公开(公告)号：US4798470A

公开(公告)日：1989-01-17

申请号：US927939

申请日：1986-11-07

申请人： Shigeo Moriyama ,  Toshiei Kurosaki ,  Tsuneo Terasawa ,  Shinji Okazaki ,  Yoshio Kawamura

发明人： Shigeo Moriyama ,  Toshiei Kurosaki ,  Tsuneo Terasawa ,  Shinji Okazaki ,  Yoshio Kawamura

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7026 ,  G03F9/7076 ,  G03F9/7084

摘要： A pattern printing method includes a step of printing a pattern on a wafer on the basis of a target mark provided on the surface of the wafer which is opposite to the surface thereof on which the pattern is to be printed. Also disclosed is a pattern printing apparatus which comprises detecting means for detecting a target mark provided on the surface of a wafer which is opposite to the surface thereof on which a pattern is to be printed, and pattern printing means for printing the pattern on the pattern printing surface of the wafer on the basis of mark position data obtained by the detecting means.

摘要翻译： 图案印刷方法包括基于设置在与要印刷图案的表面相对的晶片表面上的目标标记在晶片上印刷图案的步骤。 还公开了一种图案打印装置，其包括检测装置，用于检测设置在与其上要印刷图案的表面相对的晶片表面上的目标标记，以及用于在图案上印刷图案的图案印刷装置 基于由检测装置获得的标记位置数据，晶片的印刷表面。

公开(公告)号：US4597669A

公开(公告)日：1986-07-01

申请号：US539760

申请日：1983-10-07

申请人： Tsuneo Terasawa ,  Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka

发明人： Tsuneo Terasawa ,  Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka

IPC分类号： G01B11/00 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86

CPC分类号： G03F9/70 ,  H01L21/30

摘要： A pattern detector according to the present invention adopts a processing method wherein means is provided anew with which the intensity distribution of light reflected from or transmitted through an illuminated specimen is photoelectrically converted, and a pattern position is detected at high speed from the ratio between the primary moment and integral value of a detection signal thus derived, whereupon a symmetry calculation is executed within a narrow range around the detected value, whereby the pattern position is found fast and precisely.

摘要翻译： 根据本发明的图案检测器采用一种处理方法，其中重新提供装置，其中从被照射的样品反射或透射的光的光强分布被光电转换，并且以高速的比例检测图案位置 这样得到的检测信号的初始矩和积分值，由此在检测值附近的窄范围内执行对称计算，从而快速且精确地找到图案位置。

公开(公告)号：US4504726A

公开(公告)日：1985-03-12

申请号：US327627

申请日：1981-12-04

申请人： Sumio Hosaka ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Sumio Hosaka ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： B23K26/08 ,  B23K26/12 ,  B41M5/24 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/428

CPC分类号： B23K26/0861 ,  B23K26/12 ,  B23K26/1224 ,  B23K26/123 ,  B41M5/24 ,  G03F1/76 ,  G03F7/704 ,  G03F7/70875 ,  H01L21/30

摘要： A pattern generator in which a workpiece to be machined into a desired pattern shape is held in vacuum and is irradiated with a laser beam condensed to be fine, while scanning the laser beam so as to depict the desired pattern shape, whereby the workpiece is directly machined in conformity with the desired pattern shape. As the workpiece, one in which a shading film (for example, chromium film) is deposited on a transparent glass substrate is employed, and it is irradiated with the laser beam in the vacuum, whereby the irradiated parts of the shading film are vaporized to fabricate a shading mask pattern of good quality.

摘要翻译： 一种图案发生器，其中待加工成所需图案形状的工件被保持在真空中并且被激光束照射以被精细地聚焦，同时扫描激光束以便描绘所需的图案形状，由此工件直接 根据所需的图案形状加工。 作为工件，使用在透明玻璃基板上沉积遮光膜（例如，铬膜）的工件，并在真空中照射激光束，使遮光膜的照射部分蒸发至 制作质量好的遮光罩图案。

公开(公告)号：US4441206A

公开(公告)日：1984-04-03

申请号：US330778

申请日：1981-12-14

申请人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G06K9/20 ,  G06K9/00 ,  H04N7/00

CPC分类号： G03F9/7088 ,  H01L21/30

摘要： A pattern detecting apparatus is disclosed which comprises, in order to detect the center of a positioning pattern on a sample with high accuracy in a wide range, means for illuminating the positioning pattern, means for defining an illumination range in which the positioning pattern is illuminated, means for focusing reflected light from the positioning pattern on a predetermined image plane, means for electrically detecting a bright and dark image on the image plane in accordance with positions on the image plane, means for removing a signal corresponding to the outside of the illumination range from the output signal of the detecting means and for holding, in place of the removed signal, a level of the output signal produced within the illumination range, and means for detecting a position of the center of the positioning pattern from the output signal of the holding means.

