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公开(公告)号：US20140301000A1
公开(公告)日：2014-10-09
申请号：US13817661
申请日：2011-12-27
申请人： Toshiki Takahashi , Shin Yamauchi
发明人： Toshiki Takahashi , Shin Yamauchi
IPC分类号： H02H3/26
CPC分类号： H02H3/26 , G01R31/025 , H01M10/482
摘要： A first battery pack (252-1) comprises a battery module (314) which includes a plurality of battery cells (310) connected in series between a positive terminal (352) and a negative terminal (353), ground-fault resistances (45) each of which appears between a grounding point (23) and an inter-battery connection point (311) between adjoining ones of the battery cells (310), a booster unit (11) which is provided to the positive terminal (352) and outputs boosted electric potential acquired by boosting high electric potential of the battery module (314), a protective resistance (25) and a ground fault detecting resistance (27) which are provided in series between a third connection point (19) (on the output side of the booster unit (11)) and the grounding point (23), and a ground fault detecting unit (41) which detects the presence/absence of a ground fault in the battery module (314) based on the result of comparison between preset threshold electric potential (Vref) and electric potential of an inter-resistance connection point (29) between the protective resistance (25) and the ground fault detecting resistance (27).
摘要翻译： 第一电池组（252-1）包括电池模块（314），其包括串联连接在正极端子（352）和负极端子（353）之间的多个电池单元（310），接地故障电阻（45 ）分别出现在相邻的电池单元（310）之间的接地点（23）和电池间连接点（311）之间，提供给正极端子（352）的升压单元（11）和 输出通过提高电池模块（314）的高电位而获得的升压电位，串联地设置在第三连接点（19）（输出端）上的保护电阻（25）和接地故障检测电阻（27） （11））和接地点（23），以及接地故障检测单元（41），其基于电池模块（314）中的接地故障的结果来检测电池模块（314）中是否存在接地故障 预设阈值电位（Vref）和电势 1的保护电阻（25）和接地故障检测电阻（27）之间的电阻间连接点（29）。
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公开(公告)号：US20140117762A1
公开(公告)日：2014-05-01
申请号：US13391998
申请日：2011-06-20
申请人： Shin Yamauchi , Hiromu Kakuya , Motoo Futami , Toshiki Takahashi , Tsutomu Sudo
发明人： Shin Yamauchi , Hiromu Kakuya , Motoo Futami , Toshiki Takahashi , Tsutomu Sudo
IPC分类号： H02J7/00
CPC分类号： H02J7/0014 , H01M2/1061 , H01M2/206 , H01M2/266 , H02J7/0042 , H02J7/0091 , Y10T307/527
摘要： An objective of the invention is to deal with difference of the internal resistance of batteries.A battery system (1) including a plurality of battery modules (3) connected, wherein the higher the temperature of the location where the battery module (3) is located becomes, the larger the resistance value of a distribution cable (11) is made. In a chassis (2), the distribution cable (11) located where the temperature is high is made longer and the distribution cable (11) located where the temperature is low is made shorter. More specifically, the distribution cable (11) connected to a battery group (4) located on the upper part of the chassis is made longer and the distribution cable (11) connected to a battery group (4) located on the lower part of the chassis is made shorter. Further, the length of the distribution cable (11) may be adjusted by arranging the output terminal (21) on the lowermost part of the chassis (2).
摘要翻译： 本发明的目的是处理电池内阻的差异。 一种电池系统（1），包括连接有多个电池模块（3），其中电池模块（3）所在位置的温度越高，配电电缆（11）的电阻值越大 。 在底盘（2）中，位于温度较高的分配电缆（11）较长，位于温度较低的分配电缆（11）较短。 更具体地，连接到位于机架上部的电池组（4）的分配电缆（11）制成得更长，并且配置电缆（11）连接到位于底座的下部的电池组（4） 底盘更短。 此外，可以通过将输出端子（21）布置在底架（2）的最下部分来调节配线电缆（11）的长度。
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公开(公告)号：US08608902B2
公开(公告)日：2013-12-17
申请号：US12686060
申请日：2010-01-12
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： C23C16/345 , C23C16/4401 , C23C16/452 , H01J37/321 , H01J37/3244
摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.
摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，并限制与过程场气密地通信的等离子体产生区域; ICP电极，设置在等离子体生成箱的外部并且沿纵向延伸 等离子体生成箱的方向，以及与ICP电极连接的RF电源。 ICP电极包括与等离子体发生箱的壁面隔开预定距离的分离部分。
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4.发明授权Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method 有权等离子体处理装置，等离子体处理装置用电极板及电极板的制造方法公开(公告)号：US07585386B2
公开(公告)日：2009-09-08
申请号：US11195803
申请日：2005-08-03
申请人： Katsuya Okumura , Shinji Himori , Kazuya Nagaseki , Hiroki Matsumaru , Shoichiro Matsuyama , Toshiki Takahashi
发明人： Katsuya Okumura , Shinji Himori , Kazuya Nagaseki , Hiroki Matsumaru , Shoichiro Matsuyama , Toshiki Takahashi
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/32082 , H01J37/32541
摘要： A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is configured to supply a process gas into the process container. An electric field formation system is configured to form an RF electric field within the process container so as to generate plasma of the process gas. A number of protrusions are discretely disposed on a main surface of the first electrode and protrude toward a space where the plasma is generated.
