公开(公告)号：US06653763B2

公开(公告)日：2003-11-25

申请号：US09811112

申请日：2001-03-16

申请人： Zhihong Wang ,  Tamon Kasajima ,  Masashi Shiraishi ,  Ping Shang ,  Kai Wu

发明人： Zhihong Wang ,  Tamon Kasajima ,  Masashi Shiraishi ,  Ping Shang ,  Kai Wu

IPC分类号： H01L4108

CPC分类号： G11B5/5552 ,  G11B21/106 ,  G11B21/20 ,  H01L41/096 ,  H02N2/10

摘要： A piezoelectric actuator is disclosed including an annular piezoelectric element and a base. There is a gap along the radial direction of the annular piezoelectric element. One of the two ends, i.e., the fixed end of the said annular element, is connected to the base, while the other end is free. The base is made of piezoelectric materials. Furthermore, the annular element is divided into two or more annular parts along the direction of its circumference by the electrode patterns applied on its two opposite surface and/or its polarization directions. When driving voltages are applied, the actuator can generate roughly a rotary motion around the center of the annular piezoelectric element. The annular rotary actuator could be either a single plate or with multilayer structure. The present invention further relates to a dual stage head positioning actuator system of a hard disk drive with a plurality of disks and a plurality of vertically aligned head sliders mounted on distal ends of a plurality of suspensions via the annular piezoelectric actuators.

摘要翻译： 公开了一种压电致动器，其包括环形压电元件和基座。 沿着环形压电元件的径向存在间隙。 两个端部中的一个，即所述环形元件的固定端连接到基座，而另一端是自由的。 基座由压电材料制成。 此外，通过施加在其两个相对表面和/或其偏振方向上的电极图案，环形元件沿其圆周方向被分成两个或更多个环形部分。 当施加驱动电压时，致动器可围绕环形压电元件的中心大致产生旋转运动。 环形旋转致动器可以是单板或具有多层结构。 本发明还涉及具有多个盘的硬盘驱动器的双级头定位致动器系统和经由环形压电致动器安装在多个悬架的远端上的多个垂直对准的头滑块。

公开(公告)号：US06856070B2

公开(公告)日：2005-02-15

申请号：US10632638

申请日：2003-08-01

申请人： Zhihong Wang ,  Tamon Kasajima ,  Masashi Shiraishi ,  Ping Shang ,  Kai Wu

发明人： Zhihong Wang ,  Tamon Kasajima ,  Masashi Shiraishi ,  Ping Shang ,  Kai Wu

IPC分类号： G11B5/55 ,  G11B21/10 ,  G11B21/20 ,  H01L41/04 ,  H01L41/09 ,  H02N2/00 ,  H02N2/10

CPC分类号： G11B5/5552 ,  G11B21/106 ,  G11B21/20 ,  H01L41/096 ,  H02N2/10

摘要： A piezoelectric actuator is disclosed including an annular piezoelectric element and a base. There is a gap along the radial direction of the annular piezoelectric element. One of the two ends, i.e., the fixed end of the said annular element, is connected to the base, while the other end is free. The base is made of piezoelectric materials. Furthermore, the annular element is divided into two or more annular parts along the direction of its circumference by the electrode patterns applied on its two opposite surface and/or its polarization directions. When driving voltages are applied, the actuator can generate roughly a rotary motion around the center of the annular piezoelectric element. The annular rotary actuator could be either a single plate or with multilayer structure. The present invention further relates to a dual stage head positioning actuator system of a hard disk drive with a plurality of disks and a plurality of vertically aligned head sliders mounted on distal ends of a plurality of suspensions via the annular piezoelectric actuators.

摘要翻译： 公开了一种压电致动器，其包括环形压电元件和基座。 沿着环形压电元件的径向存在间隙。 两个端部中的一个，即所述环形元件的固定端连接到基座，而另一端是自由的。 基座由压电材料制成。 此外，通过施加在其两个相对表面和/或其偏振方向上的电极图案，环形元件沿其圆周方向被分成两个或更多个环形部分。 当施加驱动电压时，致动器可围绕环形压电元件的中心大致产生旋转运动。 环形旋转致动器可以是单板或具有多层结构。 本发明还涉及具有多个盘的硬盘驱动器的双级头定位致动器系统和经由环形压电致动器安装在多个悬架的远端上的多个垂直对准的头滑块。

公开(公告)号：US06680826B2

公开(公告)日：2004-01-20

申请号：US09810821

申请日：2001-03-16

申请人： Masashi Shiraishi ,  Tamon Kasajima ,  Kai Wu ,  Zhihong Wang ,  Weiguang Zhu ,  Xi Yao

发明人： Masashi Shiraishi ,  Tamon Kasajima ,  Kai Wu ,  Zhihong Wang ,  Weiguang Zhu ,  Xi Yao

IPC分类号： G11B2124

CPC分类号： H01L41/096 ,  G11B5/5552

摘要： A piezoelectric device comprises an integral body of piezoelectric material having a length and width greater than its thickness; wherein the device further includes, in contact with the body, respective pairs of electrodes, wherein the electrodes of each pair are opposed in the thickness direction, wherein the body deflects along said transverse direction when a voltage is applied to the electrode pair. The present invention further provisdes a disk drive suspension and a head gimbal assembly.

