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    System and mechanism to create autonomic business process solutions
    4.
    发明申请
    System and mechanism to create autonomic business process solutions 审中-公开
    系统和机制创建自主业务流程解决方案

    公开(公告)号：US20050108022A1

    公开(公告)日：2005-05-19

    申请号：US10706040

    申请日：2003-11-13

    申请人： Kamal Bhattacharya ,  Ying Huang ,  Jun-Jang Jeng ,  Shubir Kapoor ,  Santhosh Kumaran ,  Yingjie Li ,  Anil Nigam ,  Frederick Wu ,  Liangzhao Zeng

    发明人： Kamal Bhattacharya ,  Ying Huang ,  Jun-Jang Jeng ,  Shubir Kapoor ,  Santhosh Kumaran ,  Yingjie Li ,  Anil Nigam ,  Frederick Wu ,  Liangzhao Zeng

    IPC分类号： G06Q10/00 ,  G06F17/60

    CPC分类号： G06Q10/06 ,  G06Q10/06375

    摘要： Automomic business processes management solutions have capabilities to adapt themselves to changes in the business environment. These autonomic business solutions are built by wiring together autonomic solution components called BPbots (Business Process robots). BPbots are granular solution components representing an aspect of a business process. In general, BPbots consist of two parts, an execution module and a managerial module. The execution module represents the standard, non-autonomic solution component, such as a standard process flow model describing the long-running flow or business adapter describing the communication of the solution with service providers (such as applications). The managerial module is responsible for the autonomic behavior of the BPbot. The managerial component has the ability to monitor the execution module, analyze the performance, plan new, more appropriate execution patterns and change the behavior of the execution module according to the new plan.

    摘要翻译： 自动化业务流程管理解决方案具有适应业务环境变化的能力。 这些自主业务解决方案是通过将称为BPbots（业务流程机器人）的自主解决方案组件连接在一起构建的。 BPbots是代表业务流程方面的细粒度的解决方案组件。 一般来说，BPbots由两部分组成，一个执行模块和一个管理模块。 执行模块表示标准的非自主性解决方案组件，例如描述长时间运行的流程或描述与服务提供商（例如应用程序）的解决方案通信的业务适配器的标准流程模型。 管理模块负责BPbot的自主行为。 管理组件能够监视执行模块，分析性能，计划新的更合适的执行模式，并根据新计划改变执行模块的行为。

    Method and apparatus for simulating implementation models of business solutions
    5.
    发明申请
    Method and apparatus for simulating implementation models of business solutions 审中-公开
    用于模拟业务解决方案实现模型的方法和装置

    公开(公告)号：US20060074725A1

    公开(公告)日：2006-04-06

    申请号：US10952935

    申请日：2004-09-30

    申请人： Ying Huang ,  Makoto Kano ,  Akio Koide ,  Bala Ramachandran ,  Frederick Wu

    发明人： Ying Huang ,  Makoto Kano ,  Akio Koide ,  Bala Ramachandran ,  Frederick Wu

    IPC分类号： G06F9/44

    CPC分类号： G06Q10/04

    摘要： A method (and system) for simulating an implementation model of a business solution includes simulating business artifacts that invoke the implementation model of the business solution, at least one of simulating and executing a component of the business solution during at least one intermediate stage of a development and integration lifecycle of the implementation model, and analyzing results from the simulation of the implementation model during said at least one intermediate stage of the development and integration lifecycle of the implementation model, thereby allowing a user to simulate an implementation model using both real solution components and simulated solution components.

    摘要翻译： 用于模拟业务解决方案的实现模型的方法（和系统）包括模拟业务工件，其调用业务解决方案的实现模型，至少一个在业务解决方案的至少一个中间阶段中模拟和执行业务解决方案的组件 实现模型的开发和集成生命周期，以及在实施模型的开发和集成生命周期的至少一个中间阶段分析实施模型的模拟结果，从而允许用户使用实际解决方案来模拟实现模型 组件和模拟解决方案组件。

    METHOD AND SYSTEM FOR PROVIDING CONTACT MANAGEMENT TO CHAT SESSION PARTICIPANTS
    6.
    发明申请
    METHOD AND SYSTEM FOR PROVIDING CONTACT MANAGEMENT TO CHAT SESSION PARTICIPANTS 失效
    提供联系人管理会议参与者的方法和系统

    公开(公告)号：US20070234216A1

    公开(公告)日：2007-10-04

    申请号：US11761158

    申请日：2007-06-11

    申请人： Gregory Fitzpatrick ,  Frederick Wu

    发明人： Gregory Fitzpatrick ,  Frederick Wu

    IPC分类号： G06F3/048

    CPC分类号： H04L12/1813 ,  H04L51/04

    摘要： The present invention provides a method and system for providing contact management to participants engaged in a communication session. The invention permits chat session participants to a communication session to determine common contacts that exists between the chat session participants. Dependent on the accessibility of the particular chat session participants' contact list, other chat session participants to the communication session can view the information located in the contact list. Moreover, a particular chat session participant to the communication session can give either a particular chat session participant or all the chat session participants to the communication session permission to modify their contact list. Permission to access or modify contact lists for chat session participants can be defined prior to establishment of the communication session and/or changed during the communication session. Changes relating to whether a particular contact list is accessible and/or modifiable can be initiated by the chat session participant associated with the contact list. Additionally, such changes can be initiated by a request from a chat session participants to modify the contact records in a particular contact list. The invention can be applicable to systems which can include, but is not limited to, chat rooms, instant messaging, and call conferencing.

