公开(公告)号：US08343306B2

公开(公告)日：2013-01-01

申请号：US12046094

申请日：2008-03-11

申请人： Satoshi Tanaka ,  Chishio Koshimizu ,  Manabu Iwata ,  Naoki Matsumoto ,  Toru Ito

发明人： Satoshi Tanaka ,  Chishio Koshimizu ,  Manabu Iwata ,  Naoki Matsumoto ,  Toru Ito

IPC分类号： H01L21/00 ,  C23C16/00

CPC分类号： H01J37/32706 ,  H01J37/32091

摘要： A plasma processing apparatus can prevent a sheath from becoming distorted, simplify a configuration of the apparatus, and prevent particles from attaching to a substrate. The plasma processing apparatus performs plasma processing on the substrate. A housing chamber houses the substrate. A mounting stage is disposed within the housing chamber and mounted with the substrate. An annular member is disposed in the mounting stage. A power supply unit supplies high-frequency power to the mounting stage. An observation unit optically observes the distribution of the plasma. A voltage applying unit applies a DC voltage to the annular member. A control unit sets the value of the DC voltage to be applied based on the observed plasma distribution.

摘要翻译： 等离子体处理装置可以防止护套变形，简化装置的构造，并防止颗粒附着于基板。 等离子体处理装置对基板进行等离子体处理。 容纳室容纳衬底。 安装台设置在壳体室内并与基板一起安装。 环形构件设置在安装台中。 电源单元为安装级提供高频电源。 观察单元光学地观察等离子体的分布。 电压施加单元向环形构件施加DC电压。 控制单元基于观察到的等离子体分布来设定要施加的DC电压的值。

公开(公告)号：US20090026170A1

公开(公告)日：2009-01-29

申请号：US12046094

申请日：2008-03-11

申请人： Satoshi TANAKA ,  Chishio Koshimizu ,  Manabu Iwata ,  Naoki Matsumoto ,  Toru Ito

发明人： Satoshi TANAKA ,  Chishio Koshimizu ,  Manabu Iwata ,  Naoki Matsumoto ,  Toru Ito

IPC分类号： G01R31/00 ,  C23F1/08

CPC分类号： H01J37/32706 ,  H01J37/32091

摘要： A plasma processing apparatus can prevent a sheath from becoming distorted, simplify a configuration of the apparatus, and prevent particles from attaching to a substrate. The plasma processing apparatus performs plasma processing on the substrate. A housing chamber houses the substrate. A mounting stage is disposed within the housing chamber and mounted with the substrate. An annular member is disposed in the mounting stage. A power supply unit supplies high-frequency power to the mounting stage. An observation unit optically observes the distribution of the plasma. A voltage applying unit applies a DC voltage to the annular member. A control unit sets the value of the DC voltage to be applied based on the observed plasma distribution.

摘要翻译： 等离子体处理装置可以防止护套变形，简化装置的构造，并防止颗粒附着于基板。 等离子体处理装置对基板进行等离子体处理。 容纳室容纳衬底。 安装台设置在壳体室内并与基板一起安装。 环形构件设置在安装台中。 电源单元为安装级提供高频电源。 观察单元光学地观察等离子体的分布。 电压施加单元向环形构件施加直流电压。 控制单元基于观察到的等离子体分布来设定要施加的DC电压的值。

公开(公告)号：US20080236749A1

公开(公告)日：2008-10-02

申请号：US12056665

申请日：2008-03-27

申请人： Chishio KOSHIMIZU ,  Naoki Matsumoto ,  Satoshi Tanaka ,  Toru Ito

发明人： Chishio KOSHIMIZU ,  Naoki Matsumoto ,  Satoshi Tanaka ,  Toru Ito

IPC分类号： H01L21/3065

CPC分类号： H01J37/21 ,  H01J37/32091 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32348 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32642 ,  H01J2237/21 ,  H01J2237/334

摘要： A plasma processing apparatus includes a processing chamber, a first electrode and a second electrode disposed to face each other, a high frequency power supply unit for applying a high frequency power to either the first electrode or the second electrode, a processing gas supply unit for supplying a processing gas to a processing space, and a main dielectric member provided at a substrate mounting portion on a main surface of the first electrode. A focus ring is attached to the first electrode to cover a peripheral portion of the main surface of the first electrode and a peripheral dielectric member is provided in a peripheral portion on the main surface of the first electrode so that an electrostatic capacitance per unit area applied between the first electrode and the focus ring is smaller than that applied between the first electrode and the substrate by the main dielectric member.

