公开(公告)号：US06741806B2

公开(公告)日：2004-05-25

申请号：US10441112

申请日：2003-05-20

申请人： Yuji Mikami ,  Kazuo Kamata ,  Takeshi Masuda

发明人： Yuji Mikami ,  Kazuo Kamata ,  Takeshi Masuda

IPC分类号： G03B1702

CPC分类号： G03B15/05 ,  G03B9/70 ,  G03B19/04 ,  G03B2215/0503 ,  G03B2215/0589

摘要： A stop lever is rotatable on a light shielding tunnel with an exposure aperture. When the stop lever is at a fast shutter speed position, a support pad is located below a lower metal plate of a synchronization switch of a flash circuit. The support pad holds the lower metal plate to limit rotation of a shutter blade, so that photography is carried out at a fast shutter speed. The synchronization switch is turned on after the exposure aperture is fully open. When the stop lever is at a slow shutter speed position, a support pad is away from the lower metal plate to obtain a slow shutter speed. It is possible to obtain a fast shutter speed by providing a light shielding tunnel with a fixed stopper to limit rotation of the shutter speed, and a slow shutter speed by providing a light shielding tunnel without a stopper.

摘要翻译： 止动杆可在具有曝光孔的遮光通道上旋转。 当止动杆处于快门速度位置时，支撑垫位于闪光电路的同步开关的下金属板的下方。 支撑垫保持下金属板以限制快门叶片的旋转，使得以快速快门速度进行拍摄。 曝光孔完全打开后，同步开关打开。 当止动杆处于低速快门速度位置时，支撑垫远离下金属板以获得低速快门速度。 通过提供具有固定止动器的遮光通道来限制快门速度的旋转和通过提供没有挡块的遮光通道来实现慢快门速度，可以获得快速快门速度。

公开(公告)号：US06771900B2

公开(公告)日：2004-08-03

申请号：US10636749

申请日：2003-08-08

申请人： Mitsuhiro Moriya ,  Takeshi Masuda ,  Nobuyuki Kameyama ,  Yuji Mikami ,  Fuminori Kawamura ,  Fumio Noji ,  Yutaka Senda

发明人： Mitsuhiro Moriya ,  Takeshi Masuda ,  Nobuyuki Kameyama ,  Yuji Mikami ,  Fuminori Kawamura ,  Fumio Noji ,  Yutaka Senda

IPC分类号： G03B1503

CPC分类号： G03B19/04 ,  G03B17/02 ,  G03B2219/045

摘要： A lens-fitted photo film unit includes a flash unit for applying flash light to a photographic object. An exposure amount changer, such as an aperture stop changing mechanism, changes over object light incident on photo film from the object between low and high exposure amounts. For the lens-fitted photo film unit, a photographic mode selection device includes a movable selector, such as a button, for selectively designating a daylight mode, a daylight flash mode and a night flash mode. The movable selector, when the daylight mode is designated, determines the low exposure amount and turns off the flash unit, and when the daylight flash mode is designated, determines the low exposure amount and turns on the flash unit, and when the night flash mode is designated, determines the high exposure amount and turns on the flash unit.

摘要翻译： 装有镜头的摄影胶片单元包括用于将闪光照射到拍摄对象的闪光单元。 诸如孔径光阑改变机构的曝光量改变器在低曝光量和高曝光量之间改变从物体入射到摄影胶片上的物体光。 对于装有镜头的摄影胶片单元，照相模式选择装置包括诸如按钮的可移动选择器，用于选择性地指定日光模式，日光闪光模式和夜间闪光模式。 当指定了日光模式时，可移动选择器确定低曝光量并关闭闪光灯组件，并且当指定了日光闪光模式时，确定低曝光量并打开闪光灯组件，并且当夜间闪光模式 被指定，确定高曝光量并打开闪光灯组件。

公开(公告)号：US06714728B2

公开(公告)日：2004-03-30

申请号：US10439191

申请日：2003-05-16

申请人： Mitsuhiro Moriya ,  Takeshi Masuda ,  Nobuyuki Kameyama ,  Yuji Mikami ,  Fuminori Kawamura ,  Fumio Noji ,  Yutaka Senda

发明人： Mitsuhiro Moriya ,  Takeshi Masuda ,  Nobuyuki Kameyama ,  Yuji Mikami ,  Fuminori Kawamura ,  Fumio Noji ,  Yutaka Senda

