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    Cold cathode forming process
    1.
    发明授权
    Cold cathode forming process 失效
    冷阴极成型工艺

    公开(公告)号：US06726517B2

    公开(公告)日：2004-04-27

    申请号：US09988396

    申请日：2001-11-19

    申请人： Yuka Yamada ,  Takehito Yoshida ,  Nobuyasu Suzuki ,  Toshiharu Makino ,  Yoshikazu Hori

    发明人： Yuka Yamada ,  Takehito Yoshida ,  Nobuyasu Suzuki ,  Toshiharu Makino ,  Yoshikazu Hori

    IPC分类号： H01J900

    CPC分类号： H01J9/025

    摘要： The object of the present invention is to form the fine structure on a cathode surface homogeneously and reproducibly to realize the increased emission current value and stability with a simple process in the electron emission element forming process. An electron emission part of an electron emission element that is a crystalline thin film of electron emissive material formed in self-aligning fashion by means of a laser ablation process, in which a laser beam is irradiated onto a target material and the material ejected and emitted from the target material is deposited to form a thin film on a substrate facing to the target, is used as the thin film electron source. The above-mentioned structure is effective to realize the low electron emission threshold value and the increased emission current value and stability, and realize the reduced cost with the structure that is simpler than the conventional structure.

    摘要翻译： 本发明的目的是在阴极表面上均匀且可再现地形成精细结构，以通过电子发射元件形成过程中的简单工艺实现增加的发射电流值和稳定性。 作为电子发射元件的电子发射部分，其是通过激光烧蚀工艺以自对准方式形成的电子发射材料的结晶薄膜，其中将激光束照射到目标材料上并且材料被喷射和发射 从目标材料沉积以在面向靶的衬底上形成薄膜，用作薄膜电子源。 上述结构对于实现低电子发射阈值和增加的发射电流值和稳定性是有效的，并且以比传统结构简单的结构实现降低的成本。

    Field-emission electron source and method of manufacturing the same
    2.
    发明授权
    Field-emission electron source and method of manufacturing the same 失效
    场发射电子源及其制造方法

    公开(公告)号：US5897790A

    公开(公告)日：1999-04-27

    申请号：US995839

    申请日：1997-12-22

    申请人： Keisuke Koga ,  Yoshikazu Hori ,  Takehito Yoshida ,  Yuka Yamada

    发明人： Keisuke Koga ,  Yoshikazu Hori ,  Takehito Yoshida ,  Yuka Yamada

    IPC分类号： H01J9/02 ,  B44C1/22

    CPC分类号： H01J9/025 ,  H01J2201/30426

    摘要： A withdrawn electrode is formed on a silicon substrate with intervention of upper and lower silicon oxide films each having circular openings corresponding to regions in which cathodes are to be formed. Tower-shaped cathodes are formed in the respective openings of the upper and lower silicon oxide films and of the withdrawn electrode. Each of the cathodes has a sharply tapered tip portion having a radius of 2 nm or less, which has been formed by crystal anisotropic etching and thermal oxidation process for silicon. The region of the silicon substrate exposed in the openings of the upper and lower silicon oxide films and the cathode have their surfaces coated with a thin surface coating film made of a material having a low work function.

    摘要翻译： 引出电极形成在硅衬底上，介于上和下氧化硅膜之间，每个氧化硅膜具有对应于其中将形成阴极的区域的圆形开口。 在上下氧化硅膜和引出电极的各个开口中形成塔状阴极。 每个阴极具有通过晶体各向异性蚀刻和硅的热氧化工艺形成的具有2nm或更小半径的尖锐尖端部分。 暴露在上，下氧化硅膜和阴极的开口中的硅衬底的区域的表面涂覆有由具有低功函数的材料制成的薄表面涂膜。

    Field-emission electron source
    3.
    发明授权
    Field-emission electron source 失效
    场发射电子源

    公开(公告)号：US5925891A

    公开(公告)日：1999-07-20

    申请号：US833191

    申请日：1997-04-14

    申请人： Keisuke Koga ,  Yoshikazu Hori ,  Takehito Yoshida ,  Yuka Yamada

    发明人： Keisuke Koga ,  Yoshikazu Hori ,  Takehito Yoshida ,  Yuka Yamada

    IPC分类号： H01J9/02 ,  H01L29/06 ,  H01J1/16 ,  H01J19/10

    CPC分类号： H01J9/025 ,  H01J2201/30426

    摘要： A withdrawn electrode is formed on a silicon substrate with intervention of upper and lower silicon oxide films each having circular openings corresponding to regions in which cathodes are to be formed. Tower-shaped cathodes are formed in the respective openings of the upper and lower silicon oxide films and of the withdrawn electrode. Each of the cathodes has a sharply tapered tip portion having a radius of 2 nm or less, which has been formed by crystal anisotropic etching and thermal oxidation process for silicon. The region of the silicon substrate exposed in the openings of the upper and lower silicon oxide films and the cathode have their surfaces coated with a thin surface coating film made of a material having a low work function.

