Method for the controlled formation of voids in doped glass dielectric
films
    1.
    发明授权
    Method for the controlled formation of voids in doped glass dielectric films 失效
    在掺杂的玻璃介电膜中控制形成空隙的方法

    公开(公告)号:US5719084A

    公开(公告)日:1998-02-17

    申请号:US564922

    申请日:1995-11-29

    摘要: A method is provided for the controlled formation of voids in integrated circuit doped glass dielectric films. The film can be formed of borophosphosilica glass (BPSG) or other types of doped glass. The method involves the steps of providing a substrate on which conductors are formed, depositing a first layer of doped glass to a thickness in a predetermined ratio to the size of the space between conductors, reflowing the first doped glass layer, applying one or more additional doped glass layers to make up for any shortfall in desired total doped glass thickness, and performing a high temperature densification to smooth each additional layer. The method provides for increased integrated circuit speed by controlled formation of voids which have a low dielectric constant and therefore reduce capacitance between adjacent conductors. The method can be performed using existing doped glass deposition and reflow equipment.

    摘要翻译: 提供了一种用于在集成电路掺杂的玻璃介电膜中控制形成空隙的方法。 该膜可由硼磷石玻璃(BPSG)或其他类型的掺杂玻璃形成。 该方法包括以下步骤:提供其上形成有导体的基板,将第一掺杂玻璃层以与导体之间的空间的尺寸预定比例的厚度沉积,回流第一掺杂玻璃层,施加一个或多个附加 掺杂的玻璃层以弥补所需的总掺杂玻璃厚度的任何不足,并且执行高温致密化以平滑每个附加层。 该方法通过控制形成具有低介电常数并因此降低相邻导体之间的电容的空隙来提供增加的集成电路速度。 该方法可以使用现有的掺杂玻璃沉积和回流设备进行。

    Method for the controlled formation of voids in doped glass dielectric
films
    2.
    发明授权
    Method for the controlled formation of voids in doped glass dielectric films 失效
    在掺杂的玻璃介电膜中控制形成空隙的方法

    公开(公告)号:US5278103A

    公开(公告)日:1994-01-11

    申请号:US23304

    申请日:1993-02-26

    摘要: A method is provided for the controlled formation of voids in integrated circuit doped glass dielectric films. The film can be formed of borophosphosilica glass (BPSG) or other types of doped glass. The method involves the steps of providing a substrate on which conductors are formed, depositing a first layer of doped glass to a thickness in a predetermined ratio to the size of the space between conductors, reflowing the first doped glass layer, applying one or more additional doped glass layers to make up for any shortfall in desired total doped glass thickness, and performing a high temperature densification to smooth each additional layer. The method provides for increased integrated circuit speed by controlled formation of voids which have a low dielectric constant and therefore reduce capacitance between adjacent conductors. The method can be performed using existing doped glass deposition and reflow equipment.

    摘要翻译: 提供了一种用于在集成电路掺杂的玻璃介电膜中控制形成空隙的方法。 该膜可由硼磷石玻璃(BPSG)或其他类型的掺杂玻璃形成。 该方法包括以下步骤:提供其上形成有导体的基板,将第一掺杂玻璃层以与导体之间的空间的尺寸预定比例的厚度沉积,回流第一掺杂玻璃层,施加一个或多个附加 掺杂的玻璃层以弥补所需的总掺杂玻璃厚度的任何不足,并且执行高温致密化以平滑每个附加层。 该方法通过控制形成具有低介电常数并因此降低相邻导体之间的电容的空隙来提供增加的集成电路速度。 该方法可以使用现有的掺杂玻璃沉积和回流设备进行。

    Vacuum processing apparatus and operating method of vacuum processing apparatus
    3.
    发明授权
    Vacuum processing apparatus and operating method of vacuum processing apparatus 有权
    真空处理装置和真空处理装置的操作方法

    公开(公告)号:US09011065B2

    公开(公告)日:2015-04-21

    申请号:US12871333

    申请日:2010-08-30

    IPC分类号: H01L21/677 H01L21/67

    摘要: A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.

