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    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
    2.
    发明授权
    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film 有权
    图案形成方法，光化射线敏感或辐射敏感树脂组合物和抗蚀剂膜

    公开(公告)号：US09223219B2

    公开(公告)日：2015-12-29

    申请号：US13521164

    申请日：2011-01-07

    申请人： Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Akinori Shibuya

    发明人： Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Akinori Shibuya

    IPC分类号： G03F7/30 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

    CPC分类号： G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041

    摘要： Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

    摘要翻译： 提供了一种图案形成方法，其包括（i）从光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）使所述曝光膜显影的步骤 通过使用含有机溶剂的显影剂，其中所述光化学射线敏感性或辐射敏感性树脂组合物包含（A）能够通过酸的作用降低对含有机溶剂的显影剂的溶解度的树脂，（B） 能够在用光化学射线或辐射照射时产生酸的化合物，（D）溶剂，和（G）具有氟原子和硅原子中的至少一个并具有碱性或能够增加碱度的化合物 通过酸的作用。

    Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern
    3.
    发明授权
    Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern 有权
    使用光化射线或辐射敏感树脂组合物形成图案的方法和图案

    公开(公告)号：US08911930B2

    公开(公告)日：2014-12-16

    申请号：US13375749

    申请日：2010-06-03

    申请人： Yuichiro Enomoto ,  Shinji Tarutani ,  Akinori Shibuya ,  Shuhei Yamaguchi

    发明人： Yuichiro Enomoto ,  Shinji Tarutani ,  Akinori Shibuya ,  Shuhei Yamaguchi

    IPC分类号： G03F7/26 ,  G03F7/095 ,  G03F7/32 ,  C08F20/28 ,  G03F7/004 ,  G03F7/039

    CPC分类号： C08F20/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/095 ,  G03F7/325

    摘要： According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.

    摘要翻译： 根据一个实施方案，形成图案的方法包括将光化学射线或辐射敏感性树脂组合物施加到基底上以便形成膜的步骤，通过掩模选择性地使膜暴露的步骤，并且步骤 通过使用含有有机溶剂的显影剂显影曝光的薄膜，其中光化射线或辐射敏感性树脂组合物含有通过酸的作用极性增加的树脂（A），使得 包含有机溶剂的显影剂中的树脂减少，当暴露于光化射线或辐射时产生含有氟原子的酸和溶剂（C）的光致酸产生剂（B），并且其中含有光酸产生剂（B） 相对于组合物的总固体成分为8〜20质量％。

    METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN
    4.
    发明申请
    METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN 有权
    使用丙酰胺或辐射敏感性树脂组合物形成图案的方法和图案

    公开(公告)号：US20120077131A1

    公开(公告)日：2012-03-29

    申请号：US13375749

    申请日：2010-06-03

    申请人： Yuichiro Enomoto ,  Shinji Tarutani ,  Akinori Shibuya ,  Shuhei Yamaguchi

    发明人： Yuichiro Enomoto ,  Shinji Tarutani ,  Akinori Shibuya ,  Shuhei Yamaguchi

    IPC分类号： G03F7/20

    CPC分类号： C08F20/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/095 ,  G03F7/325

    摘要： According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.

    摘要翻译： 根据一个实施方案，形成图案的方法包括将光化学射线或辐射敏感性树脂组合物施加到基底上以便形成膜的步骤，通过掩模选择性地使膜暴露的步骤，并且步骤 通过使用含有有机溶剂的显影剂显影曝光的薄膜，其中光化射线或辐射敏感性树脂组合物含有通过酸的作用极性增加的树脂（A），使得 包含有机溶剂的显影剂中的树脂减少，当暴露于光化射线或辐射时产生含有氟原子的酸和溶剂（C）的光致酸产生剂（B），并且其中含有光酸产生剂（B） 相对于组合物的总固体成分为8〜20质量％。

    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    9.
    发明申请
    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
    正极性组合物和使用其的图案形成方法

    公开(公告)号：US20110014571A1

    公开(公告)日：2011-01-20

    申请号：US12922041

    申请日：2009-03-26

    申请人： Kei Yamamoto ,  Akinori Shibuya

    发明人： Kei Yamamoto ,  Akinori Shibuya

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0007 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/111

    摘要： A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.

    摘要翻译： 提供了一种使用该抗蚀剂组合物的正性抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）含有本说明书中定义的式（I）表示的重复结构单元并且能够通过动作分解的树脂 的酸以增加在碱性显影剂中的溶解度; （B）酸发生剂; 和（C）含有选自下列组（a）和至少一种选自下列组（b）至（d）的组的溶剂中的至少一种溶剂的混合溶剂：组（a） 亚烷基二醇单烷基醚，（b）：亚烷基二醇单烷基醚羧酸酯，（c）组：直链酮，支链酮，环酮，内酯和碳酸亚烷基酯，和（d）： 乳酸酯，乙酸酯和烷氧基丙酸酯。

    Lithographic printing plate precursor
    10.
    发明授权
    Lithographic printing plate precursor 有权
    平版印刷版前体

    公开(公告)号：US07449282B2

    公开(公告)日：2008-11-11

    申请号：US11116399

    申请日：2005-04-28

    申请人： Akinori Shibuya

    发明人： Akinori Shibuya

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/00 ,  G03F7/031 ,  G03F7/035 ,  Y10S430/134

    摘要： A lithographic printing plate precursor comprising a photosensitive layer comprising: (A) a fluorescent brightening agent; (B) an activator compound being capable of inducing a chemical change by an interaction with light absorption of the fluorescent brightening agent to produce at least one of a radical, an acid and a base; (C) a compound being capable of undergoing a reaction by an effect of at least one of a radical, an acid and a base to irreversibly change in its physical or chemical properties; and (D) a polyurethane resin binder, wherein the polyurethane resin binder is synthesized from at least following compounds (i), (ii), (iii) and (iv): (i) a diisocyanate compound; (ii) a diol compound having at least one carboxyl group; (iii) a diol compound having a logP value of less than 0; and (iv) a diol compound having a logP value of 0 or more, with the proviso that each of the diol compound (iii) and the diol compound (iv) does not have a carboxyl group.

    摘要翻译： 包括感光层的平版印刷版原版包括：（A）荧光增白剂; （B）能够通过与荧光增白剂的光吸收相互作用而引起化学变化以产生基团，酸和碱中的至少一种的活化剂化合物; （C）能够通过自由基，酸和碱中的至少一种的作用进行反应的化合物，以不可逆地改变其物理或化学性质; 和（D）聚氨酯树脂粘合剂，其中所述聚氨酯树脂粘合剂由至少以下化合物（i），（ii），（iii）和（iv）合成：（i）二异氰酸酯化合物; （ii）具有至少一个羧基的二醇化合物; （iii）logP值小于0的二醇化合物; 和（iv）logP值为0以上的二醇化合物，条件是二醇化合物（iii）和二醇化合物（iv）中的每一个不具有羧基。