WAFER LEVEL LENS ARRAYS FOR IMAGE SENSOR PACKAGES AND THE LIKE, IMAGE SENSOR PACKAGES, AND RELATED METHODS
    1.
    发明申请
    WAFER LEVEL LENS ARRAYS FOR IMAGE SENSOR PACKAGES AND THE LIKE, IMAGE SENSOR PACKAGES, AND RELATED METHODS 审中-公开
    图像传感器包装的像素水平镜头阵列和类似的图像传感器包以及相关方法

    公开(公告)号:US20080290435A1

    公开(公告)日:2008-11-27

    申请号:US11751206

    申请日:2007-05-21

    摘要: Image sensor packages, lenses therefore, and methods for fabrication are disclosed. A substrate having through-hole vias may be provided, and an array of lenses may be formed in the vias. The lenses may be formed by molding or by tenting material over the vias. An array of lenses may provide a color filter array (CFA). Filters of the CFA may be formed in the vias, and lenses may be formed in or over the vias on either side of the filters. A substrate may include an array of microlenses, and each microlens of the array may correspond to a pixel of an associated image sensor. In other embodiments, each lens of the array may correspond to an imager array of an image sensor. A wafer having an array of lenses may be aligned with and attached to an imager wafer comprising a plurality of image sensor dice, then singulated to form a plurality of image sensor packages.

    摘要翻译: 公开了图像传感器封装,透镜以及制造方法。 可以提供具有通孔过孔的衬底,并且可以在通孔中形成透镜阵列。 透镜可以通过模制或通过在通孔上的材料的凸起来形成。 透镜阵列可以提供滤色器阵列(CFA)。 可以在过孔中形成CFA的过滤器,并且透镜可以形成在过滤器两侧的通孔中或上方。 衬底可以包括微透镜阵列,并且阵列的每个微透镜可以对应于相关联的图像传感器的像素。 在其他实施例中,阵列的每个透镜可以对应于图像传感器的成像器阵列。 具有透镜阵列的晶片可以与包括多个图像传感器芯片的成像器晶片对准并且附接到成像器晶片,然后被单个化以形成多个图像传感器封装。

    Methods for thinning semiconductor substrates that employ support structures formed on the substrates
    7.
    发明授权
    Methods for thinning semiconductor substrates that employ support structures formed on the substrates 有权
    减薄采用在基板上形成的支撑结构的半导体衬底的方法

    公开(公告)号:US07713841B2

    公开(公告)日:2010-05-11

    申请号:US10666742

    申请日:2003-09-19

    IPC分类号: H01L21/46

    摘要: A support structure for use with a semiconductor substrate in thinning, or backgrinding, thereof, as well as during post-thinning processing of the semiconductor substrate includes a portion which extends substantially along and around an outer periphery of the semiconductor substrate to impart the thinned semiconductor substrate with rigidity. The support structure may be configured as a ring or as a member which substantially covers an active surface of the semiconductor substrate and forms a protective structure over each semiconductor device carried by the active surface. Assemblies that include the support structure and a semiconductor substrate are also within the scope of the present invention, as are methods for forming the support structures and thinning and post-thinning processes that include use of the support structures.

    摘要翻译: 在半导体衬底的薄化或后研磨以及后稀化处理期间与半导体衬底一起使用的支撑结构包括基本上沿半导体衬底的外周延伸并且围绕半导体衬底的外周延伸的部分,以使薄化半导体 基板具有刚性。 支撑结构可以被配置为环或作为基本上覆盖半导体衬底的有源表面并且在由有源表面承载的每个半导体器件上形成保护结构的构件。 包括支撑结构和半导体衬底的组件也在本发明的范围内,形成支撑结构的方法和包括使用支撑结构的减薄和后变薄工艺也是如此。