摘要翻译： 等离子体处理装置包括处理室，第一电极和彼此相对配置的第二电极，用于向第一电极或第二电极施加高频电力的高频电源单元，用于 将处理气体供给到处理空间，以及设置在第一电极的主表面上的基板安装部的主电介质部件。 聚焦环安装在第一电极上以覆盖第一电极的主表面的周边部分，并且在第一电极的主表面的周边部分设置外围电介质构件，使得每单位面积的静电电容 在第一电极和聚焦环之间的距离小于通过主电介质构件施加在第一电极和衬底之间的位置。

公开(公告)号：US08298371B2

公开(公告)日：2012-10-30

申请号：US12056665

申请日：2008-03-27

申请人： Chishio Koshimizu ,  Naoki Matsumoto ,  Satoshi Tanaka ,  Toru Ito

发明人： Chishio Koshimizu ,  Naoki Matsumoto ,  Satoshi Tanaka ,  Toru Ito

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01J37/21 ,  H01J37/32091 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32348 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32642 ,  H01J2237/21 ,  H01J2237/334

摘要： A plasma processing apparatus includes a processing chamber, a first electrode and a second electrode disposed to face each other, a high frequency power supply unit for applying a high frequency power to either the first electrode or the second electrode, a processing gas supply unit for supplying a processing gas to a processing space, and a main dielectric member provided at a substrate mounting portion on a main surface of the first electrode. A focus ring is attached to the first electrode to cover a peripheral portion of the main surface of the first electrode and a peripheral dielectric member is provided in a peripheral portion on the main surface of the first electrode so that an electrostatic capacitance per unit area applied between the first electrode and the focus ring is smaller than that applied between the first electrode and the substrate by the main dielectric member.

摘要翻译： 等离子体处理装置包括处理室，第一电极和彼此相对配置的第二电极，用于向第一电极或第二电极施加高频电力的高频电源单元，用于 将处理气体供给到处理空间，以及设置在第一电极的主表面上的基板安装部的主电介质部件。 聚焦环安装在第一电极上以覆盖第一电极的主表面的周边部分，并且在第一电极的主表面的周边部分设置外围电介质构件，使得每单位面积的静电电容 在第一电极和聚焦环之间的距离小于通过主电介质构件施加在第一电极和衬底之间的位置。

公开(公告)号：US20110061811A1

公开(公告)日：2011-03-17

申请号：US12920731

申请日：2009-02-26

申请人： Toru Ito ,  Sumie Segawa

发明人： Toru Ito ,  Sumie Segawa

IPC分类号： H01L21/3065

CPC分类号： H05H1/0081 ,  H01J37/32935

摘要： A plasma monitoring device is provided with a measuring section, and a coaxial cable connected to the measuring section. One end of the coaxial cable is inserted into a plasma generating region in a processing chamber. A leading end portion of the coaxial cable is permitted to be a probe, and the portion is in a state where the core cable is exposed. The measuring section detects frequency distribution of electromagnetic waves existing in plasma detected by the probe portion of the coaxial cable, and displays the detected frequency distribution.

