摘要:
Provided are a magnet structure and the like capable of changing a magnetic force line distribution on a surface of a target to thereby achieve wide erosion of a target, using a simple drive mechanism. A magnet structure (110) comprises a main magnet (10, 13) disposed at a reverse surface (20B) side of a target (20) to produce a main magnetic force line reaching an obverse surface (20A) of the target, an adjustment magnet (11) disposed at the reverse surface (20B) side of the target (20) to produce an adjustment magnetic force line for changing a magnetic flux density distribution produced by the main magnetic force line, a magnetic path (21A, 21B, 24) of the adjustment magnetic force line which is disposed at the reverse surface (20B) side of the target 20, and a magnetic field adjustment means (12, 14) configured to be able to change strength of the adjustment magnetic force line passing through inside of the magnetic path (21A, 21B, 24).
摘要:
A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure (110) includes: inner and outer magnets (10 and 13) positioned at a reverse surface side of a target (20) to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (20A) of the target (20); a pair of intermediate magnets (11 and 12) positioned at the reverse surface side of the target (20) and between the inner and outer magnets (10 and 13) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member (24) positioned at the reverse surface side of the target (20) to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (11 and 12) into an end surface of the other, the magnetic member (24) being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target (20) in association with the inner magnet (10) or the outer magnet (L3).
摘要:
A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure (110) includes: inner and outer magnets (10 and 13) positioned at a reverse surface side of a target (20) to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (20A) of the target (20); a pair of intermediate magnets (11 and 12) positioned at the reverse surface side of the target (20) and between the inner and outer magnets (10 and 13) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member (24) positioned at the reverse surface side of the target (20) to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (11 and 12) into an end surface of the other, the magnetic member (24) being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target (20) in association with the inner magnet (10) or the outer magnet (13).
摘要:
A vacuum film deposition method comprises the steps of mounting a substrate on a substrate holder (6a) that is disposed in a vacuum chamber (1) and is provided with a passage (7f), (7g), and (7j) in which predetermined heat medium flows; maintaining an inside of the vacuum chamber substantially in vacuum state; evaporating evaporation materials from two or more evaporation sources in the inside of the vacuum chamber; and diffusing the evaporated evaporation materials in the inside of the vacuum chamber in a predetermined order; and depositing the diffused evaporation materials on a deposition surface of the substrate, thereby forming a multi-layered film made of the evaporation materials on the deposition surface of the substrate; wherein an antifreezing fluid is used as the predetermined heat medium flowing in the passage of the substrate holder.
摘要:
A gas separator having excellent humidifying performance, pressure loss, volume efficiency, and durability humidifies gases used in an on-vehicle fuel cell. The gas separator has upper and lower surfaces of pleat elements of a pleat molding covered by a plate having intake and exhaust ports. The pleat molding is formed by pleating a compound membrane formed of a gas separating membrane and at least one layer of permeable reinforcement material. The pleat element is formed by disposing a reinforcement frame at the outer side part of the molding. The ratio (R=L/H) of a shortest distance (L) between the intake and exhaust ports to a height (H) of the pleat molding is 0.1 to 7.0, and the ratio (W/Le) of the width (W) to the length (Le) of the pleat molding is 0.3 to 10.0. The gas separator operates at a volume flow ratio of 200 or higher.
摘要:
A gas separation membrane has: a polymeric microporous membrane which has a polyolefin as a main component, and which is manufactured by wet phase separation process, and has a porosity of 20 to 80%, an average pore diameter of 1 to 100 nm and a piercing strength at 100° C. of 2 to 50 N; and a gas-separating thin film, which is provided on at least one surface, and/or the interior of the polymeric microporous membrane, and which comprises a fluorine-containing gas-separating resin as a main component, and has an average thickness of 0.01 μm to less than 0.4 μm. The gas separation membrane having an oxygen-nitrogen separation factor not smaller than 1.4.
摘要:
A humidifying apparatus comprising: a pleated functional element comprising a pleated structure and, secured to the pleated structure around a periphery thereof, a reinforcing frame, wherein the pleated structure is comprised of a humidifying membrane and, superimposed on at least one surface thereof, a gas-permeable reinforcing material layer, and a dry-side channel and a wet-side channel which are, respectively, provided on opposite sides of the pleated functional element, wherein each of the dry-side channel and the wet-side channel has at least one pair of a gas-intake and a gas-outlet, the humidifying apparatus having a first pressure-buffering means between the gas-intake and an outside conduit connected thereto and a second pressure-buffering means between the gas-outlet and an outside conduit connected thereto, wherein the humidifying membrane divides the internal space of the pleated functional element into spaces which form a part or whole of the dry-side channel and a part or whole of the wet-side channel, respectively.
摘要:
A microporous film comprising a high-density polyethylene and a linear copolymer polyethylene and having a terminal vinyl group concentration of 2 or more per 10,000 carbon atoms in the polyethylene, as measured by an infrared spectroscopic method.
摘要:
A microporous polyolefin film that comprises polyethylene and polypropylene as essential components and is composed of a laminate film of two or more layers, wherein the percentage of polypropylene blended in at least one surface layer of the film is more than 50% by weight and 95% by weight or less and the content of polyethylene in the entire film is 50% or more and 95% or less.
摘要:
A microporous polyolefin film which comprises 5 to 95 wt. % polyethylene (A) having a viscosity-average molecular weight (Mv) of 2,000,000 or higher, a first-melting-peak signal height as determined by DSC (differential scanning calorimetry) of 3.0 mW/mg or higher, a specific surface area of 0.7 m2/g or larger, and an average particle diameter of 1 to 150 μm and 95 to 5 wt. % polyethylene (B) having an Mw of 10,000 to 200,000, excluding 10,000 and 200,000, wherein the ratio of the Mv of the compound (A) to that of the compound (B), (A)/(B), is 10 or higher, the film as a whole has a molecular weight of 300,000 to 1,500,000, and the film has a fuse temperature of 120 to 140° C., a breaking temperature of 150° C. or higher, and a ratio of the piercing strength at 25° C. to the piercing strength at 140° C. of from 0.01 to 0.25.