公开(公告)号：US4870289A

公开(公告)日：1989-09-26

申请号：US248051

申请日：1988-09-23

申请人： Takeo Sato ,  Shinichiro Aoki ,  Katsumasa Yamaguchi ,  Tadashi Kaneko ,  Noboru Nomura ,  Keisuke Koga ,  Kazuhiro Yamashita

发明人： Takeo Sato ,  Shinichiro Aoki ,  Katsumasa Yamaguchi ,  Tadashi Kaneko ,  Noboru Nomura ,  Keisuke Koga ,  Kazuhiro Yamashita

IPC分类号： G03F9/00 ,  H01L21/68

CPC分类号： G03F9/7065 ,  G03F9/7049 ,  H01L21/682

摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third difraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

公开(公告)号：US4948238A

公开(公告)日：1990-08-14

申请号：US321683

申请日：1989-03-10

申请人： Nobuhiro Araki ,  Takeo Sato ,  Koichi Kawata ,  Noboru Nomura ,  Keisuke Koga

发明人： Nobuhiro Araki ,  Takeo Sato ,  Koichi Kawata ,  Noboru Nomura ,  Keisuke Koga

IPC分类号： G02B13/00 ,  G02B13/18 ,  G02B13/24

CPC分类号： G02B13/18 ,  G02B13/00 ,  G02B13/24

摘要： A first lens, a second lens, means and a third lens means are arranged successively in a direction of travel of a ray. The first lens means each comprising a single lens element power. The second lens means has a predetermined negative refracting power. The third lens means has a predetermined positive refracting power. A fourth lens means consisting of a plurality of lens elements follows the third lens means in the direction of travel of the ray and has a predetermined positive refracting power. At least one surface of the first, second, third, and fourth lens elements is aspherical. The follwoing conditions (1), (2), and (3) are satisfied:4f

公开(公告)号：US4771180A

公开(公告)日：1988-09-13

申请号：US916738

申请日：1986-10-08

申请人： Noboru Nomura ,  Kazuhiro Yamashita

发明人： Noboru Nomura ,  Kazuhiro Yamashita

IPC分类号： G03F9/00 ,  G01N21/86

CPC分类号： G03F9/7049

摘要： A reduction projection type alignment and exposure apparatus having a light source, for alignment, a reticle having at least a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a wafer having at least a second grating, and a photo-detector for detecting light intensity of superimposed beams appearing on the spatial filter. An optical system for light exposure is provided separately from the optical system for alignment which includes the light source for alignment, first and second lens system, spatial filter, etc. The light beam generated from the light source for alignment is applied to the reticle at which it is divided into a plurality of difracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, spatial filter and second lens system onto the wafer so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams are superimposed with the diffracted light beams and the light intensity of the superimposed beams detected by the photo-detector.

摘要翻译： 一种缩小投影型对准和曝光装置，具有用于对准的光源，具有至少第一光栅的掩模版，第一透镜系统，设置在第一透镜系统的傅立叶光谱平面附近的空间滤光器，第二透镜系统，晶片 具有至少第二光栅，以及用于检测出现在空间滤光片上的叠加光束的光强度的光检测器。 与用于对准的光学系统分开设置用于曝光的光学系统，其包括用于对准的光源，第一和第二透镜系统，空间滤光器等。从用于对准的光源产生的光束被施加到掩模版 将其通过第一光栅分割为多个衍射光束，并且将衍射光束通过第一透镜系统，空间滤光器和第二透镜系统施加到晶片上，使得衍射光束被衍射的光束 并且再衍射光束与衍射光束叠加，并且由光检测器检测到的叠加光束的光强度。

公开(公告)号：US5252414A

公开(公告)日：1993-10-12

申请号：US747619

申请日：1991-08-20

申请人： Kazuhiro Yamashita ,  Hironao Iwai ,  Noboru Nomura

发明人： Kazuhiro Yamashita ,  Hironao Iwai ,  Noboru Nomura

IPC分类号： G03F7/16 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66 ,  G03F9/00

