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公开(公告)号：US20190355572A1
公开(公告)日：2019-11-21
申请号：US16234929
申请日：2018-12-28
发明人： Byeong-hwan Jeon
摘要： A method of manufacturing an integrated circuit (IC) device includes forming a photoresist layer on a substrate, and exposing the photoresist layer to light by using a photolithographic apparatus including a light generator. The light generator includes a chamber having a plasma generation space, an optical element in the chamber, and a debris shielding assembly between the optical element and the plasma generation space in the chamber, and the debris shielding assembly includes a protective film facing the optical element and being spaced apart from the optical element with a protective space therebetween, the protective space including an optical path, and a protective frame to support the protective film and to shield the protective space from the plasma generation space.
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公开(公告)号：US11615956B2
公开(公告)日：2023-03-28
申请号：US17365112
申请日：2021-07-01
发明人： Byeong-hwan Jeon
摘要： A method of manufacturing an integrated circuit (IC) device includes forming a photoresist layer on a substrate, and exposing the photoresist layer to light by using a photolithographic apparatus including a light generator. The light generator includes a chamber having a plasma generation space, an optical element in the chamber, and a debris shielding assembly between the optical element and the plasma generation space in the chamber, and the debris shielding assembly includes a protective film facing the optical element and being spaced apart from the optical element with a protective space therebetween, the protective space including an optical path, and a protective frame to support the protective film and to shield the protective space from the plasma generation space.
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公开(公告)号：US10890527B2
公开(公告)日：2021-01-12
申请号：US16235268
申请日：2018-12-28
发明人： Byeong-hwan Jeon
IPC分类号： G01N21/55
摘要： Provided are a method and an apparatus for inspecting an extreme ultraviolet (EUV) mask at a high speed with high optical efficiency, and a method of manufacturing the EUV mask, wherein the method of inspecting the EUV mask is included in the method of manufacturing the EUV mask. The apparatus for inspecting the EUV mask includes a light source configured to generate and output light, a linear zone plate configured to convert the light from the light source to light having a linear form, a slit plate configured to output the light having the linear form by removing a higher-order diffracted light component from the light having the linear form, a stage on which the EUV mask is located, and a detector configured to detect the light reflected from the EUV mask, in response to the light being irradiated onto and reflected from the EUV mask.
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公开(公告)号：US10431505B2
公开(公告)日：2019-10-01
申请号：US15429525
申请日：2017-02-10
发明人： Jun-bum Park , Kyung-sik Kang , Byeong-hwan Jeon , Jae-chol Joo , Tae-joong Kim
IPC分类号： G01J3/42 , H01L21/66 , G01N21/27 , G01N21/95 , G01N21/956 , H01L21/3205 , G01N21/552 , G01J3/28 , G01N21/25
摘要： Manufacturing a device may include inspecting a surface of an inspection target device. The inspecting may include forming a metal layer on a surface of the inspection target device on which a minute pattern is formed, directing a beam of light to be incident and normal to the surface of the inspection target device, determining a spectrum of light reflected from the surface of the inspection target device, and generating, via the spectrum, information associated with a structural characteristic of the minute pattern formed on the inspection target device. The inspection target device may be selectively incorporated into the manufactured device based on the generated information.
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公开(公告)号：US20160153915A1
公开(公告)日：2016-06-02
申请号：US14955635
申请日：2015-12-01
发明人： Kang-woong Ko , Sung-yoon Ryu , Young-hoon Sohn , Gil-woo Song , Tae-heung Ahn , Hyoung-jo Jeon , Sang-kyeong Han , Masahiro Horie , Woo-seok Ko , Yu-sin Yang , Sang-kil Lee , Byeong-hwan Jeon
CPC分类号： G01N21/8806 , G01J4/00 , G01J2004/001 , G01N21/21 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/213 , G01N2021/8848
摘要： A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.
摘要翻译： 表面检查方法包括：在目标物体上照射第一偏振态的入射光束，入射光束包括平行光并具有横截面积：测量从目标反射的反射光束的第二偏振状态 目的; 并且基于第一极化状态和第二极化状态之间的变化，对照射入射光的目标物体的整个区域进行检查。
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6.发明申请ROD LENS FOR LIGHTING APPARATUS, LIGHTING APPARATUS INCLUDING THE SAME AND SEMICONDUCTOR MANUFACTURING METHOD USING THE APPARATUS 有权用于照明装置的镜面镜，包括其的照明装置和使用装置的半导体制造方法公开(公告)号：US20150226398A1
公开(公告)日：2015-08-13
申请号：US14601234
申请日：2015-01-21
发明人： Kwang-soo KIM , Wook-rae KIM , Tae-joong KIM , Byeong-hwan Jeon
CPC分类号： F21V5/04 , G01N21/8806 , G02B2003/0093 , H01L22/12
摘要： A rod lens for a lighting apparatus and a lighting apparatus including the rod lens are disclosed. The rod lens having a rectangular rod structure extends lengthwise and includes a first end and a second end opposing each other. The first end is a light incident surface and formed of one continuous surface. The second end is a light exit surface and formed of a plurality of separated surfaces.
