Piezoelectric element, method of manufacturing the same, and ink jet head
    3.
    发明授权
    Piezoelectric element, method of manufacturing the same, and ink jet head 有权
    压电元件,其制造方法和喷墨头

    公开(公告)号:US08628174B2

    公开(公告)日:2014-01-14

    申请号:US12717816

    申请日:2010-03-04

    申请人: Shuji Takahashi

    发明人: Shuji Takahashi

    IPC分类号: B41J2/045 H01L41/00 H02N2/00

    摘要: A piezoelectric element 10 includes a supporting body 12, a lower electrode 16 that is formed over the supporting body, a piezoelectric layer 20 that is formed over the lower electrode, and an upper electrode 24 that is formed over the piezoelectric layer so as to oppose the lower electrode via the piezoelectric layer. A step portion 20A is formed at a peripheral portion of the piezoelectric layer at a side of the lower electrode such that a surface of the piezoelectric layer at the side of the lower electrode is larger than a surface of the piezoelectric layer at a side of the upper electrode.

    摘要翻译: 压电元件10包括支撑体12,形成在支撑体上的下电极16,形成在下电极上的压电层20和形成在压电层上方的上电极24, 下电极通过压电层。 台阶部分20A形成在压电层的下电极一侧的周边部分处,使得压电层在下电极侧的表面大于压电层侧面的压电层的表面 上电极。

    METHOD FOR HEAT-TREATING WAFER, METHOD FOR PRODUCING SILICON WAFER, SILICON WAFER, AND HEAT TREATMENT APPARATUS
    4.
    发明申请
    METHOD FOR HEAT-TREATING WAFER, METHOD FOR PRODUCING SILICON WAFER, SILICON WAFER, AND HEAT TREATMENT APPARATUS 审中-公开
    用于加热处理的方法,用于生产硅波的方法,硅波和热处理装置

    公开(公告)号:US20130098888A1

    公开(公告)日:2013-04-25

    申请号:US13807243

    申请日:2011-07-15

    IPC分类号: H05B1/00

    摘要: The present invention is a method for heat-treating a wafer, the method by which heat treatment at a predetermined temperature with rapid rise and fall of temperature is performed by performing heating by a heating source in a state in which a principal surface (a first principal surface) of a wafer is supported by a supporting member, the method in which heat treatment is performed with control of the heating source being performed in such a way that the temperature of the first principal surface supported by the supporting member becomes 1 to 25° C. higher than the temperature of a principal surface (a second principal surface) opposite to the first principal surface of the wafer. As a result, a method for heat-treating a wafer, the method that can reliably suppress a slip dislocation generated from a wafer supporting position when heat treatment is performed on a silicon wafer, is provided.

    摘要翻译: 本发明是一种对晶片进行热处理的方法,其特征在于,通过在主表面(第一 晶片的主表面)由支撑构件支撑,其中通过控制加热源进行热处理的方法是这样一种方式,使得由支撑构件支撑的第一主表面的温度变为1至25 高于与晶片的第一主表面相对的主表面(第二主表面)的温度。 结果,提供了一种用于对晶片进行热处理的方法,当对硅晶片进行热处理时,可以可靠地抑制从晶片支撑位置产生的滑移位错的方​​法。

    VIDEO DATA RECORDING DEVICE, VIDEO DATA PLAYING DEVICE, VIDEO DATA RECORDING METHOD, AND VIDEO DATA PLAYING METHOD
    5.
    发明申请
    VIDEO DATA RECORDING DEVICE, VIDEO DATA PLAYING DEVICE, VIDEO DATA RECORDING METHOD, AND VIDEO DATA PLAYING METHOD 有权
    视频数据记录装置,视频数据播放装置,视频数据记录方法和视频数据播放方法

    公开(公告)号:US20120008915A1

    公开(公告)日:2012-01-12

    申请号:US13001554

    申请日:2010-03-18

    IPC分类号: H04N5/91 G06K9/62

    摘要: A video data recording device for sufficiently protecting privacy even before a mask target enters into a screen. The video data recording device includes a reference information storage unit in which reference information including predetermined features is recorded; a video data acquisition unit which acquires video data and sequentially outputs the video data to a video buffer; a similarity determining unit which compares newest video data and the reference information, and extracts partial information determined to be similar to the reference information from the newest video data; a relation determining unit which compares video data output to the video buffer before the newest video data, and the partial information determined to be similar, and extracts partial information determined to be related to the partial information determined to be similar; and an imaging recording I/F unit which records the video data and the related information related to the partial information in a recording medium.

