Semiconductor device and method of manufacturing the same
    1.
    发明申请
    Semiconductor device and method of manufacturing the same 审中-公开
    半导体装置及其制造方法

    公开(公告)号:US20060220122A1

    公开(公告)日:2006-10-05

    申请号:US11373488

    申请日:2006-03-13

    IPC分类号: H01L29/76

    摘要: An n type impurity region is provided below a gate electrode. By setting a gate length to be less than a depth of a channel region, a side surface of the channel region and a side surface of the n type impurity region adjacent to the channel region form a substantially perpendicular junction surface. Thus, since a depletion layer widens uniformly in a depth direction of a substrate, it is possible to secure a predetermined breakdown voltage. Furthermore, since an interval between the channel regions, above which the gate electrode is disposed, is uniform from its surface to its bottom, it is possible to increase an impurity concentration of the n type impurity region, resulting in an achievement of a low on-resistance.

    摘要翻译: 在栅电极的下方设置有n型杂质区。 通过将栅极长度设置为小于沟道区的深度,沟道区的侧表面和与沟道区相邻的n型杂质区的侧表面形成基本上垂直的接合表面。 因此,由于耗尽层在衬底的深度方向上均匀地变宽,因此可以确保预定的击穿电压。 此外,由于栅极电极上方的沟道区域之间的间隔从表面到底部均匀,所以可以增加n型杂质区域的杂质浓度,导致实现低的导通 -抵抗性。

    Method of manufacturing semiconductor device
    2.
    发明授权
    Method of manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US08133788B2

    公开(公告)日:2012-03-13

    申请号:US12567050

    申请日:2009-09-25

    IPC分类号: H01L21/336

    摘要: An n type impurity region is provided below a gate electrode. By setting a gate length to be less than a depth of a channel region, a side surface of the channel region and a side surface of the n type impurity region adjacent to the channel region form a substantially perpendicular junction surface. Thus, since a depletion layer widens uniformly in a depth direction of a substrate, it is possible to secure a predetermined breakdown voltage. Furthermore, since an interval between the channel regions, above which the gate electrode is disposed, is uniform from its surface to its bottom, it is possible to increase an impurity concentration of the n type impurity region, resulting in an achievement of a low on-resistance.

    摘要翻译: 在栅电极的下方设置有n型杂质区。 通过将栅极长度设置为小于沟道区的深度,沟道区的侧表面和与沟道区相邻的n型杂质区的侧表面形成基本上垂直的接合表面。 因此,由于耗尽层在衬底的深度方向上均匀地变宽,因此可以确保预定的击穿电压。 此外,由于栅极电极上方的沟道区域之间的间隔从表面到底部均匀,所以可以增加n型杂质区域的杂质浓度,导致实现低的导通 -抵抗性。

    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    3.
    发明申请
    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20100015772A1

    公开(公告)日:2010-01-21

    申请号:US12567050

    申请日:2009-09-25

    IPC分类号: H01L21/336 H01L21/28

    摘要: An n type impurity region is provided below a gate electrode. By setting a gate length to be less than a depth of a channel region, a side surface of the channel region and a side surface of the n type impurity region adjacent to the channel region form a substantially perpendicular junction surface. Thus, since a depletion layer widens uniformly in a depth direction of a substrate, it is possible to secure a predetermined breakdown voltage. Furthermore, since an interval between the channel regions, above which the gate electrode is disposed, is uniform from its surface to its bottom, it is possible to increase an impurity concentration of the n type impurity region, resulting in an achievement of a low on-resistance.

    摘要翻译: 在栅电极的下方设置有n型杂质区。 通过将栅极长度设置为小于沟道区的深度,沟道区的侧表面和与沟道区相邻的n型杂质区的侧表面形成基本上垂直的接合表面。 因此,由于耗尽层在衬底的深度方向上均匀地变宽,因此可以确保预定的击穿电压。 此外,由于栅极电极上方的沟道区域之间的间隔从表面到底部均匀,所以可以增加n型杂质区域的杂质浓度,导致实现低的导通 -抵抗性。

    Driver circuit of light-emitting element
    8.
    发明授权
    Driver circuit of light-emitting element 有权
    发光元件的驱动电路

    公开(公告)号:US08665922B2

    公开(公告)日:2014-03-04

    申请号:US12607754

    申请日:2009-10-28

    IPC分类号: H01S3/00

    摘要: A driver circuit is provided which comprises a series-connected unit having a light-emitting element and a current limiting inductor directly connected to the light-emitting element, a regenerative diode which is connected in parallel to the series-connected unit and which regenerates energy stored in the current limiting inductor, a transistor which controls a current flowing through the light-emitting element and the current limiting inductor, and a controller which controls an operation of the transistor, wherein the controller controls the transistor according to a voltage value of a power supply applied to the light-emitting element.

    摘要翻译: 提供了一种驱动器电路,其包括具有发光元件的串联单元和直接连接到发光元件的限流电感器,再生二极管并联连接到串联单元并且再生能量 存储在限流电感器中,控制流过发光元件和限流电感器的电流的晶体管和控制晶体管的操作的控制器,其中控制器根据电压值控制晶体管 施加到发光元件的电源。

    DRIVER CIRCUIT OF LIGHT-EMITTING ELEMENT
    9.
    发明申请
    DRIVER CIRCUIT OF LIGHT-EMITTING ELEMENT 有权
    发光元件的驱动电路

    公开(公告)号:US20100111123A1

    公开(公告)日:2010-05-06

    申请号:US12607754

    申请日:2009-10-28

    IPC分类号: H01S3/00 H05B37/02

    摘要: A driver circuit is provided which comprises a series-connected unit having a light-emitting element and a current limiting inductor directly connected to the light-emitting element, a regenerative diode which is connected in parallel to the series-connected unit and which regenerates energy stored in the current limiting inductor, a transistor which controls a current flowing through the light-emitting element and the current limiting inductor, and a controller which controls an operation of the transistor, wherein the controller controls the transistor according to a voltage value of a power supply applied to the light-emitting element.

    摘要翻译: 提供了一种驱动器电路,其包括具有发光元件的串联单元和直接连接到发光元件的限流电感器,再生二极管并联连接到串联单元并且再生能量 存储在限流电感器中,控制流过发光元件和限流电感器的电流的晶体管和控制晶体管的操作的控制器,其中控制器根据电压值控制晶体管 施加到发光元件的电源。