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    THIN FILM MAGNETIC HEAD AND MANUFACTURING METHOD THEREOF
    1.
    发明申请
    THIN FILM MAGNETIC HEAD AND MANUFACTURING METHOD THEREOF 审中-公开
    薄膜磁头及其制造方法

    公开(公告)号：US20130070364A1

    公开(公告)日：2013-03-21

    申请号：US13233092

    申请日：2011-09-15

    申请人： Yuji Matsuura ,  Atsushi Yamaguchi ,  Tetsuji Hori ,  Naoto Matono

    发明人： Yuji Matsuura ,  Atsushi Yamaguchi ,  Tetsuji Hori ,  Naoto Matono

    IPC分类号： G11B5/17 ,  G11B21/02 ,  G11B5/127 ,  G11B5/48

    CPC分类号： G11B5/3123 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49032

    摘要： A thin film magnetic head of the present invention is configured to include a main pole layer; a main pole direct junction magnetic layer that has an auxiliary pole layer and an auxiliary yoke layer, the main pole direct junction magnetic layer being directly joined to the main pole layer in a state where a recording gap layer is partially intervened near an air bearing surface (ABS) with respect to the main pole layer; and a first magnetic recording exciting coil that is buried between the auxiliary pole layer and the auxiliary yoke layer configuring the main magnetic direct junction magnetic layer with an insulating layer therebetween. Thereby, an effective magnetic path length can be shortened in order to improve the high-frequency characteristics, and furthermore, simplification of the manufacturing processes becomes possible.

    摘要翻译： 本发明的薄膜磁头构造成包括主极层; 具有辅助极层和辅助磁轭层的主极直接结磁性层，在记录间隙层部分地插入到空气轴承表面的状态下，主极直接结磁性层直接接合到主极层 （ABS）相对于主极层; 以及第一磁记录励磁线圈，其被埋在辅助极层和构成主磁性直接结磁性层的辅助磁轭层之间，其间具有绝缘层。 由此，为了提高高频特性，可以缩短有效的磁路长度，进而可以简化制造工序。

    Method of forming metal to a concave portion of a substrate, method of manufacturing a magnetic head and a magnetic head
    2.
    发明授权
    Method of forming metal to a concave portion of a substrate, method of manufacturing a magnetic head and a magnetic head 有权
    将金属形成到基板的凹部的方法，制造磁头和磁头的方法

    公开(公告)号：US08379346B1

    公开(公告)日：2013-02-19

    申请号：US13194789

    申请日：2011-07-29

    申请人： Hisayoshi Watanabe ,  Yuji Matsuura ,  Takayuki Nishizawa ,  Masashi Sano ,  Tetsuji Hori

    发明人： Hisayoshi Watanabe ,  Yuji Matsuura ,  Takayuki Nishizawa ,  Masashi Sano ,  Tetsuji Hori

    IPC分类号： G11B5/31

    CPC分类号： G11B5/3163 ,  G11B5/3116 ,  Y10T29/49 ,  Y10T29/49021

    摘要： The present invention relates to a method of forming a metal in a concave portion of a substrate. The method includes a step of preparing a substrate having a concave portion; a step of applying a liquid coating member on the substrate and filling in and solidifying the concave portion with the coating member; a step of covering the coating member with a resist; a step of forming a penetrating hole that penetrates the resist in a position of the concave portion of the substrate; a step of removing the coating member within the concave portion; and a step of filling a metal into a portion where the coating member has been removed.

    摘要翻译： 本发明涉及在基板的凹部中形成金属的方法。 该方法包括制备具有凹部的基板的步骤; 将液体涂布部件涂覆在基板上并用涂布部件填充和固化凹部的步骤; 用抗蚀剂覆盖涂层部件的步骤; 在所述基板的凹部的位置形成贯通所述抗蚀剂的贯通孔的工序; 在所述凹部内除去所述涂布部件的工序; 以及将金属填充到已经去除了涂层部件的部分的步骤。

    Retainer ring used for polishing a structure for manufacturing magnetic head, and polishing method using the same
    4.
    发明申请
    Retainer ring used for polishing a structure for manufacturing magnetic head, and polishing method using the same 有权
    用于抛光用于制造磁头的结构的保持环，以及使用其的抛光方法

    公开(公告)号：US20090247060A1

    公开(公告)日：2009-10-01

    申请号：US12078438

    申请日：2008-03-31

    申请人： Hiroki Aritomo ,  Tetsuji Hori ,  Akira Miyasaka ,  Youji Hirao

    发明人： Hiroki Aritomo ,  Tetsuji Hori ,  Akira Miyasaka ,  Youji Hirao

    IPC分类号： B24B41/06

    CPC分类号： B24B37/042 ,  B24B37/32

    摘要： Disclosed is a polishing method for polishing a surface of a structure for magnetic-head manufacture by CMP in the process of manufacturing a magnetic head using a ceramic substrate made of a ceramic material containing AlTiC, the structure including the ceramic substrate and one or more layers formed thereon, and having the surface to be polished. The polishing method uses a retainer ring made of a ceramic material containing AlTiC.

