Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System
    1.
    发明申请
    Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System 审中-公开
    磁控溅射系统的磁体结构和阴极电极单元,以及磁控溅射系统

    公开(公告)号:US20090229977A1

    公开(公告)日:2009-09-17

    申请号:US12090465

    申请日:2006-11-02

    IPC分类号: C23C14/35

    摘要: Provided are a magnet structure and the like capable of changing a magnetic force line distribution on a surface of a target to thereby achieve wide erosion of a target, using a simple drive mechanism. A magnet structure (110) comprises a main magnet (10, 13) disposed at a reverse surface (20B) side of a target (20) to produce a main magnetic force line reaching an obverse surface (20A) of the target, an adjustment magnet (11) disposed at the reverse surface (20B) side of the target (20) to produce an adjustment magnetic force line for changing a magnetic flux density distribution produced by the main magnetic force line, a magnetic path (21A, 21B, 24) of the adjustment magnetic force line which is disposed at the reverse surface (20B) side of the target 20, and a magnetic field adjustment means (12, 14) configured to be able to change strength of the adjustment magnetic force line passing through inside of the magnetic path (21A, 21B, 24).

    摘要翻译: 提供了能够使用简单的驱动机构改变目标表面上的磁力线分布从而实现目标的广泛侵蚀的磁体结构等。 磁体结构(110)包括设置在目标(20)的反面(20B)侧的主磁体(10,13),以产生到达目标的正面(20A)的主磁力线,调节 设置在所述目标(20)的所述反面(20B)侧的磁体(11),以产生用于改变由所述主磁力线产生的磁通密度分布的调节磁力线,磁路(21A,21B,24 )设置在靶20的反面(20B)侧的调整用磁力线以及能够改变通过内侧的调节用磁力线的强度的磁场调整单元(12,14) 的磁路(21A,21B,24)。

    Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering, and Magnetron Sputtering System
    2.
    发明申请
    Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering, and Magnetron Sputtering System 有权
    用于磁控溅射的磁体结构和阴极电极单元和磁控溅射系统

    公开(公告)号:US20100230282A1

    公开(公告)日:2010-09-16

    申请号:US12067908

    申请日:2006-08-23

    IPC分类号: C23C14/35

    摘要: A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure (110) includes: inner and outer magnets (10 and 13) positioned at a reverse surface side of a target (20) to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (20A) of the target (20); a pair of intermediate magnets (11 and 12) positioned at the reverse surface side of the target (20) and between the inner and outer magnets (10 and 13) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member (24) positioned at the reverse surface side of the target (20) to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (11 and 12) into an end surface of the other, the magnetic member (24) being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target (20) in association with the inner magnet (10) or the outer magnet (L3).

    摘要翻译: 提供了磁体结构等,其可以减少制造磁体设计所需的劳动,以便以目标的正面以良好平衡的方式产生用于等离子体约束的隧道状泄漏磁场,基于四向 由多个磁体之间的磁相互作用产生的磁场。 磁体结构(110)包括:位于目标(20)的反面侧的内外磁体(10和13),以具有不同的磁矩取向,用于产生到达正面(20A)的第一磁力线 目标(20); 位于目标(20)的反面侧并且在内磁体(10和13)之间的一对中间磁体(11和12)具有不同的磁矩取向,以产生作用于 取消由第一磁力线产生的宽度方向磁通密度分量; 以及定位在所述靶(20)的所述反面侧的磁性构件(24),以将从所述一对中间磁体(11和12)中的一个的端面发出的所述第二磁力线引导到所述一对中间磁体 另一方面,磁性构件(24)被构造为产生与内磁体(10)或外磁体(L3)相关联地到达目标(20)的厚度方向的中间点的磁力线。

    Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system
    3.
    发明授权
    Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system 有权
    用于磁控溅射的磁体结构和阴极单元,以及磁控溅射系统

    公开(公告)号:US08608918B2

    公开(公告)日:2013-12-17

    申请号:US12067908

    申请日:2006-08-23

    IPC分类号: H01J37/34

    摘要: A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure (110) includes: inner and outer magnets (10 and 13) positioned at a reverse surface side of a target (20) to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (20A) of the target (20); a pair of intermediate magnets (11 and 12) positioned at the reverse surface side of the target (20) and between the inner and outer magnets (10 and 13) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member (24) positioned at the reverse surface side of the target (20) to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (11 and 12) into an end surface of the other, the magnetic member (24) being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target (20) in association with the inner magnet (10) or the outer magnet (13).

