公开(公告)号：US09567263B2

公开(公告)日：2017-02-14

申请号：US14882067

申请日：2015-10-13

Applicant: TDK CORPORATION

Inventor： Raitarou Masaoka ,  Hiroki Uchiyama ,  Shohei Fujii ,  Noriko Ogasawara

IPC: C04B35/495 ,  H01B3/12 ,  C04B35/01 ,  C04B35/453 ,  H01B3/10 ,  C04B35/626

CPC classification number: C04B35/495 ,  C04B35/01 ,  C04B35/453 ,  C04B35/62685 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3251 ,  C04B2235/3279 ,  C04B2235/3284 ,  H01B3/10 ,  H01B3/12

Abstract: A dielectric composition contains a complex oxide represented by the formula of xAO-yB′O-zB″2O5 as the main component, wherein A represents at least one element selected from the group made of Ba, Ca and Sr, B′ represents at least one element selected from the group made of Mg, Zn and Ni, B″ represents at least one element selected from the group made of Nb and Ta, and x, y and z meet the following conditions, x+y+z=1.000, 0.375≦x≦0.563, 0.250≦y≦0.500, and x/3≦z≦x/3+1/9. An electronic component using the dielectric composition is also provided.

Abstract translation: 电介质组合物含有以式xAO-yB'O-zB“2O5表示的复合氧化物为主要成分，其中A表示选自Ba，Ca和Sr中的至少一种元素，B'至少表示 选自由Mg，Zn和Ni组成的组中的一种元素，B“表示选自Nb和Ta中的至少一种元素，x，y和z满足以下条件：x + y + z = 0.375≤x≤0.563,0.250≤y≤0.500，x /3≤z≤x/ 3 + 1/9。 还提供了使用电介质组合物的电子部件。

公开(公告)号：US11462339B2

公开(公告)日：2022-10-04

申请号：US16702280

申请日：2019-12-03

Applicant: TDK CORPORATION

Inventor： Saori Takahashi ,  Masahito Furukawa ,  Masamitsu Haemori ,  Hiroki Uchiyama ,  Wakiko Sato ,  Hitoshi Saita

IPC: H01B3/12 ,  H01G4/33 ,  H01G4/12 ,  H05K1/18 ,  H05K3/30

Abstract: A dielectric film may be exposed to an acid solution such as hydrochloric acid, nitric acid, or sulfuric acid during a wet process after film formation. The inventors have newly found that when a dielectric film includes Zr having a lower ionization tendency than Ti in a main component of a metal oxide expressed by a general formula (Ba, Ca)(Ti, Zr)O3 is provided and satisfies at least one between relationships such that degree of orientation of (100) plane is higher than degree of orientation of (110) plane, and degree of orientation of (111) plane is higher than degree of orientation of (110) plane in a film thickness direction, the dielectric film is less likely to be damaged during a wet process, and the resistance to a wet process is improved.

公开(公告)号：US10991510B2

公开(公告)日：2021-04-27

申请号：US16359824

申请日：2019-03-20

Applicant: TDK CORPORATION

Inventor： Saori Takahashi ,  Masahito Furukawa ,  Masamitsu Haemori ,  Hiroki Uchiyama ,  Wakiko Sato ,  Hitoshi Saita

IPC: H01G4/33 ,  H01G4/12

Abstract: A dielectric membrane may be exposed to an acid solution such as hydrochloric acid, nitric acid, or sulfuric acid during a wet process after membrane formation. The inventors have newly found that when a dielectric membrane includes Ca having a lower ionization tendency than Ba and Zr having a lower ionization tendency than Ti in a main component of a metal oxide expressed by a general formula (Ba, Ca)(Ti, Zr)O3 and satisfies at least one of degree of orientation of (100) plane>degree of orientation of (110) plane and degree of orientation of (111) plane>degree of orientation of (110) plane in a membrane thickness direction, the dielectric membrane is less likely to be damaged during a wet process, and the resistance to a wet process is improved.