    摘要翻译： 引出电极形成在硅衬底上，介于上和下氧化硅膜之间，每个氧化硅膜具有对应于其中将形成阴极的区域的圆形开口。 在上下氧化硅膜和引出电极的各个开口中形成塔状阴极。 每个阴极具有通过晶体各向异性蚀刻和硅的热氧化工艺形成的具有2nm或更小半径的尖锐尖端部分。 暴露在上，下氧化硅膜和阴极的开口中的硅衬底的区域的表面涂覆有由具有低功函数的材料制成的薄表面涂膜。

    Optical pickup head
    6.
    发明授权
    Optical pickup head 失效
    光学拾音头

    公开(公告)号：US5301182A

    公开(公告)日：1994-04-05

    申请号：US868939

    申请日：1992-04-16

    申请人： Yoshiaki Komma ,  Seiji Nishino ,  Yoshikazu Hori

    发明人： Yoshiaki Komma ,  Seiji Nishino ,  Yoshikazu Hori

    IPC分类号： G11B7/09 ,  G11B7/135 ,  G11B7/00

    CPC分类号： G11B7/1362 ,  G11B7/1353

    摘要： An optical pickup head for operating on an information recording medium includes a light source for emitting a light beam. A transparent base plate has opposite surfaces formed with a semitransparent film and a hologram respectively. The semitransparent film is exposed to the light beam emitted from the light source, and reflects a portion of the light beam emitted from the light source. The portion of the light beam which is reflected by the semitransparent film forms a forward light beam. A condenser optical system serves to focus the forward light beam on the information recording medium. The forward light beam is reflected at the information recording medium, and forms a backward light beam. The backward light beam successively passes through the condenser optical system, the semitransparent film, and the transparent base plate, and then reaches the hologram. The hologram generates a backward +1-order diffraction light beam from the backward light beam. A plurality of photodetectors serve to receive the +1-order diffraction light beam and to convert the received +1-order diffraction light beam into corresponding electric signals respectively.

    摘要翻译： 用于在信息记录介质上操作的光学拾取头包括用于发射光束的光源。 透明基板分别具有形成半透明膜和全息图的相对表面。 半透明膜暴露于从光源发射的光束，并且反射从光源发射的光束的一部分。 由半透明膜反射的光束部分形成正向光束。 聚光器光学系统用于将前向光束聚焦在信息记录介质上。 正向光束在信息记录介质上被反射，形成反向光束。 后向光束依次通过聚光系统，半透明膜和透明基板，然后到达全息图。 全息图从后向光束产生反向+ 1级的衍射光束。 多个光电探测器用于接收+ 1级衍射光束并将接收到的+1级衍射光束分别转换为相应的电信号。

    Movable optical head integrally incorporated with objective lens and hologram element
    9.
    发明授权
    Movable optical head integrally incorporated with objective lens and hologram element 失效
    整体结合物镜和全息元件的可移动光学头

    公开(公告)号：US5648951A

    公开(公告)日：1997-07-15

    申请号：US415764

    申请日：1995-04-03

    申请人： Makoto Kato ,  Yoshiaki Komma ,  Shin-ichi Kadowaki ,  Yoshikazu Hori ,  Seiji Nishino ,  Tetsuo Saimi

    发明人： Makoto Kato ,  Yoshiaki Komma ,  Shin-ichi Kadowaki ,  Yoshikazu Hori ,  Seiji Nishino ,  Tetsuo Saimi

    IPC分类号： G02B5/18 ,  G02B5/32 ,  G02B27/00 ,  G11B7/09 ,  G11B7/12 ,  G11B7/13 ,  G11B7/135 ,  G11B7/00

    CPC分类号： G11B7/131 ,  G02B27/0037 ,  G02B27/4238 ,  G02B27/4277 ,  G02B5/1819 ,  G02B5/1857 ,  G02B5/32 ,  G11B7/094 ,  G11B7/123 ,  G11B7/1353 ,  G11B7/0912