    摘要翻译： 本发明公开了一种用于在使用由含有AlTiC的陶瓷材料制成的陶瓷基板的制造磁头的过程中通过CMP抛光用于磁头制造的结构的表面的抛光方法，包括陶瓷基板和一层或多层的结构 并且具有待抛光的表面。 抛光方法使用由含有AlTiC的陶瓷材料制成的保持环。

    Composition for selectively polishing silicon nitride layer and polishing method employing it
    5.
    发明申请
    Composition for selectively polishing silicon nitride layer and polishing method employing it 有权
    用于选择性抛光氮化硅层的组合物和使用它的抛光方法

    公开(公告)号：US20060084270A1

    公开(公告)日：2006-04-20

    申请号：US11251880

    申请日：2005-10-18

    申请人： Ai Hiramitsu ,  Takashi Ito ,  Tetsuji Hori

    发明人： Ai Hiramitsu ,  Takashi Ito ,  Tetsuji Hori

    IPC分类号： H01L21/302

    CPC分类号： C09G1/02 ,  H01L21/31053

    摘要： To provide a polishing composition whereby the stock removal rate of a silicon nitride layer is higher than the stock removal rate of a silicon oxide layer, there is substantially no adverse effect against polishing planarization, and a sufficient stock removal rate of a silicon nitride layer is obtainable, and a polishing method employing such a composition. A polishing composition which comprises silicon oxide abrasive grains, an acidic additive and water, wherein the acidic additive is such that when it is formed into a 85 wt % aqueous solution, the chemical etching rate of the silicon nitride layer is at most 0.1 nm/hr in an atmosphere of 80° C. Particularly preferred is one wherein the silicon oxide abrasive grains have an average particle size of from 1 to 50 nm, and the pH of the composition is from 3.5 to 6.5.

    摘要翻译： 为了提供一种抛光组合物，其中氮化硅层的原料去除率高于氧化硅层的原料去除率，对抛光平面化基本上没有不利影响，并且氮化硅层的充分的除屑率为 以及使用这种组合物的抛光方法。 一种抛光组合物，其包含氧化硅磨粒，酸性添加剂和水，其中所述酸性添加剂使得当其形成为85重量％的水溶液时，所述氮化硅层的化学蚀刻速率为至多0.1nm / hr。特别优选的是其中氧化硅磨粒的平均粒度为1〜50nm，组合物的pH为3.5〜6.5。

    Alumina-film-polishing composition and chemical mechanical polishing method using the same
    8.
    发明授权
    Alumina-film-polishing composition and chemical mechanical polishing method using the same 有权
    氧化铝膜抛光组合物和使用其的化学机械抛光方法

    公开(公告)号：US07699901B2

    公开(公告)日：2010-04-20

    申请号：US12081658

    申请日：2008-04-18

    申请人： Tetsuji Hori

    发明人： Tetsuji Hori

    IPC分类号： B24D3/02 ,  H01L21/302 ,  C03C15/00

    CPC分类号： C09G1/02 ,  B24B37/044

    摘要： An alumina-film-polishing composition is for use in chemical mechanical polishing of an object to be polished that includes an alumina film with an irregular surface, so as to planarize the irregular surface. The polishing composition contains an alumina abrasive grain, and a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain. The protection-film-forming agent is a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.

    摘要翻译： 氧化铝膜抛光组合物用于对具有不规则表面的氧化铝膜进行抛光的物体进行化学机械抛光，以平坦化不规则表面。 抛光组合物含有氧化铝磨粒和在每个氧化铝膜和氧化铝磨粒的表面上形成保护膜的保护膜形成剂。 保护膜形成剂是重均分子量在100〜1,000,000范围内的水溶性聚合物，其分子中具有至少一个OH基或COOH基的单体聚合而得到。

    Polishing composition
    10.
    发明授权
    Polishing composition 有权
    抛光组成

    公开(公告)号：US06355075B1

    公开(公告)日：2002-03-12

    申请号：US09502336

    申请日：2000-02-11

    申请人： Katsuyoshi Ina ,  W. Scott Rader ,  David M. Shemo ,  Tetsuji Hori

    发明人： Katsuyoshi Ina ,  W. Scott Rader ,  David M. Shemo ,  Tetsuji Hori

    IPC分类号： C09K314

    CPC分类号： C09G1/02

    摘要： A polishing composition comprising an abrasive, an anticorrosive, an oxidizing agent, an acid, a pH regulator and water and having a pH within a range of from 2 to 5, wherein the abrasive is colloidal silica or fumed silica, and its primary particle size is at most 20 nm.

    摘要翻译： 一种抛光组合物，其包含研磨剂，防腐蚀剂，氧化剂，酸，pH调节剂和水，并且pH在2至5的范围内，其中所述研磨剂是胶体二氧化硅或热解法二氧化硅，其初级粒度 至多为20nm。