公开(公告)号：US5185179A

公开(公告)日：1993-02-09

申请号：US417311

申请日：1989-10-05

申请人： Shunpei Yamazaki ,  Shigenori Hayashi ,  Noriya Ishida ,  Mari Sasaki ,  Junichi Takeyama ,  Kenji Itou ,  Masahiro Kojima ,  Masaya Kadono

发明人： Shunpei Yamazaki ,  Shigenori Hayashi ,  Noriya Ishida ,  Mari Sasaki ,  Junichi Takeyama ,  Kenji Itou ,  Masahiro Kojima ,  Masaya Kadono

IPC分类号： C23C16/26 ,  C23C16/34

CPC分类号： C23C16/345 ,  C23C16/26

摘要： Carbonaceous films are coated on a surface by chemical vapor reation. In advance of the deposition of carbonaceous film, a silicon nitride film as coated on the surface to prevent interdiffusion between the carbonaceous film and the underlying surface.

公开(公告)号：US5059502A

公开(公告)日：1991-10-22

申请号：US434783

申请日：1989-11-13

申请人： Narihito Kojima ,  Hiroshi Nagame ,  Mitsuru Seto ,  Shunpei Yamazaki ,  Shigenori Hayashi ,  Noriya Ishida ,  Naoki Hirose ,  Mari Sasaki ,  Junichi Takeyama

发明人： Narihito Kojima ,  Hiroshi Nagame ,  Mitsuru Seto ,  Shunpei Yamazaki ,  Shigenori Hayashi ,  Noriya Ishida ,  Naoki Hirose ,  Mari Sasaki ,  Junichi Takeyama

IPC分类号： G03G5/082 ,  G03G5/147

CPC分类号： G03G5/14704 ,  G03G5/08285

摘要： An electrophotographic photoconductor comprises an electroconductive substrate, an organic photoconductive layer formed on the electroconductive substrate, and a protective layer formed on the organic photoconductive layer, comprising carbon or a carbon-based material as its main component, in which the difference in the Vickers hardness between the organic photoconductive layer and the protective layer is 2500 Kg/mm.sup.2 or less, and the oxygen concentration at the interface or in the vicinity of the interface between the organic photoconductive layer and the protective layer is 1 atom % or less.

摘要翻译： 电子照相感光体包括导电性基体，形成在导电性基体上的有机光电导层和形成在有机光电导层上的保护层，其包含碳或碳类材料作为其主要成分，其中维氏硬度 有机光电导层和保护层之间的氧浓度为2500kg / mm 2以下，有机光电导层与保护层界面附近的氧浓度为1原子％以下。

公开(公告)号：US5079031A

公开(公告)日：1992-01-07

申请号：US324669

申请日：1989-03-17

申请人： Shunpei Yamazaki ,  Shinji Imatou ,  Noriya Ishida ,  Mari Sasaki ,  Mitsunori Sakama ,  Takeshi Fukada ,  Naoki Hirose ,  Mitsunori Tsuchiya ,  Atsushi Kawano ,  Kazuhisa Nakashita ,  Junichi Takeyama ,  Toshiji Hamatani

发明人： Shunpei Yamazaki ,  Shinji Imatou ,  Noriya Ishida ,  Mari Sasaki ,  Mitsunori Sakama ,  Takeshi Fukada ,  Naoki Hirose ,  Mitsunori Tsuchiya ,  Atsushi Kawano ,  Kazuhisa Nakashita ,  Junichi Takeyama ,  Toshiji Hamatani

IPC分类号： C23C16/517 ,  H01J37/32

CPC分类号： H01J37/3244 ,  C23C16/517 ,  H01J37/32082 ,  H01J37/32568 ,  H01J2237/3321

摘要： An improved apparatus and method for depositing thin films on a substrate. The apparatus utilizes two types of energy input. A pair of electrodes are provided in a reaction chamber and supplied with first AC electric energy at 1 to 100 MHz for generating a plasma gas in a reaction chamber therebetween. The substrate is mounted on a substrate holder to which second electric energy is supplied.