摘要翻译： 公开了一种图案检测装置，其包括为了在宽范围内高精度地检测样品上的定位图案的中心，用于照亮定位图案的装置，用于限定定位图案被照亮的照明范围的装置 用于将来自定位图案的反射光聚焦在预定图像平面上的装置，用于根据图像平面上的位置电学检测图像平面上的亮和暗图像的装置，用于去除对应于照明外部的信号的装置 范围从检测装置的输出信号，并且代替去除的信号，保持在照明范围内产生的输出信号的电平，以及用于从位置图的输出信号中检测定位图案的中心的位置的装置 持有手段。

公开(公告)号：US4614432A

公开(公告)日：1986-09-30

申请号：US545642

申请日：1983-10-26

申请人： Shinji Kuniyoshi ,  Tsuneo Terasawa ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka ,  Akihiro Takanashi

发明人： Shinji Kuniyoshi ,  Tsuneo Terasawa ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka ,  Akihiro Takanashi

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A pattern detector for precise position measurement of a wafer, used in a mask aligner used in manufacturing a semiconductor device is disclosed. A positioning pattern on the wafer is magnified and projected by a magnifying optical system and the magnified projected image is precisely detected to determine a position of the positioning pattern. As a light to form the magnified projected image, plurality of monochromatic lights of different wavelengths are available through optical filters and the magnifying optical systems are arranged one for each of the monochromatic lights. By selecting one of the optical filters, the magnified projected image of the positioning pattern is formed by the monochromatic light having an optimum wavelength to the wafer and the precise position of the positioning pattern on the wafer can be detected.

摘要翻译： 公开了一种用于在用于制造半导体器件的掩模对准器中使用的用于晶片的精确位置测量的图案检测器。 晶片上的定位图案由放大光学系统放大和投影，并且精确地检测放大的投影图像以确定定位图案的位置。 作为形成放大投影图像的光，通过光学滤光器可以获得不同波长的多个单色光，并且放大光学系统针对每个单色光布置一个。 通过选择一个滤光器，通过对晶片具有最佳波长的单色光来形成定位图案的放大投影图像，并且可以检测晶片上的定位图案的精确位置。

公开(公告)号：US4477183A

公开(公告)日：1984-10-16

申请号：US445079

申请日：1982-11-29

申请人： Yoshio Kawamura ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Tsuneo Terasawa

发明人： Yoshio Kawamura ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Tsuneo Terasawa

IPC分类号： H01L21/30 ,  G02B7/28 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G02B7/28 ,  G03F9/7057

摘要： An automatic focusing apparatus according to the present invention is constructed of a base on which a substrate is placed, detection means for detecting a pressure of air which is caused to flow out of an interspace between the substrate and an orifice by spurting the air from the orifice toward the substrate, reference pressure generation means for generating a reference pressure which is necessary for setting a standard distance between the substrate and the orifice, a pressure transducer which receives pressure signals from said detection means and said reference pressure generation means and which converts a pressure difference between these pressure signals into an electric signal, base drive means for moving the substrate in parallel with the orifice on the basis of the output signal from said pressure transducer, and offset signal generation means for generating a signal which, when superposed on the output signal from said pressure transducer, serves to shift the substrate from the standard distance.

摘要翻译： 根据本发明的自动对焦装置由放置基板的基座构成，检测装置用于检测从基板和孔之间的空隙流出的空气的压力， 基准压力产生装置，用于产生设置基板和孔口之间的标准距离所必需的参考压力;压力传感器，其接收来自所述检测装置和所述基准压力产生装置的压力信号， 这些压力信号之间的压力差成为电信号;基础驱动装置，用于基于来自所述压力传感器的输出信号与所述孔平行地移动所述基板，以及偏移信号产生装置，用于产生当叠加在所述压力信号上时， 来自所述压力传感器的输出信号用于使衬底移动 标准距离。

公开(公告)号：US4057347A

公开(公告)日：1977-11-08

申请号：US670830

申请日：1976-03-26

申请人： Shigeo Moriyama ,  Tatsuo Harada ,  Yoshio Kawamura ,  Seiya Hashimoto ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka

发明人： Shigeo Moriyama ,  Tatsuo Harada ,  Yoshio Kawamura ,  Seiya Hashimoto ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka

IPC分类号： G03B27/32 ,  G02B27/18 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01B11/26 ,  G03B27/54

CPC分类号： G03F9/70

摘要： An improved optical exposure apparatus for use in exposing a workpiece to a desired light pattern with a high alignment accuracy and a high operational speed is disclosed. The apparatus comprises a moving table on which a workpiece to be exposed is disposed, a movable holder on which a mask having an original pattern is disposed, a light source for irradiating said mask, a reduction lens for projecting a reduced pattern of said original pattern onto said workpiece, means for positioning said moving table to a predetermined position, means for detecting the error of said table positioning, means for calculating a value of the error of positioning the workpiece divided by the reduction rate of the reduction lens, and means for automatically shifting said movable holder by the calculated value so as to cancel said error.