摘要翻译： 一种压电装置，包括具有大于其厚度的长度和宽度的压电材料的整体; 其中所述装置还包括与所述主体接触的各对电极，其中每对电极在厚度方向上相对，其中当电压施加到所述电极对时，所述主体沿着所述横向方向偏转。 本发明进一步限制了磁盘驱动器悬架和磁头万向架组件。

公开(公告)号：US06760194B2

公开(公告)日：2004-07-06

申请号：US10369889

申请日：2003-02-19

申请人： Masashi Shiraishi ,  Tamon Kasajima ,  Kai Wu ,  Zhihong Wang ,  Weiguang Zhu ,  Xi Yao

发明人： Masashi Shiraishi ,  Tamon Kasajima ,  Kai Wu ,  Zhihong Wang ,  Weiguang Zhu ,  Xi Yao

IPC分类号： G11B2116

CPC分类号： H01L41/096 ,  G11B5/5552

摘要： A piezoelectric device comprises an integral body of piezoelectric material having a length and width greater than its thickness; wherein the device further includes, in contact with the body, respective pairs of electrodes, wherein the electrodes of each pair are opposed in the thickness direction, wherein the body deflects along said transverse direction when a voltage is applied to the electrode pair. The present invention further provisdes a disk drive suspension and a head gimbal assembly.

公开(公告)号：US20120184251A1

公开(公告)日：2012-07-19

申请号：US13432663

申请日：2012-03-28

申请人： Li Feng ,  Zhihong Wang ,  Lei Shi

发明人： Li Feng ,  Zhihong Wang ,  Lei Shi

IPC分类号： H04W4/14 ,  H04W4/12

CPC分类号： H04W4/14 ,  H04L67/1002 ,  H04L67/1034

摘要： A device and a method for processing a short message service are capable of high-reliably processing a short message service. The device for processing a short message service includes a plurality of access units and a plurality of service processing units, where each of the access units is connected to the plurality of service processing units. The access unit is configured to receive the short message service and send it to one of the service processing units, and send out the processed short message service from the service processing unit . The service processing unit is configured to process the short message service, and send out the processed short message service through one of the access units.

摘要翻译： 用于处理短消息服务的设备和方法能够高可靠地处理短消息服务。 用于处理短消息服务的设备包括多个接入单元和多个业务处理单元，其中每个接入单元连接到多个业务处理单元。 访问单元被配置为接收短消息服务并将其发送到服务处理单元之一，并从服务处理单元发出处理的短消息服务。 服务处理单元被配置为处理短消息服务，并且通过其中一个访问单元发送经处理的短消息服务。

公开(公告)号：US20120034845A1

公开(公告)日：2012-02-09

申请号：US13198635

申请日：2011-08-04

申请人： Xiaoyuan Hu ,  Zhihong Wang ,  Harry Q. Lee ,  Zhize Zhu ,  Jeffrey Drue David ,  Dominic J. Benvegnu ,  Jimin Zhang ,  Wen-Chiang Tu

发明人： Xiaoyuan Hu ,  Zhihong Wang ,  Harry Q. Lee ,  Zhize Zhu ,  Jeffrey Drue David ,  Dominic J. Benvegnu ,  Jimin Zhang ,  Wen-Chiang Tu

IPC分类号： B24B49/00 ,  B24B51/00

CPC分类号： B24B37/013 ,  B24B37/042 ,  B24B37/107 ,  B24B37/205 ,  B24B49/045 ,  B24B49/12

摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.

摘要翻译： 控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用 除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。 找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并且选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考 光谱。

公开(公告)号：US20120034844A1

公开(公告)日：2012-02-09

申请号：US12851467

申请日：2010-08-05

申请人： Jimin Zhang ,  Zhihong Wang ,  Harry Q. Lee ,  Wen-Chiang Tu

发明人： Jimin Zhang ,  Zhihong Wang ,  Harry Q. Lee ,  Wen-Chiang Tu

IPC分类号： B24B49/12

CPC分类号： B24B37/042 ,  B24B37/013 ,  B24B49/12

摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, polishing a substrate having a second layer overlying a first layer, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum to generate a sequence of best matching reference spectra, determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values, detecting exposure of the first layer, fitting a function to a portion of the sequence of index values corresponding to spectra measured after detection of exposure of the first layer, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.

