METHOD OF FABRICATING PHOTOELECTRIC DEVICE OF GROUP III NITRIDE SEMICONDUCTOR AND STRUCTURE THEREOF
    2.
    发明申请
    METHOD OF FABRICATING PHOTOELECTRIC DEVICE OF GROUP III NITRIDE SEMICONDUCTOR AND STRUCTURE THEREOF 有权
    制备III类氮化物半导体的光电器件及其结构的方法

    公开(公告)号:US20090224283A1

    公开(公告)日:2009-09-10

    申请号:US12396750

    申请日:2009-03-03

    IPC分类号: H01L33/00 H01L21/02

    CPC分类号: H01L33/007 H01L33/0079

    摘要: A method of fabricating a photoelectric device of Group III nitride semiconductor, where the method comprises the steps of: forming a first Group III nitride semiconductor layer on a surface of a temporary substrate; patterning the first Group III nitride semiconductor layer using photolithography and etching processes; forming a second Group III nitride semiconductor layer on the patterned first Group III nitride semiconductor layer; forming a conductive layer on the second Group III nitride semiconductor layer; and releasing the temporary substrate by removing the first Group III nitride semiconductor layer to obtain a composite of the second Group III nitride semiconductor layer and the conductive layer.

    摘要翻译: 一种制造III族氮化物半导体的光电器件的方法,其中所述方法包括以下步骤:在临时衬底的表面上形成第一III族氮化物半导体层; 使用光刻和蚀刻工艺图案化第一III族氮化物半导体层; 在所述图案化的第一III族氮化物半导体层上形成第二III族氮化物半导体层; 在所述第二III族氮化物半导体层上形成导电层; 并且通过去除第一III族氮化物半导体层来释放临时衬底,以获得第二III族氮化物半导体层和导电层的复合物。

    LIGHT-EMITTING DEVICE OF GROUP III NITRIDE-BASED SEMICONDUCTOR AND MANUFACTURING METHOD THEREOF
    8.
    发明申请
    LIGHT-EMITTING DEVICE OF GROUP III NITRIDE-BASED SEMICONDUCTOR AND MANUFACTURING METHOD THEREOF 审中-公开
    III类氮化物半导体发光器件及其制造方法

    公开(公告)号:US20090166650A1

    公开(公告)日:2009-07-02

    申请号:US12343984

    申请日:2008-12-24

    IPC分类号: H01L33/00 H01L21/02 H01L21/04

    CPC分类号: H01L33/007

    摘要: A light-emitting device of Group III nitride-based semiconductor comprises a substrate, a first Group III nitride layer and a second Group III nitride layer. The substrate comprises a first surface and a plurality of convex portions protruding from the first surface. Each convex portion is surrounded by a part of the first surface. The first Group III nitride layer is jointly formed by lateral growth starting at top surfaces of the convex portions. The second Group III nitride layer is formed on the first surface, wherein a thickness of the second Group III nitride layer is less than a height of the convex portion. Moreover, the first Group III nitride layer and the second Group III nitride layer are made of a same material.

    摘要翻译: III族氮化物基半导体的发光器件包括衬底,第一III族氮化物层和第二III族氮化物层。 基板包括从第一表面突出的第一表面和多个凸部。 每个凸部被第一表面的一部分包围。 第一III族氮化物层通过从凸部的顶表面开始的横向生长共同形成。 第二III族氮化物层形成在第一表面上,其中第二III族氮化物层的厚度小于凸部的高度。 此外,第一III族氮化物层和第二III族氮化物层由相同的材料制成。