PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS
    1.
    发明申请
    PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS 审中-公开
    图案曝光方法和图案曝光装置

    公开(公告)号:US20080213705A1

    公开(公告)日:2008-09-04

    申请号:US12098089

    申请日:2008-04-04

    IPC分类号: B41J2/45 G03F7/00

    摘要: A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

    摘要翻译: 图案曝光方法和图案曝光装置,其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向,而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下,使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下,每个激光器的波长可以不超过410nm。

    Pattern exposure method and pattern exposure apparatus
    2.
    发明申请
    Pattern exposure method and pattern exposure apparatus 失效
    图案曝光方法和图案曝光装置

    公开(公告)号:US20050219496A1

    公开(公告)日:2005-10-06

    申请号:US11075245

    申请日:2005-03-09

    摘要: A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

    摘要翻译: 图案曝光方法和图案曝光装置,其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向,而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下,使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下,每个激光器的波长可以不超过410nm。

    Pattern exposure method and pattern exposure apparatus
    3.
    发明授权
    Pattern exposure method and pattern exposure apparatus 失效
    图案曝光方法和图案曝光装置

    公开(公告)号:US07372478B2

    公开(公告)日:2008-05-13

    申请号:US11075245

    申请日:2005-03-09

    IPC分类号: B41J2/47 G03B27/54

    摘要: A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

    摘要翻译: 图案曝光方法和图案曝光装置,其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向,而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下,使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下,每个激光器的波长可以不超过410nm。

    Pattern exposure method and apparatus
    4.
    发明申请
    Pattern exposure method and apparatus 审中-公开
    图案曝光方法和装置

    公开(公告)号:US20060215139A1

    公开(公告)日:2006-09-28

    申请号:US11353017

    申请日:2006-02-14

    IPC分类号: G03B27/52

    摘要: A maskless exposure method and a maskless exposure apparatus in which maskless exposure can be performed efficiently with high-directivity illumination light, while the exposure efficiency of solder resist can be improved. Blue-violet semiconductor lasers 12A emitting laser beams 1a with a wavelength of 405 nm and ultraviolet semiconductor lasers 12B emitting laser beams 1b with a wavelength of 375 nm are provided to irradiate a substrate 8 with the laser beams 1a and 1b whose optical axes are made coaxial. In this event, one and the same place on the substrate 8 is irradiated with the laser beams 1a and 1b a plurality of times. Thus, the variation in intensity of the laser beams 1a and 1b is averaged.

    摘要翻译: 可以通过高方向性照明光有效地进行无掩模曝光的无掩模曝光方法和无掩模曝光装置,同时可以提高阻焊剂的曝光效率。 提供波长为405nm的蓝紫色半导体激光器12A和发射波长为375nm的激光束1b的紫外半导体激光器12B以激光束1a和1照射基板8 b的光轴是同轴的。 在这种情况下,多次地用激光束1a和1b照射基板8上的同一个位置。 因此,激光束1a和1b的强度变化是平均的。

    GAMING DEVICE, GAME CONTROL METHOD, AND RECORDING MEDIUM
    9.
    发明申请
    GAMING DEVICE, GAME CONTROL METHOD, AND RECORDING MEDIUM 审中-公开
    游戏设备,游戏控制方法和记录媒体

    公开(公告)号:US20120258780A1

    公开(公告)日:2012-10-11

    申请号:US13427401

    申请日:2012-03-22

    IPC分类号: A63F13/00

    摘要: A gaming device includes a release pattern prediction section which determines a prediction release pattern for the release pattern of the flying object to be released by the first personified character by selecting one of the plurality of release patterns stored in the release pattern storing section based on a selecting operation by a user operating the second personified character; and a difficulty adjustment section, which compares the release pattern determined with the prediction release pattern, and reduces the difficulty for the second character to hit back the flying object released by the first character when the release pattern determined and the prediction release pattern match.

    摘要翻译: 游戏装置包括释放模式预测部,其通过基于存储在释放模式存储部中的多个释放模式中的一个来确定由第一个性化角色释放的飞行对象的释放模式的预测释放模式 由操作第二个性化角色的用户选择操作; 以及难点调整部,其比较与预测释放模式确定的释放模式,并且当确定了释放模式并且预测释放模式匹配时,降低了第二个角色回击由第一个角色释放的飞行对象的难度。