    摘要翻译: 提供了磁体结构等,其可以减少制造磁体设计所需的劳动,以便以目标的正面以良好平衡的方式产生用于等离子体约束的隧道状泄漏磁场,基于四向 由多个磁体之间的磁相互作用产生的磁场。 磁体结构(110)包括:位于目标(20)的反面侧的内外磁体(10和13),以具有不同的磁矩取向,用于产生到达正面(20A)的第一磁力线 目标(20); 位于目标(20)的反面侧并且在内磁体(10和13)之间的一对中间磁体(11和12)具有不同的磁矩取向,以产生作用于 取消由第一磁力线产生的宽度方向磁通密度分量; 以及定位在所述靶(20)的所述反面侧的磁性构件(24),以将从所述一对中间磁体(11和12)中的一个的端面发出的所述第二磁力线引导到所述一对中间磁体 另一方面,磁性构件(24)构造成产生与内磁体(10)或外磁体(13)相关联地到达靶(20)的厚度方向的中间点的磁力线。

    Vacuum film deposition method and system, and filter manufactured by using the same
    4.
    发明申请
    Vacuum film deposition method and system, and filter manufactured by using the same 审中-公开
    真空膜沉积方法和系统,以及使用该过滤器制造的过滤器

    公开(公告)号:US20070098889A1

    公开(公告)日:2007-05-03

    申请号:US10570449

    申请日:2004-08-30

    IPC分类号: C23C16/00 B05D3/00

    摘要: A vacuum film deposition method comprises the steps of mounting a substrate on a substrate holder (6a) that is disposed in a vacuum chamber (1) and is provided with a passage (7f), (7g), and (7j) in which predetermined heat medium flows; maintaining an inside of the vacuum chamber substantially in vacuum state; evaporating evaporation materials from two or more evaporation sources in the inside of the vacuum chamber; and diffusing the evaporated evaporation materials in the inside of the vacuum chamber in a predetermined order; and depositing the diffused evaporation materials on a deposition surface of the substrate, thereby forming a multi-layered film made of the evaporation materials on the deposition surface of the substrate; wherein an antifreezing fluid is used as the predetermined heat medium flowing in the passage of the substrate holder.

    摘要翻译: 真空膜沉积方法包括以下步骤:将基板安装在设置在真空室(1)中的基板保持器(6a)上,并设置有通道(7f),(7g)和(7j) ),其中预定的热介质流动; 在真空状态下保持真空室的内部; 从真空室内部的两个或更多个蒸发源蒸发蒸发材料; 并以预定的顺序将蒸发的蒸发材料扩散到真空室的内部; 并将扩散的蒸发材料沉积在基板的沉积表面上,由此在基板的沉积表面上形成由蒸发材料制成的多层膜; 其中使用防冻流体作为在所述基板保持器的通道中流动的预定热介质。

    Gas separator and operating method for the same
    5.
    发明授权
    Gas separator and operating method for the same 有权
    气体分离器和操作方法相同

    公开(公告)号:US07985279B2

    公开(公告)日:2011-07-26

    申请号:US11579822

    申请日:2005-05-16

    IPC分类号: B01D53/22

    CPC分类号: B01D53/22 H01M8/04126

    摘要: A gas separator having excellent humidifying performance, pressure loss, volume efficiency, and durability humidifies gases used in an on-vehicle fuel cell. The gas separator has upper and lower surfaces of pleat elements of a pleat molding covered by a plate having intake and exhaust ports. The pleat molding is formed by pleating a compound membrane formed of a gas separating membrane and at least one layer of permeable reinforcement material. The pleat element is formed by disposing a reinforcement frame at the outer side part of the molding. The ratio (R=L/H) of a shortest distance (L) between the intake and exhaust ports to a height (H) of the pleat molding is 0.1 to 7.0, and the ratio (W/Le) of the width (W) to the length (Le) of the pleat molding is 0.3 to 10.0. The gas separator operates at a volume flow ratio of 200 or higher.

