Thin film manufacturing system
    8.
    发明授权
    Thin film manufacturing system 失效
    薄膜制造系统

    公开(公告)号:US4887548A

    公开(公告)日:1989-12-19

    申请号:US193680

    申请日:1988-05-13

    CPC分类号: C23C16/488

    摘要: A thin film manufacturing system comprises a reaction vessel with a window that is transparent to ultraviolet radiation; a means of exhausting gas from the reaction vessel to a reduced pressure condition, a means of introducing a gas into the reaction vessel to form a thin film, a source of ultraviolet radiation that activates the gas, and slits provided at a predetermined interval on the window that is transparent to ultraviolet radiation.

    摘要翻译: 薄膜制造系统包括具有对紫外线辐射透明的窗口的反应容器; 将气体从反应容器排出到减压状态的方法,将气体引入反应容器中以形成薄膜,激活气体的紫外线辐射源,以及以预定间隔设置的狭缝的方法 对紫外线辐射透明的窗户。

    Photo CVD apparatus with a glow discharge system
    10.
    发明授权
    Photo CVD apparatus with a glow discharge system 失效
    具有辉光放电系统的照相CVD装置

    公开(公告)号:US5183511A

    公开(公告)日:1993-02-02

    申请号:US352644

    申请日:1989-05-12

    IPC分类号: C23C16/48 H01J37/32

    摘要: A photo CVD apparatus includes a reaction chamber, a light source for radiating light to the inside of the chamber through a light window, and a pair of electrodes disposed in the chamber for glow discharge, one of the electrodes being located on the light window. After deposition by photo CVD, a light window for transmission of UV light is cleaned by plasma etching by virtue of glow discharge taking place between the electrodes. The light source and the electrodes for plasma etching share one power supply for supplying high frequency electric power.

    摘要翻译: 照相CVD装置包括反应室,通过光窗将光照射到室内的光源,以及设置在用于辉光放电的室中的一对电极,其中一个电极位于光窗上。 在通过光CVD沉积之后,通过在电极之间发生辉光放电,通过等离子体蚀刻来清洁用于透射UV光的光窗口。 用于等离子体蚀刻的光源和电极共享用于提供高频电力的一个电源。