公开(公告)号：US09748018B2

公开(公告)日：2017-08-29

申请号：US15192293

申请日：2016-06-24

Applicant: TDK CORPORATION

Inventor： Raitarou Masaoka ,  Hiroki Uchiyama ,  Shohei Fujii ,  Maiko Shirokawa

IPC: C04B35/495 ,  H01B3/10 ,  H01B3/12 ,  C01G35/00 ,  H01G4/33 ,  H01G4/12 ,  H01G4/10

CPC classification number: H01B3/10 ,  C01G35/006 ,  C01P2006/40 ,  C04B35/495 ,  C04B35/62645 ,  C04B35/62685 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/6565 ,  C04B2235/6567 ,  C23C14/08 ,  H01B3/12 ,  H01G4/10 ,  H01G4/1254 ,  H01G4/33

Abstract: A dielectric composition containing a complex oxide represented by the formula of xAO-yBO-zC2O5 as the main component, wherein A represents at least one element selected from the group including Ba, Ca and Sr, B represents Mg, and C represents at least one element selected from the group including Nb and Ta, and x, y and z meet the following conditions, x+y+z=1.000, 0.198≦x≦0.375, 0.389≦y≦0.625, and x/3≦z≦x/3+1/9.

公开(公告)号：US09745225B2

公开(公告)日：2017-08-29

申请号：US15192322

申请日：2016-06-24

Applicant: TDK CORPORATION

Inventor： Raitarou Masaoka ,  Hiroki Uchiyama ,  Shohei Fujii ,  Maiko Shirokawa

IPC: C04B35/495 ,  H01B3/10 ,  H01B3/12 ,  H01G4/33 ,  H01G4/12 ,  H01G4/10

CPC classification number: C04B35/495 ,  C01F5/00 ,  C01F11/00 ,  C01G15/006 ,  C01G33/006 ,  C01G35/006 ,  C01P2002/50 ,  C01P2004/03 ,  C01P2006/40 ,  C04B35/62685 ,  C04B35/638 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3255 ,  C04B2235/6562 ,  C04B2235/6567 ,  H01B3/10 ,  H01B3/12 ,  H01G4/10 ,  H01G4/1254 ,  H01G4/33

Abstract: A dielectric composition containing a complex oxide represented by the formula of xAO-yBO-zC2O5 as the main component, wherein A represents at least one element selected from the group including Ba, Ca and Sr, B represents Mg, and C represents at least one element selected from the group including Nb and Ta, and x, y and z meet the following conditions, x+y+z=1.000, 0.000

公开(公告)号：US10121592B2

公开(公告)日：2018-11-06

申请号：US15459609

申请日：2017-03-15

Applicant: TDK CORPORATION

Inventor： Maiko Shirokawa ,  Raitarou Masaoka ,  Hiroki Uchiyama ,  Shohei Fujii

IPC: B32B15/04 ,  H01G4/10 ,  H01P7/10 ,  H03H1/00 ,  C23C14/08 ,  C04B35/053 ,  H01G4/33 ,  H01G4/12 ,  C23C14/34 ,  H01B3/12

Abstract: A dielectric thin film containing MgO as a main component, wherein the dielectric thin film is composed of a columnar structure group containing at least one columnar structure A constructed by single crystal and at least one columnar structure B constructed by polycrystal, respectively, and in the cross section of the direction perpendicular to the dielectric thin film, when the area occupied by the columnar structure A is set as CA and the area occupied by the columnar structure B is set as CB, the relationship between CA and CB satisfies 0.4≤CB/CA≤1.1.

