VERTICAL MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME
    4.
    发明申请
    VERTICAL MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME 有权
    垂直存储器件及其制造方法

    公开(公告)号:US20120098048A1

    公开(公告)日:2012-04-26

    申请号:US13221380

    申请日:2011-08-30

    IPC分类号: H01L29/792 H01L21/20

    CPC分类号: H01L27/11582 H01L29/7926

    摘要: A vertical memory device includes a channel, a ground selection line (GSL), word lines and a string selection line (SSL). The channel extends in a first direction substantially perpendicular to a top surface of a substrate, and a thickness of the channel is different according to height. The GSL, the word lines and the SSL are sequentially formed on a sidewall of the channel in the first direction and spaced apart from each other.

    摘要翻译: 垂直存储器件包括通道,接地选择线(GSL),字线和字符串选择线(SSL)。 通道沿基本上垂直于基板的顶表面的第一方向延伸,并且通道的厚度根据高度而不同。 GSL,字线和SSL顺序地形成在通道的第一方向的侧壁上并且彼此间隔开。