CPC分类号： G03F7/70633 ,  G03F7/0035 ,  G03F7/20

摘要： A method for evaluating a resist coating comprising the steps of: forming a first layer resist pattern including an alignment mark by applying a first resist on a semiconductor substrate and by exposing and developing said first resist, said first layer resist pattern having a ridge portion; irradiating said first layer resist pattern with a deep ultraviolet ray; applying, onto said irradiated first layer resist pattern, a second resist having substantially the same refractive index as said first resist to form a second resist coating; detecting said alignment mark formed in said first layer resist pattern, and relatively positioning a pattern for said second resist and said first layer resist pattern; and determining nonuniformity characteristics of said second resist coating by measuring an overlay accuracy between said first layer resist pattern and said pattern for said second resist. The present invention ensures a quantitative evaluation in a non-contact manner for non-uniformity of a resist coating, and enables a resist coating method to be optimized.

摘要翻译： 一种抗蚀剂涂层评价方法，其特征在于，包括以下步骤：通过在半导体衬底上施加第一抗蚀剂，通过曝光和显影所述第一抗蚀剂，形成包括对准标记的第一层抗蚀剂图案，所述第一层抗蚀剂图案具有脊部; 用深紫外线照射所述第一层抗蚀剂图案; 在所述照射的第一层抗蚀剂图案上施加具有与所述第一抗蚀剂基本相同的折射率的第二抗蚀剂，以形成第二抗蚀剂涂层; 检测形成在所述第一层抗蚀剂图案中的所述对准标记，并且相对地定位所述第二抗蚀剂和所述第一层抗蚀剂图案的图案; 以及通过测量所述第一层抗蚀剂图案和所述第二抗蚀剂的所述图案之间的覆盖精度来确定所述第二抗蚀剂涂层的不均匀性。 本发明确保以非接触方式对抗蚀剂涂层的不均匀性进行定量评价，并且能够优化抗蚀剂涂布方法。

公开(公告)号：US5186788A

公开(公告)日：1993-02-16

申请号：US655237

申请日：1991-02-12

申请人： Kazuhiko Hashimoto ,  Kazuhiro Yamashita ,  Noboru Nomura

发明人： Kazuhiko Hashimoto ,  Kazuhiro Yamashita ,  Noboru Nomura

IPC分类号： G03F7/039 ,  G03F7/095 ,  G03F7/20

CPC分类号： G03F7/039 ,  G03F7/095 ,  G03F7/2022 ,  Y10S438/949

摘要： Disclosed is a fine pattern forming method which is capable of forming a high positive-to-negative reversal pattern high in dry-etch resistance, at high density, by irradiating an entire surface of a resist with ion shower at low doses before or after electron beam or focus ion beam exposure, and then developing it.

摘要翻译： 公开了一种精细图案形成方法，其能够通过在电子之前或之后以低剂量用离子淋浴器照射抗蚀剂的整个表面，从而以高密度形成高耐干蚀刻电阻的高正负反转图案 光束或聚焦离子束曝光，然后显影。

公开(公告)号：US4828392A

公开(公告)日：1989-05-09

申请号：US837766

申请日：1986-03-10

申请人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

发明人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

IPC分类号： G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7076

摘要： A reduction projection type alignment and exposure apparatus which comprises a light source, a reticle having a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a substrate having a second grating, and a plurality of photo-detectors for detecting light intensities of a plurality of spectrums appearing on the spatial filter.The light beam generated from the light source is applied to the reticle at which it is divided into a plurality of diffracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, the spatial filter and the second lens system onto the substrate so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams appear as a plurality of spectrums on the spatial filter. These spectrums are detected by photo-detectors and used for alignment of the reticle and the substrate.

