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公开(公告)号：US08604126B2
公开(公告)日：2013-12-10
申请号：US13350228
申请日：2012-01-13
CPC分类号： C08G77/50 , C08G77/52 , C08K3/36 , H01L2224/48091 , H01L2924/00014
摘要： A silicone resin composition is provided comprising a silicon base polymer obtained from dehydration reaction of a silicon base monomer comprising at least 70 mol % of a hydrolyzable silane compound (A). The hydrolyzable silane compound (A) has at least a pair of silicon atoms linked by a linking group which is an aliphatic hydrocarbon group or an aromatic ring-containing hydrocarbon group, and having attached thereto at least three substituent groups selected from hydrogen, hydroxyl and hydrolyzable groups. A proportion of aromatic structure-containing substituent groups is up to 30 mol % of the entire silicon-bonded substituent groups. The composition is suited to form an optical material.
摘要翻译： 提供一种硅树脂组合物，其包含由包含至少70mol％的可水解硅烷化合物（A）的硅基单体的脱水反应获得的硅基聚合物。 可水解硅烷化合物（A）具有通过连接基团连接的至少一对硅原子，该连接基团是脂族烃基或含芳环的烃基，并且具有至少三个选自氢，羟基和 可水解基团。 一部分含芳香族结构的取代基是整个硅键合取代基的30摩尔％。 该组合物适于形成光学材料。
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2.发明授权公开(公告)号：US07981815B2
公开(公告)日：2011-07-19
申请号：US12087779
申请日：2007-07-19
IPC分类号： H01L21/31
CPC分类号： H01L21/3141 , C23C16/40 , C23C16/45527 , C23C16/45546 , H01L21/02164 , H01L21/02181 , H01L21/02274 , H01L21/0228 , H01L21/31612 , H01L21/31645
摘要： Disclosed is a producing method or a semiconductor device including: loading at least one substrate into a processing chamber; forming a metal oxide film or a silicon oxide film on a surface of the substrate by repeatedly supplying a metal compound or a silicon compound, each of which is a first material, an oxide material which is a second material including an oxygen atom, and a hydride material which is a third material, into the processing chamber predetermined times; and unloading the substrate from the processing chamber.
摘要翻译： 公开了一种制造方法或半导体装置，其包括：将至少一个基板装载到处理室中; 通过重复地供给作为第一材料的金属化合物或硅化合物，作为包含氧原子的第二材料的氧化物材料，在基板的表面上形成金属氧化物膜或氧化硅膜， 作为第三材料的氢化物材料预定时间进入处理室; 并从处理室卸载基板。
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公开(公告)号：US20120165564A1
公开(公告)日：2012-06-28
申请号：US13332822
申请日：2011-12-21
IPC分类号： C07F7/10
摘要： An object is to provide a highly pure aminosilane having a reduced amount of halogen impurity, which is suitable for applications of electronic materials and others. More specifically, provided is a method for preparing a purified aminosilane comprising at least the steps of treating, with an alkyl metal reagent, an aminosilane having a Si—N bond but not a Si-halogen bond and having halogen impurity content of 1 ppm (w/w) or more; and distilling the treated aminosilane.
摘要翻译： 本发明的目的是提供一种具有减少量的卤素杂质的高纯氨基硅烷，其适用于电子材料等的应用。 更具体地说，提供了一种制备纯化氨基硅烷的方法，其至少包括用烷基金属试剂处理具有Si-N键但不是Si-卤素键并具有1ppm的卤素杂质含量的氨基硅烷的步骤 w / w）以上; 并蒸馏处理的氨基硅烷。
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4.发明申请公开(公告)号：US20090053906A1
公开(公告)日：2009-02-26
申请号：US12087779
申请日：2007-07-19
IPC分类号： H01L21/316 , B05C11/00
CPC分类号： H01L21/3141 , C23C16/40 , C23C16/45527 , C23C16/45546 , H01L21/02164 , H01L21/02181 , H01L21/02274 , H01L21/0228 , H01L21/31612 , H01L21/31645
摘要： Disclosed is a producing method of a semiconductor device including: loading at least one substrate into a processing chamber; forming a metal oxide film or a silicon oxide film on a surface of the substrate by repeatedly supplying a metal compound or a silicon compound, each of which is a first material, an oxide material which is a second material including an oxygen atom, and a hydride material which is a third material, into the processing chamber predetermined times; and unloading the substrate from the processing chamber.
摘要翻译： 公开了一种半导体器件的制造方法，包括：将至少一个衬底装载到处理室中; 通过重复地供给作为第一材料的金属化合物或硅化合物，作为包含氧原子的第二材料的氧化物材料，在基板的表面上形成金属氧化物膜或氧化硅膜， 作为第三材料的氢化物材料预定时间进入处理室; 并从处理室卸载基板。
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公开(公告)号：US08461367B2
公开(公告)日：2013-06-11
申请号：US13004377
申请日：2011-01-11
IPC分类号： C07F7/02
CPC分类号： C01B21/087
摘要： Provided is a preparation process of trisilylamine capable of preparing high-purity trisilylamine more easily at a lower cost. More specifically, provided is a preparation process of trisilylamine, comprising a step of thermally decomposing perhydropolysilazane under an oxygen-free or low oxygen atmosphere.