摘要翻译： 等离子体监测装置具有测量部分和连接到测量部分的同轴电缆。 同轴电缆的一端插入到处理室中的等离子体产生区域中。 同轴电缆的前端部被允许为探针，该部分处于芯线暴露的状态。 测量部分检测由同轴电缆的探头部分检测到的存在于等离子体中的电磁波的频率分布，并显示检测到的频率分布。

公开(公告)号：US20100321029A1

公开(公告)日：2010-12-23

申请号：US12867120

申请日：2009-01-30

申请人： Toru Ito ,  Masato Kawakami ,  Sumie Nagaseki ,  Kazuki Denpoh

发明人： Toru Ito ,  Masato Kawakami ,  Sumie Nagaseki ,  Kazuki Denpoh

IPC分类号： G01N27/62

CPC分类号： H01J37/3244 ,  H01J37/32449 ,  H01J37/32935

摘要： Provided is a technique capable of ascertaining the process condition of the boundary between electrically positive and negative plasma regions. In a vacuum chamber, one of the parameters of process conditions is stepwisely changed to generate a plasma under at least three process conditions. The parameters include a flow rate ratio between an electrically negative gas and an electrically positive gas, a pressure in the vacuum chamber and the magnitude of an energy supplied to the gases. Next, a voltage is applied to a Langmuir probe positioned in that plasma, and a current-voltage curve indicating the relationship between the applied voltage and the electric current to flow through the probe is acquired for each of the process conditions. On the basis of the current-voltage curve group acquired, the process conditions are determined for the boundary between the electrically positive and negative plasma regions.

摘要翻译： 提供了一种能够确定电正极和负电等离子体区域之间的边界的工艺条件的技术。 在真空室中，逐步改变工艺条件的参数之一，以在至少三个工艺条件下产生等离子体。 参数包括电负气体和电正气体之间的流量比，真空室中的压力和供应给气体的能量的大小。 接下来，对位于该等离子体中的Langmuir探针施加电压，并且针对每个处理条件获取指示施加的电压和流过探针的电流之间的关系的电流 - 电压曲线。 基于所获得的电流 - 电压曲线组，确定电气正电压和负电压区域之间的边界的工艺条件。

公开(公告)号：US20100112325A1

公开(公告)日：2010-05-06

申请号：US12595873

申请日：2008-04-17

申请人： Hayato Iwamoto ,  Shinji Yoshida ,  Satoshi Kishi ,  Toru Ito

发明人： Hayato Iwamoto ,  Shinji Yoshida ,  Satoshi Kishi ,  Toru Ito

IPC分类号： B32B5/02 ,  B65B7/00 ,  D02G3/04 ,  D02G3/02 ,  D01F6/00

CPC分类号： D01F8/12 ,  A47L13/16 ,  Y10T428/249921 ,  Y10T428/2929

摘要： A splittable conjugate fiber for obtaining a fiber structure excellent in denseness and bulkiness includes a polyamide resin composition and a fiber-forming polymer not having an affinity with the polyamide resin composition. The polyamide resin composition and the fiber-forming polymer are combined with each other in a fiber longitudinal direction. The polyamide resin composition contains aromatic polyamide and aliphatic polyamide. Preferably, the aromatic polyamide is a nylon MXD6 polymer, and the aliphatic polyamide is a nylon 6 polymer.

摘要翻译： 用于获得致密度和蓬松度优异的纤维结构的可分裂复合纤维包括聚酰胺树脂组合物和与聚酰胺树脂组合物不具有亲和性的成纤聚合物。 聚酰胺树脂组合物和纤维形成性聚合物在纤维长度方向上相互结合。 聚酰胺树脂组合物含有芳香族聚酰胺和脂肪族聚酰胺。 优选地，芳族聚酰胺是尼龙MXD6聚合物，并且脂族聚酰胺是尼龙6聚合物。

公开(公告)号：US20050267264A1

公开(公告)日：2005-12-01

申请号：US11166731

申请日：2005-06-27

申请人： Fumio Takei ,  Satoshi Akutsu ,  Toru Ito

发明人： Fumio Takei ,  Satoshi Akutsu ,  Toru Ito

IPC分类号： C08G61/12 ,  G06F3/033 ,  G06F3/041 ,  C08F2/00

CPC分类号： G06F3/045 ,  C08G61/126 ,  C08K5/0008 ,  G06F2203/04103 ,  C08L65/00

摘要： The present invention relates to organic conductive polymer compositions adapted to produce touch panel input devices that hardly undergo resistance degradation even after prolonged and repeated usages, and represent remarkably improved reliability and lifetime in particular. The organic conductive polymer compositions according to the present invention comprise a thiophene derivative polymer, a water-soluble organic compound (except for nitrogen-containing compounds), and a dopant, wherein the thiophene derivative polymer is expressed by the formula (1).

