METHOD OF FABRICATING PHOTOELECTRIC DEVICE OF GROUP III NITRIDE SEMICONDUCTOR AND STRUCTURE THEREOF
    4.
    发明申请
    METHOD OF FABRICATING PHOTOELECTRIC DEVICE OF GROUP III NITRIDE SEMICONDUCTOR AND STRUCTURE THEREOF 有权
    制备III类氮化物半导体的光电器件及其结构的方法

    公开(公告)号:US20090224283A1

    公开(公告)日:2009-09-10

    申请号:US12396750

    申请日:2009-03-03

    IPC分类号: H01L33/00 H01L21/02

    CPC分类号: H01L33/007 H01L33/0079

    摘要: A method of fabricating a photoelectric device of Group III nitride semiconductor, where the method comprises the steps of: forming a first Group III nitride semiconductor layer on a surface of a temporary substrate; patterning the first Group III nitride semiconductor layer using photolithography and etching processes; forming a second Group III nitride semiconductor layer on the patterned first Group III nitride semiconductor layer; forming a conductive layer on the second Group III nitride semiconductor layer; and releasing the temporary substrate by removing the first Group III nitride semiconductor layer to obtain a composite of the second Group III nitride semiconductor layer and the conductive layer.

    摘要翻译: 一种制造III族氮化物半导体的光电器件的方法,其中所述方法包括以下步骤:在临时衬底的表面上形成第一III族氮化物半导体层; 使用光刻和蚀刻工艺图案化第一III族氮化物半导体层; 在所述图案化的第一III族氮化物半导体层上形成第二III族氮化物半导体层; 在所述第二III族氮化物半导体层上形成导电层; 并且通过去除第一III族氮化物半导体层来释放临时衬底,以获得第二III族氮化物半导体层和导电层的复合物。

    GALLIUM NITRIDE-BASED LIGHT EMITTING DEVICE WITH ROUGHENED SURFACE AND FABRICATING METHOD THEREOF
    7.
    发明申请
    GALLIUM NITRIDE-BASED LIGHT EMITTING DEVICE WITH ROUGHENED SURFACE AND FABRICATING METHOD THEREOF 审中-公开
    具有粗糙表面的基于氮化钠的发光装置及其制造方法

    公开(公告)号:US20090321780A1

    公开(公告)日:2009-12-31

    申请号:US12491806

    申请日:2009-06-25

    IPC分类号: H01L33/00

    CPC分类号: H01L33/32 H01L33/14

    摘要: A gallium nitride-based light emitting device with a roughened surface is described. The light emitting device comprises a substrate, a buffer layer grown on the substrate, an n-type III-nitride semiconductor layer grown on the buffer layer, a III-nitride semiconductor active layer grown on the n-type III-nitride semiconductor layer, a first p-type III-nitride semiconductor layer grown on the III-nitride semiconductor active layer, a heavily doped p-type III semiconductor layer grown on the first p-type III-nitride semiconductor, and a roughened second p-type III-nitride semiconductor layer grown on the heavily doped p-type III semiconductor layer.

    摘要翻译: 描述了具有粗糙表面的氮化镓基发光器件。 发光器件包括衬底,在衬底上生长的缓冲层,在缓冲层上生长的n型III族氮化物半导体层,在n型III族氮化物半导体层上生长的III族氮化物半导体有源层, 在III族氮化物半导体有源层上生长的第一p型III族氮化物半导体层,在第一p型III族氮化物半导体上生长的重掺杂p型III半导体层和粗糙化的第二p型III- 在重掺杂的p型III半导体层上生长的氮化物半导体层。