IPC分类号： G03B1503

CPC分类号： G03B19/04 ,  G03B17/02 ,  G03B2219/045

摘要： A lens-fitted photo film unit includes a flash unit for applying flash light to a photographic object. An exposure amount changer, such as an aperture stop changing mechanism, changes over object light incident on photo film from the object between low and high exposure amounts. For the lens-fitted photo film unit, a photographic mode selection device includes a movable selector, such as a button, for selectively designating a daylight mode, a daylight flash mode and a night flash mode. The movable selector, when the daylight mode is designated, determines the low exposure amount and turns off the flash unit, and when the daylight flash mode is designated, determines the low exposure amount and turns on the flash unit, and when the night flash mode is designated, determines the high exposure amount and turns on the flash unit.

公开(公告)号：US06430367B1

公开(公告)日：2002-08-06

申请号：US09716939

申请日：2000-11-22

申请人： Kazumi Koike ,  Takeshi Masuda ,  Yuji Mikami

发明人： Kazumi Koike ,  Takeshi Masuda ,  Yuji Mikami

IPC分类号： G03B1702

CPC分类号： G03B5/02 ,  G03B7/20 ,  G03B9/02 ,  G03B9/04 ,  G03B9/10 ,  G03B17/12 ,  G03B2219/045

摘要： A first lens element and a second lens element for comprising a photographic lens, and a stop opening are arranged on an optical axis in this order. A stop plate has a stop-down opening. The stop plate is movable between a first position where the stop-down opening is inserted on an optical axis between the first and the second lens elements for making an f-number of the photographic lens f1, and a second position where the stop-down opening is retracted from the optical axis for making the f-number f2. The photographic lens is constructed to satisfy the following conditions: |log2(L/100)|

摘要翻译： 用于包括摄影镜头的第一透镜元件和第二透镜元件以及止动开口依次布置在光轴上。 挡板有一个停止开口。 止挡板可在第一位置和第二位置之间移动，第一位置在第一和第二透镜元件之间的光轴上插入止动开口，用于形成摄影镜头f1的f数，以及第二位置， 开口从光轴缩回以产生f数f2。 摄影镜头被构造成满足以下条件：其中L（％）表示在插入停止开口时在框架的中心部分中的框架的边缘部分中的亮度与亮度的比例，以及 E（EV）表示帧的边缘部分中的最大曝光量和最小曝光量之间的差。

公开(公告)号：US09273414B2

公开(公告)日：2016-03-01

申请号：US12945299

申请日：2010-11-12

申请人： Fumihiko Kimura ,  Kazuhisa Iwanaga ,  Takeshi Masuda

发明人： Fumihiko Kimura ,  Kazuhisa Iwanaga ,  Takeshi Masuda

IPC分类号： C30B25/02 ,  C30B29/06 ,  C30B25/12

CPC分类号： C30B29/06 ,  C30B25/02 ,  C30B25/12

摘要： An object of the present invention is to provide an epitaxial growth apparatus and an epitaxial growth method that can suppress variation in in-face temperature of a semiconductor wafer caused by deflection of a susceptor and manufacture an epitaxial wafers of high quality. Specifically, the present invention provides an epitaxial growth apparatus for forming an epitaxial film on a semiconductor wafer placed in a chamber having a supply port and an exhaust port for a treatment gas, the apparatus comprising: a susceptor for placing the semiconductor wafer thereon within the chamber; and a susceptor support shaft for supporting the susceptor at an underneath portion of the susceptor, wherein the susceptor support shaft has a support column located substantially coaxial with the center of the susceptor, and at least four support arms extending radially from the top end of the support column with equal intervals therebetween.

摘要翻译： 本发明的目的是提供一种能够抑制由于感受器的偏转引起的半导体晶片的面内温度变化的外延生长装置和外延生长方法，并且制造高质量的外延晶片。 具体地说，本发明提供了一种用于在放置在具有用于处理气体的供给口和排气口的室中的半导体晶片上形成外延膜的外延生长装置，该设备包括：用于将半导体晶片放置在其内的基座 房间 以及用于将基座支撑在基座的下部的基座支撑轴，其中，所述基座支撑轴具有与所述基座的中心基本同轴的支撑柱，以及从所述基座的顶端径向延伸的至少四个支撑臂 支撑柱之间具有相等的间隔。