摘要翻译： 公开了一种用于照明装置的棒状透镜和包括棒状透镜的照明装置。 具有矩形杆结构的棒状透镜纵向延伸并且包括彼此相对的第一端和第二端。 第一端是一个光入射表面，由一个连续表面形成。 第二端是光出射面，由多个分离面形成。
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公开(公告)号：US11114298B2
公开(公告)日：2021-09-07
申请号：US16234929
申请日：2018-12-28
发明人： Byeong-hwan Jeon
摘要： A method of manufacturing an integrated circuit (IC) device includes forming a photoresist layer on a substrate, and exposing the photoresist layer to light by using a photolithographic apparatus including a light generator. The light generator includes a chamber having a plasma generation space, an optical element in the chamber, and a debris shielding assembly between the optical element and the plasma generation space in the chamber, and the debris shielding assembly includes a protective film facing the optical element and being spaced apart from the optical element with a protective space therebetween, the protective space including an optical path, and a protective frame to support the protective film and to shield the protective space from the plasma generation space.
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公开(公告)号：US10001444B2
公开(公告)日：2018-06-19
申请号：US14955635
申请日：2015-12-01
发明人： Kang-woong Ko , Sung-yoon Ryu , Young-hoon Sohn , Gil-woo Song , Tae-heung Ahn , Hyoung-jo Jeon , Sang-kyeong Han , Masahiro Horie , Woo-seok Ko , Yu-sin Yang , Sang-kil Lee , Byeong-hwan Jeon
IPC分类号： G01N21/88 , G01J4/00 , G01N21/21 , G01N21/956 , G01N21/95
CPC分类号： G01N21/8806 , G01J4/00 , G01J2004/001 , G01N21/21 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/213 , G01N2021/8848
摘要： A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.
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公开(公告)号：US09903705B2
公开(公告)日：2018-02-27
申请号：US15206613
申请日：2016-07-11
发明人： Kwang-soo Kim , Harutaka Sekiya , Kwang-jun Yoon , Sung-won Park , Young-duk Kim , Heon-ju Shin , Byeong-hwan Jeon
IPC分类号： G01N21/00 , G01B11/00 , H01L21/68 , G01N21/95 , G01N21/956
CPC分类号： G01B11/002 , G01N21/9501 , G01N21/956 , G01N2201/121 , H01L21/681
摘要： An automatic focus control apparatus includes a light detector, which receives light reflected by a surface of a wafer and generates a light reception signal based on the received signal, a controller, which generates a driving signal, the driving signal being one of a first signal and a second signal, the driving signal indicating whether to perform automatic focus control based on the light reception signal, a focus error corrector, which generates a focus error correction signal based on the driving signal, and a stage driver, which displaces a wafer stage supporting the wafer by adjusting the z-axis position of the wafer stage based on the focus error correcting signal if the driving signal is the first signal, and maintains the z-axis position of the wafer stage based on the focus error correction signal if the driving signal is the second signal.
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10.发明授权Rod lens for lighting apparatus, lighting apparatus including the same and semiconductor manufacturing method using the apparatus 有权照明装置的棒状透镜，包括该照明装置的照明装置和使用该装置的半导体制造方法公开(公告)号：US09546772B2
公开(公告)日：2017-01-17
申请号：US14601234
申请日：2015-01-21
发明人： Kwang-soo Kim , Wook-rae Kim , Tae-joong Kim , Byeong-hwan Jeon
CPC分类号： F21V5/04 , G01N21/8806 , G02B2003/0093 , H01L22/12
摘要： A rod lens for a lighting apparatus and a lighting apparatus including the rod lens are disclosed. The rod lens having a rectangular rod structure extends lengthwise and includes a first end and a second end opposing each other. The first end is a light incident surface and formed of one continuous surface. The second end is a light exit surface and formed of a plurality of separated surfaces.
摘要翻译： 公开了一种用于照明装置的棒状透镜和包括棒状透镜的照明装置。 具有矩形杆结构的棒状透镜纵向延伸并且包括彼此相对的第一端和第二端。 第一端是一个光入射表面，由一个连续表面形成。 第二端是光出射面，由多个分离面形成。
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