Compensated photonic device structure and fabrication method thereof

    公开(公告)号:US10340409B2

    公开(公告)日:2019-07-02

    申请号:US15612086

    申请日:2017-06-02

    IPC分类号: H01L31/107 H01L31/105

    摘要: Various embodiments of a compensated photonic device structure and fabrication method thereof are described herein. In one aspect, a photonic device may include a substrate and a functional layer disposed on the substrate. The substrate may be made of a first material and the functional layer may be made of a second material that is different from the first material. The photonic device may also include a compensation region formed at an interface region between the substrate and the functional layer. The compensation region may be doped with compensation dopants such that a first carrier concentration around the interface region of function layer is reduced and a second carrier concentration in a bulk region of functional layer is reduced.

    High performance surface illuminating GeSi photodiodes
    7.
    发明授权
    High performance surface illuminating GeSi photodiodes 有权
    高性能表面照明GeSi光电二极管

    公开(公告)号:US09000551B2

    公开(公告)日:2015-04-07

    申请号:US14194002

    申请日:2014-02-28

    CPC分类号: H01L31/1075 H01L31/02327

    摘要: A GeSi avalanche photodiode (APD includes an anti-reflection structure, a Ge absorption region, and a resonance cavity enhanced (RCE) reflector. The anti-reflection structure includes one or more dielectric layers and a top contact layer which is heavily doped with dopants of a first polarity. The RCE reflector includes: an intrinsic or lightly doped Si multiplication layer, a Si contact layer which is heavily doped with dopants of a second polarity opposite the first polarity, a Si cavity length compensation layer, a buried oxide (BOX) layer, and a Si substrate.

    摘要翻译: GeSi雪崩光电二极管(APD包括抗反射结构,Ge吸收区和谐振腔增强(RCE)反射器),抗反射结构包括一个或多个电介质层和重掺杂掺杂剂的顶部接触层 RCE反射器包括:本征或轻掺杂的Si倍增层,重掺杂有与第一极性相反的第二极性的掺杂剂的Si接触层,Si腔长度补偿层,掩埋氧化物(BOX )层和Si衬底。

    High Performance Surface Illuminating GeSi Photodiodes
    8.
    发明申请
    High Performance Surface Illuminating GeSi Photodiodes 有权
    高性能表面照明GeSi光电二极管

    公开(公告)号:US20140239301A1

    公开(公告)日:2014-08-28

    申请号:US14194002

    申请日:2014-02-28

    IPC分类号: H01L31/107 H01L31/0376

    CPC分类号: H01L31/1075 H01L31/02327

    摘要: A GeSi avalanche photodiode (APD includes an anti-reflection structure, a Ge absorption region, and a resonance cavity enhanced (RCE) reflector. The anti-reflection structure includes one or more dielectric layers and a top contact layer which is heavily doped with dopants of a first polarity. The RCE reflector includes: an intrinsic or lightly doped Si multiplication layer, a Si contact layer which is heavily doped with dopants of a second polarity opposite the first polarity, a Si cavity length compensation layer, a buried oxide (BOX) layer, and a Si substrate.

    摘要翻译: GeSi雪崩光电二极管(APD包括抗反射结构,Ge吸收区和谐振腔增强(RCE)反射器),抗反射结构包括一个或多个电介质层和重掺杂掺杂剂的顶部接触层 RCE反射器包括:本征或轻掺杂的Si倍增层,重掺杂有与第一极性相反的第二极性的掺杂剂的Si接触层,Si腔长度补偿层,掩埋氧化物(BOX )层和Si衬底。