摘要翻译： 本发明涉及适于制造即使经过长时间和重复使用也难以经受阻力降低的触摸面板输入装置的有机导电聚合物组合物，特别是显着提高的可靠性和使用寿命。 根据本发明的有机导电聚合物组合物包含噻吩衍生物聚合物，水溶性有机化合物（含氮化合物除外）和掺杂剂，其中噻吩衍生物聚合物由式（1）表示。

公开(公告)号：US06621398B2

公开(公告)日：2003-09-16

申请号：US09996047

申请日：2001-11-28

申请人： Teruhiko Fujiwara ,  Masayoshi Ishii ,  Haruki Hoshi ,  Keita Isogai ,  Hatsuo Matsumoto ,  Toru Ito ,  Tamiko Ambo

发明人： Teruhiko Fujiwara ,  Masayoshi Ishii ,  Haruki Hoshi ,  Keita Isogai ,  Hatsuo Matsumoto ,  Toru Ito ,  Tamiko Ambo

IPC分类号： H01F118

CPC分类号： H01F29/146 ,  H01F3/10 ,  H01F3/14 ,  H01F17/04 ,  H01F2003/103

摘要： Disposed in a magnetic gap of a magnetic core, a magnetically biasing permanent magnet is a bond magnet comprising rare-earth magnetic powder and a binder resin. The rare-earth magnetic powder has an intrinsic coercive force of 5 kOe or more, a Curie temperature of 300° C. or more, and an average particle size of 2.0-50 &mgr;m. The rare-earth magnetic power has a surface coated with a metallic layer containing an oxidation-resistant metal. In order to enable a surface-mount to reflow, the rare-earth magnetic powder may have the intrinsic coercive force of 10 kOe or more, the Curie temperature of 500° C. and the average particle size of 2.5-50 &mgr;m. In addition, to prevent specific resistance from degrading, the metallic layer desirably may be coated with a glass layer consisting of low-melting glass having a softening point less than a melting point of the oxidation-resistant metal.

公开(公告)号：US06574438B2

公开(公告)日：2003-06-03

申请号：US10184871

申请日：2002-07-01

申请人： Kenji Yamane ,  Toru Ito

发明人： Kenji Yamane ,  Toru Ito

IPC分类号： G03B1700

CPC分类号： G03B17/425

摘要： A zoom lens device is attached in front of a main body. The main body has a film cartridge chamber and a take-up chamber. A take-up spool is rotatably positioned into the take-up chamber. The zoom lens device consists of a fixed lens barrel and plural movable lens barrels. The movable lens barrels move along a photographic optical axis in order to perform zooming. Rotation of a film motor is transmitted to the take-up spool through a film advance gear train. Rotation of the lens motor is transmitted to the zoom lens device through a lens drive gear train. The film advance gear train and the lens drive gear train are positioned side by side on the lower part of the main body.

摘要翻译： 变焦镜头装置安装在主体前面。 主体具有暗盒室和卷取室。 卷取卷轴可旋转地定位在卷取室中。 变焦透镜装置由固定镜筒和多个可移动透镜筒组成。 可移动透镜筒沿着摄影光轴移动，以进行变焦。 胶片电动机的旋转通过胶片前进齿轮系传递到卷取卷轴。 镜头马达的旋转通过透镜驱动齿轮系传递到变焦镜头装置。 胶卷推进齿轮系和镜头驱动齿轮系并排设置在主体的下部。