公开(公告)号：US09140848B2

公开(公告)日：2015-09-22

申请号：US14110764

申请日：2012-04-12

申请人： Takeshi Masuda

发明人： Takeshi Masuda

IPC分类号： G02B6/36 ,  F21V8/00 ,  G02F1/1335 ,  G02B6/00

CPC分类号： G02B6/0088 ,  G02F1/133608 ,  G02F1/133615

摘要： A backlight device (illumination device) 80 includes a plurality of LEDs 22 and entrance ends 30a that light from the LEDs 22 enters, and further includes a plurality of light guide bars 30 that guide the light from the LEDs 22 and a bar-shaped attachment member 55 to which the LEDs 22 and the light guide bars 30 are attached.

摘要翻译： 背光装置（照明装置）80包括多个LED22和来自LED22的光的入射端30a，并且还包括引导来自LED22的光的多个导光杆30和条形附件 LED 22和导光杆30所附接的构件55。

公开(公告)号：US20150054294A1

公开(公告)日：2015-02-26

申请号：US14343385

申请日：2012-08-29

申请人： Hiroki UNO ,  Takeshi MASUDA

发明人： Hiroki Uno ,  Takeshi Masuda

IPC分类号： E05B65/08 ,  E05F15/00 ,  E05B47/00

CPC分类号： E05F15/632 ,  B61D19/005 ,  B61D19/02 ,  E05B47/00 ,  E05B65/08 ,  E05B65/0829 ,  E05B81/06 ,  E05B81/20 ,  E05B81/21 ,  E05B81/38 ,  E05B81/56 ,  E05B83/363 ,  E05B83/40 ,  E05B85/245 ,  E05F15/00 ,  E05F15/40 ,  E05F15/635 ,  E05F15/655 ,  E05Y2201/22 ,  E05Y2201/42 ,  E05Y2201/72 ,  E05Y2400/56 ,  E05Y2400/57 ,  E05Y2800/12 ,  E05Y2800/73 ,  E05Y2800/748 ,  E05Y2900/51 ,  Y10T292/1043

摘要： An opening and closing apparatus with a lock that is provided is capable of safely and promptly closing a sliding door, and also easily performing unlocking with a simple configuration. In an opening and closing apparatus with a lock for opening and closing sliding doors that are provided with elastic members at their door leading ends, output of an electric motor is transmitted to a rack-and-pinion mechanism or a lock mechanism. A control unit controls the electric motor such that a closing operation is performed, the closing operation operates the rack-and-pinion mechanism so as to move the sliding doors to a fully closed position and then displacing a link mechanism in a lock mechanism from an unlocking position to a locking position. Furthermore, the control unit controls the electric motor so as to reduce the output of the electric motor at a predetermined intermediate time point during the closing operation.

摘要翻译： 具有锁定的开闭装置能够安全且及时地关闭滑动门，并且也可以以简单的结构容易地执行解锁。 在具有用于打开和关闭在其门前端设置有弹性构件的滑动门的锁的开闭装置中，电动机的输出被传递到齿条 - 小齿轮机构或锁定机构。 控制单元控制电动机，使得执行关闭操作，关闭操作操作齿条 - 小齿轮机构，以将滑动门移动到完全关闭位置，然后将锁定机构中的连杆机构从 解锁位置到锁定位置。 此外，控制单元控制电动机，以便在关闭操作期间将电动机的输出减小到预定的中间时间点。

公开(公告)号：US08684588B2

公开(公告)日：2014-04-01

申请号：US12990957

申请日：2009-02-20

申请人： Yuhsaku Ajichi ,  Takeshi Masuda ,  Yukihide Kohtoku

发明人： Yuhsaku Ajichi ,  Takeshi Masuda ,  Yukihide Kohtoku

IPC分类号： F21V7/04

CPC分类号： G02B6/0036 ,  G02B6/0028 ,  G02B6/0045 ,  G02B6/0055 ,  G02B6/0061 ,  G02B6/008

摘要： A light guide element includes a light-emitting section including a light-emitting surface, a light guide section, and a diffusing device provided in at least part of a region extending from a boundary surface between the light-emitting section and the light guide section, to point halfway between the boundary surface and an end of the light guide section closer to the light source. The light guide element might be used to form a backlight for a liquid crystal display device.

