WIRING BOARD AND SEMICONDUCTOR DEVICE

    公开(公告)号:US20250113438A1

    公开(公告)日:2025-04-03

    申请号:US18884616

    申请日:2024-09-13

    Abstract: A wiring board includes a first interconnect structure including a first interconnect layer and a first insulating layer, a second interconnect structure, including a second interconnect layer and a second insulating layer, and laminated on one side of the first interconnect structure, and a third interconnect structure, including a third interconnect layer and a third insulating layer, and laminated on the other side of the first interconnect structure. The second interconnect layer has an interconnect density higher than those of the first and the third interconnect layers. The first insulating layer has a through hole penetrating the first insulating layer, and an electronic component electrically connected to the second interconnect layer is disposed inside the through hole. An embedding resin covering the electronic component is provided inside the through hole, and extends to cover the first insulating layer and fills in between the first and second insulating layers.

    WIRING BOARD
    5.
    发明申请

    公开(公告)号:US20230123522A1

    公开(公告)日:2023-04-20

    申请号:US17937831

    申请日:2022-10-04

    Abstract: A wiring board includes a pad configured to make an external electrical connection, and an insulating layer. A portion of a lower surface of the pad is covered with the insulating layer. The pad includes a base portion, and an extending portion formed integrally with the base portion and extending toward an outer periphery of a side surface of the base portion in a plan view at a lower end of the side surface of the base portion. The insulating layer is provided with a groove that is located in a periphery of the pad in the plan view, exposes a side surface of the pad, and opens to an upper surface of the insulating layer.

    INTERCONNECT SUBSTRATE
    6.
    发明申请

    公开(公告)号:US20190371717A1

    公开(公告)日:2019-12-05

    申请号:US16418168

    申请日:2019-05-21

    Abstract: An interconnect substrate includes an insulating layer having a first resin layer and a second resin layer covering an upper surface of the first resin layer, a first conductive layer having an upper surface and side surfaces covered with the first resin layer, a lower surface of the first conductive layer being exposed from a lower surface of the first resin layer, and a second conductive layer including an interconnect pattern and a via interconnect, the interconnect pattern being disposed on an upper surface of the second resin layer, the via interconnect penetrating through both the second resin layer and the first resin layer to connect the interconnect pattern to the upper surface of the first conductive layer, wherein the first resin layer is made of a resin having a higher modulus of elasticity and a lower coefficient of elongation than the second resin layer.

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