摘要翻译： 一种还原投影型取向曝光装置，包括光源，具有第一光栅的掩模版，第一透镜系统，设置在第一透镜系统的傅立叶光谱平面附近的空间滤光器，第二透镜系统，具有第二光栅的基板 以及用于检测出现在空间滤波器上的多个光谱的光强度的多个光检测器。 从光源产生的光束被施加到光掩模，在该掩模版处，由第一光栅将其分成多个衍射光束，衍射光束通过第一透镜系统，空间滤光器和第二透镜 系统到基板上，使得衍射光束被第二光栅重衍射，并且再衍射光束在空间滤光器上表现为多个光谱。 这些光谱由光电检测器检测并用于对准标线片和基板。

公开(公告)号：US5191465A

公开(公告)日：1993-03-02

申请号：US759041

申请日：1991-09-05

申请人： Kazuhiro Yamashita ,  Noboru Nomura

发明人： Kazuhiro Yamashita ,  Noboru Nomura

IPC分类号： G03F9/00

CPC分类号： G03F9/7049

摘要： An optical apparatus for aligning a reticle and a wafer together in connection with reduction projection onto the wafer of an image of a circuit pattern formed on the reticle. Two light beams having slightly different frequencies are concurrently applied to alignment gratings on the reticle and alignment gratings on the wafer through the windows on the reticle and a reduction projection lens. Heterodyne signals of interference rays resulting from diffraction by the alignment gratings on the reticle of the light applied to the alignment gratings are caught by a first optical sensor. Heterodyne signals of interference rays resulting from diffraction by the alignment gratings on the wafer of the light applied to the alignment gratings are caught by a second optical sensor. The difference in phase of the heterodyne signals detected by the respective optical sensors is detected by a phase meter, and the position of the wafer relative to the reticle is adjusted so that the phase difference is reduced to zero.

摘要翻译： 一种用于将掩模版和晶片结合在一起的光学装置，其与形成在掩模版上的电路图案的图像的晶片上的还原投影相结合。 具有稍微不同频率的两个光束通过掩模版上的窗口和还原投影透镜同时施加在光罩上的对准光栅和晶片上的对准光栅。 通过第一光学传感器捕获由施加到对准光栅的光的光罩上的对准光栅衍射产生的干涉光线的异常信号。 由施加到对准光栅的光的晶片上的对准光栅的衍射产生的干涉光线的异常信号被第二光学传感器捕获。 通过相位计检测由各个光学传感器检测到的外差信号的相位差，调整晶片相对于掩模版的位置，使得相位差减小到零。

公开(公告)号：US4861148A

公开(公告)日：1989-08-29

申请号：US24134

申请日：1987-03-11

申请人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atushi Ueno ,  Shotaro Yoshida

发明人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atushi Ueno ,  Shotaro Yoshida

IPC分类号： G02B17/08 ,  G03F7/20

CPC分类号： G02B17/0888 ,  G02B17/084 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70308

摘要： A projection optical system for use in a precise copy which uses a pair of catadioptric optical systems consisting of convex mirrors, concave mirrors, and phase correction members is shown. Two catadioptric optical systems commonly use an entrance pupil on a coaxis and are coupled so as to respectively face the phase correction members. Each of the concave mirrors has an opening at the center. Each of the convex mirrors has no opening in one embodiment but has an opening portion at the center in another embodiment.

摘要翻译： 示出了使用由凸面镜，凹面镜和相位校正构件组成的一对反射折射光学系统的精确复制用的投影光学系统。 两个反折射光学系统通常在同轴线上使用入射光瞳，并且被耦合以分别面对相位校正构件。 每个凹面镜在中心有开口。 在另一实施例中，每个凸面镜在一个实施例中不具有开口，而在中心处具有开口部分。

公开(公告)号：US4757354A

公开(公告)日：1988-07-12

申请号：US43620

申请日：1987-04-28

申请人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atsushi Ueno ,  Shotaro Yoshida

发明人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atsushi Ueno ,  Shotaro Yoshida

IPC分类号： G02B17/08 ,  G03F7/20 ,  G03B27/42 ,  G02B17/00

CPC分类号： G02B17/0852 ,  G02B17/0808 ,  G02B17/0892 ,  G03F7/70225

摘要： A projection optical system for photolithography includes a refraction sub-system and a cata-dioptric sub-system optically connected to each other. The refraction sub-system extends at an object side. The cata-dioptric sub-system extends at an image side. The refraction sub-system is generally composed of refracting members. The cata-dioptric sub-system is generally composed of a phase compensating member, a concave mirror, and a convex mirror. The phase compensating member adjoins the refraction sub-system. At least the concave mirror has a central opening through which light passes. The light forms an image at a rear of the concave mirror.