    摘要翻译: 一种真空处理装置,包括具有用于传送晶片的多个盒架的大气传送室,用于存储晶片的锁定室,来自锁定室的晶片被转移到的第一真空传送室,连接到传送中间室 到第一真空传送室,以及连接到传送中间室的第二真空传送室。 至少一个真空处理室连接到第一真空传送室,并且两个或更多个真空处理室连接到第二真空传送室的后侧。 多个闸阀设置在第一真空传送室与联接到第一真空传送室的锁定室,传送中间室和真空处理室中的每一个之间。 还设置有用于控制闸阀的操作的控制单元。

    Apparatus and method for inspecting pattern
    4.
    发明授权
    Apparatus and method for inspecting pattern 失效
    用于检查图案的装置和方法

    公开(公告)号:US08149395B2

    公开(公告)日:2012-04-03

    申请号:US13069091

    申请日:2011-03-22

    IPC分类号: G01N21/00

    摘要: A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

    摘要翻译: 用于检查缺陷的方法和装置包括从紫外光源发射紫外光,用受紫外光的偏振条件的紫外线照射样本,控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光,检测从样本反射的光,处理检测到的光以检测缺陷,并输出关于缺陷的信息。 紫外光源设置在清洁环境中,并提供清洁气体并与外界分离。

    Method And Apparatus For Inspecting A Pattern Formed On A Substrate
    5.
    发明申请
    Method And Apparatus For Inspecting A Pattern Formed On A Substrate 有权
    检查基板上形成的图案的方法和装置

    公开(公告)号:US20100104173A1

    公开(公告)日:2010-04-29

    申请号:US12649898

    申请日:2009-12-30

    IPC分类号: G06K9/62

    CPC分类号: G03F7/7065 G01N21/95684

    摘要: A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译: 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像,形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号,以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷,并且显示器显示检测到的缺陷的信息 。

    Method And Apparatus For Inspecting Pattern Defects
    6.
    发明申请
    Method And Apparatus For Inspecting Pattern Defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号:US20090153840A1

    公开(公告)日:2009-06-18

    申请号:US12366003

    申请日:2009-02-05

    IPC分类号: G01N21/88 G01N21/00

    摘要: An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.

    摘要翻译: 用于检查缺陷的装置和方法包括:照射器,用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器,用于形成从样本反射的光的图像, 至少通过反射物镜的照明器的光,用图像传感器检测由成像器形成的光的图像的检测器,以及用于处理从检测器输出的信号以检测缺陷的图像处理器 在标本上。 图像传感器是反面照射型图像传感器。

    Method and apparatus for inspecting a pattern formed on a substrate
    8.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 有权
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号:US08253934B2

    公开(公告)日:2012-08-28

    申请号:US12649898

    申请日:2009-12-30

    IPC分类号: G01N21/00

    CPC分类号: G03F7/7065 G01N21/95684

    摘要: A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译: 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像,形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号,以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷,并且显示器显示检测到的缺陷的信息 。

    Method and apparatus for inspecting pattern defects
    9.
    发明授权
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号:US07489395B2

    公开(公告)日:2009-02-10

    申请号:US11518195

    申请日:2006-09-11

    IPC分类号: G01N21/00

    摘要: A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

    摘要翻译: 用于检查发射激光束的图案缺陷的方法和装置,调节激光束的光量,将调整光量的激光束转换成狭缝状激光束,降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像,并且提供检测器,其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器,用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

    Apparatus and method for inspecting pattern
    10.
    发明授权
    Apparatus and method for inspecting pattern 失效
    用于检查图案的装置和方法

    公开(公告)号:US07446866B2

    公开(公告)日:2008-11-04

    申请号:US11488620

    申请日:2006-07-19

    IPC分类号: G01N21/00

    摘要: An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.

    摘要翻译: 一种用于检查缺陷的装置,包括安装待检查样本并且可在平面中移动的台面,用于发射紫外线的紫外光源的照明单元,用于对从紫外线发射的光照射安装在桌子上的样本的照明单元 源,用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元,以及图像处理单元,用于处理由所述图像传感器检测到的图像,并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。 照明单元和检测单元设置在清洁的环境中,其中提供有清洁的气体并且由壁与外部分离。