    摘要翻译: 具有优异的加湿性能,压力损失,体积效率和耐久性的气体分离器加湿车载燃料电池中使用的气体。 气体分离器具有由具有进气和排气口的板覆盖的褶皱成形体的褶皱元件的上表面和下表面。 褶皱成型通过对由气体分离膜和至少一层可渗透增强材料形成的复合膜进行打褶而形成。 褶皱元件通过在模制品的外侧部分设置加强框架而形成。 进气口和排气口之间的最短距离(L)与褶皱成型体的高度(H)的比(R = L / H)为0.1〜7.0,宽度(W / Le) )与褶皱成型体的长度(Le)为0.3〜10.0。 气体分离器以200或更高的体积流量比运行。

    Gas Separation Membrane
    6.
    发明申请
    Gas Separation Membrane 有权
    气体分离膜

    公开(公告)号:US20090301307A1

    公开(公告)日:2009-12-10

    申请号:US12298447

    申请日:2007-04-25

    IPC分类号: B01D53/22 B01D67/00

    摘要: A gas separation membrane has: a polymeric microporous membrane which has a polyolefin as a main component, and which is manufactured by wet phase separation process, and has a porosity of 20 to 80%, an average pore diameter of 1 to 100 nm and a piercing strength at 100° C. of 2 to 50 N; and a gas-separating thin film, which is provided on at least one surface, and/or the interior of the polymeric microporous membrane, and which comprises a fluorine-containing gas-separating resin as a main component, and has an average thickness of 0.01 μm to less than 0.4 μm. The gas separation membrane having an oxygen-nitrogen separation factor not smaller than 1.4.

    摘要翻译: 气体分离膜具有聚烯烃作为主要成分的聚合物微孔膜,其通过湿相分离法制造,孔隙率为20〜80%,平均孔径为1〜100nm, 刺穿强度为100°C,2〜50 N; 以及气体分离薄膜,其设置在聚合物微孔膜的至少一个表面和/或内部,并且包含含氟气体分离树脂作为主要成分,并且具有平均厚度 0.01毫米至小于0.4毫米。 具有不小于1.4的氧 - 氮分离因子的气体分离膜。

    Humidifier
    7.
    发明申请
    Humidifier 有权
    加湿器

    公开(公告)号:US20070007674A1

    公开(公告)日:2007-01-11

    申请号:US10558639

    申请日:2004-05-28

    IPC分类号: B01F3/04

    CPC分类号: B01J47/12 H01M8/04119

    摘要: A humidifying apparatus comprising: a pleated functional element comprising a pleated structure and, secured to the pleated structure around a periphery thereof, a reinforcing frame, wherein the pleated structure is comprised of a humidifying membrane and, superimposed on at least one surface thereof, a gas-permeable reinforcing material layer, and a dry-side channel and a wet-side channel which are, respectively, provided on opposite sides of the pleated functional element, wherein each of the dry-side channel and the wet-side channel has at least one pair of a gas-intake and a gas-outlet, the humidifying apparatus having a first pressure-buffering means between the gas-intake and an outside conduit connected thereto and a second pressure-buffering means between the gas-outlet and an outside conduit connected thereto, wherein the humidifying membrane divides the internal space of the pleated functional element into spaces which form a part or whole of the dry-side channel and a part or whole of the wet-side channel, respectively.

