Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System
    1.
    发明申请
    Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System 审中-公开
    磁控溅射系统的磁体结构和阴极电极单元,以及磁控溅射系统

    公开(公告)号:US20090229977A1

    公开(公告)日:2009-09-17

    申请号:US12090465

    申请日:2006-11-02

    IPC分类号: C23C14/35

    摘要: Provided are a magnet structure and the like capable of changing a magnetic force line distribution on a surface of a target to thereby achieve wide erosion of a target, using a simple drive mechanism. A magnet structure (110) comprises a main magnet (10, 13) disposed at a reverse surface (20B) side of a target (20) to produce a main magnetic force line reaching an obverse surface (20A) of the target, an adjustment magnet (11) disposed at the reverse surface (20B) side of the target (20) to produce an adjustment magnetic force line for changing a magnetic flux density distribution produced by the main magnetic force line, a magnetic path (21A, 21B, 24) of the adjustment magnetic force line which is disposed at the reverse surface (20B) side of the target 20, and a magnetic field adjustment means (12, 14) configured to be able to change strength of the adjustment magnetic force line passing through inside of the magnetic path (21A, 21B, 24).

    摘要翻译: 提供了能够使用简单的驱动机构改变目标表面上的磁力线分布从而实现目标的广泛侵蚀的磁体结构等。 磁体结构(110)包括设置在目标(20)的反面(20B)侧的主磁体(10,13),以产生到达目标的正面(20A)的主磁力线,调节 设置在所述目标(20)的所述反面(20B)侧的磁体(11),以产生用于改变由所述主磁力线产生的磁通密度分布的调节磁力线,磁路(21A,21B,24 )设置在靶20的反面(20B)侧的调整用磁力线以及能够改变通过内侧的调节用磁力线的强度的磁场调整单元(12,14) 的磁路(21A,21B,24)。

    Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering, and Magnetron Sputtering System
    2.
    发明申请
    Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering, and Magnetron Sputtering System 有权
    用于磁控溅射的磁体结构和阴极电极单元和磁控溅射系统

    公开(公告)号:US20100230282A1

    公开(公告)日:2010-09-16

    申请号:US12067908

    申请日:2006-08-23

    IPC分类号: C23C14/35

    摘要: A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure (110) includes: inner and outer magnets (10 and 13) positioned at a reverse surface side of a target (20) to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (20A) of the target (20); a pair of intermediate magnets (11 and 12) positioned at the reverse surface side of the target (20) and between the inner and outer magnets (10 and 13) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member (24) positioned at the reverse surface side of the target (20) to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (11 and 12) into an end surface of the other, the magnetic member (24) being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target (20) in association with the inner magnet (10) or the outer magnet (L3).

    摘要翻译: 提供了磁体结构等,其可以减少制造磁体设计所需的劳动,以便以目标的正面以良好平衡的方式产生用于等离子体约束的隧道状泄漏磁场,基于四向 由多个磁体之间的磁相互作用产生的磁场。 磁体结构(110)包括:位于目标(20)的反面侧的内外磁体(10和13),以具有不同的磁矩取向,用于产生到达正面(20A)的第一磁力线 目标(20); 位于目标(20)的反面侧并且在内磁体(10和13)之间的一对中间磁体(11和12)具有不同的磁矩取向,以产生作用于 取消由第一磁力线产生的宽度方向磁通密度分量; 以及定位在所述靶(20)的所述反面侧的磁性构件(24),以将从所述一对中间磁体(11和12)中的一个的端面发出的所述第二磁力线引导到所述一对中间磁体 另一方面,磁性构件(24)被构造为产生与内磁体(10)或外磁体(L3)相关联地到达目标(20)的厚度方向的中间点的磁力线。

    Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system
    3.
    发明授权
    Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system 有权
    用于磁控溅射的磁体结构和阴极单元,以及磁控溅射系统

    公开(公告)号:US08608918B2

    公开(公告)日:2013-12-17

    申请号:US12067908

    申请日:2006-08-23

    IPC分类号: H01J37/34

    摘要: A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure (110) includes: inner and outer magnets (10 and 13) positioned at a reverse surface side of a target (20) to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (20A) of the target (20); a pair of intermediate magnets (11 and 12) positioned at the reverse surface side of the target (20) and between the inner and outer magnets (10 and 13) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member (24) positioned at the reverse surface side of the target (20) to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (11 and 12) into an end surface of the other, the magnetic member (24) being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target (20) in association with the inner magnet (10) or the outer magnet (13).