公开(公告)号：US5041201A

公开(公告)日：1991-08-20

申请号：US403821

申请日：1989-09-07

申请人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Shigenori Hayashi ,  Naoki Hirose ,  Noriya Ishida ,  Mari Sasaki ,  Atsushi Kawano

发明人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Shigenori Hayashi ,  Naoki Hirose ,  Noriya Ishida ,  Mari Sasaki ,  Atsushi Kawano

IPC分类号： C23C16/26 ,  C23C16/517

CPC分类号： C23C16/517 ,  C23C16/26

摘要： Plasma CVD method and apparatus are described. The apparatus comprises a vacuum chamber in which two pairs of electrodes are provided. A high frequency voltage is applied to one of the pairs in order to produce a plasma from a reactive gas in the chamber. A substrate to be coated is located between the other of the pairs. A relatively low frequency voltage is applied to the other pair of electrodes. By virtue of the low frequency voltage, the substrate is exposed to the bombardment of ions of the plasma during deposition. The bombardment functions to remove relatively soft portions of the depositing material.

公开(公告)号：US06191492B1

公开(公告)日：2001-02-20

申请号：US08161859

申请日：1993-12-06

申请人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

发明人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

IPC分类号： H01L2328

CPC分类号： H01L24/48 ,  H01L23/3135 ,  H01L23/49586 ,  H01L24/45 ,  H01L2224/05624 ,  H01L2224/29339 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2224/48624 ,  H01L2224/8592 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01007 ,  H01L2924/0101 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01045 ,  H01L2924/01047 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/05042 ,  H01L2924/00 ,  H01L2924/00012

摘要： An electronic device comprising a substrate having a frame, a metal lead and an electronic parts in a bonding structure, and a molding of an organic resin formed on the substrate, wherein the surface of the organic resin is provided with a hardened water-resistant or carbonaceous film or wherein pores at the surface of the organic resin are filled within an inactive gas such as argon because of a plasma treatment of the resin surface with the inactive gas whereby impurities are prevented from entering into the organic resin through the pores.

摘要翻译： 一种电子设备，包括具有框架，金属引线和接合结构中的电子部件的基板，以及在所述基板上形成的有机树脂的模制件，其中所述有机树脂的表面设置有硬化防水或 碳质膜或其中有机树脂表面的孔被填充在惰性气体如氩气中，因为用惰性气体等离子体处理树脂表面，从而防止杂质通过孔进入有机树脂。

公开(公告)号：US06756670B1

公开(公告)日：2004-06-29

申请号：US09698055

申请日：2000-10-30

申请人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

发明人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

IPC分类号： H01L2306

CPC分类号： H01L23/49586 ,  H01L21/56 ,  H01L23/29 ,  H01L23/3135 ,  H01L24/45 ,  H01L24/48 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48463 ,  H01L2224/8592 ,  H01L2924/01007 ,  H01L2924/0101 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/01079 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/05442 ,  H01L2924/05042 ,  H01L2924/00012

摘要： An electronic device comprising a substrate having a frame, a metal lead and an electronic parts in a bonding structure, and a molding of an organic resin formed on the substrate, wherein the surface of the organic resin is provided with a hardened water-resistant or carbonaceous film or wherein pores at the surface of the organic resin are filled within an inactive gas such as argon because of a plasma treatment of the resin surface with the inactive gas whereby impurities are prevented from entering into the organic resin through the pores.

摘要翻译： 一种电子设备，包括具有框架，金属引线和接合结构中的电子部件的基板，以及在所述基板上形成的有机树脂的模制件，其中所述有机树脂的表面设置有硬化防水或 碳质膜或其中有机树脂表面的孔被填充在惰性气体如氩气中，因为用惰性气体等离子体处理树脂表面，从而防止杂质通过孔进入有机树脂。

公开(公告)号：US5147822A

公开(公告)日：1992-09-15

申请号：US667231

申请日：1991-02-25

申请人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

发明人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

IPC分类号： H01L21/56 ,  H01L23/29 ,  H01L23/31 ,  H01L23/495

CPC分类号： H01L23/49586 ,  H01L21/56 ,  H01L23/29 ,  H01L23/3135 ,  H01L2224/32245 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48464 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2224/8592 ,  H01L24/45 ,  H01L24/48 ,  H01L2924/01007 ,  H01L2924/0101 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01029 ,  H01L2924/01079 ,  H01L2924/14 ,  H01L2924/181

摘要： An electronic device comprising a substrate having a frame, a metal lead and electronic parts in a bonding structure, and a molding of an organic resin formed on the substrate, wherein the surface of the organic resin is provided with a hardened water-resistant or carbonaceous film.