摘要翻译： 导光元件包括发光部分，发光表面，导光部分和漫射装置，该发光部分设置在从发光部分和导光部分之间的边界面延伸的区域的至少一部分中 指向边界表面和更靠近光源的导光部分的端部之间的中途。 导光元件可以用于形成用于液晶显示装置的背光源。

公开(公告)号：US08591655B2

公开(公告)日：2013-11-26

申请号：US10612149

申请日：2003-07-03

申请人： Takeshi Masuda ,  Masahiko Kajinuma ,  Takakazu Yamada ,  Hiroto Uchida ,  Masaki Uematsu ,  Koukou Suu

发明人： Takeshi Masuda ,  Masahiko Kajinuma ,  Takakazu Yamada ,  Hiroto Uchida ,  Masaki Uematsu ,  Koukou Suu

IPC分类号： C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45565 ,  C23C16/409 ,  C23C16/45512 ,  C23C16/45519 ,  C23C16/45589 ,  C30B25/02 ,  C30B25/14 ,  C30B29/60

摘要： A thin film-forming apparatus, for ensuring uniform plane distribution of properties of a film formed on a substrate surface, has a gas-supply port 24a supplying a gas mixture from a gas-mixing chamber 24 to a shower head 25. The port is arranged at the peripheral portion on the bottom face of the gas-mixing chamber so that the gas mixture flows from the upper peripheral region of the head towards the center thereof. An exhaust port 32 discharging the exhaust gas generated in the film-forming chamber 3 is arranged at a position lower than the level of a stage 31 during film-formation directing the exhaust gas towards the side wall of the chamber 3 and discharging the exhaust gas through the exhaust port. The stage 31 is designed to move freely up and down to adjust the distance between the shower head 25 and substrate S.

摘要翻译： 用于确保形成在基板表面上的膜的性质的均匀平面分布的薄膜形成装置具有将气体混合物从气体混合室24供应到喷淋头25的气体供应口24a。该端口是 布置在气体混合室的底面的周边部分，使得气体混合物从头部的上周边区域朝向其中心流动。 将成膜室3内产生的废气排出的排气口32配置在低于气缸台31的高度的位置，在成膜期间将排气朝着室3的侧壁排出，排出废气 通过排气口。 舞台31被设计成上下移动以调节淋浴头25和基底S之间的距离。

公开(公告)号：US20130224381A1

公开(公告)日：2013-08-29

申请号：US13876756

申请日：2011-09-15

申请人： Takeshi Masuda ,  Takuya Ideno ,  Masahiko Kajinuma ,  Nobuhiro Odajima ,  Yohei Uchida ,  Koukou Suu

发明人： Takeshi Masuda ,  Takuya Ideno ,  Masahiko Kajinuma ,  Nobuhiro Odajima ,  Yohei Uchida ,  Koukou Suu

IPC分类号： C23C16/44

CPC分类号： C23C16/44 ,  C23C16/4401 ,  H01L21/02197 ,  H01L21/02271

摘要： In order to provide a thin film manufacturing method and a thin film manufacturing apparatus, wherein a thin film with good reproducibility can be manufactured at low cost, and in a way wherein resources are saved, a dummy substrate (S2) is conveyed into a chamber (51), dummy processing gas is supplied to the dummy substrate (S2), a product substrate (S3) is conveyed into the chamber (51), and raw material gas different from the dummy processing gas, and containing therein metal material for manufacturing a thin film with the Metal Organic Chemical Vapor Deposition (MOCVD) method, is supplied to the product substrate (S3). Since the raw material gas is not used as dummy processing gas, the amount of metal material to be used can be inhibited, and a thin film with good reproducibility can be manufactured at low cost, and in a way wherein resources are saved.

摘要翻译： 为了提供薄膜制造方法和薄膜制造装置，其中可以以低成本制造具有良好重复性的薄膜，并且以节省资源的方式，将虚设基板（S2）输送到室 （51）中，将假处理气体供给到虚拟基板（S2），将产品基板（S3）输送到室（51）中，将原料气体与虚拟处理气体不同，并且内装有用于制造的金属材料 将具有金属有机化学气相沉积（MOCVD）方法的薄膜供应到产品基板（S3）。 由于不使用原料气体作为虚拟处理气体，所以能够抑制金属材料的使用量，能够以低成本制造具有良好重复性的薄膜，并且以节省资源的方式。