摘要翻译： 公开了一种用于以高对准精度和高操作速度将工件暴露于期望的光图案的改进的光学曝光装置。 该装置包括：移动台，设置待曝光的工件;可移动的保持器，其上设置有原始图案的掩模;用于照射所述掩模的光源;还原透镜，用于将所述原始图案的缩小图案投影 在所述工件上，用于将所述移动台定位到预定位置的装置，用于检测所述工作台定位误差的装置，用于计算所述工件定位误差值除以所述还原透镜的减速率的装置， 自动地将所述活动支架移动所述计算值，以便消除所述误差。

公开(公告)号：US4480910A

公开(公告)日：1984-11-06

申请号：US358436

申请日：1982-03-15

申请人： Akihiro Takanashi ,  Tatsuo Harada ,  Masamoto Akeyama ,  Yataro Kondo ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Yoshio Kawamura

发明人： Akihiro Takanashi ,  Tatsuo Harada ,  Masamoto Akeyama ,  Yataro Kondo ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Yoshio Kawamura

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/68

CPC分类号： G03F7/70241 ,  G03F7/2041 ,  G03F7/70341

摘要： There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

摘要翻译： 公开了一种图案形成装置，用于将形成在掩模版上的图案投影在基板上的光致抗蚀剂层上，该基板包括用于照射用于形成光学图像的图案的照明系统，用于减少光学图案图像的缩小透镜 特定的缩小率，并且将减小的光学图案图像投影到形成在用于曝光光致抗蚀剂层的基板上的光致抗蚀剂层上;以及液体维持装置，用于用光学透明液体填充至少一部分还原透镜和光致抗蚀剂层之间的间隙 折射率大于1（1）。

公开(公告)号：US4894343A

公开(公告)日：1990-01-16

申请号：US122269

申请日：1987-11-18

申请人： Shinji Tanaka ,  Kazuo Sato ,  Tsuneo Terasawa ,  Yoshio Kawamura ,  Hisashi Tsuruoka

发明人： Shinji Tanaka ,  Kazuo Sato ,  Tsuneo Terasawa ,  Yoshio Kawamura ,  Hisashi Tsuruoka

IPC分类号： C12M1/00 ,  C12M1/32 ,  C12M1/34 ,  C12M3/00 ,  C12N13/00 ,  G01N15/14

CPC分类号： C12N13/00 ,  C12M23/20 ,  C12M35/02 ,  G01N2015/149

摘要： There are disclosed a chamber plate for use in cell fusion comprising a plate of single crystal silicon on which a plurality of chambers for holding at least a pair of unit cells are formed in array, said chamber having at the bottom a plate having slits which do not pass cells to be held; and a process for producing a chamber plate for use in cell fusion which comprises forming chambers for holding cells in a plate of single crystal silicon by anisotropic etching or isotropic etching by chemical etching.

摘要翻译： 公开了一种用于细胞融合的室板，其包括单晶硅板，其上形成有用于保持至少一对单元电池的多个室，所述室在底部具有切口的板 不通过细胞被保持; 以及用于生产用于细胞融合的室板的方法，其包括通过各向异性蚀刻或通过化学蚀刻的各向同性蚀刻形成用于将单元硅保持在单元硅板中的室。

公开(公告)号：US4750364A

公开(公告)日：1988-06-14

申请号：US920426

申请日：1986-10-20

申请人： Yoshio Kawamura ,  Kazuo Sato ,  Tsuneo Terasawa ,  Shinji Tanaka

发明人： Yoshio Kawamura ,  Kazuo Sato ,  Tsuneo Terasawa ,  Shinji Tanaka

IPC分类号： G01C19/56 ,  G01C19/5621 ,  G01C19/5628 ,  G01P15/097 ,  G01P15/10 ,  G01P15/125 ,  G01P15/08 ,  G01P9/04

CPC分类号： G01P15/097 ,  G01C19/5607 ,  G01P15/14

摘要： The specification discloses an angular velocity and acceleration sensor in which a tuning-fork oscillator is vibrated on the main driven vibrating axis and displacement on an axis which is parallel to the main driven vibrating axis or displacement which crosses it at right angles is detected so that at least one of angular velocity and acceleration on an axis which is parallel to the main driven vibrating axis or which crosses it at right angles may be detected. The sensor is characterized in that vibrating reeds of the tuning-fork oscillator are so formed that the spring constant of the vibrating reeds on the main driven vibrating axis is substantially equal to that on the axis which crosses the main driven vibrating axis at right angles.

摘要翻译： 本说明书公开了一种角速度和加速度传感器，其中音叉振荡器在主驱动振动轴上振动，并且检测到平行于主驱动振动轴的轴线的位移或与其直角穿过的轴的位移，使得 可以检测在与主驱动振动轴平行的轴上的角速度和加速度中的至少一个，或者以直角与其相交。 传感器的特征在于，音叉振荡器的振动片形成为使得主从动振动轴上的振动片的弹簧常数基本上等于与主驱动振动轴线成直角相交的轴线的弹簧常数。