    摘要： Disclosed is a compact optical pick-up head apparatus suitable for mass-production, which comprises a light radiation source, an element composed of photodetector split into a plurality of regions and integrated on the same base, an objective lens for focusing a beam from the above source on an optical disk, a blazed hologram integrated to the support member of the lens, a means for driving the support member to which the objective lens and blazed hologram are integrated in response to an output as servo signal output from the photodetector which receives a diffracted beam produced in such a manner that a return beam reflected or diffracted by the optical disk is incident on the objective lens integrated with the above hologram. The optical pickup apparatus according to the present invention employs a region-split-type phase hologram in which a pair of Flesnel zone plate-like patterns, by which a plurality of diffraction wavefronts having a different focus and the same diffraction order are produced outside an optical-axis, are non-superimposedly formed. The above hologram can be blazed with a pinpoint accuracy by lithography using a few mask patterns synthesized by a computer, and further a more preferably blazing can be realized by the combination of the ion beam etching and the lithography. Accordingly, not only noise caused by an unnecessary diffracted beam component but also the offset of a servo signal can be restrained and the size of the objective lens can be reduced by the integration of the entire optical system, which greatly contributes to the superminiaturization of an optical head.

    摘要翻译： 公开了一种适用于批量生产的紧凑型光学拾取头装置，其包括光辐射源，由分离成多个区域并集成在同一基底上的光电检测器构成的元件，用于将来自 在光盘上的源极上，与透镜的支撑构件集成的闪耀的全息图，用于驱动支撑构件的装置，物镜和闪耀的全息图响应于作为从接收到的光电检测器输出的伺服信号的输出而被集成到该支撑构件上 以使得由光盘反射或衍射的返回光束入射到与上述全息图集成的物镜上的方式产生的衍射光束。 根据本发明的光学拾取装置采用区域分割型相位全息图，其中一对Flesnel区域板状图案，其中具有不同焦点和相同衍射级的多个衍射波前在外部产生 光轴不叠加地形成。 通过使用由计算机合成的几个掩模图案通过光刻可以使上述全息图以精确的准确度闪耀，并且还可以通过离子束蚀刻和光刻的组合来实现更好的燃烧。 因此，不仅可以抑制由不必要的衍射光束分量引起的噪声，而且可以抑制伺服信号的偏移，并且可以通过整个光学系统的整合来减小物镜的尺寸，这极大地有助于使 光头。

    Field-emission element having a cathode with a small radius
    10.
    发明授权
    Field-emission element having a cathode with a small radius 失效
    具有半径小的阴极的场发射元件

    公开(公告)号：US5502314A

    公开(公告)日：1996-03-26

    申请号：US269676

    申请日：1994-07-01

    申请人： Yoshikazu Hori

    发明人： Yoshikazu Hori

    IPC分类号： H01J1/304 ,  H01J9/02 ,  H01L29/06 ,  H01J1/46 ,  H01L29/04 ,  H01L29/12

    CPC分类号： H01J1/3042 ,  H01J9/025

    摘要： The invention is a field-emission element that is fabricated by forming an elevated surface and a base surface on a conductive substrate or a semiconductor substrate by applying a photolithographic process and an etching process, and making these surfaces cross at a step with an acute angle between the two surfaces. The intersection of the elevated surface with the step form a cathode having a radius of curvature of less than 20 nm. A gate electrode formed on the base electrode but insulated therefrom is disposed at a distance less than 1 .mu.m from said cathode by controlling the distance by the thickness of an etching protection mask. The field-emission element enables electrons to be emitted from the cathode when a voltage less than 150V is applied between the cathode and the gate electrode.

    摘要翻译： 本发明是通过应用光刻工艺和蚀刻工艺在导电衬底或半导体衬底上形成升高的表面和基底表面而制成的场致发射元件，并使这些表面以锐角 在两个表面之间。 升高的表面与台阶的交点形成具有小于20nm的曲率半径的阴极。 通过将距离除以蚀刻保护掩模的厚度，将形成在基极上但与之绝缘的栅电极设置在距离阴极小于1μm的距离处。 当在阴极和栅电极之间施加小于150V的电压时，场发射元件使得能够从阴极发射电子。