摘要翻译： 用于光刻的投影光学系统包括彼此光学连接的折射子系统和cata度数子系统。 折射子系统在物体侧延伸。 cata-indiopt子系统在图像侧延伸。 折射子系统通常由折射构件组成。 数位子系统通常由相位补偿构件，凹面镜和凸面镜组成。 相位补偿构件邻接折射子系统。 至少凹面镜具有光通过的中心开口。 光在凹面镜的后部形成图像。

公开(公告)号：US07213664B2

公开(公告)日：2007-05-08

申请号：US11369748

申请日：2006-03-08

申请人： Noboru Nomura ,  Takashi Fukunaga ,  Jiro Suzuki

发明人： Noboru Nomura ,  Takashi Fukunaga ,  Jiro Suzuki

IPC分类号： B60K1/00

CPC分类号： B60L11/1892 ,  B60K1/04 ,  B60L1/003 ,  B60L1/02 ,  B60L3/0046 ,  B60L7/14 ,  B60L11/1803 ,  B60L11/1861 ,  B60L11/1875 ,  B60L11/1887 ,  B60L11/1894 ,  B60L2210/30 ,  B60L2210/40 ,  B60L2240/36 ,  B60L2240/545 ,  B60L2240/662 ,  B60L2270/44 ,  H01M8/04007 ,  H01M8/04052 ,  H01M8/04156 ,  H01M8/04164 ,  H01M8/0662 ,  H01M16/006 ,  H01M2250/20 ,  H01M2250/405 ,  Y02B90/16 ,  Y02T10/7044 ,  Y02T10/705 ,  Y02T10/7241 ,  Y02T10/7291 ,  Y02T90/16 ,  Y02T90/32 ,  Y02T90/34

摘要： There is provided a vehicle system, including an electromobile having a fuel cell power generator mounted therein, and a predetermined mobile unit jointable to the electromobile, such that cogeneration within the mobile unit can be realized even during the travel of the electromobile. Via a joint section 30, a vehicle 10 including a fuel cell 13 as a source of motive power is jointed to a mobile unit 20 capable of travelling and at least including a storage battery 23 and a water tank 25. The water produced in the fuel cell 13 is recovered by a water recovery section 21 via the joint section 30. The heat produced in the fuel cell 13 is recovered by a heat recovery section 22 via the joint section 30. The recovered water is warmed up with the recovered heat, and thereafter stored in the water tank 25. The hot water stored in the water tank 25 is utilized as hot water to be used for controlling the temperature of the mobile unit 20 or supplied as hot water. Any excess electric power generated by the fuel cell 13 is stored in the storage battery 23, and supplied onto electric wiring within the mobile unit 20.

摘要翻译： 提供了一种车辆系统，其包括具有安装在其中的燃料电池发电机的电动机和可与电动机连接的预定移动单元，使得即使在电动汽车行驶期间也可以实现移动单元内的热电联供。 通过接合部30，将包括作为动力源的燃料电池13的车辆10接合到能够行驶的移动单元20，并且至少包括蓄电池23和水箱25。 在燃料电池13中产生的水经由接合部30被水回收部21回收。 在燃料电池13中产生的热量经由接合部30被热回收部22回收。 回收的水用回收的热量加热，然后储存在水箱25中。 存储在水箱25中的热水被用作用于控制移动单元20的温度或作为热水供应的热水。 由燃料电池13产生的任何多余的电力被存储在蓄电池23中，并被供给到移动单元20内的电线路上。