摘要翻译： 提供了能够以更低成本更容易地制备高纯度三甲胺的三甲胺的制备方法。 更具体地说，提供了三甲胺的制备方法，包括在无氧或低氧气氛下热分解全氢聚硅氮烷的步骤。
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公开(公告)号：US20110178322A1
公开(公告)日：2011-07-21
申请号：US13004377
申请日：2011-01-11
IPC分类号： C07F7/10
CPC分类号： C01B21/087
摘要： Provided is a preparation process of trisilylamine capable of preparing high-purity trisilylamine more easily at a lower cost. More specifically, provided is a preparation process of trisilylamine, comprising a step of thermally decomposing perhydropolysilazane under an oxygen-free or low oxygen atmosphere.
摘要翻译： 提供了能够以更低成本更容易地制备高纯度三甲胺的三甲胺的制备方法。 更具体地说，提供了三甲胺的制备方法，包括在无氧或低氧气氛下热分解全氢聚硅氮烷的步骤。
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公开(公告)号：US5951820A
公开(公告)日：1999-09-14
申请号：US882160
申请日：1997-06-25
CPC分类号： B01D5/0012 , B01D7/00 , C23C16/4402 , Y10S159/16 , Y10S159/23 , Y10S165/911 , Y10S165/912
摘要： An organometallic compound represented by the general formula (I) ##STR1## or the general formula (II)R-M.sup.2 -R (II)is evaporated, and then passed through the inner tube of a heat exchanger to be precipitated. The heat exchanger is then heated to re-evaporate the organometallic compound, and the re-evaporated organometallic compound is then precipitated in a filling container which is connected to said heat exchanger and cooled down to a prescribed temperature to fill the container.
摘要翻译： 将由通式（I）或通式（II）表示的有机金属化合物R-M2-R（II）蒸发，然后通过热交换器的内管沉淀。 然后将热交换器加热以再蒸发有机金属化合物，然后将再蒸发的有机金属化合物沉淀在与所述热交换器连接的填充容器中并冷却至规定温度以填充容器。
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公开(公告)号：US20080302302A1
公开(公告)日：2008-12-11
申请号：US11990499
申请日：2007-01-24
IPC分类号： C23C16/56
CPC分类号： C23C16/4407 , C23C16/4481 , C23C16/455
摘要： Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.
摘要翻译： 公开了一种基板处理系统，包括：处理基板; 用于蒸发液体材料的蒸发单元; 用于向所述处理室供应由所述蒸发单元蒸发的材料的气体的供应系统; 用于排出处理室中的气氛的排气系统; 以及清洗液体供给系统，用于向蒸发单元提供清洁液体，用于清洗沉积在蒸发单元中的产物，其中清洗液供应系统将至少两种清洗液体供应到蒸发单元中，从而可以将产品从 蒸发单元通过两种清洁液体在产品上的作用。
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9.发明授权Block-graft copolymer, self-crosslinked polymer solid electrolyte and composite solid electrolyte manufactured through use of the block-graft copolymer, and solid cell employing the composite solid electrolyte 失效通过使用嵌段共聚物制造的嵌段共聚物，自交联聚合物固体电解质和复合固体电解质，以及使用复合固体电解质的固体电池
公开(公告)号：US6025437A
公开(公告)日：2000-02-15
申请号：US33731
申请日：1998-03-03
IPC分类号： C08F8/00 , C08F287/00 , C08F297/02 , C08F299/00 , C08G65/28 , C08L53/00 , H01B1/12 , H01G9/02 , H01G9/025 , H01M6/18 , H01M10/05 , H01M10/052 , H01M10/0565 , C08L53/02 , C08J3/28 , H01M8/10
CPC分类号： H01G9/025 , C08F287/00 , C08L53/00 , H01M10/052 , H01M10/0565 , H01M10/0525 , H01M6/181 , Y02P70/54
摘要： There are disclosed a self-crosslinked polymer solid electrolyte, a composite solid electrolyte, and a method of manufacturing the same. A high-energy ray is irradiated to a block-graft copolymer composed of a polymer block chain A represented by formula I and a polymer block chain B represented by formula III in order to crosslink the entire the system. A nonaqueous electrolytic solution is then added to the block-graft polymer to obtain a self-crosslinked polymer solid electrolyte. The self-crosslinked polymer solid electrolyte and an electrically insulating material are combined to obtain a composite solid electrolyte. ##STR1##
摘要翻译： 公开了一种自交联聚合物固体电解质，复合固体电解质及其制造方法。 将高能射线照射到由式I表示的聚合物嵌段链A和由式III表示的聚合物嵌段链B组成的嵌段共聚物共聚物以使整个系统交联。 然后将非水电解溶液加入到嵌段接枝聚合物中以获得自交联的聚合物固体电解质。 将自交联聚合物固体电解质和电绝缘材料组合以获得复合固体电解质。
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公开(公告)号：US08506714B2
公开(公告)日：2013-08-13
申请号：US11990499
申请日：2007-01-24
IPC分类号： C23C16/455 , C23C16/453 , C23C16/52 , C23C16/06 , C23C16/22
CPC分类号： C23C16/4407 , C23C16/4481 , C23C16/455
摘要： Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.
摘要翻译： 公开了一种基板处理系统，包括：处理基板; 用于蒸发液体材料的蒸发单元; 用于向所述处理室供应由所述蒸发单元蒸发的材料的气体的供应系统; 用于排出处理室中的气氛的排气系统; 以及清洗液体供给系统，用于向蒸发单元提供清洁液体，用于清洗沉积在蒸发单元中的产物，其中清洗液供应系统将至少两种清洗液体供应到蒸发单元中，从而可以将产品从 蒸发单元通过两种清洁液体在产品上的作用。
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