摘要翻译： 一种电子设备，包括具有框架，金属引线和接合结构中的电子部件的基板，以及在所述基板上形成的有机树脂的模制品，其中所述有机树脂的表面设置有硬化的耐水或含碳的 电影。

公开(公告)号：US5302226A

公开(公告)日：1994-04-12

申请号：US892710

申请日：1992-05-29

申请人： Shunpei Yamazaki ,  Naoki Hirose ,  Masaya Kadono ,  Kenji Itoh ,  Toru Takayama ,  Yasuyuki Arai ,  Noriya Ishida

发明人： Shunpei Yamazaki ,  Naoki Hirose ,  Masaya Kadono ,  Kenji Itoh ,  Toru Takayama ,  Yasuyuki Arai ,  Noriya Ishida

IPC分类号： H01J37/32 ,  H01L21/00

CPC分类号： H01J37/32449 ,  H01J37/32192 ,  H01J37/3244

摘要： A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.

摘要翻译： 微波辅助等离子体处理装置具有反应室，在该反应室中设置有用于支撑被处理基板的基板支架。 保持器与反应室的内部形成一致并且被设置为基本上分离反应室中的反应空间，除了其间的窄间隙，排出的气体从所述反应空间通过所述反应空间进入所述辅助空间。 通过这种结构，可以在反应室中形成高密度等离子体，而不会大量损失输入的微波能量。

公开(公告)号：US5609774A

公开(公告)日：1997-03-11

申请号：US194571

申请日：1994-02-10

申请人： Shunpei Yamazaki ,  Masaya Kadono ,  Kenji Itoh ,  Toru Takayama ,  Yasuyuki Arai ,  Noriya Ishida

发明人： Shunpei Yamazaki ,  Masaya Kadono ,  Kenji Itoh ,  Toru Takayama ,  Yasuyuki Arai ,  Noriya Ishida

IPC分类号： H01J37/32 ,  H01L21/302

CPC分类号： H01J37/32449 ,  H01J37/32192 ,  H01J37/3244

摘要： A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.

摘要翻译： 微波辅助等离子体处理装置具有反应室，在该反应室中设置有用于支撑被处理基板的基板支架。 保持器与反应室的内部形成一致并且被设置为基本上分离反应室中的反应空间，除了其间的窄间隙，排出的气体从所述反应空间通过所述反应空间进入所述辅助空间。 通过这种结构，可以在反应室中形成高密度等离子体，而不会大量损失输入的微波能量。

公开(公告)号：US5096851A

公开(公告)日：1992-03-17

申请号：US572331

申请日：1990-08-24

申请人： Shunpei Yamazaki ,  Noriya Ishida ,  Mitsunori Sakama ,  Mari Sasaki

发明人： Shunpei Yamazaki ,  Noriya Ishida ,  Mitsunori Sakama ,  Mari Sasaki

IPC分类号： H01L21/56 ,  H01L23/31

CPC分类号： H01L23/3135 ,  H01L21/56 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2224/8592 ,  H01L24/45 ,  H01L24/48 ,  H01L2924/00014 ,  H01L2924/01082 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/19041

摘要： An improved electric device and manufacturing method for the same are described. The device is for example an IC chip clothed in moulding. In advance of the moulding process, the IC chip is coated with silicon nitride in order to protect the IC chip from moisture invaded through cracks or gaps. The coating of silicon nitride is carried out by plasma CVD. Particularly, an AC voltage is applied to the IC chip during deposition for the purpose of obtaining an excellent property of the silicon nitride coating.