摘要翻译： 用于在目标衬底上执行等离子体处理的等离子体处理装置包括：配置成容纳目标衬底并减少其中的压力的处理容器。 第一电极设置在处理容器内。 供应系统被配置为将处理气体供应到处理容器中。 电场形成系统被配置为在处理容器内形成RF电场，以产生处理气体的等离子体。 多个突起离散地设置在第一电极的主表面上，朝向产生等离子体的空间突出。
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公开(公告)号：US20090078201A1
公开(公告)日：2009-03-26
申请号：US12277344
申请日：2008-11-25
IPC分类号： C23C16/505
CPC分类号： C23C16/45578 , C23C16/452 , C23C16/45565 , C23C16/45574
摘要： A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a vertical direction. A partition plate having an insulative surface is located between a process field and the plasma generation. The partition plate includes a gas passage disposed over a length corresponding to the plurality of target substrates in a vertical direction. A process gas is exited while passing through the plasma generation area, and is then supplied through the gas passage to the process field.
摘要翻译： 用于半导体工艺的垂直等离子体处理装置包括由具有绝缘内表面并与处理容器一体化的壳体限定的气密辅助室。 辅助室包括在垂直方向上在对应于多个目标基板的长度上延伸的等离子体产生区域。 具有绝缘表面的隔板位于处理场和等离子体产生之间。 隔板包括沿垂直方向设置在与多个目标基板相对应的长度上的气体通道。 在通过等离子体产生区域时排出处理气体，然后通过气体通道供给到处理区域。
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公开(公告)号：US20090056877A1
公开(公告)日：2009-03-05
申请号：US12230468
申请日：2008-08-29
CPC分类号： H01J37/32532 , C23C16/345 , C23C16/452 , H01J37/321
摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.
摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，以形成与过程场气密地连通的等离子体产生区域，提供给等离子体生成箱的ICP电极和RF功率 电源连接到电极。
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公开(公告)号：US06644726B2
公开(公告)日：2003-11-11
申请号：US10230396
申请日：2002-08-29
IPC分类号： B60R2700
CPC分类号： B62D25/2072 , B60R19/48
摘要： In a vehicle rear body structure in which a muffler is disposed below a rear cross member disposed to extend transversely below a rear part of the body of a vehicle, a lower end portion 10 of the rear cross member 7 extends downwardly to substantially the same height of that of a lower end portion 4c of a rear bumper face 4a disposed rearward of the rear cross member. Accordingly, it is possible to prevent the generation of heat deformation by protecting from heat related effects from a muffler a lower end portion of a rear bumper which tends to easily heat deform.
摘要翻译： 在车辆后车体结构中，其中消音器设置在横向于车辆后部的后部延伸的后横梁的下方，后横梁7的下端部分10向下延伸到大致相同的高度 设置在后横梁的后方的后保险杠面4a的下端部分4c。 因此，通过防止来自消音器的热相关作用，能够防止发生热变形，后者的容易易发生变形的后保险杠的下端部。
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8.发明授权Rotating apparatus having rotating electrical machine and reduction device with common rotating shaft 有权具有旋转电机的旋转装置和具有共同旋转轴的减速装置公开(公告)号：US09166457B2
公开(公告)日：2015-10-20
申请号：US13347699
申请日：2012-01-11
申请人： Toshiyuki Yamagishi , Nobukazu Miyauchi , Kenji Matsuura , Toshinao Kato , Atsushi Oishi , Toshiki Takahashi
发明人： Toshiyuki Yamagishi , Nobukazu Miyauchi , Kenji Matsuura , Toshinao Kato , Atsushi Oishi , Toshiki Takahashi
CPC分类号： H02K7/1166 , F16H1/166 , H02K7/085 , H02K7/106 , H02K11/225
摘要： The disclosure discloses a rotating electrical machine that is integrally formed with a reduction device having an input shaft to which a roller gear cam is provided and an output shaft to which cam followers configured to sequentially engage with the roller gear cam is provided on an outer periphery, extending along a direction orthogonal to the input shaft, and is configured to employ one of a field system or an armature as a rotator and the other of the field system or the armature as a stator, including a rotating shaft that is fixed to the rotator and integrally formed as a single shaft with the input shaft of the reduction device.
摘要翻译： 本公开公开了一种旋转电机，其与具有设置有滚子齿轮凸轮的输入轴的减速装置整体形成，以及输出轴，配置成与滚子齿轮凸轮顺序接合的凸轮从动件设置在该输出轴的外周上 沿着与输入轴正交的方向延伸，并且被构造为采用现场系统或电枢中的一个作为转子，并且将场系统或电枢中的另一个作为定子，包括固定到 并且与减速装置的输入轴一体地形成为单个轴。
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公开(公告)号：US08336490B2
公开(公告)日：2012-12-25
申请号：US13339149
申请日：2011-12-28
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01J37/32532 , C23C16/345 , C23C16/452 , H01J37/321
摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.
摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，以形成与过程场气密地连通的等离子体产生区域，提供给等离子体生成箱的ICP电极和RF功率 电源连接到电极。
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公开(公告)号：US20120103525A1
公开(公告)日：2012-05-03
申请号：US13339149
申请日：2011-12-28
IPC分类号： C23F1/08
CPC分类号： H01J37/32532 , C23C16/345 , C23C16/452 , H01J37/321
摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.
摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，以形成与过程场气密地连通的等离子体产生区域，提供给等离子体生成箱的ICP电极和RF功率 电源连接到电极。
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