摘要:
The polarizer of the invention has the following constitution: On a transparent substrate having a plurality of linear prismatic structures formed thereon to be parallel to each other, a plurality of tabular members parallel to each other are formed at a predetermined angle to the substrate surface. One edge of the tabular member is in contact with the substrate along the ridge direction of the linear prismatic structure. In the invention, the thin film structure has a transparent film that covers the tabular member on the side thereof opposite to that in contact with the substrate. Preferably, the dielectric film has a one- to four-layered structure.
摘要:
A face panel for a cathode-ray tube is coated with an antireflection film by forming, on the outer surface thereof in this order, a 44.9 nm-thick praseodymium titanate film as a first layer, a 4.9 nm-thick film of a nickel-iron alloy as a second layer, a 53.4 nm-thick praseodymium titanate film as a third layer, a 3.9 nm-thick film of a nickel-iron alloy as a fourth layer, a 20.6 nm-thick praseodymium titanate film as a fifth layer, and an 84.7 nm-thick magnesium fluoride film as a sixth layer. This coated face panel is free from the problem that conventional cathode-ray tube face panels coated on the outer surface with an antireflection film comprising superposed metal films and transparent dielectric films make the cathode-ray tubes exhibit double images although effective in diminishing the reflection of external light on the surface of the cathode-ray tubes and in enhancing display contrast. The cathode-ray tube using the face panel coated with the specific antireflection film does not exhibit double images, is prevented from suffering static buildup on its surface or from reflecting external light thereon, and can attain higher image contrast.
摘要:
An electromagnetic wave filter for a plasma display panel which is effective in preventing incorrect actions of a remote control of appliances, comprising a transparent substrate, a light transmitting electromagnetic wave shield film, and a resin protective film, wherein the electromagnetic wave shield film is a 7-layered laminate in which a dielectric layer and a metal layer containing silver as the principal ingredient are laminated alternately with the dielectric layer being the first to be provided on the transparent substrate, the dielectric layer has a refractive index of 1.6 to 2.8 at 550 nm, and the metal layer containing silver as the principal ingredient contains 0.1 atomic % or more and less than 0.5 atomic % of palladium based on silver and has a thickness of 5 to 25 nm, whereby the electromagnetic wave shield film has a sheet resistance of 3 &OHgr;/□ or lower and a near infrared transmission of 20% or lower at 850 nm.
摘要:
A sputtering target according to the invention including an oxide sintered body containing NbOx and TiOx in which the abundance ratio of Ti atoms in the target is from 70% to 90% both inclusively. Preferably, the oxide sintered body has a specific resistance value not higher than 10Ω·cm. Preferably, theoxidesinteredbody has a thermal expansion coefficient not larger than 7 ×10−6/K and a thermal conductivity not lower than 10 ×10−4 cal/mm-K-sec.
摘要:
A solar-shading light-transmissive panel has a light-transmissive sheet, an absorbing layer disposed on said light-transmissive sheet, a first transparent dielectric layer disposed on said absorbing layer, an Ag-rich layer comprising Ag as a main component disposed on said first transparent dielectric layer, and a second transparent dielectric layer disposed on said Ag-rich layer. The solar-shading light-transmissive panel, which basically has the four layers and can be manufactured relatively inexpensively, has an ornamentally excellent appearance, a relatively high solar-shalding capability, and a relatively high visible light transmittance.
摘要:
A sunlight shielding translucent glass panel has a transparent glass sheet, an absorbing layer disposed on the transparent glass sheet, and transparent dielectric films and mainly Ag films that are alternately arranged on the absorbing layer.
摘要:
An object of the invention, in the formation of a thin film on a synthetic resin, is to improve adhesiveness between the synthetic resin and the thin film by a relatively simple method. In the invention, a protective metallic layer is formed on a synthetic resin, and one thin film of (1) a semi-transmitting metallic mirror, (2) a total reflection metallic mirror, or (3) a transparent conductive film is formed. The material of the protective metallic layer is preferably selected from the group of Ti, Zr, Nb, Si, In, and Sn, and for sake of ensuring adhesiveness between the synthetic resin and the thin film, the film thickness of the protective metal layer is preferably 1 nm or more. Also, when the film thickness of the protective metallic layer is large, transmittance of the whole of the laminated film is lowered due to light absorption by the protective metallic layer, and hence, the film thickness of the protective metallic layer is preferably not more than 5 nm.
摘要:
A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.
摘要:
The prevent invention improves the film thickness distribution in the direction of revolution of substrates by a simple manner in a method for forming coating films, wherein a evaporating source 3 is disposed at a predetermined distance from substrates 2, and when a coating film material is applied from the evaporating source 3 onto the substrate surfaces while revolving the substrates 2, coating films are formed on the substrate surfaces in a condition where the radius of curvature of the substrates 2 obtained by bending the substrates 2 within the elasticity range is made equal to the radius of revolution of the substrates 2.
摘要:
A plasma CVD method and the device for generating an arc discharging plasma, together with introducing both a material gas and a reactive gas into a vacuum chamber; coating a substrate with a thin film which contains a material gas component and a reactive gas component, said plasma CVD method comprising the steps of: introducing said material gas into a position between the arc discharging plasma and the substrate; and introducing said reactive gas into a space opposite, relative to the arc discharging plasma, to a side whereinto the material gas is introduced.