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110 条记录 (耗时 0.039 秒)

    Pattern forming method
    1.
    发明授权
    Pattern forming method 失效
    图案形成方法

    公开(公告)号：US06316163B1

    公开(公告)日：2001-11-13

    申请号：US09163421

    申请日：1998-09-30

    申请人： Shunko Magoshi ,  Masamitsu Itoh ,  Shinji Sato ,  Soichi Inoue ,  Kazuyoshi Sugihara ,  Katsuya Okumura

    发明人： Shunko Magoshi ,  Masamitsu Itoh ,  Shinji Sato ,  Soichi Inoue ,  Kazuyoshi Sugihara ,  Katsuya Okumura

    IPC分类号： G03F900

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  G03F7/7045 ,  H01J37/3174

    摘要： A method for forming patterns, in which pattern transfer to the same photosensitive material on a first layer is carried out using both light exposure and charged particle beam exposure, comprises the steps of performing a predetermined geometric operation between data associated with a pattern to be transferred to the first layer and data associated with a pattern to be transferred to a second layer different from the first layer, separating the pattern data associated with the pattern to be transferred to the first layer into first exposure pattern data for charged particle beam exposure and second exposure pattern data for light exposure, and performing pattern transfer on to the first layer based on the result of the separation.

    摘要翻译： 一种用于形成图案的方法，其中使用曝光和带电粒子束曝光两者进行对第一层上的相同感光材料的图案转印，包括以下步骤：在与待转印图案相关联的数据之间执行预定的几何运算 将与要传送到不同于第一层的第二层的图案相关联的数据相关联的数据与将要传送到第一层的图案相关联的图案数据分离成用于带电粒子束曝光的第一曝光图案数据和第二层 用于曝光的曝光图案数据，以及基于分离结果将图案转印到第一层上。

    Electron beam image picturing method and image picturing device
    4.
    发明授权
    Electron beam image picturing method and image picturing device 有权
    电子束图像图像方法和图像图像装置

    公开(公告)号：US06204511B1

    公开(公告)日：2001-03-20

    申请号：US09192311

    申请日：1998-11-16

    申请人： Masamitsu Itoh ,  Shunko Magoshi ,  Shinji Sato

    发明人： Masamitsu Itoh ,  Shunko Magoshi ,  Shinji Sato

    IPC分类号： H01J3730

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174

    摘要： In the electron beam drawing method, the optimal irradiation amount of an electron beam in accordance with a drawing area ratio at each of drawing positions, is obtained prior to drawing a desired pattern by irradiating an electron beam on a sample. The optimal irradiation amount obtained is separated in a plurality of gradations as a correction amount for a reference irradiation amount of the electron beam. This separation is made finer as the drawing area ratio is higher. The representative correction amount data is determined for each of the plurality of gradations. The representative correction amount data determined is stored for each of the plurality of gradations, and a pattern is drawn on a sample with the optical irradiation amount corresponding to read data of the representative correction amount stored.

    摘要翻译： 在电子束拉制法中，通过在样品上照射电子束，在绘制期望的图案之前，获得根据每个拉伸位置处的拉伸面积比的电子束的最佳照射量。 将获得的最佳照射量作为电子束的基准照射量的校正量以多个灰度分离。 随着拉伸面积比越高，这种分离越细。 为多个灰度中的每一个确定代表校正量数据。 针对多个灰度中的每一个存储确定的代表校正量数据，并且在存储有代表校正量的读取数据的光照射量的样本上绘制图案。

    Exposure apparatus, exposure method, and device manufacturing method
    8.
    发明授权
    Exposure apparatus, exposure method, and device manufacturing method 有权
    曝光装置，曝光方法和装置制造方法

    公开(公告)号：US08896806B2

    公开(公告)日：2014-11-25

    申请号：US12644703

    申请日：2009-12-22

    申请人： Shinji Sato

    发明人： Shinji Sato

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70916

    摘要： An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.

