量电势相对于光束轴线的正交性或轴向移动的功能的功能。 为了产生相位差，在物镜孔附近设置衍射像差校正器，该衍射像差校正器垂直于光束轴并且在相对于光束轴线的正交平面内具有对称分布的矢量电位， 镜片。 在从光束轴倾斜的状态下行进的衍射波通过磁通的环。 由于由于向量电位而使光束直径内的相位差增加了Aharonov-Bohm效应，所以抑制了样品上电子束的强度。

公开(公告)号：US08207498B2

公开(公告)日：2012-06-26

申请号：US12985633

申请日：2011-01-06

申请人： Muneyuki Fukuda ,  Tomoyasu Shojo ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki ,  Ichiro Tachibana

发明人： Muneyuki Fukuda ,  Tomoyasu Shojo ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki ,  Ichiro Tachibana

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/221 ,  H01J2237/2444 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495

摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an ExB deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.

摘要翻译： 一种电子束装置，包括放置样品的样品台和电子光学系统。 电子光学系统包括产生一次电子束的电子枪，将一次电子束收敛在样品上的浸没物镜，将一次束照射产生的二次粒子分离为样品的ExB偏转器 从一次光束的光轴，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测三元的速度分量和方位分量 由二次粒子与反射部件碰撞而产生的粒子和位于反射部件上方的中心检测器。

公开(公告)号：US07504626B2

公开(公告)日：2009-03-17

申请号：US11655264

申请日：2007-01-19

申请人： Ichiro Tachibana ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki ,  Muneyuki Fukuda

发明人： Ichiro Tachibana ,  Mitsugu Sato ,  Atsuko Fukada ,  Naomasa Suzuki ,  Muneyuki Fukuda

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J37/09 ,  H01J2237/0262 ,  H01J2237/12 ,  H01J2237/24592 ,  H01J2237/2817

摘要： A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the present invention. A sample image is obtained by use of the scanning electron microscope with a configuration in which a positive voltage is applied in order to accelerate a primary electron beam, and an electric field shielding plate, a magnetic field shielding plate, or an electromagnetic field shielding plate is arranged on the upper side of an object lens.

摘要翻译： 根据本发明，提供了可以以高分辨率和高对比度获得样品表面上的不均匀图像的扫描电子显微镜。 使用扫描电子显微镜，其中施加正电压以加速一次电子束，以及电场屏蔽板，磁场屏蔽板或电磁场屏蔽板获得样品图像 布置在物镜的上侧。