    摘要翻译： 本发明提供了一种用于向从事通信会话的参与者提供联系人管理的方法和系统。 本发明允许聊天会话参与者进行通信会话以确定在聊天会话参与者之间存在的常见联系人。 根据特定聊天会话参与者的联系人列表的可访问性，通信会话的其他聊天会话参与者可以查看位于联系人列表中的信息。 此外，通信会话的特定聊天会话参与者可以向特定的聊天会话参与者或所有聊天会话参与者授予通信会话许可以修改其联系人列表。 可以在建立通信会话之前定义访问或修改聊天会话参与者的联系人列表的权限和/或在通信会话期间更改。 与特定联系人列表是否可访问和/或可修改有关的更改可以由与联系人列表关联的聊天会话参与者发起。 此外，可以通过来自聊天会话参与者的请求来发起这样的改变，以修改特定联系人列表中的联系人记录。 本发明可以应用于可以包括但不限于聊天室，即时消息和呼叫会议的系统。

    Process for electroless copper deposition on a ruthenium seed
    7.
    发明申请
    Process for electroless copper deposition on a ruthenium seed 审中-公开
    在钌种子上沉积无电镀铜的方法

    公开(公告)号：US20060246699A1

    公开(公告)日：2006-11-02

    申请号：US11385038

    申请日：2006-03-20

    申请人： Timothy Weidman ,  Arulkumar Shanmugasundram ,  Kapila Wijekoon ,  Schubert Chu ,  Frederick Wu ,  Kavita Shah

    发明人： Timothy Weidman ,  Arulkumar Shanmugasundram ,  Kapila Wijekoon ,  Schubert Chu ,  Frederick Wu ,  Kavita Shah

    IPC分类号： H01L21/44

    CPC分类号： C23C18/40 ,  C23C18/1608 ,  C23C18/165 ,  H01L21/288 ,  H01L21/76802 ,  H01L21/76831 ,  H01L21/76843 ,  H01L21/76844 ,  H01L21/76849 ,  H01L21/76864 ,  H01L21/76873 ,  H01L21/76874 ,  H01L21/76877

    摘要： Embodiments of the invention provide methods for forming conductive materials within contact features on a substrate by depositing a seed layer within a feature and subsequently filling the feature with a copper-containing material during an electroless deposition process. In one example, a copper electroless deposition solution contains levelers to form convexed or concaved copper surfaces. In another example, a seed layer is selectively deposited on the bottom surface of the aperture while leaving the sidewalls substantially free of the seed material during a collimated PVD process. In another example, the seed layer is conformably deposited by a PVD process and subsequently, a portion of the seed layer and the underlayer are plasma etched to expose an underlying contact surface. In another example, a ruthenium seed layer is formed on an exposed contact surface by an ALD process utilizing the chemical precursor ruthenium tetroxide.

    摘要翻译： 本发明的实施例提供了通过在特征内沉积种子层并随后在无电沉积工艺期间用含铜材料填充该特征而在基底上的接触特征内形成导电材料的方法。 在一个实例中，铜无电解沉积溶液含有形成凸形或凹陷铜表面的矫直机。 在另一个实例中，在准直的PVD工艺期间，将籽晶层选择性地沉积在孔的底表面上，同时留下基本上不含种子材料的侧壁。 在另一个实例中，种子层通过PVD工艺顺应地沉积，随后种子层和底层的一部分被等离子体蚀刻以暴露下面的接触表面。 在另一个实例中，通过使用化学前体四氧化钌的ALD工艺在暴露的接触表面上形成钌籽晶层。

    Method for cleaning a process chamber
    8.
    发明授权
    Method for cleaning a process chamber 有权
    清洁处理室的方法

    公开(公告)号：US06242347B1

    公开(公告)日：2001-06-05

    申请号：US09163711

    申请日：1998-09-30

    申请人： Anand Vasudev ,  Toshio Itoh ,  Ramanujapuram A. Srinivas ,  Frederick Wu ,  Li Wu ,  Brian Boyle ,  Mei Chang

    发明人： Anand Vasudev ,  Toshio Itoh ,  Ramanujapuram A. Srinivas ,  Frederick Wu ,  Li Wu ,  Brian Boyle ,  Mei Chang

    IPC分类号： H01L2144

    CPC分类号： H01L21/67028 ,  Y10S438/905 ,  Y10S438/906

    摘要： A method for the in situ cleaning of a semiconductor deposition chamber utilized for the deposition of a semiconductor material such as titanium or titanium nitride comprising, between wafers, introducing chlorine gas into the chamber at elevated temperature, purging the chamber with an inert gas and evacuating it before introduction of the next wafer. A two-stage between wafer cleaning process is carried out by introducing chlorine into the chamber at elevated temperature, thereafter initiating a plasma without removing the chlorine, purging the chamber with an inert gas and evacuating it before introduction of the next wafer. In a preferred embodiment, a thin protective film of titanium is deposited on the inner surfaces of the chamber prior to utilizing the chamber for the deposition of such material. The protective layer is replenished following each two-stage cleaning.

    摘要翻译： 一种半导体沉积室的原位清洗方法，用于沉积诸如钛或氮化钛的半导体材料，包括在晶片之间，在升高的温度下将氯气引入室中，用惰性气体吹扫室，并排空 在引入下一个晶圆之前。 晶片清洗过程之间的两阶段是通过在升高的温度下将氯引入室中，之后启动等离子体而不去除氯，用惰性气体吹扫室并在引入下一个晶片之前对其进行排空。 在一个优选实施例中，在利用该腔室以沉积这种材料之前，在室的内表面上沉积薄的钛保护膜。 在每次两级清洁之后补充保护层。