    摘要翻译: 提供了磁体结构等,其可以减少制造磁体设计所需的劳动,以便以目标的正面以良好平衡的方式产生用于等离子体约束的隧道状泄漏磁场,基于四向 由多个磁体之间的磁相互作用产生的磁场。 磁体结构(110)包括:位于目标(20)的反面侧的内外磁体(10和13),以具有不同的磁矩取向,用于产生到达正面(20A)的第一磁力线 目标(20); 位于目标(20)的反面侧并且在内磁体(10和13)之间的一对中间磁体(11和12)具有不同的磁矩取向,以产生作用于 取消由第一磁力线产生的宽度方向磁通密度分量; 以及定位在所述靶(20)的所述反面侧的磁性构件(24),以将从所述一对中间磁体(11和12)中的一个的端面发出的所述第二磁力线引导到所述一对中间磁体 另一方面,磁性构件(24)构造成产生与内磁体(10)或外磁体(13)相关联地到达靶(20)的厚度方向的中间点的磁力线。

    Vacuum film deposition method and system, and filter manufactured by using the same
    4.
    发明申请
    Vacuum film deposition method and system, and filter manufactured by using the same 审中-公开
    真空膜沉积方法和系统,以及使用该过滤器制造的过滤器

    公开(公告)号:US20070098889A1

    公开(公告)日:2007-05-03

    申请号:US10570449

    申请日:2004-08-30

    IPC分类号: C23C16/00 B05D3/00

    摘要: A vacuum film deposition method comprises the steps of mounting a substrate on a substrate holder (6a) that is disposed in a vacuum chamber (1) and is provided with a passage (7f), (7g), and (7j) in which predetermined heat medium flows; maintaining an inside of the vacuum chamber substantially in vacuum state; evaporating evaporation materials from two or more evaporation sources in the inside of the vacuum chamber; and diffusing the evaporated evaporation materials in the inside of the vacuum chamber in a predetermined order; and depositing the diffused evaporation materials on a deposition surface of the substrate, thereby forming a multi-layered film made of the evaporation materials on the deposition surface of the substrate; wherein an antifreezing fluid is used as the predetermined heat medium flowing in the passage of the substrate holder.

    摘要翻译: 真空膜沉积方法包括以下步骤:将基板安装在设置在真空室(1)中的基板保持器(6a)上,并设置有通道(7f),(7g)和(7j) ),其中预定的热介质流动; 在真空状态下保持真空室的内部; 从真空室内部的两个或更多个蒸发源蒸发蒸发材料; 并以预定的顺序将蒸发的蒸发材料扩散到真空室的内部; 并将扩散的蒸发材料沉积在基板的沉积表面上,由此在基板的沉积表面上形成由蒸发材料制成的多层膜; 其中使用防冻流体作为在所述基板保持器的通道中流动的预定热介质。

    Viscous fluid coupling
    5.
    发明授权
    Viscous fluid coupling 失效
    粘性流体耦合

    公开(公告)号:US4313531A

    公开(公告)日:1982-02-02

    申请号:US109194

    申请日:1980-01-03

    CPC分类号: F16D35/023 F01P7/042

    摘要: A viscous fluid coupling including a rotatable casing provided with a fluid operating chamber and a fluid reservoir chamber therein and having an axial opening formed in said casing, a rotor located in the fluid operating chamber and rotatable relative to the casing, a valve shaft rotatably received in the axial opening formed in the casing, a valve member 27 fixed to an inner end of the valve shaft and operable to control fluid communication between the fluid operating chamber and the fluid reservoir chamber, a bimetal coil located on an exterior portion of the casing, the bimetal coil being connected at inner and outer ends thereof to an outer end of the valve shaft and the casing, respectively, and a plurality of sealing rings axially spaced and interposed between the outer periphery of the valve shaft and a wall of the opening wherein the sealing rings include a resilient material.

    摘要翻译: 一种粘性流体联接器,包括设置有流体操作室的可旋转外壳和其中的流体储存室,并且具有形成在所述壳体中的轴向开口,位于流体操作室中并且可相对于壳体旋转的转子,可旋转地接收的阀轴 在形成在壳体中的轴向开口中,固定在阀轴的内端并可操作以控制流体操作室和流体储存室之间的流体连通的阀构件27,位于外壳的外部的双金属线圈 所述双金属线圈的内端和外端分别连接到所述阀轴和所述壳体的外端,并且在所述阀轴的外周和所述开口的壁之间轴向间隔设置的多个密封环 其中所述密封环包括弹性材料。

    Cooling fan for internal combustion engine
    7.
    发明授权
    Cooling fan for internal combustion engine 失效
    内燃机冷却风扇

    公开(公告)号:US4505641A

    公开(公告)日:1985-03-19

    申请号:US564361

    申请日:1983-12-22

    IPC分类号: F01P5/02 F04D29/32 F04D29/38

    CPC分类号: F04D29/326 F01P5/02

    摘要: A cooling fan to be located between an internal combustion engine and a radiator and rotatingly driven from a rotational shaft of the engine. The fan includes a plurality of blade elements radially projecting from a boss portion and a cylindrical ring formed at the outer ends of the blade elements coaxially with the boss portion. In each blade element, a base line, which is drawn through a base point located on a chord of blade between leading and trailing edges of the blade element at a distance of 40% from the leading edge in percentage to the length of the chord, describes a straight or moderately curved line from the inner to the outer end of the blade element, which is inclined rotationally forward of a radial line passing through the base point at the inner end of the blade element. This fan construction produces air flows containing axial and radial components of velocity to increase the air flows through the radiator irrespective of the existence of the internal combustion engine on the downstream side of the fan. Maximum air flow is obtained by projecting the trailing edge of the outer end of each blade element from the trailing edge of the above-mentioned ring by a length corresponding to 1/3 of the chord length of the outer blade end.