    摘要翻译： 曝光基板的曝光装置包括：包括发射曝光光的发射面的光学系统; 第一表面，其设置在从所述发射表面发射的所述曝光光的光路的周围的至少一部分中; 第二表面，其设置在所述第一表面的周围的至少一部分中并且位于比所述第一表面低的位置; 空间部分，液体可以经由第一表面和第二表面之间的第一孔流动，并且经由不同于第一孔的第二孔向大气开放; 以及第一回收部，其回收流入空间部的液体的至少一部分。 这里，在基板的曝光的至少一部分中，发光面，第一表面和第二表面与基板的表面相对，并且通过液体从发射表面暴露出曝光的基板 在发射表面和衬底的表面之间。

    TANK-TYPE CIRCUIT BREAKER
    9.
    发明申请
    TANK-TYPE CIRCUIT BREAKER 有权
    油罐式断路器

    公开(公告)号：US20140166622A1

    公开(公告)日：2014-06-19

    申请号：US14233305

    申请日：2012-08-24

    申请人： Junichi Abe ,  Shinji Sato ,  Tomoko Tanabe ,  Naoaki Inoue

    发明人： Junichi Abe ,  Shinji Sato ,  Tomoko Tanabe ,  Naoaki Inoue

    IPC分类号： H01H33/26

    CPC分类号： H01H33/26 ,  G01R31/1227 ,  H01H33/668 ,  H02B13/0655

    摘要： Capacitors (5a, 5b) are provided in the insulators of bushings (4a, 4b), respectively. One ends of the capacitors (5a, 5b) are connected to central conductors (3a, 3b) side, and the other ends are connected to a tank (1) side at the ground potential. When a discharge signal from the outside of the tank (1) reaches the capacitors (5a, 5b) through the central conductors (3a, 3b), the capacitors (5a, 5b) work as a filter to attenuate and prevent the signal in the frequency band of the discharge waveform from propagating to the inside of the tank (1). When an antenna (7) placed in the tank (1) receives a signal in the frequency band of the discharge waveform, a discharge detection unit (20) determines that a discharge inside the tank has been detected.

    摘要翻译： 电容器（5a，5b）分别设置在衬套（4a，4b）的绝缘体中。 电容器（5a，5b）的一端与中心导体（3a，3b）侧连接，另一端与接地电位的水箱（1）侧连接。 当来自罐（1）的外部的放电信号通过中心导体（3a，3b）到达电容器（5a，5b）时，电容器（5a，5b）用作滤波器，以衰减并防止 放电波形的频带从传播到罐（1）的内部。 当放置在储罐（1）中的天线（7）接收到放电波形的频带中的信号时，放电检测单元（20）确定已经检测到罐内的放电。

    Selected word line dependent select gate voltage during program
    10.
    发明授权
    Selected word line dependent select gate voltage during program 有权
    程序中所选字线相关选择栅极电压

    公开(公告)号：US08638608B2

    公开(公告)日：2014-01-28

    申请号：US13430502

    申请日：2012-03-26

    申请人： Chun-Hung Lai ,  Deepanshu Dutta ,  Shinji Sato ,  Gerrit Jan Hemink

    发明人： Chun-Hung Lai ,  Deepanshu Dutta ,  Shinji Sato ,  Gerrit Jan Hemink

    IPC分类号： G11C11/34

    CPC分类号： G11C11/5628 ,  G11C16/0483 ,  G11C16/10

    摘要： Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming, which may reduce or eliminate program disturb. The voltage applied to the gate of a select transistor of a NAND string may depend on the location of the selected word line. This could be either a source side or drain side select transistor. This may prevent or reduce program disturb that could result due to DIBL. This may also prevent or reduce program disturb that could result due to GIDL. A negative bias may be applied to the gate of a source side select transistor when programming at least some of the word lines. In one embodiment, progressively lower voltages are used for the gate of the drain side select transistor when programming progressively higher word lines.

    摘要翻译： 公开了用于操作非易失性存储器的方法和装置。 一个或多个编程条件取决于选择用于编程的字线的位置，这可以减少或消除程序干扰。 施加到NAND串的选择晶体管的栅极的电压可以取决于所选字线的位置。 这可以是源极侧或漏极侧选择晶体管。 这可能会阻止或减少由于DIBL而导致的程序干扰。 这也可以防止或减少由于GIDL可能导致的程序干扰。 当编程至少一些字线时，负偏压可以施加到源极侧选择晶体管的栅极。 在一个实施例中，当编程逐渐增加的字线时，逐渐降低的电压用于漏极侧选择晶体管的栅极。