    摘要翻译: 一种加湿装置,包括:打褶功能元件,其包括褶皱结构,并且在其周围的褶边结构周围固定有加强框架,其中所述褶皱结构由加湿膜构成,并且在其至少一个表面上叠加 透气性增强材料层,以及分别设置在打褶功能元件的相对侧的干侧通道和湿侧通道,其中干侧通道和湿侧通道中的每一个具有 至少一对气体入口和气体出口,所述加湿装置具有在所述进气口和与其连接的外部导管之间的第一压力缓冲装置,以及在所述气体出口与外部的外部之间的第二压力缓冲装置 连接到其上的导管,其中加湿膜将打褶的功能元件的内部空间分成形成干侧通道的一部分或整体的空间, r整个湿侧通道。

    Short circuit-resistant polyethylene microporous film
    8.
    发明授权
    Short circuit-resistant polyethylene microporous film 失效
    耐短路聚乙烯微孔薄膜

    公开(公告)号:US6054498A

    公开(公告)日:2000-04-25

    申请号:US91737

    申请日:1998-06-24

    IPC分类号: C08J5/18 H01M2/16 C08J9/28

    CPC分类号: H01M2/1653

    摘要: A microporous film comprising a high-density polyethylene and a linear copolymer polyethylene and having a terminal vinyl group concentration of 2 or more per 10,000 carbon atoms in the polyethylene, as measured by an infrared spectroscopic method.

    摘要翻译: PCT No.PCT / JP96 / 03783 Sec。 371日期:1998年6月24日 102(e)1998年6月24日PCT 1996年12月25日PCT PCT。 公开号WO97 / 23554 日期1997年7月3日利用红外光谱法测定的包含聚乙烯中高密度聚乙烯和线型共聚物聚乙烯的聚乙烯末端乙烯基浓度为每10,000个碳原子数为2以上的微多孔膜。

    Microporous polyolefin film
    9.
    发明授权
    Microporous polyolefin film 有权
    微孔聚烯烃膜

    公开(公告)号:US07618743B2

    公开(公告)日:2009-11-17

    申请号:US10551465

    申请日:2004-04-02

    IPC分类号: H01M2/16 H01M4/58

    摘要: A microporous polyolefin film that comprises polyethylene and polypropylene as essential components and is composed of a laminate film of two or more layers, wherein the percentage of polypropylene blended in at least one surface layer of the film is more than 50% by weight and 95% by weight or less and the content of polyethylene in the entire film is 50% or more and 95% or less.

    摘要翻译: 一种微孔聚烯烃膜,其包含聚乙烯和聚丙烯作为必要组分,并且由两层或多层的层压膜组成,其中在所述膜的至少一个表面层中共混的聚丙烯的百分比大于50重量%且95重量% 以下,整个膜中的聚乙烯的含量为50%以上且95%以下。

    Microporous polyolefin film
    10.
    发明申请
    Microporous polyolefin film 审中-公开
    微孔聚烯烃膜

    公开(公告)号:US20070015876A1

    公开(公告)日:2007-01-18

    申请号:US10574613

    申请日:2004-09-21

    IPC分类号: B29C47/88 C08L23/04

    摘要: A microporous polyolefin film which comprises 5 to 95 wt. % polyethylene (A) having a viscosity-average molecular weight (Mv) of 2,000,000 or higher, a first-melting-peak signal height as determined by DSC (differential scanning calorimetry) of 3.0 mW/mg or higher, a specific surface area of 0.7 m2/g or larger, and an average particle diameter of 1 to 150 μm and 95 to 5 wt. % polyethylene (B) having an Mw of 10,000 to 200,000, excluding 10,000 and 200,000, wherein the ratio of the Mv of the compound (A) to that of the compound (B), (A)/(B), is 10 or higher, the film as a whole has a molecular weight of 300,000 to 1,500,000, and the film has a fuse temperature of 120 to 140° C., a breaking temperature of 150° C. or higher, and a ratio of the piercing strength at 25° C. to the piercing strength at 140° C. of from 0.01 to 0.25.

    摘要翻译: 一种微孔聚烯烃膜,其包含5至95重量% 粘均分子量(Mv)为2,000,000以上的聚乙烯(A),DSC(差示扫描量热法)测定的第一熔点峰值信号高度为3.0mW / mg以上,比表面积 0.7m 2 / g以上,平均粒径为1〜150μm,95〜5wt。 化合物(A)与化合物(B)的摩尔比(A)/(B))的摩尔比为10或10以下的Mw为10,000〜200,000的聚乙烯(B)为10〜 更高,膜的整体分子量为30万〜150万,膜的熔点温度为120〜140℃,断裂温度为150℃以上, 25℃至140℃的刺穿强度为0.01至0.25。