    摘要翻译: 一种冷却风扇,其位于内燃机和散热器之间并且从发动机的旋转轴旋转驱动。 风扇包括从凸起部分径向突出的多个叶片元件和形成在与凸起部分同轴的叶片元件的外端处的圆柱形环。 在每个叶片元件中,基线被设置在叶片元件的前缘和后缘之间的位于叶片弦上的基点,其距前缘的百分比与弦的长度成40%的距离, 描述了从叶片元件的内端到外端的直线或中等弯曲的线,其在叶片元件的内端处穿过基点的径向线的旋转前方倾斜。 该风扇结构产生包含轴向和径向分量的空气流,以增加通过散热器的空气流量,而不管风扇下游侧是否存在内燃机。 通过将每个叶片元件的外端的后缘从上述环的后缘突出相当于外刀片端的弦长的1/3的长度来获得最大气流。

    Film deposition method
    8.
    发明授权
    Film deposition method 失效
    膜沉积法

    公开(公告)号:US07223449B2

    公开(公告)日:2007-05-29

    申请号:US10858178

    申请日:2004-06-01

    IPC分类号: H05H1/24

    摘要: A film deposition method and film deposition system for depositing a halogen compound film, capable of depositing such a film while suppressing abuse that occurs due to deficiency of a halogen element even if the halogen element is dissociated from a film material. The halogen compound film is deposited through a process including: evaporating a film material comprising a halogen compound by means of an evaporation source 3; ionizing the evaporated film material with a radio frequency power outputted from a radio frequency power supply unit 11 and supplied through a substrate holder 2; and causing the ionized film material deposit on the substrate 5. A bias voltage outputted from a bias power supply unit 12 and applied to the substrate holder 2 causes halogen ions dissociated from ions of the halogen compound to be incorporated into the film being deposited on the substrate 5.

    摘要翻译: 一种用于沉积卤素化合物膜的膜沉积方法和膜沉积系统,即使卤素元素与膜材料分离,也能够抑制由于卤素元素不足而发生的滥用而沉积这种膜。 卤素化合物膜通过包括通过蒸发源3蒸发包含卤素化合物的膜材料的方法沉积; 用从射频电源单元11输出的射频功率电离蒸发的薄膜材料并通过基板支架2提供; 并使电离膜材料沉积在基板5上。 从偏置电源单元12输出并施加到衬底保持器2的偏置电压使得从被卤素化合物的离子离解的卤素离子被引入沉积在衬底5上的膜中。

    Viscous fluid coupling having centrifugal valve means
    10.
    发明授权
    Viscous fluid coupling having centrifugal valve means 失效
    具有离心阀装置的粘性流体联轴器

    公开(公告)号:US4570771A

    公开(公告)日:1986-02-18

    申请号:US445602

    申请日:1982-11-30

    CPC分类号: F16D35/026

    摘要: The viscous fluid coupling is comprised of a drive shaft having a hollow casing rotatably mounted thereon with one end of the drive shaft extending into the hollow casing. The interior of the casing is divided into a reservoir chamber and an operating chamber by means of a dividing plate secured within the housing. The rotor on the end of the shaft is rotatably mounted within the operating chamber and a thermostatically responsive valve member is rotatably mounted within the reservoir chamber for controlling the flow of fluid through a first passage extending through the divider plate. A centrifugally responsive valve member is located within the divider plate for providing additional control of the fluid through the first passage from the reservoir chamber to the operating chamber. A second passage extends through the divider plate for permitting the flow of fluid from the operating chamber to the reservoir chamber in response to a pumping action generated by relative rotation between the rotor and the casing. According to one embodiment, the centrifugally responsive valve also controls the flow of fluid through the second passage so that fluid will continue to be pumped through the second passage subsequent to the closing of the first passage by the valve. In a second embodiment, a separate flexible, resilient one-way valve is provided for controlling the flow of fluid from the operating chamber to the reservoir chamber through the second passage in response to the pumping pressure created by relative rotation between the rotor and the casing.

    摘要翻译: 粘性流体联轴器由具有可旋转地安装在其上的中空壳体的驱动轴组成,驱动轴的一端延伸到中空壳体中。 壳体的内部通过固定在壳体内的分隔板分成储存室和操作室。 轴的端部上的转子可旋转地安装在操作室内,并且恒温响应阀构件可旋转地安装在储存室内,用于控制通过延伸穿过分隔板的第一通道的流体流动。 离心响应的阀构件位于分隔板内,用于通过从储存室到操作室的第一通道提供对流体的附加控制。 第二通道延伸穿过分隔板,用于响应于通过转子和壳体之间的相对旋转而产生的泵送作用,允许流体从操作室流到储存室。 根据一个实施例,离心响应阀还控制通过第二通道的流体流动,使得在通过阀关闭第一通道之后,流体将继续被泵送通过第二通道。 在第二实施例中,提供单独的柔性弹性单向阀,用于响应于由转子和壳体之间的相对旋转产生的泵送压力来控制流体通过第二通道从操作室流向储存室 。