    摘要翻译: 一种视频数据记录装置,即使在掩模目标进入屏幕之前也能充分保护隐私。 视频数据记录装置包括参考信息存储单元,其中记录了包括预定特征的参考信息; 视频数据获取单元,其获取视频数据并将视频数据顺序地输出到视频缓冲器; 相似度确定单元,对最新的视频数据和参考信息进行比较,并从最新的视频数据中提取确定为与参考信息相似的部分信息; 关系确定单元,将在最新视频数据之前的视频缓冲器输出的视频数据与确定为相似的部分信息进行比较,并且提取被确定为与被确定为相似的部分信息相关的部分信息; 以及成像记录I / F单元,其将视频数据和与部分信息相关的相关信息记录在记录介质中。

    Nozzle plate, method of manufacturing nozzle plate, and image forming apparatus
    6.
    发明授权
    Nozzle plate, method of manufacturing nozzle plate, and image forming apparatus 有权
    喷嘴板,喷嘴板的制造方法以及成像装置

    公开(公告)号:US07854494B2

    公开(公告)日:2010-12-21

    申请号:US12023984

    申请日:2008-01-31

    申请人: Shuji Takahashi

    发明人: Shuji Takahashi

    IPC分类号: B41J2/14

    摘要: The nozzle plate has a nozzle hole formed therethrough, the nozzle hole being defined in the nozzle plate with an inner surface including a first liquid-philic portion, a liquid-phobic portion and a second liquid-philic portion that are arranged in this order from a side near the nozzle mouth, the first and second liquid-philic portions having liquid-philicity, the liquid-phobic portion having liquid-phoblicity.

    摘要翻译: 喷嘴板具有贯穿其上形成的喷嘴孔,喷嘴孔限定在喷嘴板中,其内表面包括第一液体亲水部分,液体疏液部分和第二液体亲水部分, 在喷嘴口附近的一侧,第一和第二液体亲液部分具有液体亲和性,该液体疏液部分具有液体光阑。

    PLASMA ETCHING METHOD AND APPARATUS, AND METHOD OF MANUFACTURING LIQUID EJECTION HEAD
    7.
    发明申请
    PLASMA ETCHING METHOD AND APPARATUS, AND METHOD OF MANUFACTURING LIQUID EJECTION HEAD 有权
    等离子体蚀刻方法和装置,以及制造液体喷射头的方法

    公开(公告)号:US20100216260A1

    公开(公告)日:2010-08-26

    申请号:US12712132

    申请日:2010-02-24

    申请人: Shuji Takahashi

    发明人: Shuji Takahashi

    摘要: The plasma etching method includes: an etching step of placing, on a stage in a chamber, a substrate in which a prescribed mask pattern is formed by a protective film on a surface of a material to be etched, generating a plasma in the chamber while supplying processing gas to the chamber, and etching a portion of the material corresponding to an opening portion in the mask pattern; a voltage measurement step of, during the etching in the etching step, measuring a voltage at the surface of the material on a side where the mask pattern is formed, through a conductive member that is placed in contact with the surface of the material on the side where the mask pattern is formed; and a control step of controlling an etching condition in the etching step in accordance with a measurement result obtained in the voltage measurement step.

