-
公开(公告)号:US20240331771A1
公开(公告)日:2024-10-03
申请号:US18741201
申请日:2024-06-12
发明人: Meng-Sheng Chang , Chia-En HUANG , Yi-Ching LIU , Yih WANG
IPC分类号: G11C13/00
CPC分类号: G11C13/004 , G11C13/0026 , G11C13/0028 , G11C13/003
摘要: Disclosed herein are systems, methods and apparatuses related to a memory array. In one aspect, the memory array includes a set of resistive storage circuits including a first subset of resistive storage circuits connected between a first local line and a second local line in parallel. The first local line and the second local line may extend along a first direction. In one aspect, for each resistive storage circuit of the first subset of resistive storage circuits, current injected at a first common entry point of the first local line exits through a first common exit point of the second local line, such that each resistive storage circuit of the first subset of resistive storage circuits may have same or substantial equal resistive loading.
-
公开(公告)号:US20240297115A1
公开(公告)日:2024-09-05
申请号:US18333189
申请日:2023-06-12
IPC分类号: H01L23/525 , G11C17/16 , H01L23/522 , H01L23/528 , H10B20/25
CPC分类号: H01L23/5256 , G11C17/16 , H01L23/5226 , H01L23/5283 , H10B20/25 , H01L29/0673 , H01L29/42392 , H01L29/66439 , H01L29/66545 , H01L29/775 , H01L29/78696
摘要: A semiconductor structure includes a substrate having a first surface and a second surface opposite the first surface. The semiconductor structure includes a semiconductor device disposed on the first surface. The semiconductor structure includes a metallization layer disposed on the second surface. The semiconductor structure includes a first conductive via and a second conductive via coupled in parallel to the metallization layer, the first conductive via and the second conductive via extending from the second side toward the first side. The semiconductor structure further includes an electrical fuse disposed over the semiconductor device and coupled to the first and second conductive vias.
-
公开(公告)号:US12080641B2
公开(公告)日:2024-09-03
申请号:US18489674
申请日:2023-10-18
发明人: Chien-Ying Chen , Yen-Jen Chen , Yao-Jen Yang , Meng-Sheng Chang , Chia-En Huang
IPC分类号: G11C29/02 , G11C17/16 , H01L23/48 , H01L23/525 , H10B20/20
CPC分类号: H01L23/5256 , G11C17/16 , H01L23/481 , H10B20/20 , G11C29/027
摘要: An integrated circuit includes a transistor formed in a semiconductor structure, a front-side horizontal conducting line in a first metal layer above the semiconductor structure, and a front-side vertical conducting line in a second metal layer above the first metal layer. The front-side horizontal conducting line is directly connected to a first terminal of the transistor, and the front-side vertical conducting line is directly connected to the front-side horizontal conducting line. In the integrated circuit, a front-side fuse element is conductively connected to the front-side vertical conducting line, and a backside conducting line is directly connected to a second terminal of the transistor. A word connection line extending in the first direction is directly connected to a gate terminal of the transistor.
-
公开(公告)号:US12014796B2
公开(公告)日:2024-06-18
申请号:US17669628
申请日:2022-02-11
发明人: Meng-Sheng Chang , Ku-Feng Lin
CPC分类号: G11C7/1012 , G11C7/06 , G11C7/1063 , G11C7/109 , G11C7/1096 , G11C8/08
摘要: A memory device includes a plurality of memory cells including a first memory cell and a second memory cell, a first bit line connected to the first memory cell, a second bit line connected to the second memory cell, a first word line connected to the first and second memory cells, a first control transistor connected to the first bit line, a second control transistor connected to second bit line, a first mux transistor commonly connected to the first and second control transistors, and a sense amplifier connected to the first mux transistor.
-
公开(公告)号:US20240146305A1
公开(公告)日:2024-05-02
申请号:US18170408
申请日:2023-02-16
发明人: Ting-Yu Yu , Meng-Sheng Chang , Shao-Yu Chou
IPC分类号: H03K19/0185 , H03K19/20
CPC分类号: H03K19/018521 , H03K19/20
摘要: The present disclosure includes a voltage provision circuit. In one aspect of the present disclosure, a voltage provision circuit is disclosed. The voltage provision circuit includes a first NMOS transistor gated with a first control signal and sourced with a ground voltage. The voltage provision circuit includes a second NMOS transistor gated with a second control signal complementary to the first control signal and sourced with the ground voltage. The voltage provision circuit includes a first PMOS transistor sourced with a first supply voltage. The voltage provision circuit includes a second PMOS transistor sourced with the first supply voltage. The voltage provision circuit includes a voltage modulation circuit, coupled between the first to second PMOS transistors and the first to second NMOS transistors, that is configured to provide a first intermediate signal based on the first and second control signals. In some embodiments, the first intermediate signal has a first logic state corresponding to the first supply voltage and a second logic state corresponding to a second supply voltage that is a fraction of the first supply voltage.
