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公开(公告)号：US20150145001A1
公开(公告)日：2015-05-28
申请号：US14610254
申请日：2015-01-30
IPC分类号： H01L21/02 , H01L29/267 , H01L29/06
CPC分类号： H01L21/02513 , C30B7/005 , C30B23/025 , C30B25/04 , C30B25/18 , C30B25/183 , C30B29/40 , C30B29/42 , H01L21/02381 , H01L21/02433 , H01L21/02455 , H01L21/02458 , H01L21/02505 , H01L21/02538 , H01L21/02546 , H01L21/02636 , H01L21/02642 , H01L21/02647 , H01L29/0665 , H01L29/0688 , H01L29/267
摘要： Exemplary embodiments provide materials and methods of forming high-quality semiconductor devices using lattice-mismatched materials. In one embodiment, a composite film including one or more substantially-single-particle-thick nanoparticle layers can be deposited over a substrate as a nanoscale selective growth mask for epitaxially growing lattice-mismatched materials over the substrate.
摘要翻译： 示例性实施例提供了使用晶格失配材料形成高质量半导体器件的材料和方法。 在一个实施方案中，包含一个或多个基本上单个颗粒的纳米颗粒层的复合膜可以沉积在衬底上作为纳米级选择性生长掩模，用于在衬底上外延生长晶格失配的材料。
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公开(公告)号：US20150207290A1
公开(公告)日：2015-07-23
申请号：US14540604
申请日：2014-11-13
申请人： STEVEN R.J. BRUECK , XIANG HE , STEVE BENOIT
发明人： STEVEN R.J. BRUECK , XIANG HE , STEVE BENOIT
CPC分类号： H01S3/1022 , H01S3/08009 , H01S5/041 , H01S5/1212 , H01S5/1231 , H01S5/125 , H01S5/3235 , H01S5/3422 , H01S5/34313
摘要： In some aspects of the present application, an apparatus for producing an interference pattern on a photosensitive portion formed on a surface of a sample is disclosed. The apparatus can include an optical system for providing interference between two coherent spherical wavefronts impinging on a thin-film photosensitive material formed on a surface of a sample, wherein a plane of the surface normal of the sample is arranged at an angle with respect to a plane defined by center propagation vectors of the two coherent spherical wavefronts; and one or more actuating elements operable to actuate one or more optical elements in the optical system, the sample, or both the one or more optical elements and the sample in one or more degrees of freedom to control a relative magnitude of a longitudinal and a transverse chirp of the interference pattern.
摘要翻译： 在本申请的一些方面，公开了一种用于在形成在样品表面上的感光部分上产生干涉图案的装置。 该装置可以包括光学系统，用于提供入射到形成在样品表面上的薄膜感光材料上的两个相干球面波前的干涉，其中样品的表面法线的平面相对于 由两个相干球面波前的中心传播矢量定义的平面; 以及一个或多个致动元件，其可操作以一个或多个自由度致动所述光学系统，所述样品或所述一个或多个光学元件和所述样品中的一个或多个光学元件，以控制纵向和纵向的相对幅度 横向啁啾的干涉图案。
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3.发明申请公开(公告)号：US20160161731A1
公开(公告)日：2016-06-09
申请号：US14230582
申请日：2014-03-31
CPC分类号： G01B9/02015 , G01B9/04 , G01N21/65 , G01N2021/653 , G02B21/0056 , G02B21/06 , G02B21/18 , G02B21/365 , G06T3/4061
摘要： In accordance with the aspects of the present disclosure, a method and apparatus is disclosed for three-dimensional imaging interferometric microscopy (IIM), which can use at least two wavelengths to image a three-dimensional object. The apparatus can include a first, a second, and a third optical system. The first optical system is disposed to provide a substantially coherent illumination to the 3D object, wherein the illumination is characterized by a plurality of wavelengths. The second optical system includes an optical image recording device and one or more additional optical components characterized by a numerical aperture NA. The third optical system provides interferometric reintroduction of a portion of the coherent illumination as a reference beam into the second optical system. An image recording device records each sub-image formed as a result of interference between the illumination that is scattered by the 3D object and the reference beam.
摘要翻译： 根据本公开的方面，公开了用于三维成像干涉显微镜（IIM）的方法和装置，其可以使用至少两个波长来成像三维物体。 该装置可以包括第一，第二和第三光学系统。 第一光学系统设置成向3D对象提供基本相干的照明，其中照明由多个波长表征。 第二光学系统包括光学图像记录装置和由数值孔径NA表征的一个或多个附加光学部件。 第三光学系统将相干照明的一部分的干涉重新引入作为参考光束进入第二光学系统。 图像记录装置记录由作为3D对象散射的照明与参照光束之间的干涉而形成的各子图像。
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