摘要翻译： 控制抛光的方法包括存储具有多个参考光谱的库，多个参考光谱的每个参考光谱具有存储的相关索引值，抛光具有覆盖第一层的第二层的衬底，测量第 对于光谱序列的每个测量光谱，找到最佳匹配参考光谱以产生最佳匹配参考光谱序列，从最佳匹配参考序列确定每个最佳匹配光谱的相关索引值 光谱以产生索引值序列，检测第一层的曝光，将功能拟合到对应于在检测到第一层的曝光之后测量的光谱的索引值序列的一部分，以及确定抛光终点中的至少一个 或基于该功能的抛光速率的调整。

公开(公告)号：US20090061741A1

公开(公告)日：2009-03-05

申请号：US11849724

申请日：2007-09-04

申请人： Zhihong Wang ,  Alain Duboust ,  Wei-Yung Hsu ,  Yan Wang

发明人： Zhihong Wang ,  Alain Duboust ,  Wei-Yung Hsu ,  Yan Wang

IPC分类号： B24B7/04

CPC分类号： B24B37/042 ,  H01L21/67219

摘要： A method for processing a substrate having a conductive layer disposed thereon is provided. The substrate is coupled with a planarizing head. The planarizing head is moved to a position above a polishing pad assembly. The planarizing pad is positioned relative to the polishing pad assembly without applying a voltage to the substrate. A first voltage is applied to the substrate for a first time period. A second voltage is applied to the substrate for a second time period in order to remove a portion of the conductive layer, wherein the second voltage is greater than the first voltage. In certain embodiments, applying a first voltage to the substrate further comprises forming a uniform passivation layer on the conductive layer.

摘要翻译： 提供一种处理其上设置有导电层的基板的方法。 衬底与平坦化头结合。 平坦化头移动到抛光垫组件上方的位置。 平面化焊盘相对于抛光垫组件定位，而不向衬底施加电压。 第一次施加第一电压到基板。 向基板施加第二电压第二时间段，以便去除导电层的一部分，其中第二电压大于第一电压。 在某些实施例中，向衬底施加第一电压还包括在导电层上形成均匀的钝化层。

公开(公告)号：US20080003931A1

公开(公告)日：2008-01-03

申请号：US11562811

申请日：2006-11-22

申请人： Antoine Manens ,  Alain Duboust ,  Paul Butterfield ,  Yan Wang ,  Shi-Ping Wang ,  Zhihong Wang ,  Andrew Nagengast ,  Wei-Yung Hsu ,  Liang-Yuh Chen

发明人： Antoine Manens ,  Alain Duboust ,  Paul Butterfield ,  Yan Wang ,  Shi-Ping Wang ,  Zhihong Wang ,  Andrew Nagengast ,  Wei-Yung Hsu ,  Liang-Yuh Chen

IPC分类号： B24B53/007

CPC分类号： B24B37/30 ,  B24B55/00 ,  H01L21/67219

摘要： A carrier head and a method of cleaning the carrier head are disclosed. The carrier head may have one or more openings through a sidewall that extend into a cavity within the carrier head using a fluid passage. The openings may each have a lip. The lip may have a chamfered edge. Additionally, a fluid passage may slope generally downward from the openings to the cavity. The chamfered lips and the sloped fluid passage reduce back splashing and help ensure that sufficient rinsing fluid reaches the cavity to rinse polishing fluid and particles from the carrier head. The present invention relates to carrier heads for polishing or planarizing semiconductor substrates by chemical mechanical polishing (CMP) or electrochemical mechanical polishing (ECMP). The cavities in the carrier head are cleaned by rinsing fluid (i.e., liquid or gas) from inside the cavity towards a substrate receiving side of the carrier head.

摘要翻译： 公开了载体头和清洁载体头的方法。 载体头部可以具有穿过侧壁的一个或多个开口，该侧壁使用流体通道延伸到载体头部内的空腔中。 开口可以各自具有唇缘。 唇缘可以具有倒角边缘。 此外，流体通道可以从开口大致向下倾斜到空腔。 倒角的唇缘和倾斜的流体通道减少了飞溅，并有助于确保足够的冲洗流体到达腔体以从载体头部漂洗抛光液和颗粒。 本发明涉及用于通过化学机械抛光（CMP）或电化学机械抛光（ECMP）对半导体衬底进行抛光或平面化的载体头。 载体头部中的空腔通过从空腔内部朝向承载头的基板接收侧的冲洗流体（即，液体或气体）来清洁。

公开(公告)号：US20070153453A1

公开(公告)日：2007-07-05

申请号：US11327527

申请日：2006-01-05

申请人： You Wang ,  Renhe Jia ,  Stan Tsai ,  Yongqi Hu ,  Zhihong Wang ,  Jie Diao ,  Gerald Alonzo

发明人： You Wang ,  Renhe Jia ,  Stan Tsai ,  Yongqi Hu ,  Zhihong Wang ,  Jie Diao ,  Gerald Alonzo

IPC分类号： H05K5/00 ,  H05K3/10

CPC分类号： C25F7/00 ,  B23H5/08 ,  B24B37/20 ,  Y10T29/49155 ,  Y10T29/49156

摘要： Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a plurality of discrete members and a plurality of apertures. Each of the plurality of discrete members include a first conductive layer and a second conductive layer, with an isolation layer therebetween, and a recess for byproduct accumulation. The second conductive layer comprises a plurality of reaction surfaces that are orthogonal to the upper and lower surfaces of the pad assembly.

摘要翻译： 提供了用于处理基板的垫组件的实施例。 垫组件包括多个分立构件和多个孔。 多个离散构件中的每一个包括第一导电层和第二导电层，其间具有隔离层，以及用于副产物积累的凹部。 第二导电层包括与焊盘组件的上表面和下表面正交的多个反应表面。