利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

24 条记录 (耗时 0.027 秒)

    Conversion of unsaturated chemicals to oligomers
    2.
    发明申请
    Conversion of unsaturated chemicals to oligomers 失效
    不饱和化合物转化为低聚物

    公开(公告)号：US20050113620A1

    公开(公告)日：2005-05-26

    申请号：US11020427

    申请日：2004-12-22

    申请人： Stephen Brown ,  Robert Crane ,  Robert Saxton ,  William Weber

    发明人： Stephen Brown ,  Robert Crane ,  Robert Saxton ,  William Weber

    IPC分类号： C10G50/00 ,  C07C2/02

    CPC分类号： C10G50/02 ,  C10G50/00

    摘要： An oligomerization process in which hydrocarbon feedstocks are contacted with a hydrotreating catalyst in the absence of hydrogen and in the liquid phase. The catalyst is a heterogeneous catalyst selected from supported reduced metals, metals oxides, metal sulfides and combinations thereof. Preferred catalysts include mixed nickel and molybdenum oxides or mixed cobalt and molybdenum oxides. The process also oligomerizes sulfur compounds so that sulfur containing feedstocks can be treated without deactivating the catalysts.

    摘要翻译： 一种低聚方法，其中烃原料在不存在氢气和液相的情况下与加氢处理催化剂接触。 催化剂是选自负载的还原金属，金属氧化物，金属硫化物及其组合的多相催化剂。 优选的催化剂包括混合的镍和钼氧化物或混合的钴和钼氧化物。 该方法还使硫化合物低聚，使得含硫原料可以在不使催化剂失活的情况下进行处理。

    Box Closure Apparatus
    4.
    发明申请
    Box Closure Apparatus 有权
    封闭装置

    公开(公告)号：US20150344201A1

    公开(公告)日：2015-12-03

    申请号：US14290170

    申请日：2014-05-29

    申请人： Jason Weber ,  Arthur Weber ,  William Weber

    发明人： Jason Weber ,  Arthur Weber ,  William Weber

    IPC分类号： B65D45/00

    CPC分类号： B65D45/00 ,  B65D5/2066 ,  B65D5/643 ,  B65D5/6611

    摘要： A box closure apparatus is provided for securing flaps of a box in the closed position. The box closure apparatus comprises an upper flange, a bottom flange and a web. The flaps are secured by engaging the apparatus with two flaps and sliding the apparatus toward a third flap. The flaps are released by sliding the apparatus away from the third flap and raising the two side flaps.

    摘要翻译： 提供盒闭合装置用于将盒子的襟翼固定在关闭位置。 盒子封闭装置包括上凸缘，底部凸缘和腹板。 翼片通过将设备与两个翼片接合而固定，并将装置朝向第三翼片滑动。 通过将设备从第三挡板滑离并提升两个侧翼来释放翼片。

    Portable Retinal Camera and Image Acquisition Method
    5.
    发明申请
    Portable Retinal Camera and Image Acquisition Method 有权
    便携式视网膜摄像机和图像采集方法

    公开(公告)号：US20130033593A1

    公开(公告)日：2013-02-07

    申请号：US13645763

    申请日：2012-10-05

    申请人： Randal B. Chinnock ,  Fredrick G. Bargoot ,  George Grubner ,  Jason P. Julian ,  Sarah Latta ,  William Weber

    发明人： Randal B. Chinnock ,  Fredrick G. Bargoot ,  George Grubner ,  Jason P. Julian ,  Sarah Latta ,  William Weber

    IPC分类号： H04N7/18

    CPC分类号： A61B3/14 ,  A61B3/0091

    摘要： A camera for capturing an image of an object, for example an eye. The camera has at least two light sources and an image-sensing system having two image sensors. A multiple branch optical system transmits outgoing light from the light sources to the object, and transmits incoming light from the object to the image-sensing system. The multiple branch optical system includes an autofocusing element such as a variable power optical element that varies the focus of the incoming light. There is also an image display. There is a controller that controls the operation of the light sources, controls acquisition of images by the image-sensing system, and controls the display of images on the image display. The controller activates an autofocus light source and uses the resulting captured image to automatically adjust the image exposure parameters. The controller automatically adjusts the autofocusing element to improve the image focus, and then activates the second light source and acquires one or more images of the object while the second light source is activated.

    摘要翻译： 用于捕获物体（例如眼睛）的图像的照相机。 相机具有至少两个光源和具有两个图像传感器的图像感测系统。 多分支光学系统将来自光源的输出光发射到物体，并将来自物体的入射光发射到图像感测系统。 多分支光学系统包括诸如可变功率光学元件的自动聚焦元件，其改变入射光的焦点。 还有图像显示。 控制器控制光源的操作，控制图像感测系统的图像采集，并控制图像显示上的图像显示。 控制器激活自动对焦光源，并使用得到的拍摄图像自动调整图像曝光参数。 控制器自动调整自动对焦元件以改善图像焦点，然后激活第二个光源并在第二个光源激活时获取对象的一个​​或多个图像。

    Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
    8.
    发明授权
    Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them 有权
    光刻胶组合物，其硬化形式，其硬化图案和使用它们形成的金属图案

    公开(公告)号：US07282324B2

    公开(公告)日：2007-10-16

    申请号：US11028455

    申请日：2005-01-03

    申请人： William Weber ,  Satoshi Mori ,  Nao Honda

    发明人： William Weber ,  Satoshi Mori ,  Nao Honda

    IPC分类号： G03F7/40

    CPC分类号： G03F7/40 ,  G03F7/038

    摘要： Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of MEMS and micromachine devices. These photoresist compositions according to the invention comprise one or more epoxide-substituted, polycarboxylic acid Resin Component (A), one or more photoacid generator compounds (B), and one or more solvent (C).

    摘要翻译： 显示优异的光刻性能的光刻胶组合物和显示出优异的耐溶剂性的硬化抗蚀剂膜，在金属电沉积期间具有优异的耐电镀性，并且显示出优异的抗剥离特性。 根据本发明的这些光致抗蚀剂组合物非常适用于制造MEMS和微机械装置的应用。 根据本发明的这些光致抗蚀剂组合物包含一种或多种环氧化物取代的多元羧酸树脂组分（A），一种或多种光酸产生剂化合物（B）和一种或多种溶剂（C）。

    Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
    9.
    发明申请
    Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them 有权
    光刻胶组合物，其硬化形式，其硬化图案和使用它们形成的金属图案

    公开(公告)号：US20050147918A1

    公开(公告)日：2005-07-07

    申请号：US11028455

    申请日：2005-01-03

    申请人： William Weber ,  Satoshi Mori ,  Nao Honda

    发明人： William Weber ,  Satoshi Mori ,  Nao Honda

    IPC分类号： G03C1/76 ,  G03F7/038 ,  G03F7/40

    CPC分类号： G03F7/40 ,  G03F7/038

    摘要： Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of MEMS and micromachine devices. These photoresist compositions according to the invention comprise one or more epoxide-substituted, polycarboxylic acid Resin Component (A), one or more photoacid generator compounds (B), and one or more solvent (C).

    摘要翻译： 显示优异的光刻性能的光刻胶组合物和显示出优异的耐溶剂性的硬化抗蚀剂膜，在金属电沉积期间具有优异的耐电镀性，并且显示出优异的抗剥离特性。 根据本发明的这些光致抗蚀剂组合物非常适用于制造MEMS和微机械装置的应用。 根据本发明的这些光致抗蚀剂组合物包含一种或多种环氧化物取代的多元羧酸树脂组分（A），一种或多种光酸产生剂化合物（B）和一种或多种溶剂（C）。