-
公开(公告)号:US11950411B2
公开(公告)日:2024-04-02
申请号:US17473636
申请日:2021-09-13
发明人: Meng-Sheng Chang , Chia-En Huang
IPC分类号: H01L27/112 , H01L29/06 , H10B20/20
CPC分类号: H10B20/20 , H01L29/0665
摘要: A semiconductor device includes a plurality of first nanostructures extending along a first lateral direction. The semiconductor device includes a first epitaxial structure and second epitaxial structure respectively coupled to ends of each of the plurality of first nanostructures along the first lateral direction. The semiconductor device includes a dielectric fin structure disposed immediately next to a sidewall of each of the plurality of first nanostructures facing a second lateral direction perpendicular to the first lateral direction. The semiconductor device includes a first gate structure wrapping around each of the plurality of first nanostructures except for the sidewalls of the first nanostructures. The semiconductor device includes a metal structure disposed above the first gate structure and coupled to one of the first or second epitaxial structure.
-
公开(公告)号:US11844209B2
公开(公告)日:2023-12-12
申请号:US16842693
申请日:2020-04-07
发明人: Meng-Sheng Chang , Chia-En Huang
IPC分类号: H10B20/20 , G11C7/18 , H01L23/525 , H01L23/522 , H01L23/528 , G11C8/14
CPC分类号: H10B20/20 , G11C7/18 , G11C8/14 , H01L23/5226 , H01L23/5252 , H01L23/5283
摘要: A memory cell includes: a first transistor, having a first diffusion region coupled to a bit line and a first gate electrode coupled to a first word line; a second transistor, having a second diffusion region coupled to the bit line and a second gate electrode coupled to a second word line; and a third transistor, having a third diffusion region coupled to a fourth diffusion region of the first transistor, a fifth diffusion region coupled to a sixth diffusion region of the second transistor, and a third gate electrode coupled to a third word line; wherein the first transistor is arranged to have a first threshold voltage, the second transistor is arranged to have a second threshold voltage, and the second threshold voltage is different from the first threshold voltage.
-
公开(公告)号:US11837539B2
公开(公告)日:2023-12-05
申请号:US17412999
申请日:2021-08-26
发明人: Chien-Ying Chen , Yen-Jen Chen , Yao-Jen Yang , Meng-Sheng Chang , Chia-En Huang
IPC分类号: G11C29/02 , H01L23/525 , G11C17/16 , H01L23/48 , H10B20/20
CPC分类号: H01L23/5256 , G11C17/16 , H01L23/481 , H10B20/20 , G11C29/027
摘要: An integrated circuit includes a front-side horizontal conducting line in a first metal layer, a front-side vertical conducting line in a second metal layer, a front-side fuse element, and a backside conducting line. The front-side horizontal conducting line is directly connected to the drain terminal-conductor of a transistor through a front-side terminal via-connector. The front-side vertical conducting line is directly connected to the front-side horizontal conducting line through a front-side metal-to-metal via-connector. The front-side fuse element having a first fuse terminal conductively connected to the front-side vertical conducting line. The backside conducting line is directly connected to the source terminal-conductor of the transistor through a backside terminal via-connector.
-
公开(公告)号:US20230386579A1
公开(公告)日:2023-11-30
申请号:US18232539
申请日:2023-08-10
发明人: Meng-Sheng Chang , Chia-En Huang , Yi-Ching Liu , Yih Wang
CPC分类号: G11C16/102 , G11C16/26 , G11C16/0433 , G11C16/3404 , G11C16/24
摘要: Disclosed herein are related to a memory array including one-time programmable (OTP) cells. In one aspect, the memory array includes a first set of one-time programmable (OTP) cells connected between a first program control line and a first bit line. Each OTP cell of the first set of OTP cells includes a programmable storage device and a switch connected between the first program control line and the first bit line. The first program control line extends towards a first side of the memory array along a first direction. The first bit line extends towards a second side of the memory array facing away from the first side of the memory array. Each switch of the first set of OTP cells includes a gate electrode coupled to a corresponding read control line extending along a second direction traversing the first direction.
-
公开(公告)号:US20230377654A1
公开(公告)日:2023-11-23
申请号:US18362198
申请日:2023-07-31
发明人: Meng-Sheng Chang , Chia-En Huang
CPC分类号: G11C16/0483 , G11C17/165 , G11C16/12
摘要: In some aspects of the present disclosure, a memory circuit is disclosed. In some aspects, the memory circuit includes a first memory cell including a first resistor; and a first transistor coupled to the first resistor, wherein a first bulk port of the first transistor is biased at a first voltage level; a second memory cell coupled to the first memory cell, the second memory cell including a second resistor; and a second transistor coupled to the second memory cell, wherein a second bulk port of the second transistor is biased at a second voltage level, wherein the second voltage level is less than the first voltage level.
-
-
-
-
-
-
-
-
-