公开(公告)号：US09862646B2

公开(公告)日：2018-01-09

申请号：US15278725

申请日：2016-09-28

Applicant: TDK CORPORATION

Inventor： Shohei Fujii ,  Raitarou Masaoka ,  Hiroki Uchiyama ,  Maiko Shirokawa

IPC: C04B35/01 ,  C04B35/495 ,  H01G4/08 ,  H01G4/33 ,  C04B35/057 ,  H01G4/12 ,  H01L49/02 ,  C01G33/00 ,  C01G35/00 ,  C01F11/02

CPC classification number: C04B35/057 ,  C01F11/02 ,  C01G33/006 ,  C01G35/006 ,  C01P2006/40 ,  C04B35/01 ,  C04B35/495 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3251 ,  C04B2235/3255 ,  C04B2235/6562 ,  C04B2235/6567 ,  H01G4/1254 ,  H01G4/33 ,  H01L27/11582 ,  H01L28/00 ,  H01L28/55

Abstract: A dielectric composition containing a complex oxide represented by the formula of AαBβC2γOα+β+5γ as the main component, wherein A represents Ba, B represents at least one element selected from the group consisting of Ca and Sr, C represents at least one element selected from the group consisting of Ta and Nb, and α, β and γ meet the following conditions, i.e., α+β+γ=1.000, 0.000

公开(公告)号：US10035711B2

公开(公告)日：2018-07-31

申请号：US15459306

申请日：2017-03-15

Applicant: TDK CORPORATION

Inventor： Hiroki Uchiyama ,  Raitarou Masaoka ,  Shohei Fujii ,  Maiko Shirokawa

IPC: C04B35/03 ,  C01F11/02 ,  C01F5/02 ,  C04B35/04 ,  C04B35/057 ,  C04B35/622 ,  C23C14/08 ,  C23C14/18 ,  C23C14/34 ,  H01G4/10 ,  H01G4/33 ,  C04B35/486 ,  H01G4/08 ,  H01G4/12 ,  H01L21/02 ,  H01L49/02

CPC classification number: C01F11/02 ,  C01F5/02 ,  C01P2002/74 ,  C04B35/01 ,  C04B35/03 ,  C04B35/04 ,  C04B35/057 ,  C04B35/486 ,  C04B35/62218 ,  C04B2235/3205 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3236 ,  C04B2235/3239 ,  C04B2235/3244 ,  C04B2235/3248 ,  C04B2235/3255 ,  C04B2235/3284 ,  C04B2235/762 ,  C04B2235/787 ,  C23C14/082 ,  C23C14/185 ,  C23C14/3414 ,  H01G4/085 ,  H01G4/10 ,  H01G4/1227 ,  H01G4/33 ,  H01L21/02175 ,  H01L21/02194 ,  H01L21/02266 ,  H01L28/55

Abstract: A dielectric film containing an alkaline earth metal oxide having a NaCl type crystal structure as a main component, wherein the dielectric film has a (111)-oriented columnar structure in a direction perpendicular to the surface of the dielectric film, and in a Cu—Kα X-ray diffraction chart of the dielectric film, a half width of the diffraction peak of (111) is in a range of from 0.3° to 2.0°.

公开(公告)号：US09643890B2

公开(公告)日：2017-05-09

申请号：US14661881

申请日：2015-03-18

Applicant: TDK CORPORATION

Inventor： Raitarou Masaoka ,  Toshihiko Kaneko ,  Yuki Yamashita ,  Hiroki Uchiyama ,  Saori Takeda ,  Yuji Sezai ,  Shirou Ootsuki

IPC: C04B35/48 ,  C04B35/49 ,  C04B35/465 ,  H01B3/12 ,  C04B35/47 ,  C04B35/486 ,  C04B35/638

CPC classification number: C04B35/49 ,  C04B35/47 ,  C04B35/48 ,  C04B35/486 ,  C04B35/638 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/6562 ,  C04B2235/79 ,  C04B2235/80 ,  H01B3/12

Abstract: A dielectric composition contains major components that are an A-group containing major components that are at least two selected from the group consisting of Ba, Ca, and Sr and a B-group which contains a major component that is selected from Zr and Ti and which contains at least Zr. The dielectric composition contains an amorphous substance containing the A-group and the B-group and a crystalline substance containing the A-group and the B-group. In the dielectric composition, the inequality 0.5≦α≦1.5 holds, where α is the molar ratio of the A-group to the B-group.