    摘要翻译: 等离子体蚀刻方法包括:蚀刻步骤,在室中的台上放置通过保护膜在待蚀刻材料的表面上形成规定的掩模图案的基板,在腔室中产生等离子体,同时 向所述室供应处理气体,并且蚀刻与所述掩模图案中的开口部分相对应的所述材料的一部分; 电压测量步骤,在蚀刻步骤的蚀刻期间,通过与所述材料的表面接触放置的导电构件测量形成有所述掩模图案的一侧上的所述材料的表面处的电压 形成掩模图案的一侧; 以及根据在电压测量步骤中获得的测量结果来控制蚀刻步骤中的蚀刻条件的控制步骤。

    Repellency increasing structure and method of producing the same, liquid ejection head and method of producing the same, and stain-resistant film
    8.
    发明申请
    Repellency increasing structure and method of producing the same, liquid ejection head and method of producing the same, and stain-resistant film 失效
    排斥性增加结构及其制造方法,液体喷射头及其制造方法以及耐污染膜

    公开(公告)号:US20060115598A1

    公开(公告)日:2006-06-01

    申请号:US11290695

    申请日:2005-12-01

    IPC分类号: G11B5/64 B05D3/10

    CPC分类号: B41J2/1606 Y10T428/24355

    摘要: The repellency increasing structure includes a substrate, if a surface of the substrate is flat, a flat surface of which shows lyophilic property with respect to a liquid having a surface tension lower than that of water and multiple recesses multiple and/or projections that are formed in the surface of the substrate. Inner walls of the recesses and outer walls of the projections are substantially parallel to a thickness direction of the substrate. The structure further includes a repellent layer that covers the recesses and the projections. In the liquid ejection head, a solution ejection surface around multiple through-holes of a ejection substrate corresponds to the surface of the substrate of the repellency increasing structure in which the recesses and/or the projections are formed. In the stain-resistant film, the substrate of the repellency increasing structure is a support film.

    摘要翻译: 排斥性增加结构包括基材,如果基材的表面是平坦的,其平坦表面相对于表面张力低于水的表面张力的液体显示亲液性,并且多个凹陷形成多个和/或突起 在基板的表面。 突起的凹部和外壁的内壁基本上平行于基板的厚度方向。 该结构还包括覆盖凹部和突起的驱避层。 在液体喷射头中,喷射基板的多个通孔周围的溶液喷射面对应于形成凹部和/或突起的排斥性增加结构的基板的表面。 在耐污染膜中,斥力增加结构的基材是支持膜。

    Pneumatic vehicle tire having belt wound from flattened tubular tape
    10.
    发明授权
    Pneumatic vehicle tire having belt wound from flattened tubular tape 失效
    气动车辆轮胎具有从扁平的管状带缠绕的带

    公开(公告)号:US5837077A

    公开(公告)日:1998-11-17

    申请号:US693671

    申请日:1996-08-13

    摘要: A pneumatic vehicle tire having a belt layer at the outside of a carcass layer of the tread, wherein a plurality of mutually parallel reinforcement cords are wound back and forth in a spiral at a predetermined angle to the longitudinal direction and embedded in a matrix of a lateral flattened tubular cross-section to form a continuous tape and the continuous tape is continuously wound around the outer circumference of the carcass layer a plurality of times in a spiral to form the belt layer or a pneumatic vehicle tire having a continuous tape, composed of a two-layer construction consisting of a plurality of aligned rubberized reinforcement cords wound in a spiral to form a lateral flattened tubular cross-section and an elastic cord inserted inside the flattened tube along its longitudinal direction as a core member, continuously wound over an outer circumference of a carcass layer at a tread in a spiral with a slight angle with respect to the tire circumferential direction to form a belt layer.

    摘要翻译: 一种气动车辆轮胎,其在所述胎面的胎体层的外侧具有带束层,其中多个相互平行的加强帘线以与所述纵向方向成预定角度的螺旋形来回缠绕并嵌入 横向扁平的管状横截面以形成连续的带,并且连续带以螺旋形式连续缠绕在胎体层的外周上以形成带束层或具有连续带的气动车辆轮胎,该连续带由 由螺旋形缠绕成多个排列的橡胶增强帘线形成横向扁平的管状横截面的两层结构和沿其纵向方向插入扁平管内的弹性绳作为芯构件,连续地卷绕在外侧 胎体层的胎面层的圆周以相对于轮胎周向具有小角度的螺旋形状形成 elt层。