FOCUSING MEMBER AND OPTOELECTRONIC DEVICE
    5.
    发明申请
    FOCUSING MEMBER AND OPTOELECTRONIC DEVICE 有权
    聚焦会员和光电设备

    公开(公告)号:US20110097033A1

    公开(公告)日:2011-04-28

    申请号:US12605891

    申请日:2009-10-26

    IPC分类号: G02B6/12 G02B1/10 G02B6/32

    CPC分类号: G02B6/12004 G02B6/305

    摘要: A focusing member and an optoelectronic device having the same are provided. The focusing member includes multiple levels of conductive plugs and multiple levels of conductive layers that together form an inversed half-boat shape. The optoelectronic device includes a bottom layer, an optical waveguide above the bottom layer, a dielectric layer covering the optical waveguide, and the above focusing member disposed at an edge of the optoelectronic device and located in the dielectric layer above the optical waveguide. A wider end of the inversed half-boat shape of the focusing member faces the outside of the optoelectronic device. The refractive indexes of the bottom layer and the dielectric layer are smaller than that of the optical waveguide.

    摘要翻译: 提供聚焦构件和具有该聚焦构件的光电子器件。 聚焦构件包括多个级别的导电插塞和多层导电层,这些导电层一起形成反转的半舟形状。 光电子器件包括底层,底层上方的光波导,覆盖光波导的电介质层,以及设置在光电子器件的边缘并位于光波导上方的电介质层中的上述聚焦构件。 聚焦构件的反转半舟形的较宽端面向光电器件的外侧。 底层和电介质层的折射率小于光波导的折射率。

    Optoelectronic device and method of forming the same
    7.
    发明授权
    Optoelectronic device and method of forming the same 有权
    光电器件及其形成方法

    公开(公告)号:US08139907B2

    公开(公告)日:2012-03-20

    申请号:US12648861

    申请日:2009-12-29

    IPC分类号: G02B6/12

    摘要: An optoelectronic device including a substrate, a half-boat-shaped material layer, a deep trench isolation structure, and an optical waveguide is provided. The substrate has a first area. The half-boat-shaped material layer is disposed in the substrate within the first area. The refractive index of the half-boat-shaped material layer is lower than that of the substrate. A top surface of the half-boat-shaped material layer is coplanar with the surface of the substrate. The deep trench isolation structure is disposed in the substrate within the first area and located at one side of a bow portion of the half-boat-shaped material layer. The optical waveguide is disposed on the substrate within the first area. The optical waveguide overlaps a portion of the deep trench isolation structure and at least a portion of the half-boat-shaped material layer.

    摘要翻译: 提供了包括基板,半舟形材料层,深沟槽隔离结构和光波导的光电子器件。 衬底具有第一区域。 半船形材料层设置在第一区域内的基板内。 半舟状材料层的折射率低于基板的折射率。 半舟状材料层的上表面与基板的表面共面。 深沟槽隔离结构设置在第一区域内的基板中,并且位于半舟形材料层的弓形部分的一侧。 光波导路设置在第一区域内的基板上。 光波导与深沟槽隔离结构的一部分和半舟形材料层的至少一部分重叠。

    OPTOELECTRONIC DEVICE AND METHOD OF FORMING THE SAME
    8.
    发明申请
    OPTOELECTRONIC DEVICE AND METHOD OF FORMING THE SAME 有权
    光电装置及其形成方法

    公开(公告)号:US20110158581A1

    公开(公告)日:2011-06-30

    申请号:US12648861

    申请日:2009-12-29

    IPC分类号: G02B6/12 H01L21/30

    摘要: An optoelectronic device including a substrate, a half-boat-shaped material layer, a deep trench isolation structure, and an optical waveguide is provided. The substrate has a first area. The half-boat-shaped material layer is disposed in the substrate within the first area. The refractive index of the half-boat-shaped material layer is lower than that of the substrate. A top surface of the half-boat-shaped material layer is coplanar with the surface of the substrate. The deep trench isolation structure is disposed in the substrate within the first area and located at one side of a bow portion of the half-boat-shaped material layer. The optical waveguide is disposed on the substrate within the first area. The optical waveguide overlaps a portion of the deep trench isolation structure and at least a portion of the half-boat-shaped material layer.

    摘要翻译: 提供了包括基板,半舟形材料层,深沟槽隔离结构和光波导的光电子器件。 衬底具有第一区域。 半船形材料层设置在第一区域内的基板内。 半舟状材料层的折射率低于基板的折射率。 半舟状材料层的上表面与基板的表面共面。 深沟槽隔离结构设置在第一区域内的基板中,并且位于半舟形材料层的弓形部分的一侧。 光波导路设置在第一区域内的基板上。 光波导与深沟槽隔离结构的一部分和半舟形材料层的至少一部分重叠。

    Integrated circuit having microelectromechanical system device and method of fabricating the same
    9.
    发明授权
    Integrated circuit having microelectromechanical system device and method of fabricating the same 有权
    具有微机电系统装置的集成电路及其制造方法

    公开(公告)号:US08642986B2

    公开(公告)日:2014-02-04

    申请号:US12565154

    申请日:2009-09-23

    IPC分类号: H01L29/84 H01L21/30

    CPC分类号: B81C1/00238

    摘要: An integrated circuit (IC) having a microelectromechanical system (MEMS) device buried therein is provided. The integrated circuit includes a substrate, a metal-oxide semiconductor (MOS) device, a metal interconnect, and the MEMS device. The substrate has a logic circuit region and a MEMS region. The MOS device is located on the logic circuit region of the substrate. The metal interconnect, formed by a plurality of levels of wires and a plurality of vias, is located above the substrate to connect the MOS device. The MEMS device is located on the MEMS region, and includes a sandwich membrane located between any two neighboring levels of wires in the metal interconnect and connected to the metal interconnect.

    摘要翻译: 提供了一种其中埋有微机电系统(MEMS)器件的集成电路(IC)。 集成电路包括衬底,金属氧化物半导体(MOS)器件,金属互连和MEMS器件。 衬底具有逻辑电路区域和MEMS区域。 MOS器件位于衬底的逻辑电路区域上。 由多层电线形成的金属互连和多个通孔位于衬底上方以连接MOS器件。 MEMS器件位于MEMS区域上,并且包括位于金属互连中的任何两个相邻电平线之间并连接到金属互连的夹层膜。